Ellie Yieh

Best Publications

• Method and apparatus for gettering fluorine from chamber material surfaces

  Li-Qun Xia;Visweswaren Sivaramakrishnan;Srinivas Nemani;Ellie Yieh

  448
  Citations

• Post-deposition treatment to enhance properties of Si-O-C low k films

  Li-Qun Xia;Frederic Gaillard;Ellie Yieh;Tian H. Lim

  430
  Citations

• Formation of fluid silicon layer by reaction of organic silicon compound with hydroxyl forming compound

  David W Cheung;Frederick Gaillard;Shin-Puu Jeng;Chi-I Lang

  421
  Citations

• Method and system for improving dielectric film quality for void free gap fill

  Abhijit Basu Mallick;Jeffrey C. Munro;Linlin Wang;Srinivas D. Nemani

  418
  Citations

• Method of forming high quality silicon oxide film by remote plasma cvd from disilane precursor

  Abhijit Basu Mallick;Srinivas D Nemani;Ellie Yieh;バス マリック アビジット

  416
  Citations

• Process for forming a low dielectric constant carbon-containing film

  Frederic Gaillard;Li-Qun Xia;Jen Shu;Ellie Yieh

  403
  Citations

• Process chamber for dielectric gapfill

  Dmitry Lubomirsky;Qiwei Liang;Soonam Park;Kien N Chuc

  373
  Citations

• Method of depositing dielectric materials including oxygen-doped silicon carbide in damascene applications

  Ju-hyung Lee;Ping Xu;Shankar Venkataraman;Li-Qun Xia

  329
  Citations

• Multi-step dep-etch-dep high density plasma chemical vapor deposition processes for dielectric gapfills

  Zhong Qiang Hua;Rionard Purnawan;Jason Thomas Bloking;Anchuan Wang

  325
  Citations

• Method of decreasing the K value in SIOC layer deposited by chemical vapor deposition

  Frederic Gaillard;Li-Qun Xia;Tian-Hoe Lim;Ellie Yieh

  315
  Citations

• Dual frequency plasma enhanced chemical vapor deposition of silicon carbide layers

  Srinivas D. Nemani;Li-Qun Xia;Ellie Yieh

  291
  Citations

• Method of depositing dielectric films

  Srinivas D Nemani;Li-Qun Xia;Dian Sugiarto;Ellie Yieh

  284
  Citations

• Methods and apparatus for shallow trench isolation

  Ellie Yieh;Li-Qun Xia;Srinivas Nemani

  278
  Citations

• MULTISTAGE CHAMBER CLEANING PROCESS FOR IMPROVING FILM GAP FILLING USING REMOTE PLASMA

  Xia Li-Qun;Yieh Ellie

  273
  Citations

• Thermal CVD process for depositing a low dielectric constant carbon-doped silicon oxide film

  Li-Qun Xia;Fabrice Geiger;Frederic Gaillard;Ellie Yieh

  251
  Citations

• Dual Top Gas Feed Through Distributor for High Density Plasma Chamber

  Won B. Bang;Srivivas D. Nemani;Phong Pham;Ellie Y. Yieh

  222
  Citations

• Methods and apparatus for depositing premetal dielectric layer at sub-atmospheric and high temperature conditions

  Li-Qun Xia;Ellie Yieh;Srinivas Nemani

  214
  Citations

• Method and apparatus for deposition of low dielectric constant materials

  Kang Sub Yim;Soovo Sen;Dian Sugiarto;Peter Lee

  181
  Citations

• Method of depositing low k films

  Tzu-Fang Huang;Yung-Cheng Lu;Li-Qun Xia;Ellie Yieh

  177
  Citations

• Lid assembly for a process chamber employing asymmetric flow geometries

  Won Bang;Ellie Yieh;Thanh Pham

  160
  Citations