M. L. Alles is affiliated with Vanderbilt University in the United States and has focused their academic work predominantly in the field of Engineering. Their research specialization centers on Electrical and Electronic Engineering, with contributions also spanning Condensed Matter Physics, Materials Chemistry, Electronic, Optical and Magnetic Materials, and Information Systems.
The primary research topics addressed by Alles include Radiation Effects in Electronics and Semiconductor Materials and Devices. Additional areas of investigation cover Advancements in Semiconductor Devices and Circuit Design, Silicon Carbide Semiconductor Technologies, Integrated Circuits and Semiconductor Failure Analysis, GaN-based Semiconductor Devices and Materials, and Electrostatic Discharge in Electronics.
Alles has authored numerous papers, with recent publications including the following:
The main publication venues for Alles's work include:
Frequent co-authors collaborating with Alles comprise Ronald D. Schrimpf, Robert A. Reed, En Xia Zhang, Dennis R. Ball, and Daniel M. Fleetwood. These collaborative relationships are reflected in multiple publications spanning various topics related to semiconductor devices and radiation effects.
O.A. Amusan;A.F. Witulski;L.W. Massengill;B.L. Bhuva
K.M. Warren;R.A. Weller;M.H. Mendenhall;R.A. Reed
J.S. Kauppila;A.L. Sternberg;M.L. Alles;A.M. Francis
E. Simoen;M. Gaillardin;P. Paillet;R. A. Reed
J.D. Black;A.L. Sternberg;M.L. Alles;A.F. Witulski
B.D. Olson;O.A. Amusan;S. Dasgupta;L.W. Massengill
S. DasGupta;A.F. Witulski;B.L. Bhuva;M.L. Alles
I.S. Esqueda;H.J. Barnaby;M.L. Alles
D. R. Ball;J. M. Hutson;A. Javanainen;J.-M. Lauenstein
O.A. Amusan;L.W. Massengill;M.P. Baze;B.L. Bhuva
Lloyd W. Massengill;Bharat L. Bhuva;W. Timothy Holman;Michael L. Alles
L.W. Massengill;E.V. Kerns;S.E. Kerns;M.L. Alles
Patrick Nsengiyumva;Dennis R. Ball;Jeffrey S. Kauppila;Nelson Tam
S.E. Kerns;L.W. Massengill;D.V. Kerns;M.L. Alles
Robert P. Dolan;Bernhardt F. Cordts;Maria J. Anc;Michael L. Alles
En Xia Zhang;A. K. M. Newaz;Bin Wang;S. Bhandaru
J. S. Bi;Z. S. Han;E. X. Zhang;M. W. McCurdy
M P King;R A Reed;R A Weller;M H Mendenhall
T. Roy;A.F. Witulski;R.D. Schrimpf;M.L. Alles
I. Chatterjee;E. X. Zhang;B. L. Bhuva;R. A. Reed
M. P. King;X. Wu;M. Eller;S. Samavedam
J.A. Pellish;R.A. Reed;R.D. Schrimpf;M.L. Alles
E. X. Zhang;A. K. M. Newaz;B. Wang;C. X. Zhang
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