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Engineering and Technology

D-Index
39
Citations
5614
World Ranking
7746
National Ranking
2127

Overview

M. L. Alles is affiliated with Vanderbilt University in the United States and has focused their academic work predominantly in the field of Engineering. Their research specialization centers on Electrical and Electronic Engineering, with contributions also spanning Condensed Matter Physics, Materials Chemistry, Electronic, Optical and Magnetic Materials, and Information Systems.

The primary research topics addressed by Alles include Radiation Effects in Electronics and Semiconductor Materials and Devices. Additional areas of investigation cover Advancements in Semiconductor Devices and Circuit Design, Silicon Carbide Semiconductor Technologies, Integrated Circuits and Semiconductor Failure Analysis, GaN-based Semiconductor Devices and Materials, and Electrostatic Discharge in Electronics.

Alles has authored numerous papers, with recent publications including the following:

  • "Effects of Breakdown Voltage on Single-Event Burnout Tolerance of High-Voltage SiC Power MOSFETs," 2021, IEEE Transactions on Nuclear Science
  • "Low-Energy Ion-Induced Single-Event Burnout in Gallium Oxide Schottky Diodes," 2023, IEEE Transactions on Nuclear Science
  • "Impact of Heavy-Ion Range on Single-Event Effects in Silicon Carbide Power Junction Barrier Schottky Diodes," 2023, IEEE Transactions on Nuclear Science
  • "LET and Voltage Dependence of Single-Event Burnout and Single-Event Leakage Current in High-Voltage SiC Power Devices," 2024, IEEE Transactions on Nuclear Science
  • "Total Ionizing Dose Responses of 22-nm FDSOI and 14-nm Bulk FinFET Charge-Trap Transistors," 2021, IEEE Transactions on Nuclear Science

The main publication venues for Alles's work include:

  • IEEE Transactions on Nuclear Science
  • IEEE Transactions on Electron Devices
  • IEEE Electron Device Letters
  • The International Journal of Digital Accounting Research
  • Materials Science Forum

Frequent co-authors collaborating with Alles comprise Ronald D. Schrimpf, Robert A. Reed, En Xia Zhang, Dennis R. Ball, and Daniel M. Fleetwood. These collaborative relationships are reflected in multiple publications spanning various topics related to semiconductor devices and radiation effects.

Best Publications

  • Charge Collection and Charge Sharing in a 130 nm CMOS Technology

    O.A. Amusan;A.F. Witulski;L.W. Massengill;B.L. Bhuva

  • The contribution of nuclear reactions to heavy ion single event upset cross-section measurements in a high-density SEU hardened SRAM

    K.M. Warren;R.A. Weller;M.H. Mendenhall;R.A. Reed

  • A Bias-Dependent Single-Event Compact Model Implemented Into BSIM4 and a 90 nm CMOS Process Design Kit

    J.S. Kauppila;A.L. Sternberg;M.L. Alles;A.M. Francis

  • Radiation Effects in Advanced Multiple Gate and Silicon-on-Insulator Transistors

    E. Simoen;M. Gaillardin;P. Paillet;R. A. Reed

  • HBD layout isolation techniques for multiple node charge collection mitigation

    J.D. Black;A.L. Sternberg;M.L. Alles;A.F. Witulski

  • Analysis of Parasitic PNP Bipolar Transistor Mitigation Using Well Contacts in 130 nm and 90 nm CMOS Technology

    B.D. Olson;O.A. Amusan;S. Dasgupta;L.W. Massengill

  • Effect of Well and Substrate Potential Modulation on Single Event Pulse Shape in Deep Submicron CMOS

    S. DasGupta;A.F. Witulski;B.L. Bhuva;M.L. Alles

  • Two-dimensional methodology for modeling radiation-induced off-state leakage in CMOS technologies

    I.S. Esqueda;H.J. Barnaby;M.L. Alles

  • Ion-Induced Energy Pulse Mechanism for Single-Event Burnout in High-Voltage SiC Power MOSFETs and Junction Barrier Schottky Diodes

    D. R. Ball;J. M. Hutson;A. Javanainen;J.-M. Lauenstein

  • Directional Sensitivity of Single Event Upsets in 90 nm CMOS Due to Charge Sharing

    O.A. Amusan;L.W. Massengill;M.P. Baze;B.L. Bhuva

  • Technology scaling and soft error reliability

    Lloyd W. Massengill;Bharat L. Bhuva;W. Timothy Holman;Michael L. Alles

  • Single-event charge enhancement in SOI devices

    L.W. Massengill;E.V. Kerns;S.E. Kerns;M.L. Alles

  • A Comparison of the SEU Response of Planar and FinFET D Flip-Flops at Advanced Technology Nodes

    Patrick Nsengiyumva;Dennis R. Ball;Jeffrey S. Kauppila;Nelson Tam

  • Model for CMOS/SOI single-event vulnerability

    S.E. Kerns;L.W. Massengill;D.V. Kerns;M.L. Alles

  • Implantation process using sub-stoichiometric, oxygen doses at different energies

    Robert P. Dolan;Bernhardt F. Cordts;Maria J. Anc;Michael L. Alles

  • Low-Energy X-ray and Ozone-Exposure Induced Defect Formation in Graphene Materials and Devices

    En Xia Zhang;A. K. M. Newaz;Bin Wang;S. Bhandaru

  • The Impact of X-Ray and Proton Irradiation on ${ m HfO}_2/{ m Hf}$ -Based Bipolar Resistive Memories

    J. S. Bi;Z. S. Han;E. X. Zhang;M. W. McCurdy

  • The Impact of Delta-Rays on Single-Event Upsets in Highly Scaled SOI SRAMs

    M P King;R A Reed;R A Weller;M H Mendenhall

  • Single Event Mechanisms in 90 nm Triple-Well CMOS Devices

    T. Roy;A.F. Witulski;R.D. Schrimpf;M.L. Alles

  • Geometry Dependence of Total-Dose Effects in Bulk FinFETs

    I. Chatterjee;E. X. Zhang;B. L. Bhuva;R. A. Reed

  • Analysis of TID Process, Geometry, and Bias Condition Dependence in 14-nm FinFETs and Implications for RF and SRAM Performance

    M. P. King;X. Wu;M. Eller;S. Samavedam

  • Substrate Engineering Concepts to Mitigate Charge Collection in Deep Trench Isolation Technologies

    J.A. Pellish;R.A. Reed;R.D. Schrimpf;M.L. Alles

  • Ozone-exposure and annealing effects on graphene-on-SiO2 transistors

    E. X. Zhang;A. K. M. Newaz;B. Wang;C. X. Zhang

Frequent Co-Authors

Ronald D. Schrimpf
Ronald D. Schrimpf Vanderbilt University
Robert A. Reed
Robert A. Reed Vanderbilt University
Daniel M. Fleetwood
Daniel M. Fleetwood Vanderbilt University
Lloyd W. Massengill
Lloyd W. Massengill Vanderbilt University
Bharat L. Bhuva
Bharat L. Bhuva Vanderbilt University
Robert A. Weller
Robert A. Weller Woods Hole Oceanographic Institution
Andrew L. Sternberg
Andrew L. Sternberg Vanderbilt University
Arthur F. Witulski
Arthur F. Witulski Vanderbilt University
John D. Cressler
John D. Cressler Georgia Institute of Technology

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