William I. Milne is affiliated with the University of Cambridge in the United Kingdom and works primarily in the fields of Engineering and Materials Science. Their research interests span various subfields including Electrical and Electronic Engineering, Materials Chemistry, Biomedical Engineering, and Atomic and Molecular Physics, and Optics.
Their recent research has focused on topics such as ZnO doping and properties, Thin-Film Transistor Technologies, Semiconductor materials and devices, Silicon Nanostructures and Photoluminescence, Nanowire Synthesis and Applications, Semiconductor materials and interfaces, and Advancements in Semiconductor Devices and Circuit Design.
Frequent collaborators in their research include Arokia Nathan, George Adamopoulos, Giorgos Antoniou, Dimitrios Afouxenidis, and Nathan R. Halcovitch.
William I. Milne has been recognized as a Fellow of the Royal Academy of Engineering (UK) since 2006 and also holds fellowship with the American Association for the Advancement of Science (AAAS) since 1941.
Kenneth K. S. Lau;José Bico;Kenneth B. K. Teo;Manish Chhowalla
M. Chhowalla;K. B. K. Teo;C. Ducati;N. L. Rupesinghe
A. Nathan;A. Ahnood;M. T. Cole;Sungsik Lee
P. J. Fallon;V. S. Veerasamy;C. A. Davis;J. Robertson
Oleksiy Rozhin;Andrea Ferrari;William Ireland Milne
F. Wang;A. G. Rozhin;V. Scardaci;Z. Sun
Yong Qing Fu;Yong Qing Fu;Jack Luo;Nam-Trung Nguyen;Anthony Walton
Zhigang Zhu;Luis Garcia-Gancedo;Andrew J. Flewitt;Huaqing Xie
Yong Qing Fu;Yong Qing Fu;Jikui Luo;Jikui Luo;X. Du;Andrew Flewitt
W. I. Milne;K. B. K. Teo;G. A. J. Amaratunga;P. Legagneux
K. B. K. Teo;M. Chhowalla;G. A. J. Amaratunga;W. I. Milne
B.S. Satyanarayana;A. Hart;W.I. Milne;J. Robertson
Kenneth B. K. Teo;Eric Minoux;Ludovic Hudanski;Franck Peauger
M. Chhowalla;J. Robertson;C. W. Chen;S. R. P. Silva
Shi Xu;B. K. Tay;H. S. Tan;Li Zhong
K. B. K. Teo;M. Chhowalla;G. A. J. Amaratunga;W. I. Milne
K. B.K. Teo;S. B. Lee;Manishkumar Chhowalla;V. Semet
K. W. R. Gilkes;H. S. Sands;D. N. Batchelder;J. Robertson
H.J. Qi;K.B.K. Teo;K.K.S. Lau;M.C. Boyce
M. J. Powell;C. van Berkel;A. R. Franklin;S. C. Deane
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