World's Best Scientists 2026 revealed!

D-Index & Metrics

Materials Science

D-Index
42
Citations
9536
World Ranking
12483
National Ranking
2864

Ellie Yieh publication distribution in Materials Science in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Ellie Yieh sits on this spectrum.

50–69 publications: 28 scientists 70–89 publications: 152 scientists 90–109 publications: 356 scientists 110–129 publications: 487 scientists 130–149 publications: 723 scientists 150–169 publications: 835 scientists 170–189 publications: 850 scientists 190–209 publications: 891 scientists 210–229 publications: 862 scientists 230–249 publications: 766 scientists 250–269 publications: 726 scientists 270–289 publications: 665 scientists 290–309 publications: 593 scientists 310–329 publications: 537 scientists 330–349 publications: 477 scientists 350–369 publications: 440 scientists 370–389 publications: 356 scientists 390–409 publications: 321 scientists 410–429 publications: 256 scientists 430–449 publications: 246 scientists 450–469 publications: 216 scientists 470–489 publications: 212 scientists 490–509 publications: 174 scientists 510–529 publications: 194 scientists 530–549 publications: 162 scientists 550–569 publications: 131 scientists 570–589 publications: 111 scientists 590–609 publications: 103 scientists 610–629 publications: 99 scientists 630–649 publications: 77 scientists 650–669 publications: 92 scientists 670–689 publications: 56 scientists 690–709 publications: 53 scientists 710–729 publications: 53 scientists 730–749 publications: 38 scientists 750–769 publications: 52 scientists 770–789 publications: 43 scientists 790–809 publications: 38 scientists 810–829 publications: 34 scientists 830–849 publications: 25 scientists 850–869 publications: 18 scientists 870–889 publications: 20 scientists 890–909 publications: 24 scientists 910–929 publications: 27 scientists 930–949 publications: 20 scientists 950–969 publications: 17 scientists 970–989 publications: 10 scientists 990–1,009 publications: 16 scientists 1,010–1,029 publications: 13 scientists 1,030–1,049 publications: 12 scientists 1,050–1,069 publications: 9 scientists 1,070–1,089 publications: 8 scientists 1,090–1,109 publications: 7 scientists 1,110–1,129 publications: 9 scientists 1,130–1,149 publications: 2 scientists 1,150–1,162 publications: 5 scientists 1,163+ publications: 100 scientists
50 publications 1,163+

This scientist: 145 publications — 12th percentile

12% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,163 publications or more.

Ellie Yieh D-index placement in Materials Science in 2026

The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Ellie Yieh sits on this spectrum.

40–41 D-Index: 211 scientists 42–43 D-Index: 450 scientists 44–45 D-Index: 612 scientists 46–47 D-Index: 612 scientists 48–49 D-Index: 598 scientists 50–51 D-Index: 657 scientists 52–53 D-Index: 667 scientists 54–55 D-Index: 621 scientists 56–57 D-Index: 597 scientists 58–59 D-Index: 610 scientists 60–61 D-Index: 587 scientists 62–63 D-Index: 606 scientists 64–65 D-Index: 533 scientists 66–67 D-Index: 490 scientists 68–69 D-Index: 469 scientists 70–71 D-Index: 378 scientists 72–73 D-Index: 421 scientists 74–75 D-Index: 359 scientists 76–77 D-Index: 323 scientists 78–79 D-Index: 299 scientists 80–81 D-Index: 230 scientists 82–83 D-Index: 210 scientists 84–85 D-Index: 195 scientists 86–87 D-Index: 203 scientists 88–89 D-Index: 175 scientists 90–91 D-Index: 175 scientists 92–93 D-Index: 142 scientists 94–95 D-Index: 121 scientists 96–97 D-Index: 117 scientists 98–99 D-Index: 107 scientists 100–101 D-Index: 88 scientists 102–103 D-Index: 85 scientists 104–105 D-Index: 68 scientists 106–107 D-Index: 62 scientists 108–109 D-Index: 57 scientists 110–111 D-Index: 45 scientists 112–113 D-Index: 49 scientists 114–115 D-Index: 50 scientists 116–117 D-Index: 34 scientists 118–119 D-Index: 38 scientists 120–121 D-Index: 37 scientists 122–123 D-Index: 29 scientists 124–125 D-Index: 28 scientists 126–127 D-Index: 24 scientists 128–129 D-Index: 33 scientists 130–131 D-Index: 28 scientists 132–133 D-Index: 21 scientists 134–135 D-Index: 20 scientists 136–137 D-Index: 23 scientists 138–139 D-Index: 17 scientists 140–141 D-Index: 12 scientists 142–143 D-Index: 17 scientists 144–145 D-Index: 21 scientists 146–147 D-Index: 13 scientists 148–149 D-Index: 11 scientists 150–151 D-Index: 14 scientists 152–153 D-Index: 13 scientists 154–155 D-Index: 9 scientists 156–157 D-Index: 10 scientists 158–159 D-Index: 7 scientists 160–161 D-Index: 4 scientists 162–163 D-Index: 4 scientists 164 D-Index: 3 scientists 165+ D-Index: 98 scientists
40 D-Index 165+

This scientist: 42 D-Index — 3rd percentile

3% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 165 D-Index or more.

Best Publications

  • Method and apparatus for gettering fluorine from chamber material surfaces

    Li-Qun Xia;Visweswaren Sivaramakrishnan;Srinivas Nemani;Ellie Yieh

  • Post-deposition treatment to enhance properties of Si-O-C low k films

    Li-Qun Xia;Frederic Gaillard;Ellie Yieh;Tian H. Lim

  • Formation of fluid silicon layer by reaction of organic silicon compound with hydroxyl forming compound

    David W Cheung;Frederick Gaillard;Shin-Puu Jeng;Chi-I Lang

  • Method and system for improving dielectric film quality for void free gap fill

    Abhijit Basu Mallick;Jeffrey C. Munro;Linlin Wang;Srinivas D. Nemani

  • Method of forming high quality silicon oxide film by remote plasma cvd from disilane precursor

    Abhijit Basu Mallick;Srinivas D Nemani;Ellie Yieh;バス マリック アビジット

  • Process for forming a low dielectric constant carbon-containing film

    Frederic Gaillard;Li-Qun Xia;Jen Shu;Ellie Yieh

  • Process chamber for dielectric gapfill

    Dmitry Lubomirsky;Qiwei Liang;Soonam Park;Kien N Chuc

  • Method of depositing dielectric materials including oxygen-doped silicon carbide in damascene applications

    Ju-hyung Lee;Ping Xu;Shankar Venkataraman;Li-Qun Xia

  • Multi-step dep-etch-dep high density plasma chemical vapor deposition processes for dielectric gapfills

    Zhong Qiang Hua;Rionard Purnawan;Jason Thomas Bloking;Anchuan Wang

  • Method of decreasing the K value in SIOC layer deposited by chemical vapor deposition

    Frederic Gaillard;Li-Qun Xia;Tian-Hoe Lim;Ellie Yieh

  • Dual frequency plasma enhanced chemical vapor deposition of silicon carbide layers

    Srinivas D. Nemani;Li-Qun Xia;Ellie Yieh

  • Method of depositing dielectric films

    Srinivas D Nemani;Li-Qun Xia;Dian Sugiarto;Ellie Yieh

  • Methods and apparatus for shallow trench isolation

    Ellie Yieh;Li-Qun Xia;Srinivas Nemani

  • MULTISTAGE CHAMBER CLEANING PROCESS FOR IMPROVING FILM GAP FILLING USING REMOTE PLASMA

    Xia Li-Qun;Yieh Ellie

  • Thermal CVD process for depositing a low dielectric constant carbon-doped silicon oxide film

    Li-Qun Xia;Fabrice Geiger;Frederic Gaillard;Ellie Yieh

  • Dual Top Gas Feed Through Distributor for High Density Plasma Chamber

    Won B. Bang;Srivivas D. Nemani;Phong Pham;Ellie Y. Yieh

  • Methods and apparatus for depositing premetal dielectric layer at sub-atmospheric and high temperature conditions

    Li-Qun Xia;Ellie Yieh;Srinivas Nemani

  • Method and apparatus for deposition of low dielectric constant materials

    Kang Sub Yim;Soovo Sen;Dian Sugiarto;Peter Lee

  • Method of depositing low k films

    Tzu-Fang Huang;Yung-Cheng Lu;Li-Qun Xia;Ellie Yieh

  • Lid assembly for a process chamber employing asymmetric flow geometries

    Won Bang;Ellie Yieh;Thanh Pham

Frequent Co-Authors

Srinivas D. Nemani
Srinivas D. Nemani Applied Materials (United States)
Li-Qun Xia
Li-Qun Xia Applied Materials (United States)
Dmitry Lubomirsky
Dmitry Lubomirsky Applied Materials (United States)
Nitin K. Ingle
Nitin K. Ingle Applied Materials (United States)
Kartik Ramaswamy
Kartik Ramaswamy Applied Materials (United States)
Andrew C. Kummel
Andrew C. Kummel University of California, San Diego
Scott E. Thompson
Scott E. Thompson University of Florida
Timothy W. Weidman
Timothy W. Weidman Applied Materials (United States)
Kenneth S. Collins
Kenneth S. Collins Applied Materials (United States)
Zoran Krivokapic
Zoran Krivokapic GlobalFoundries (United States)

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