D-Index & Metrics Best Publications

D-Index & Metrics D-index (Discipline H-index) only includes papers and citation values for an examined discipline in contrast to General H-index which accounts for publications across all disciplines.

Discipline name D-index D-index (Discipline H-index) only includes papers and citation values for an examined discipline in contrast to General H-index which accounts for publications across all disciplines. Citations Publications World Ranking National Ranking
Materials Science D-index 60 Citations 12,499 257 World Ranking 4343 National Ranking 1248

Overview

What is he best known for?

The fields of study he is best known for:

  • Electrical engineering
  • Mechanical engineering
  • Semiconductor

His primary areas of investigation include Optoelectronics, Analytical chemistry, Wafer, Etching and Layer. His Optoelectronics research incorporates themes from Annealing, Toroid, Radio frequency, Voltage and Electronic engineering. Kenneth S. Collins has researched Analytical chemistry in several fields, including Vacuum chamber, Electrical conduit, Plasma reactor, Plasma-immersion ion implantation and Inductively coupled plasma.

The study incorporates disciplines such as Deposition, Chamber pressure, Sputtering, Semiconductor and Inductive coupling in addition to Wafer. The concepts of his Deposition study are interwoven with issues in Molecular physics and Chemical vapor deposition. Kenneth S. Collins studies Plasma etching which is a part of Etching.

His most cited work include:

  • Thermal CVD/PECVD reactor and use for thermal chemical vapor deposition of silicon dioxide and in-situ multi-step planarized process (680 citations)
  • Reactor chamber self-cleaning process (437 citations)
  • CVD of silicon oxide using TEOS decomposition and in-situ planarization process (347 citations)

What are the main themes of his work throughout his whole career to date?

His primary areas of study are Optoelectronics, Wafer, Analytical chemistry, Plasma reactor and Electrical engineering. Kenneth S. Collins combines subjects such as Cathode, Radio frequency, Plasma processing, Etching and Inductively coupled plasma with his study of Optoelectronics. His Wafer research integrates issues from Deposition, Vacuum chamber, Semiconductor, Layer and Voltage.

His Semiconductor research is multidisciplinary, incorporating elements of Metallurgy, Oxide and Ceramic. While the research belongs to areas of Plasma reactor, Kenneth S. Collins spends his time largely on the problem of Optics, intersecting his research to questions surrounding Pedestal and Conductor. His studies in Electrical engineering integrate themes in fields like Power and Acoustics.

He most often published in these fields:

  • Optoelectronics (32.30%)
  • Wafer (19.95%)
  • Analytical chemistry (18.29%)

What were the highlights of his more recent work (between 2014-2021)?

  • Optoelectronics (32.30%)
  • Plasma reactor (16.15%)
  • Distributor (2.85%)

In recent papers he was focusing on the following fields of study:

Kenneth S. Collins spends much of his time researching Optoelectronics, Plasma reactor, Distributor, Cathode ray and Substrate. His study in Etching extends to Optoelectronics with its themes. His Etching research includes themes of Electron temperature, Semiconductor and Reactive plasma.

His studies deal with areas such as Acoustics, Mechanics and Nozzle as well as Plasma reactor. The Cathode ray study which covers Diamond-like carbon that intersects with Ionization, Deposition and Inert gas. His Substrate research also works with subjects such as

  • Electrical conductor, which have a strong connection to Actuator, Electrode array, Feedthrough and Electromagnetic shielding,
  • Plasma processing together with Conductance, Flow, Thermal, Analytical chemistry and Drop,
  • Volume, which have a strong connection to Azimuthal asymmetry.

Between 2014 and 2021, his most popular works were:

  • Symmetric plasma process chamber (63 citations)
  • Ion-ion plasma atomic layer etch process and reactor (20 citations)
  • Etching with atomic precision by using low electron temperature plasma (16 citations)

In his most recent research, the most cited papers focused on:

  • Electrical engineering
  • Mechanical engineering
  • Thermodynamics

His primary scientific interests are in Optoelectronics, Distributor, Plasma etching, Plasma processing and Semiconductor. His research integrates issues of Power and Substrate in his study of Optoelectronics. His Distributor study also includes

  • Ceiling together with Plasma reactor and Electrical conductor,
  • Conductor and related Protein filament.

Kenneth S. Collins has included themes like Scientific method, Electron temperature, Ion beam and Analytical chemistry in his Plasma etching study. His Semiconductor study integrates concerns from other disciplines, such as Yttrium, Metallurgy and Chemical engineering. His Etching study is concerned with the larger field of Layer.

This overview was generated by a machine learning system which analysed the scientist’s body of work. If you have any feedback, you can contact us here.

Best Publications

Thermal CVD/PECVD reactor and use for thermal chemical vapor deposition of silicon dioxide and in-situ multi-step planarized process

Deibuitsudo Nin Kuu Wan;Jiyon Emu Howaito;Kamu Esu Rou;Shishii Riyuun.
(1986)

1086 Citations

Reactor chamber self-cleaning process

Kam S. Law;Cissy Leung;Ching C. Tang;Kenneth S. Collins.
(1989)

675 Citations

CVD of silicon oxide using TEOS decomposition and in-situ planarization process

David N. Wang;John M. White;Kam S. Law;Cissy Leung.
(1988)

532 Citations

Process for PECVD of silicon oxide using TEOS decomposition

David Nin-Kou Wang;John M. White;Kam S. Law;Cissy Leung.
(1988)

433 Citations

Semiconductor substrate process using a low temperature-deposited carbon-containing hard mask

Kartik Ramaswamy;Hiroji Hanawa;Biagio Gallo;Kenneth S. Collins.
(2005)

362 Citations

Plasma immersion ion implantation process using a capacitively coupled plasma source having low dissociation and low minimum plasma voltage

Kenneth S. Collins;Hiroji Hanawa;Kartik Ramaswamy;Andrew Nguyen.
(2003)

346 Citations

Methods for processing substrates in process systems having shared resources

James P. Cruse;Dermot Cantwell;Ming Xu;Charles Hardy.
(2010)

345 Citations

Silicon scavenger in an inductively coupled RF plasma reactor

Kenneth S. Collins;Craig A. Roderick;John R. Trow;Chan-Lon Yang.
(1993)

331 Citations

Method for ion implanting insulator material to reduce dielectric constant

Amir Al-Bayati;Rick J. Roberts;Kenneth S. Collins;Ken MacWilliams.
(2004)

314 Citations

Parallel plate electrode plasma reactor having an inductive antenna and adjustable radial distribution of plasma ion density

Eric Askarinam;Douglas Buchberger;Kenneth Collins;David Groechel.
(1997)

297 Citations

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