World's Best Scientists 2026 revealed!

D-Index & Metrics

Engineering and Technology

D-Index
53
Citations
12085
World Ranking
3361
National Ranking
996

Overview

John M. White is affiliated with Applied Materials, located in the United States, and has contributed to the field of Agricultural and Biological Sciences with a focus on Plant Science. Their research primarily addresses plant nutrient uptake and metabolism.

The scientist has published research in the venue Scholarworks (University of Massachusetts Amherst). A notable recent paper is titled Relationship of root cation exchange capacity to calcium uptake, published in 2023.

  • Relationship of root cation exchange capacity to calcium uptake, 2023, Scholarworks (University of Massachusetts Amherst)

Research topics covered by John M. White include:

  • Plant nutrient uptake and metabolism

Main fields of study consist of:

  • Agricultural and Biological Sciences

Subfields of study include:

  • Plant Science

Their frequent publication venue is:

  • Scholarworks (University of Massachusetts Amherst)

There are no records of frequent co-authors or book publications associated with John M. White. No awards or honors are listed in the available data.

Best Publications

  • Plasma uniformity control by gas diffuser hole design

    Soo Young Choi;John M. White;Qunhua Wang;Li Hou

  • Method of controlling the film properties of PECVD-deposited thin films

    Soo Young Choi;John M. White;Qunhua Wang;Beom Soo Park

  • CVD of silicon oxide using TEOS decomposition and in-situ planarization process

    David N. Wang;John M. White;Kam S. Law;Cissy Leung

  • Plasma uniformity control by gas diffuser curvature

    Soo Young Choi;Beom Soo Park;John M. White;Robin L. Tiner

  • Magnetic field-enhanced plasma etch reactor

    David Cheng;Dan Maydan;Sasson Somekh;Kenneth R. Stalder

  • Method and apparatus for protecting conductive surface in plasma treatment reactor

    Kam S Law;Robert Robertson;John M White;エス. ロウ カム

  • APPARATUS FOR DISPENSING GAS AND CHAMBER WITH THE SAME

    White John M;Keller Ernst;Blonigan Wendell T

  • Movable or flexible shower head mounting

    M White John;William N Sterling;ノーマン スターリング ウィリアム;エム. ホワイト ジョン

  • Modular substrate processing system and method

    White John M;Conner Robert B;Law Kam S;Turner Norman L

  • Cooling and heating of glass substrate of large area and apparatus therefor

    David Berkstresser;Norman L Turner;John M White;マックネイル ホワイト ジョン

  • Apparatus for depositing a uniform silicon film and methods for manufacturing the same

    Soo Young Choi;Tae Kyung Won;Beom Soo Park;John M. White

  • Method of controlling film uniformity of a cvd-deposited silicon nitride film during deposition over a large substrate surface

    Beom Soo Park;Soo Young Choi;Tae Kyung Won;John M. White

  • A vacuum processing system having improved substrate heating and cooling

    John M. White;Norman L. Turner;Alan D'entremont

  • Low temperature thin film transistor process, device property, and device stability improvement

    Ya-Tang Yang;Beom Soo Park;Tae Kyung Won;Soo Young Choi

  • Semiconductor processing using an efficiently coupled gas source

    Carl A. Sorensen;Albert R. Ellingboe;Quanyuan Shang;Wendell T. Blonigan

  • Guided wave radiator possessing non-gaseous dielectric medium and used for plasma chamber

    Joseph Kudla;Rei Tanaka;Carl A Sorensen;Sucher Anwar

  • Thin film deposition using microwave plasma

    Tae Kyung Won;Helinda Nominanda;Seon-Mee Cho;Soo Young Choi

  • Hybrid PVD-CVD system

    Takako Takehara;Sheng Sun;John M. White

  • Substrate transfer shuttle having a magnetic drive

    Wendell T. Blonigan;John M. White

  • Large-area magnetron sputtering chamber with individually controlled sputtering zones

    Yan Ye;John M. White;Akihiro Hosokawa;Hien-Minh Huu Le

Frequent Co-Authors

Kenneth S. Collins
Kenneth S. Collins Applied Materials (United States)
Mei Chang
Mei Chang Applied Materials (United States)

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