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Materials Science
UK
2022

D-Index & Metrics

Materials Science

D-Index
123
Citations
111507
World Ranking
431
National Ranking
17

Manish Chhowalla publication distribution in Materials Science in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Manish Chhowalla sits on this spectrum.

50–69 publications: 28 scientists 70–89 publications: 152 scientists 90–109 publications: 356 scientists 110–129 publications: 487 scientists 130–149 publications: 723 scientists 150–169 publications: 835 scientists 170–189 publications: 850 scientists 190–209 publications: 891 scientists 210–229 publications: 862 scientists 230–249 publications: 766 scientists 250–269 publications: 726 scientists 270–289 publications: 665 scientists 290–309 publications: 593 scientists 310–329 publications: 537 scientists 330–349 publications: 477 scientists 350–369 publications: 440 scientists 370–389 publications: 356 scientists 390–409 publications: 321 scientists 410–429 publications: 256 scientists 430–449 publications: 246 scientists 450–469 publications: 216 scientists 470–489 publications: 212 scientists 490–509 publications: 174 scientists 510–529 publications: 194 scientists 530–549 publications: 162 scientists 550–569 publications: 131 scientists 570–589 publications: 111 scientists 590–609 publications: 103 scientists 610–629 publications: 99 scientists 630–649 publications: 77 scientists 650–669 publications: 92 scientists 670–689 publications: 56 scientists 690–709 publications: 53 scientists 710–729 publications: 53 scientists 730–749 publications: 38 scientists 750–769 publications: 52 scientists 770–789 publications: 43 scientists 790–809 publications: 38 scientists 810–829 publications: 34 scientists 830–849 publications: 25 scientists 850–869 publications: 18 scientists 870–889 publications: 20 scientists 890–909 publications: 24 scientists 910–929 publications: 27 scientists 930–949 publications: 20 scientists 950–969 publications: 17 scientists 970–989 publications: 10 scientists 990–1,009 publications: 16 scientists 1,010–1,029 publications: 13 scientists 1,030–1,049 publications: 12 scientists 1,050–1,069 publications: 9 scientists 1,070–1,089 publications: 8 scientists 1,090–1,109 publications: 7 scientists 1,110–1,129 publications: 9 scientists 1,130–1,149 publications: 2 scientists 1,150–1,162 publications: 5 scientists 1,163+ publications: 100 scientists
50 publications 1,163+

This scientist: 351 publications — 70th percentile

70% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,163 publications or more.

Manish Chhowalla D-index placement in Materials Science in 2026

The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Manish Chhowalla sits on this spectrum.

40–41 D-Index: 211 scientists 42–43 D-Index: 450 scientists 44–45 D-Index: 612 scientists 46–47 D-Index: 612 scientists 48–49 D-Index: 598 scientists 50–51 D-Index: 657 scientists 52–53 D-Index: 667 scientists 54–55 D-Index: 621 scientists 56–57 D-Index: 597 scientists 58–59 D-Index: 610 scientists 60–61 D-Index: 587 scientists 62–63 D-Index: 606 scientists 64–65 D-Index: 533 scientists 66–67 D-Index: 490 scientists 68–69 D-Index: 469 scientists 70–71 D-Index: 378 scientists 72–73 D-Index: 421 scientists 74–75 D-Index: 359 scientists 76–77 D-Index: 323 scientists 78–79 D-Index: 299 scientists 80–81 D-Index: 230 scientists 82–83 D-Index: 210 scientists 84–85 D-Index: 195 scientists 86–87 D-Index: 203 scientists 88–89 D-Index: 175 scientists 90–91 D-Index: 175 scientists 92–93 D-Index: 142 scientists 94–95 D-Index: 121 scientists 96–97 D-Index: 117 scientists 98–99 D-Index: 107 scientists 100–101 D-Index: 88 scientists 102–103 D-Index: 85 scientists 104–105 D-Index: 68 scientists 106–107 D-Index: 62 scientists 108–109 D-Index: 57 scientists 110–111 D-Index: 45 scientists 112–113 D-Index: 49 scientists 114–115 D-Index: 50 scientists 116–117 D-Index: 34 scientists 118–119 D-Index: 38 scientists 120–121 D-Index: 37 scientists 122–123 D-Index: 29 scientists 124–125 D-Index: 28 scientists 126–127 D-Index: 24 scientists 128–129 D-Index: 33 scientists 130–131 D-Index: 28 scientists 132–133 D-Index: 21 scientists 134–135 D-Index: 20 scientists 136–137 D-Index: 23 scientists 138–139 D-Index: 17 scientists 140–141 D-Index: 12 scientists 142–143 D-Index: 17 scientists 144–145 D-Index: 21 scientists 146–147 D-Index: 13 scientists 148–149 D-Index: 11 scientists 150–151 D-Index: 14 scientists 152–153 D-Index: 13 scientists 154–155 D-Index: 9 scientists 156–157 D-Index: 10 scientists 158–159 D-Index: 7 scientists 160–161 D-Index: 4 scientists 162–163 D-Index: 4 scientists 164 D-Index: 3 scientists 165+ D-Index: 98 scientists
40 D-Index 165+

This scientist: 123 D-Index — 97th percentile

97% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 165 D-Index or more.

Research.com Recognitions

  • 2022 - Research.com Materials Science in United Kingdom Leader Award
  • 2017 - Fellow of the Materials Research Society For seminal contributions in elucidating the fundamental role of disorder and structural phases on properties of low dimensional materials such as amorphous carbon films, graphene oxide and 2D transition-metal dichalcogenides.

Overview

Manish Chhowalla is affiliated with the University of Cambridge in the United Kingdom. Their research primarily spans the fields of Materials Science and Engineering, with a significant focus on Materials Chemistry and Electrical and Electronic Engineering in particular.

The scientist's work extensively covers topics such as:

  • 2D Materials and Applications
  • Graphene research and applications
  • Advancements in Battery Materials
  • MXene and MAX Phase Materials
  • Advanced Battery Materials and Technologies
  • Perovskite Materials and Applications
  • Advanced Photocatalysis Techniques

Chhowalla has a series of recent publications that include the following:

  • "Recent Advances in Design of Electrocatalysts for High-Current-Density Water Splitting" (2021), published in Advanced Materials
  • "Chemical vapour deposition" (2021), published in Nature Reviews Methods Primers
  • "Lithiated metallic molybdenum disulfide nanosheets for high-performance lithium-sulfur batteries" (2023), published in Nature Energy
  • "Ultralow-dielectric-constant amorphous boron nitride" (2020), published in Nature
  • "P-type electrical contacts for 2D transition-metal dichalcogenides" (2022), published in Nature

The scientist frequently collaborates with co-authors such as Yan Wang, Soumya Sarkar, Han Yan, Zhuangnan Li, and Yiru Zhu, indicating a collaborative research environment.

Chhowalla's publications appear regularly in several prominent venues including:

  • ACS Nano
  • arXiv (Cornell University)
  • Nature
  • Nano Letters
  • MRS Energy & Sustainability

In terms of recognition, the scientist was awarded the title of Fellow of the Materials Research Society in 2017. This honor was granted for contributions related to understanding the roles of disorder and structural phases on properties of low dimensional materials such as amorphous carbon films, graphene oxide, and 2D transition-metal dichalcogenides.

Best Publications

  • The chemistry of two-dimensional layered transition metal dichalcogenide nanosheets

    Manishkumar Chhowalla;Hyeon Suk Shin;Goki Eda;Lain Jong Li

  • Large-area ultrathin films of reduced graphene oxide as a transparent and flexible electronic material

    Goki Eda;Giovanni Fanchini;Manish Chhowalla

  • Photoluminescence from Chemically Exfoliated MoS2

    Goki Eda;Goki Eda;Hisato Yamaguchi;Damien Voiry;Takeshi Fujita

  • Liquid Exfoliation of Layered Materials

    Valeria Nicolosi;Manish Chhowalla;Mercouri G. Kanatzidis;Michael S. Strano

  • Graphene oxide as a chemically tunable platform for optical applications

    Kian Ping Loh;Qiaoliang Bao;Goki Eda;Manishkumar Chhowalla;Manishkumar Chhowalla

  • High-efficiency solution-processed perovskite solar cells with millimeter-scale grains

    Wanyi Nie;Hsinhan Tsai;Reza Asadpour;Jean Christophe Blancon

  • Metallic 1T phase MoS2 nanosheets as supercapacitor electrode materials

    Muharrem Acerce;Damien Voiry;Manish Chhowalla

  • Enhanced catalytic activity in strained chemically exfoliated WS 2 nanosheets for hydrogen evolution

    Damien Voiry;Hisato Yamaguchi;Junwen Li;Rafael Silva

  • Enhanced Catalytic Activity in Strained Chemically Exfoliated WS2 Nanosheets for Hydrogen Evolution

    Damien Voiry;Hisato Yamaguchi;Junwen Li;Rafael Silva

  • Chemically derived graphene oxide: towards large-area thin-film electronics and optoelectronics.

    Goki Eda;Manishkumar Chhowalla

  • Blue photoluminescence from chemically derived graphene oxide

    Goki Eda;Yun-Yue Lin;Cecilia Mattevi;Cecilia Mattevi;Hisato Yamaguchi

  • Conducting MoS2 Nanosheets as Catalysts for Hydrogen Evolution Reaction

    Damien Voiry;Maryam Salehi;Rafael Silva;Takeshi Fujita

  • Structural evolution during the reduction of chemically derived graphene oxide

    Akbar Bagri;Cecilia Mattevi;Cecilia Mattevi;Muge Acik;Yves J. Chabal

  • Superhydrophobic Carbon Nanotube Forests

    Kenneth K. S. Lau;José Bico;Kenneth B. K. Teo;Manish Chhowalla

  • Evolution of Electrical, Chemical, and Structural Properties of Transparent and Conducting Chemically Derived Graphene Thin Films

    Cecilia Mattevi;Goki Eda;Stefano Agnoli;Steve Miller

  • Phase-engineered low-resistance contacts for ultrathin MoS2 transistors.

    Rajesh Kappera;Damien Voiry;Sibel Ebru Yalcin;Brittany Branch

  • A review of chemical vapour deposition of graphene on copper

    Cecilia Mattevi;Hokwon Kim;Manish Chhowalla;Manish Chhowalla

  • Two-dimensional semiconductors for transistors

    Manishkumar Chhowalla;Debdeep Jena;Hua Zhang

  • Growth process conditions of vertically aligned carbon nanotubes using plasma enhanced chemical vapor deposition

    M. Chhowalla;K. B. K. Teo;C. Ducati;N. L. Rupesinghe

  • Atomic and Electronic Structure of Graphene-Oxide

    K. Andre Mkhoyan;Alexander W. Contryman;John Silcox;Derek A. Stewart

Frequent Co-Authors

Damien Voiry
Damien Voiry University of Montpellier
Gehan A. J. Amaratunga
Gehan A. J. Amaratunga University of Cambridge
Goki Eda
Goki Eda National University of Singapore
Cecilia Mattevi
Cecilia Mattevi Imperial College London
William I. Milne
William I. Milne University of Cambridge
Aditya D. Mohite
Aditya D. Mohite Rice University
Gautam Gupta
Gautam Gupta University of Louisville
Mingwei Chen
Mingwei Chen Southern University of Science and Technology
Takeshi Fujita
Takeshi Fujita Kochi University of Technology
Andrew T. S. Wee
Andrew T. S. Wee National University of Singapore

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