World's Best Scientists 2026 revealed!

D-Index & Metrics

Electronics and Electrical Engineering

D-Index
40
Citations
8230
World Ranking
4429
National Ranking
1579

Arthur F. Witulski publication distribution in Electronics and Electrical Engineering in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Electronics and Electrical Engineering in 2026. The highlighted bar marks where Arthur F. Witulski sits on this spectrum.

34–53 publications: 24 scientists 54–73 publications: 52 scientists 74–93 publications: 114 scientists 94–113 publications: 203 scientists 114–133 publications: 269 scientists 134–153 publications: 355 scientists 154–173 publications: 403 scientists 174–193 publications: 445 scientists 194–213 publications: 430 scientists 214–233 publications: 431 scientists 234–253 publications: 399 scientists 254–273 publications: 366 scientists 274–293 publications: 335 scientists 294–313 publications: 300 scientists 314–333 publications: 276 scientists 334–353 publications: 250 scientists 354–373 publications: 214 scientists 374–393 publications: 187 scientists 394–413 publications: 152 scientists 414–433 publications: 169 scientists 434–453 publications: 147 scientists 454–473 publications: 111 scientists 474–493 publications: 117 scientists 494–513 publications: 103 scientists 514–533 publications: 99 scientists 534–553 publications: 92 scientists 554–573 publications: 75 scientists 574–593 publications: 58 scientists 594–613 publications: 69 scientists 614–633 publications: 50 scientists 634–653 publications: 62 scientists 654–673 publications: 54 scientists 674–693 publications: 44 scientists 694–713 publications: 37 scientists 714–733 publications: 28 scientists 734–753 publications: 26 scientists 754–773 publications: 26 scientists 774–793 publications: 19 scientists 794–813 publications: 23 scientists 814–833 publications: 20 scientists 834–853 publications: 16 scientists 854–873 publications: 20 scientists 874–893 publications: 11 scientists 894–913 publications: 11 scientists 914–933 publications: 16 scientists 934–953 publications: 13 scientists 954–973 publications: 10 scientists 974–993 publications: 11 scientists 994–1,013 publications: 9 scientists 1,014–1,033 publications: 9 scientists 1,034–1,053 publications: 10 scientists 1,054–1,064 publications: 6 scientists 1,065+ publications: 99 scientists
34 publications 1,065+

This scientist: 159 publications — 17th percentile

17% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,065 publications or more.

Arthur F. Witulski D-index placement in Electronics and Electrical Engineering in 2026

The chart shows the D-index (discipline H-index) distribution of Electronics and Electrical Engineering scientists ranked by Research.com in 2026. The highlighted bar marks where Arthur F. Witulski sits on this spectrum.

30 D-Index: 178 scientists 31 D-Index: 257 scientists 32 D-Index: 263 scientists 33 D-Index: 262 scientists 34 D-Index: 244 scientists 35 D-Index: 236 scientists 36 D-Index: 211 scientists 37 D-Index: 220 scientists 38 D-Index: 214 scientists 39 D-Index: 214 scientists 40 D-Index: 205 scientists 41 D-Index: 187 scientists 42 D-Index: 194 scientists 43 D-Index: 201 scientists 44 D-Index: 155 scientists 45 D-Index: 189 scientists 46 D-Index: 148 scientists 47 D-Index: 160 scientists 48 D-Index: 134 scientists 49 D-Index: 130 scientists 50 D-Index: 141 scientists 51 D-Index: 156 scientists 52 D-Index: 108 scientists 53 D-Index: 130 scientists 54 D-Index: 112 scientists 55 D-Index: 97 scientists 56 D-Index: 111 scientists 57 D-Index: 102 scientists 58 D-Index: 108 scientists 59 D-Index: 120 scientists 60 D-Index: 103 scientists 61 D-Index: 93 scientists 62 D-Index: 92 scientists 63 D-Index: 74 scientists 64 D-Index: 77 scientists 65 D-Index: 73 scientists 66 D-Index: 64 scientists 67 D-Index: 69 scientists 68 D-Index: 60 scientists 69 D-Index: 39 scientists 70 D-Index: 57 scientists 71 D-Index: 59 scientists 72 D-Index: 46 scientists 73 D-Index: 49 scientists 74 D-Index: 38 scientists 75 D-Index: 35 scientists 76 D-Index: 32 scientists 77 D-Index: 35 scientists 78 D-Index: 31 scientists 79 D-Index: 22 scientists 80 D-Index: 34 scientists 81 D-Index: 31 scientists 82 D-Index: 34 scientists 83 D-Index: 23 scientists 84 D-Index: 18 scientists 85 D-Index: 30 scientists 86 D-Index: 19 scientists 87 D-Index: 19 scientists 88 D-Index: 20 scientists 89 D-Index: 8 scientists 90 D-Index: 17 scientists 91 D-Index: 7 scientists 92 D-Index: 14 scientists 93 D-Index: 9 scientists 94 D-Index: 15 scientists 95 D-Index: 10 scientists 96 D-Index: 12 scientists 97 D-Index: 10 scientists 98 D-Index: 10 scientists 99 D-Index: 12 scientists 100 D-Index: 16 scientists 101 D-Index: 5 scientists 102 D-Index: 7 scientists 103 D-Index: 7 scientists 104 D-Index: 8 scientists 105 D-Index: 9 scientists 106 D-Index: 13 scientists 107 D-Index: 4 scientists 108 D-Index: 5 scientists 109 D-Index: 10 scientists 110 D-Index: 8 scientists 111+ D-Index: 96 scientists
30 D-Index 111+

This scientist: 40 D-Index — 36th percentile

36% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 111 D-Index or more.

Overview

Arthur F. Witulski is affiliated with Vanderbilt University in the United States and has a scholarly focus on engineering, particularly electrical and electronic engineering. Their research predominantly explores the fields of semiconductor materials and devices, with a notable emphasis on radiation effects in electronics and silicon carbide semiconductor technologies.

Their work covers several specialized subfields including electronic, optical and magnetic materials, statistics, probability and uncertainty, safety, risk, reliability and quality, and condensed matter physics. These areas inform their investigations into semiconductor performance and failure mechanisms.

Witulski has contributed extensively to the literature with 43 publications primarily in engineering disciplines and has published 40 papers specifically in electrical and electronic engineering. The majority of these works appear in the IEEE Transactions on Nuclear Science, a venue in which they have 17 publications. Other publication venues include Materials Science Forum and Facta Universitatis - Series Electronics and Energetics.

Recent research outputs demonstrate a continued focus on single-event burnout (SEB) phenomena and reliability in advanced semiconductor devices. Representative papers include:

  • "Effects of Breakdown Voltage on Single-Event Burnout Tolerance of High-Voltage SiC Power MOSFETs," 2021, IEEE Transactions on Nuclear Science
  • "Low-Energy Ion-Induced Single-Event Burnout in Gallium Oxide Schottky Diodes," 2023, IEEE Transactions on Nuclear Science
  • "Impact of Heavy-Ion Range on Single-Event Effects in Silicon Carbide Power Junction Barrier Schottky Diodes," 2023, IEEE Transactions on Nuclear Science
  • "LET and Voltage Dependence of Single-Event Burnout and Single-Event Leakage Current in High-Voltage SiC Power Devices," 2024, IEEE Transactions on Nuclear Science
  • "Inclusion of Radiation Environment Variability for Reliability Estimates for SiC Power MOSFETs," 2020, IEEE Transactions on Nuclear Science

The research topics covered in their publications include:

  • Radiation Effects in Electronics
  • Silicon Carbide Semiconductor Technologies
  • Semiconductor Materials and Devices
  • Electrostatic Discharge in Electronics
  • Integrated Circuits and Semiconductor Failure Analysis
  • Ga2O3 and Related Materials
  • Advancements in Semiconductor Devices and Circuit Design

Their frequent collaborators reflect interdisciplinary engagements across radiation effects and semiconductor device communities. Key co-authors include Ronald D. Schrimpf, Dennis R. Ball, Andrew L. Sternberg, K.F. Galloway, and Robert A. Reed.

Best Publications

  • Ultrawide-Bandgap Semiconductors: Research Opportunities and Challenges

    J. Y. Tsao;S. Chowdhury;M. A. Hollis;D. Jena

  • Charge Collection and Charge Sharing in a 130 nm CMOS Technology

    O.A. Amusan;A.F. Witulski;L.W. Massengill;B.L. Bhuva

  • Large signal stability criteria for distributed systems with constant power loads

    M. Belkhayat;R. Cooley;A. Witulski

  • Comparison of resonant topologies in high-voltage DC applications

    S.D. Johnson;A.F. Witulski;R.W. Erickson

  • A comparison of resonant topologies in high voltage DC applications

    S. D. Johnson;A. F. Witulski;R. W. Erickson

  • Characterization of Digital Single Event Transient Pulse-Widths in 130-nm and 90-nm CMOS Technologies

    B. Narasimham;B.L. Bhuva;R.D. Schrimpf;L.W. Massengill

  • Introduction to modeling of transformers and coupled inductors

    A.F. Witulski

  • Models and Algorithmic Limits for an ECC-Based Approach to Hardening Sub-100-nm SRAMs

    M.A. Bajura;Y.. Boulghassoul;R.. Naseer;S.. DasGupta

  • On-Chip Characterization of Single-Event Transient Pulsewidths

    B. Narasimham;V. Ramachandran;B.L. Bhuva;R.D. Schrimpf

  • Single-Event Burnout Mechanisms in SiC Power MOSFETs

    Arthur F. Witulski;Dennis R. Ball;Kenneth F. Galloway;Arto Javanainen

  • Critical Charge Characterization for Soft Error Rate Modeling in 90nm SRAM

    R. Naseer;Y. Boulghassoul;J. Draper;S. DasGupta

  • Extension of state-space averaging to resonant switches and beyond

    A.F. Witulski;R.W. Erickson

  • Single Event Upsets in Deep-Submicrometer Technologies Due to Charge Sharing

    O.A. Amusan;L.W. Massengill;M.P. Baze;A.L. Sternberg

  • A Hardened-by-Design Technique for RF Digital Phase-Locked Loops

    T.D. Loveless;L.W. Massengill;B.L. Bhuva;W.T. Holman

  • Mitigation Techniques for Single-Event-Induced Charge Sharing in a 90-nm Bulk CMOS Process

    O.A. Amusan;L.W. Massengill;M.P. Baze;B.L. Bhuva

  • HBD layout isolation techniques for multiple node charge collection mitigation

    J.D. Black;A.L. Sternberg;M.L. Alles;A.F. Witulski

  • Design Techniques to Reduce SET Pulse Widths in Deep-Submicron Combinational Logic

    O.A. Amusan;L.W. Massengill;B.L. Bhuva;S. DasGupta

  • Analysis of Parasitic PNP Bipolar Transistor Mitigation Using Well Contacts in 130 nm and 90 nm CMOS Technology

    B.D. Olson;O.A. Amusan;S. Dasgupta;L.W. Massengill

  • Effect of Well and Substrate Potential Modulation on Single Event Pulse Shape in Deep Submicron CMOS

    S. DasGupta;A.F. Witulski;B.L. Bhuva;M.L. Alles

  • Small signal equivalent circuit modeling of resonant converters

    A. F. Witulski;A. F. Hernandez;R. W. Erickson

  • Layout Technique for Single-Event Transient Mitigation via Pulse Quenching

    N M Atkinson;A F Witulski;W T Holman;J R Ahlbin

  • Ion-Induced Energy Pulse Mechanism for Single-Event Burnout in High-Voltage SiC Power MOSFETs and Junction Barrier Schottky Diodes

    D. R. Ball;J. M. Hutson;A. Javanainen;J.-M. Lauenstein

Frequent Co-Authors

Bharat L. Bhuva
Bharat L. Bhuva Vanderbilt University
Lloyd W. Massengill
Lloyd W. Massengill Vanderbilt University
Ronald D. Schrimpf
Ronald D. Schrimpf Vanderbilt University
Robert A. Reed
Robert A. Reed Vanderbilt University
Andrew L. Sternberg
Andrew L. Sternberg Vanderbilt University
Kenneth F. Galloway
Kenneth F. Galloway Vanderbilt University
Gabor Karsai
Gabor Karsai Vanderbilt University
M. L. Alles
M. L. Alles Vanderbilt University
Daniel M. Fleetwood
Daniel M. Fleetwood Vanderbilt University
Robert W. Erickson
Robert W. Erickson University of Colorado Boulder

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