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Materials Science
Singapore
2026
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Materials Science
China
2025

D-Index & Metrics

Materials Science

D-Index
140
Citations
91225
World Ranking
231
National Ranking
7

Research.com Recognitions

  • 2026 - Research.com Materials Science in Singapore Leader Award
  • 2025 - Research.com Materials Science in China Leader Award
  • 2022 - Research.com Materials Science in China Leader Award

Overview

Lain-Jong Li is affiliated with the University of Hong Kong in China and focuses on research primarily within Materials Science and Engineering.

Their work spans several specific subfields, including Materials Chemistry, Electrical and Electronic Engineering, Biomedical Engineering, Renewable Energy, Sustainability and the Environment, and Atomic and Molecular Physics, and Optics.

The main topics of Lain-Jong Li's research include:

  • 2D Materials and Applications
  • Graphene research and applications
  • Perovskite Materials and Applications
  • MXene and MAX Phase Materials
  • Ferroelectric and Negative Capacitance Devices
  • Advanced Memory and Neural Computing
  • Electronic and Structural Properties of Oxides

Lain-Jong Li has published extensively in notable scientific venues. The frequent publication journals include:

  • ACS Nano
  • Nature Communications
  • Nano Letters
  • Advanced Materials
  • Nature

Some of the recent published papers are:

  • "Ultralow contact resistance between semimetal and monolayer semiconductors," 2021, Nature
  • "Transistors based on two-dimensional materials for future integrated circuits," 2021, Nature Electronics
  • "Strain engineering and epitaxial stabilization of halide perovskites," 2020, Nature
  • "Wafer-scale single-crystal hexagonal boron nitride monolayers on Cu (111)," 2020, Nature
  • "Recent Progress on Two-Dimensional Materials," 2021, Acta Physico-Chimica Sinica

The frequent co-authors collaborating with Lain-Jong Li include:

  • Vincent Tung
  • Yi Wan
  • Areej Aljarb
  • Wen-Hao Chang
  • Jing-Kai Huang

Best Publications

  • The chemistry of two-dimensional layered transition metal dichalcogenide nanosheets

    Manishkumar Chhowalla;Hyeon Suk Shin;Goki Eda;Lain Jong Li

  • Synthesis of Large‐Area MoS2 Atomic Layers with Chemical Vapor Deposition

    Yi-Hsien Lee;Xin-Quan Zhang;Wenjing Zhang;Mu-Tung Chang

  • Janus monolayers of transition metal dichalcogenides

    Ang Yu Lu;Hanyu Zhu;Jun Xiao;Chih Piao Chuu

  • Growth of Large-Area and Highly Crystalline MoS2 Thin Layers on Insulating Substrates

    Keng Ku Liu;Wenjing Zhang;Yi Hsien Lee;Yu Chuan Lin

  • Integrated Circuits Based on Bilayer MoS2 Transistors

    Han Wang;Lili Yu;Yi-Hsien Lee;Yi-Hsien Lee;Yumeng Shi

  • Graphene and two-dimensional materials for silicon technology.

    Deji Akinwande;Cedric Huyghebaert;Ching-Hua Wang;Martha I. Serna

  • A 45nm Logic Technology with High-k+Metal Gate Transistors, Strained Silicon, 9 Cu Interconnect Layers, 193nm Dry Patterning, and 100% Pb-free Packaging

    K. Mistry;C. Allen;C. Auth;B. Beattie

  • Monolayer MoS2 Heterojunction Solar Cells

    Meng-Lin Tsai;Meng-Lin Tsai;Sheng-Han Su;Sheng-Han Su;Jan-Kai Chang;Dung-Sheng Tsai

  • Synthesis of Few-Layer Hexagonal Boron Nitride Thin Film by Chemical Vapor Deposition

    Yumeng Shi;Christoph Hamsen;Christoph Hamsen;Xiaoting Jia;Ki Kang Kim

  • Ultralow contact resistance between semimetal and monolayer semiconductors.

    Pin-Chun Shen;Cong Su;Yuxuan Lin;Yuxuan Lin;Ang-Sheng Chou;Ang-Sheng Chou

  • Large-area synthesis of highly crystalline WSe2 monolayers and device applications

    Jing Kai Huang;Jiang Pu;Chang Lung Hsu;Ming Hui Chiu

  • High-Quality Thin Graphene Films from Fast Electrochemical Exfoliation

    Ching Yuan Su;Ang Yu Lu;Ang Yu Lu;Yanping Xu;Fu Rong Chen

  • Epitaxial growth of a monolayer WSe2-MoS2 lateral p-n junction with an atomically sharp interface

    Ming Yang Li;Yumeng Shi;Chia Chin Cheng;Li Syuan Lu

  • van der Waals Epitaxy of MoS2 Layers Using Graphene As Growth Templates

    Yumeng Shi;Wu Zhou;Wu Zhou;Ang-Yu Lu;Wenjing Fang

  • Ultrahigh-Gain Photodetectors Based on Atomically Thin Graphene-MoS2 Heterostructures

    Wenjing Zhang;Chih Piao Chuu;Jing Kai Huang;Chang Hsiao Chen

  • High-gain phototransistors based on a CVD MoS₂ monolayer.

    Wenjing Zhang;Jing Kai Huang;Chang Hsiao Chen;Yung Huang Chang

  • Large-Area Aiming Synthesis of WSe2 Monolayers

    Jing-Kai Huang;Jiang Pu;Chih-Piao Chuu;Chang-Lung Hsu

  • Highly flexible MoS2 thin-film transistors with ion gel dielectrics.

    Jiang Pu;Yohei Yomogida;Keng Ku Liu;Lain Jong Li

  • Recent advances in controlled synthesis of two-dimensional transition metal dichalcogenides via vapour deposition techniques

    Yumeng Shi;Henan Li;Lain Jong Li

  • Transistors based on two-dimensional materials for future integrated circuits

    Saptarshi Das;Amritanand Sebastian;Eric Pop;Connor J. McClellan

  • Wafer-Scale MoS2 Thin Layers Prepared by MoO3 Sulfurization

    Yu Chuan Lin;Wenjing Zhang;Jing Kai Huang;Jing Kai Huang;Keng Ku Liu

  • Highly Efficient Electrocatalytic Hydrogen Production by MoSx Grown on Graphene‐Protected 3D Ni Foams

    Yung Huang Chang;Cheng Te Lin;Tzu Yin Chen;Chang Lung Hsu

Frequent Co-Authors

Yumeng Shi
Yumeng Shi Shenzhen University
Wen-Hao Chang
Wen-Hao Chang National Yang Ming Chiao Tung University
Wenjing Zhang
Wenjing Zhang East China University of Science and Technology
Cheng-Te Lin
Cheng-Te Lin Chinese Academy of Sciences
Taishi Takenobu
Taishi Takenobu Nagoya University
Chih-Wei Chu
Chih-Wei Chu Academia Sinica
Yuan Chen
Yuan Chen University of Sydney
Kung-Hwa Wei
Kung-Hwa Wei National Yang Ming Chiao Tung University
Yi-Hsien Lee
Yi-Hsien Lee National Tsing Hua University
Mary B. Chan-Park
Mary B. Chan-Park Nanyang Technological University

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