J.-E. Sundgren

J.-E. Sundgren publication distribution in Materials Science in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where J.-E. Sundgren sits on this spectrum.

J.-E. Sundgren D-index placement in Materials Science in 2026

The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where J.-E. Sundgren sits on this spectrum.

Overview

Best Publications

• Structure and properties of TiN coatings

  J.-E. Sundgren

  1276
  Citations

• Growth of single-crystal TiN/VN strained-layer superlattices with extremely high mechanical hardness

  U. Helmersson;S. Todorova;S. A. Barnett;J.‐E. Sundgren

  981
  Citations

• Superhard and elastic carbon nitride thin films having fullerenelike microstructure.

  H. Sjöström;S. Stafström;M. Boman;J. E. Sundgren

  834
  Citations

• Oxidation of metastable single‐phase polycrystalline Ti0.5Al0.5N films: Kinetics and mechanisms

  D. McIntyre;J. E. Greene;G. Håkansson;J.‐E. Sundgren

  682
  Citations

• Role of nitrogen in the formation of hard and elastic CN x thin films by reactive magnetron sputtering

  Niklas Hellgren;Mats P. Johansson;Esteban Broitman;Lars Hultman

  549
  Citations

• Development of preferred orientation in polycrystalline TiN layers grown by ultrahigh vacuum reactive magnetron sputtering

  J. E. Greene;J.‐E. Sundgren;L. Hultman;I. Petrov

  452
  Citations

• Mechanisms of reactive sputtering of titanium nitride and titanium carbide II: Morphology and structure

  J.-E. Sundgren;B.-O. Johansson;S.-E. Karlsson;H.T.G. Hentzell

  388
  Citations

• Microstructure modification of TiN by ion bombardment during reactive sputter deposition

  I. Petrov;L. Hultman;U. Helmersson;J.-E. Sundgren

  380
  Citations

• Microstructure and physical properties of polycrystalline metastable Ti0.5Al0.5N alloys grown by d.c. magnetron sputter deposition

  G. Håkansson;J.-E. Sundgren;D. McIntyre;J.E. Greene

  334
  Citations

• Growth of poly- and single-crystal ScN on MgO(001): Role of low-energy N2+ irradiation in determining texture, microstructure evolution, and mechanical properties

  D. Gall;I. Petrov;N. Hellgren;L. Hultman

  319
  Citations

• Nanoindentation studies of single‐crystal (001)‐, (011)‐, and (111)‐oriented TiN layers on MgO

  H. Ljungcrantz;M. Odén;L. Hultman;J. E. Greene

  296
  Citations

• Polycrystalline TiN films deposited by reactive bias magnetron sputtering: Effects of ion bombardment on resputtering rates, film composition, and microstructure

  I. Petrov;L. Hultman;J.‐E. Sundgren;J. E. Greene

  294
  Citations

• High‐flux low‐energy (≂20 eV) N+2 ion irradiation during TiN deposition by reactive magnetron sputtering: Effects on microstructure and preferred orientation

  L. Hultman;J.‐E. Sundgren;J. E. Greene;D. B. Bergstrom

  293
  Citations

• Crystal growth and microstructure of polycrystalline Ti1−xAlxN alloy films deposited by ultra-high-vacuum dual-target magnetron sputtering

  U. Wahlström;L. Hultman;J.-E. Sundgren;F. Adibi

  288
  Citations

• Average energy deposited per atom : a universal parameter for describing ion-assisted film growth ?

  I. Petrov;F. Adibi;J. E. Greene;L. Hultman

  277
  Citations

• Synthesis of metastable epitaxial zinc‐blende‐structure AlN by solid‐state reaction

  I. Petrov;E. Mojab;R. C. Powell;J. E. Greene

  270
  Citations

• Structural and mechanical properties of carbon nitride CNx (0.2⩽x⩽0.35) films

  H. Sjöström;L. Hultman;J.‐E. Sundgren;S. V. Hainsworth

  264
  Citations

• Growth and properties of single crystal TiN films deposited by reactive magnetron sputtering

  B. O. Johansson;J.‐E. Sundgren;J. E. Greene;A. Rockett

  258
  Citations

• Mechanisms of reactive sputtering of titanium nitride and titanium carbide I: Influence of process parameters on film composition

  J.-E. Sundgren;B.-O. Johansson;S.-E. Karlsson

  254
  Citations

• Effects of high‐flux low‐energy (20–100 eV) ion irradiation during deposition on the microstructure and preferred orientation of Ti0.5Al0.5N alloys grown by ultra‐high‐vacuum reactive magnetron sputtering

  F. Adibi;I. Petrov;J. E. Greene;L. Hultman

  232
  Citations