What is he best known for?
The fields of study he is best known for:
- Mechanical engineering
- Electrical engineering
- Semiconductor
Mei Chang mainly investigates Substrate, Optoelectronics, Layer, Chemical vapor deposition and Composite material.
His Substrate research integrates issues from Electrical engineering and Analytical chemistry.
His research integrates issues of Inorganic chemistry and Deposition process in his study of Layer.
His research in Inorganic chemistry intersects with topics in Nitrogen trifluoride, Chemical engineering, Nitride and Deposition.
His work carried out in the field of Chemical vapor deposition brings together such families of science as Choke, Wafer, Structural engineering and Pedestal.
His research investigates the link between Composite material and topics such as Electronic engineering that cross with problems in Inner diameter, Copper interconnect and Tin.
His most cited work include:
- Chemical vapor deposition chamber (500 citations)
- Gas delivery apparatus for atomic layer deposition (431 citations)
- Thermally floating pedestal collar in a chemical vapor deposition chamber (328 citations)
What are the main themes of his work throughout his whole career to date?
His scientific interests lie mostly in Optoelectronics, Wafer, Substrate, Layer and Chemical engineering.
His study in Optoelectronics is interdisciplinary in nature, drawing from both Electronic engineering, Plasma etching and Electrical engineering.
The Wafer study combines topics in areas such as Chemical vapor deposition, Deposition, Pedestal, Semiconductor and Susceptor.
The Substrate study which covers Analytical chemistry that intersects with Purge and Plasma-enhanced chemical vapor deposition.
His Layer research incorporates themes from Inorganic chemistry and Metallurgy, Tungsten.
His Chemical engineering research includes themes of Silicon, Cobalt, Metal, Dielectric and Substrate.
He most often published in these fields:
- Optoelectronics (25.25%)
- Wafer (24.26%)
- Substrate (23.76%)
What were the highlights of his more recent work (between 2013-2021)?
- Substrate (23.76%)
- Chemical engineering (21.78%)
- Composite material (18.32%)
In recent papers he was focusing on the following fields of study:
Mei Chang mainly focuses on Substrate, Chemical engineering, Composite material, Metal and Substrate.
His work in Substrate addresses issues such as Atomic layer deposition, which are connected to fields such as Deposition rate.
His Chemical engineering research is multidisciplinary, incorporating perspectives in Cobalt, Chemical vapor deposition and Deposition.
The various areas that Mei Chang examines in his Metal study include Layer, Optoelectronics and Deposition.
His research on Layer often connects related topics like Tungsten.
The concepts of his Substrate study are interwoven with issues in Titanium and Argon.
Between 2013 and 2021, his most popular works were:
- Alcohol Assisted ALD Film Deposition (98 citations)
- Multi-threshold voltage (Vt) workfunction metal by selective atomic layer deposition (ALD) (74 citations)
- Methods for pre-cleaning conductive interconnect structures (60 citations)
In his most recent research, the most cited papers focused on:
- Mechanical engineering
- Electrical engineering
- Semiconductor
His primary areas of investigation include Substrate, Metal, Inorganic chemistry, Atomic layer deposition and Layer.
His Substrate research is classified as research in Composite material.
His work deals with themes such as Substrate and Low temperature deposition, which intersect with Metal.
His Inorganic chemistry research integrates issues from Oxide, Deposition, Dielectric surface and Reactive gas.
His Atomic layer deposition study integrates concerns from other disciplines, such as Blocking layer, Optoelectronics, Work function and Threshold voltage.
As a part of the same scientific study, Mei Chang usually deals with the Layer, concentrating on Tungsten and frequently concerns with Inert gas, Etching and Analytical chemistry.
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