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Materials Science

D-Index
67
Citations
17718
World Ranking
5070
National Ranking
51

Overview

J.-E. Sundgren is affiliated with Chalmers University of Technology in Sweden. Their research output includes work published in renowned scientific venues, with a recent focus on materials science. Sundgren has contributed to advancing knowledge in sustainable materials through collaborative studies.

The following recent paper exemplifies their research contributions:

  • Advanced materials provide solutions towards a sustainable world (2024), published in Nature Materials

This publication reflects Sundgren's engagement with current challenges in developing materials that support sustainability goals.

Co-authorship is a significant aspect of Sundgren's work, involving collaboration with several researchers. Frequent co-authors include:

  • Lars Hultman
  • Sara Mazur
  • Caroline Ankarcrona
  • Anders E. C. Palmqvist
  • Maria Abrahamsson

Their collaborative publications have appeared in prominent scientific venues, with Nature Materials being the frequent platform for dissemination of their research:

  • Nature Materials

Sundgren's research is situated primarily within the broad field of advanced materials science, with a particular emphasis on solutions that contribute to sustainability. This focus aligns with contemporary scientific priorities addressing environmental and technological challenges.

Best Publications

  • Structure and properties of TiN coatings

    J.-E. Sundgren

  • Growth of single-crystal TiN/VN strained-layer superlattices with extremely high mechanical hardness

    U. Helmersson;S. Todorova;S. A. Barnett;J.‐E. Sundgren

  • Superhard and elastic carbon nitride thin films having fullerenelike microstructure.

    H. Sjöström;S. Stafström;M. Boman;J. E. Sundgren

  • Oxidation of metastable single‐phase polycrystalline Ti0.5Al0.5N films: Kinetics and mechanisms

    D. McIntyre;J. E. Greene;G. Håkansson;J.‐E. Sundgren

  • Role of nitrogen in the formation of hard and elastic CN x thin films by reactive magnetron sputtering

    Niklas Hellgren;Mats P. Johansson;Esteban Broitman;Lars Hultman

  • Development of preferred orientation in polycrystalline TiN layers grown by ultrahigh vacuum reactive magnetron sputtering

    J. E. Greene;J.‐E. Sundgren;L. Hultman;I. Petrov

  • Mechanisms of reactive sputtering of titanium nitride and titanium carbide II: Morphology and structure

    J.-E. Sundgren;B.-O. Johansson;S.-E. Karlsson;H.T.G. Hentzell

  • Microstructure modification of TiN by ion bombardment during reactive sputter deposition

    I. Petrov;L. Hultman;U. Helmersson;J.-E. Sundgren

  • Microstructure and physical properties of polycrystalline metastable Ti0.5Al0.5N alloys grown by d.c. magnetron sputter deposition

    G. Håkansson;J.-E. Sundgren;D. McIntyre;J.E. Greene

  • Growth of poly- and single-crystal ScN on MgO(001): Role of low-energy N2+ irradiation in determining texture, microstructure evolution, and mechanical properties

    D. Gall;I. Petrov;N. Hellgren;L. Hultman

  • Nanoindentation studies of single‐crystal (001)‐, (011)‐, and (111)‐oriented TiN layers on MgO

    H. Ljungcrantz;M. Odén;L. Hultman;J. E. Greene

  • Polycrystalline TiN films deposited by reactive bias magnetron sputtering: Effects of ion bombardment on resputtering rates, film composition, and microstructure

    I. Petrov;L. Hultman;J.‐E. Sundgren;J. E. Greene

  • High‐flux low‐energy (≂20 eV) N+2 ion irradiation during TiN deposition by reactive magnetron sputtering: Effects on microstructure and preferred orientation

    L. Hultman;J.‐E. Sundgren;J. E. Greene;D. B. Bergstrom

  • Crystal growth and microstructure of polycrystalline Ti1−xAlxN alloy films deposited by ultra-high-vacuum dual-target magnetron sputtering

    U. Wahlström;L. Hultman;J.-E. Sundgren;F. Adibi

  • Average energy deposited per atom : a universal parameter for describing ion-assisted film growth ?

    I. Petrov;F. Adibi;J. E. Greene;L. Hultman

  • Synthesis of metastable epitaxial zinc‐blende‐structure AlN by solid‐state reaction

    I. Petrov;E. Mojab;R. C. Powell;J. E. Greene

  • Structural and mechanical properties of carbon nitride CNx (0.2⩽x⩽0.35) films

    H. Sjöström;L. Hultman;J.‐E. Sundgren;S. V. Hainsworth

  • Growth and properties of single crystal TiN films deposited by reactive magnetron sputtering

    B. O. Johansson;J.‐E. Sundgren;J. E. Greene;A. Rockett

  • Mechanisms of reactive sputtering of titanium nitride and titanium carbide I: Influence of process parameters on film composition

    J.-E. Sundgren;B.-O. Johansson;S.-E. Karlsson

  • Effects of high‐flux low‐energy (20–100 eV) ion irradiation during deposition on the microstructure and preferred orientation of Ti0.5Al0.5N alloys grown by ultra‐high‐vacuum reactive magnetron sputtering

    F. Adibi;I. Petrov;J. E. Greene;L. Hultman

Frequent Co-Authors

Lars Hultman
Lars Hultman Linköping University
Joseph E Greene
Joseph E Greene University of Illinois at Urbana-Champaign
Jens Birch
Jens Birch Linköping University
Ivan Petrov
Ivan Petrov University of Illinois at Urbana-Champaign
Scott A. Barnett
Scott A. Barnett Northwestern University
Ulf Helmersson
Ulf Helmersson Linköping University
Magnus Willander
Magnus Willander Linköping University
Angus Rockett
Angus Rockett Colorado School of Mines
Erik Janzén
Erik Janzén Linköping University
William R. Salaneck
William R. Salaneck Linköping University

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