What is he best known for?
The fields of study he is best known for:
- Electron
- Plasma
- Composite material
Ian G. Brown spends much of his time researching Vacuum arc, Atomic physics, Plasma, Analytical chemistry and Ion implantation.
His Vacuum arc research is multidisciplinary, incorporating elements of Thin film, Arc, Optics and Electric current.
He has included themes like Ion gun, Ion source, Ion beam, Beam and Plasma arc welding in his Atomic physics study.
The concepts of his Plasma study are interwoven with issues in Ionization and Current.
His Analytical chemistry study combines topics from a wide range of disciplines, such as Field strength, Chemical vapor deposition, Diamond and Amorphous carbon.
His study on Plasma-immersion ion implantation is often connected to Biological organism as part of broader study in Ion implantation.
His most cited work include:
- The Physics and technology of ion sources (599 citations)
- Vacuum Arc Ion Sources (408 citations)
- Nanoindentation and nanoscratching of hard carbon coatings for magnetic disks (289 citations)
What are the main themes of his work throughout his whole career to date?
His scientific interests lie mostly in Atomic physics, Vacuum arc, Ion implantation, Ion source and Ion beam.
His study in Atomic physics is interdisciplinary in nature, drawing from both Plasma arc welding, Plasma, Ion gun, Beam and Ion beam deposition.
The Vacuum arc study combines topics in areas such as Electric arc, Optoelectronics, Electric current and Analytical chemistry.
His Analytical chemistry research is multidisciplinary, relying on both Rutherford backscattering spectrometry, Thin film, Chemical vapor deposition, Amorphous carbon and Biasing.
In his study, which falls under the umbrella issue of Ion implantation, Carbon film and Nanotechnology is strongly linked to Composite material.
His studies in Ion beam integrate themes in fields like Particle accelerator and Focused ion beam.
He most often published in these fields:
- Atomic physics (43.44%)
- Vacuum arc (42.37%)
- Ion implantation (30.32%)
What were the highlights of his more recent work (between 2005-2021)?
- Ion implantation (30.32%)
- Atomic physics (43.44%)
- Ion beam (28.60%)
In recent papers he was focusing on the following fields of study:
His primary areas of investigation include Ion implantation, Atomic physics, Ion beam, Ion source and Vacuum arc.
His Ion implantation study combines topics in areas such as Composite material, Polymer, Transmission electron microscopy, Electrical resistivity and conductivity and Analytical chemistry.
The study incorporates disciplines such as Rutherford backscattering spectrometry, Colloidal gold and Ceramic in addition to Analytical chemistry.
The Atomic physics study which covers Plasma that intersects with Lens.
His work on Ion beam deposition as part of general Ion beam research is frequently linked to Macromolecule, thereby connecting diverse disciplines of science.
His research in Vacuum arc tackles topics such as Optoelectronics which are related to areas like High voltage.
Between 2005 and 2021, his most popular works were:
- Simple and inexpensive time-of-flight charge-to-mass analyzer for ion beam source characterization (63 citations)
- Upgraded vacuum arc ion source for metal ion implantation. (51 citations)
- Conducting polymer formed by low energy gold ion implantation (38 citations)
In his most recent research, the most cited papers focused on:
- Electron
- Composite material
- Optics
His main research concerns Ion implantation, Atomic physics, Composite material, Transmission electron microscopy and Analytical chemistry.
His work deals with themes such as Nanoparticle, Polymer, Layer, Vacuum arc and Metal, which intersect with Ion implantation.
His Vacuum arc research incorporates themes from Ion gun and Voltage drop.
His Atomic physics research is multidisciplinary, incorporating perspectives in Ion beam and Magnet.
His Ion beam study integrates concerns from other disciplines, such as Ion source, Time of flight and Spectrum analyzer.
In his study, Deposition, Plasma, Polishing, Lens and Electron is inextricably linked to Optoelectronics, which falls within the broad field of Analytical chemistry.
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