World's Best Scientists 2026 revealed!

D-Index & Metrics

Materials Science

D-Index
55
Citations
12930
World Ranking
8513
National Ranking
2096

Mei Chang publication distribution in Materials Science in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Mei Chang sits on this spectrum.

50–69 publications: 28 scientists 70–89 publications: 152 scientists 90–109 publications: 356 scientists 110–129 publications: 487 scientists 130–149 publications: 723 scientists 150–169 publications: 835 scientists 170–189 publications: 850 scientists 190–209 publications: 891 scientists 210–229 publications: 862 scientists 230–249 publications: 766 scientists 250–269 publications: 726 scientists 270–289 publications: 665 scientists 290–309 publications: 593 scientists 310–329 publications: 537 scientists 330–349 publications: 477 scientists 350–369 publications: 440 scientists 370–389 publications: 356 scientists 390–409 publications: 321 scientists 410–429 publications: 256 scientists 430–449 publications: 246 scientists 450–469 publications: 216 scientists 470–489 publications: 212 scientists 490–509 publications: 174 scientists 510–529 publications: 194 scientists 530–549 publications: 162 scientists 550–569 publications: 131 scientists 570–589 publications: 111 scientists 590–609 publications: 103 scientists 610–629 publications: 99 scientists 630–649 publications: 77 scientists 650–669 publications: 92 scientists 670–689 publications: 56 scientists 690–709 publications: 53 scientists 710–729 publications: 53 scientists 730–749 publications: 38 scientists 750–769 publications: 52 scientists 770–789 publications: 43 scientists 790–809 publications: 38 scientists 810–829 publications: 34 scientists 830–849 publications: 25 scientists 850–869 publications: 18 scientists 870–889 publications: 20 scientists 890–909 publications: 24 scientists 910–929 publications: 27 scientists 930–949 publications: 20 scientists 950–969 publications: 17 scientists 970–989 publications: 10 scientists 990–1,009 publications: 16 scientists 1,010–1,029 publications: 13 scientists 1,030–1,049 publications: 12 scientists 1,050–1,069 publications: 9 scientists 1,070–1,089 publications: 8 scientists 1,090–1,109 publications: 7 scientists 1,110–1,129 publications: 9 scientists 1,130–1,149 publications: 2 scientists 1,150–1,162 publications: 5 scientists 1,163+ publications: 100 scientists
50 publications 1,163+

This scientist: 149 publications — 14th percentile

14% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,163 publications or more.

Mei Chang D-index placement in Materials Science in 2026

The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Mei Chang sits on this spectrum.

40–41 D-Index: 211 scientists 42–43 D-Index: 450 scientists 44–45 D-Index: 612 scientists 46–47 D-Index: 612 scientists 48–49 D-Index: 598 scientists 50–51 D-Index: 657 scientists 52–53 D-Index: 667 scientists 54–55 D-Index: 621 scientists 56–57 D-Index: 597 scientists 58–59 D-Index: 610 scientists 60–61 D-Index: 587 scientists 62–63 D-Index: 606 scientists 64–65 D-Index: 533 scientists 66–67 D-Index: 490 scientists 68–69 D-Index: 469 scientists 70–71 D-Index: 378 scientists 72–73 D-Index: 421 scientists 74–75 D-Index: 359 scientists 76–77 D-Index: 323 scientists 78–79 D-Index: 299 scientists 80–81 D-Index: 230 scientists 82–83 D-Index: 210 scientists 84–85 D-Index: 195 scientists 86–87 D-Index: 203 scientists 88–89 D-Index: 175 scientists 90–91 D-Index: 175 scientists 92–93 D-Index: 142 scientists 94–95 D-Index: 121 scientists 96–97 D-Index: 117 scientists 98–99 D-Index: 107 scientists 100–101 D-Index: 88 scientists 102–103 D-Index: 85 scientists 104–105 D-Index: 68 scientists 106–107 D-Index: 62 scientists 108–109 D-Index: 57 scientists 110–111 D-Index: 45 scientists 112–113 D-Index: 49 scientists 114–115 D-Index: 50 scientists 116–117 D-Index: 34 scientists 118–119 D-Index: 38 scientists 120–121 D-Index: 37 scientists 122–123 D-Index: 29 scientists 124–125 D-Index: 28 scientists 126–127 D-Index: 24 scientists 128–129 D-Index: 33 scientists 130–131 D-Index: 28 scientists 132–133 D-Index: 21 scientists 134–135 D-Index: 20 scientists 136–137 D-Index: 23 scientists 138–139 D-Index: 17 scientists 140–141 D-Index: 12 scientists 142–143 D-Index: 17 scientists 144–145 D-Index: 21 scientists 146–147 D-Index: 13 scientists 148–149 D-Index: 11 scientists 150–151 D-Index: 14 scientists 152–153 D-Index: 13 scientists 154–155 D-Index: 9 scientists 156–157 D-Index: 10 scientists 158–159 D-Index: 7 scientists 160–161 D-Index: 4 scientists 162–163 D-Index: 4 scientists 164 D-Index: 3 scientists 165+ D-Index: 98 scientists
40 D-Index 165+

This scientist: 55 D-Index — 34th percentile

34% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 165 D-Index or more.

Overview

Mei Chang is affiliated with Applied Materials in the United States and specializes in neuroscience and molecular biology research. Their work spans several interconnected fields including Neuroscience, Biochemistry, Genetics, and Molecular Biology, with particular emphasis on molecular biology and cellular and molecular neuroscience.

Their research topics cover a broad spectrum within neuroscience and molecular biology, including:

  • Neurogenesis and neuroplasticity mechanisms
  • RNA research and splicing
  • RNA modifications and cancer
  • Cancer-related molecular mechanisms research
  • Neuroscience and neuropharmacology research
  • Axon guidance and neuronal signaling
  • Pluripotent stem cells research

Mei Chang has contributed to multiple peer-reviewed publications in notable scientific venues. Some recent papers authored or co-authored include:

  • STAU2 binds a complex RNA cargo that changes temporally with production of diverse intermediate progenitor cells during mouse corticogenesis, 2021, published in Development
  • St18 specifies globus pallidus projection neuron identity in MGE lineage, 2022, published in Nature Communications
  • St18 specifies globus pallidus projection neuron identity in MGE lineage, 2021, published in bioRxiv (Cold Spring Harbor Laboratory)

Their frequent co-authors indicating collaborative research efforts include Luke F. Nunnelly, Dylan I. Lee, Guoqiang Gu, Vilas Menon, and Edmund Au, each having co-authored multiple papers with Mei Chang.

Mei Chang's research contributes to understanding complex molecular and cellular mechanisms in neural development, RNA biology, and cancer-related pathways. Their multidisciplinary focus integrates developmental neuroscience and molecular genetics applying to both fundamental and translational biomedical research contexts.

Best Publications

  • Chemical vapor deposition chamber

    Ashok Sinha;Mei Chang;Ilya Perlov;Karl Littau

  • Gas delivery apparatus for atomic layer deposition

    Ling Chen;Vincent Ku;Dien-Yeh Wu;Hua Chung

  • PECVD of compounds of silicon from silane and nitrogen

    Mei Chang;David N. K. Wang;John M. White;Dan Maydan

  • Multi chamber processing system

    Chien-Teh Kao;Jing-Pei Connie Chou;Chiukin (Steven) Lai;Salvador P. Umotoy

  • Copper interconnect barrier layer structure and formation method

    Ling Chen;Seshadri Ganguli;Christophe Marcadal;Wei Cao

  • Reactor for chemical vapor deposition of titanium

    Salvador Umotoy;Anh N. Nguyen;Truc T. Tran;Lawrence Chung Lai Lei

  • Integration of ALD tantalum nitride for copper metallization

    Hua Chung;Nirmalya Maity;Jick Yu;Roderick Craig Mosely

  • An in-situ chamber clean process to remove by-product deposits from chemical vapor etch chamber

    Chien-Teh Kao;Jing-Pei Chou;Salvador P. Umotoy;Mei Chang

  • Methods of thin film process

    Nitin K. Ingle;Jing Tang;Yi Zheng;Zheng Yuan

  • Process for forming cobalt and cobalt silicide materials in tungsten contact applications

    Seshadri Ganguli;Sang-Ho Yu;See-Eng Phan;Mei Chang

  • Apparatus for substrate processing with improved throughput and yield

    Jun Zhao;Ashok Sinha;Avi Tepman;Mei Chang

  • Passivation layer formation by plasma clean process to reduce native oxide growth

    Haichun Yang;Xin Liang Lu;Chien-Teh Kao;Mei Chang

  • Ruthenium layer formation for copper film deposition

    Mei Chang;Seshadri Ganguli;Nirmalya Maity

  • Selective etching of silicon nitride

    Xinliang Lu;Haichun Yang;Zhenbin Ge;Nan Lu

  • Apparatus for generating plasma by RF power

    Yu Chang;Gwo-Chuan Tzu;Salvador Umotoy;Chien-Teh Kao

  • Reactor for chemical vapor deposition

    Keith Koai;Mark Johnson;Mei Chang;Lawrence Chung Lai Lei

  • Method of TiSiN deposition using a chemical vapor deposition (CVD) process

    Jing-Pei Chou;Chien-Teh Kao;Chiukin Steven Lai;Roderick Mosely

  • Plasma treatment of a titanium nitride film formed by chemical vapor deposition

    Shulin Wang;Ming Xi;Zvi Lando;Mei Chang

  • Nf3/h2 remote plasma process with high etch selectivity of psg/bpsg over thermal oxide and low density surface defects

    Chien-Teh Kao;Xinliang Lu;Haichun Yang;Zhenbin Ge

  • Process for forming cobalt-containing materials

    Seshadri Ganguli;Schubert S. Chu;Mei Chang;Sang-Ho Yu

Frequent Co-Authors

John M. White
John M. White Applied Materials (United States)
Kenneth S. Collins
Kenneth S. Collins Applied Materials (United States)
Nitin K. Ingle
Nitin K. Ingle Applied Materials (United States)
Gurtej S. Sandhu
Gurtej S. Sandhu Micron (United States)
Li-Qun Xia
Li-Qun Xia Applied Materials (United States)
Brian E. Hayden
Brian E. Hayden University of Southampton

If you think any of the details on this page are incorrect, let us know.

Report an issue

We appreciate your kind effort to assist us to improve this page, it would be helpful providing us with as much detail as possible in the text box below:

Best Scientists Citing Mei Chang

Trending Scientists

Recently Published Articles