D-Index & Metrics Best Publications

D-Index & Metrics D-index (Discipline H-index) only includes papers and citation values for an examined discipline in contrast to General H-index which accounts for publications across all disciplines.

Discipline name D-index D-index (Discipline H-index) only includes papers and citation values for an examined discipline in contrast to General H-index which accounts for publications across all disciplines. Citations Publications World Ranking National Ranking
Engineering and Technology D-index 36 Citations 6,773 80 World Ranking 4764 National Ranking 1544

Overview

What is he best known for?

The fields of study he is best known for:

  • Mechanical engineering
  • Electrical engineering
  • Semiconductor

Andrew Nguyen mostly deals with Optoelectronics, Electronic engineering, Toroid, Annealing and Biasing. His work deals with themes such as Coating, Masking and Analytical chemistry, which intersect with Optoelectronics. Andrew Nguyen combines subjects such as Microelectronics, Thin film, Dielectric, Transistor and Composite material with his study of Electronic engineering.

His biological study spans a wide range of topics, including Layer, Substrate, Nanotechnology, Stress and Coupling. His work in Wafer addresses subjects such as Voltage, which are connected to disciplines such as Plasma-immersion ion implantation. His Plasma reactor research focuses on subjects like Electrical conduit, which are linked to Substrate.

His most cited work include:

  • Twin chamber processing system (245 citations)
  • Plasma immersion ion implantation process using a capacitively coupled plasma source having low dissociation and low minimum plasma voltage (227 citations)
  • Semiconductor substrate process using a low temperature-deposited carbon-containing hard mask (227 citations)

What are the main themes of his work throughout his whole career to date?

The scientist’s investigation covers issues in Optoelectronics, Electrical engineering, Substrate, Plasma reactor and Wafer. His Optoelectronics research is multidisciplinary, relying on both Electronic engineering, Toroid and Inductively coupled plasma. In his research, Electrical conduit, Enclosure and Remote plasma is intimately related to Acoustics, which falls under the overarching field of Electrical engineering.

His Substrate study integrates concerns from other disciplines, such as Mechanical engineering and Flow. His work investigates the relationship between Plasma reactor and topics such as Optics that intersect with problems in Electromagnetic coil and Coaxial. His research on Wafer also deals with topics like

  • Analytical chemistry which intersects with area such as Plasma-immersion ion implantation,
  • Vacuum chamber and related Cathode.

He most often published in these fields:

  • Optoelectronics (31.79%)
  • Electrical engineering (23.18%)
  • Substrate (22.52%)

What were the highlights of his more recent work (between 2014-2020)?

  • Substrate (22.52%)
  • Mechanical engineering (11.26%)
  • Composite material (11.26%)

In recent papers he was focusing on the following fields of study:

His primary scientific interests are in Substrate, Mechanical engineering, Composite material, Volume and Ring. His work in Substrate covers topics such as Electrical engineering which are related to areas like Support surface and Plasma chamber. His research brings together the fields of Structural engineering and Mechanical engineering.

His Composite material research incorporates elements of Radiofrequency coil and Ceiling. His study on Volume is intertwined with other disciplines of science such as Cathode, Vacuum chamber, Flow, Optoelectronics and Adapter. His research in Optoelectronics intersects with topics in Joule heating, Coupling and Inductively coupled plasma.

Between 2014 and 2020, his most popular works were:

  • Multiple electrode substrate support assembly and phase control system (6 citations)
  • Method and apparatus for controlling plasma near the edge of a substrate (6 citations)
  • Temperature ramping using gas distribution plate heat (5 citations)

In his most recent research, the most cited papers focused on:

  • Mechanical engineering
  • Electrical engineering
  • Semiconductor

His primary areas of study are Optoelectronics, Substrate, Electrical engineering, Optics and Plasma processing. His work in the fields of Optoelectronics, such as Dielectric, overlaps with other areas such as Radio frequency power transmission. His Substrate research integrates issues from Mechanical engineering, Structural engineering, Plasma technology and Phase control.

His Electrical engineering study combines topics in areas such as Vacuum pump and Plasma chamber. Andrew Nguyen interconnects Electronic engineering and Magnet in the investigation of issues within Optics. His research integrates issues of Rf filters, Joule heating, Flow, Electrical impedance and Coupling in his study of Plasma processing.

This overview was generated by a machine learning system which analysed the scientist’s body of work. If you have any feedback, you can contact us here.

Best Publications

Semiconductor substrate process using a low temperature-deposited carbon-containing hard mask

Kartik Ramaswamy;Hiroji Hanawa;Biagio Gallo;Kenneth S. Collins.
(2005)

362 Citations

Plasma immersion ion implantation process using a capacitively coupled plasma source having low dissociation and low minimum plasma voltage

Kenneth S. Collins;Hiroji Hanawa;Kartik Ramaswamy;Andrew Nguyen.
(2003)

346 Citations

Methods for processing substrates in process systems having shared resources

James P. Cruse;Dermot Cantwell;Ming Xu;Charles Hardy.
(2010)

345 Citations

Twin chamber processing system

Ming Xu;Andrew Nguyen;Evans Lee;Jared Ahmad Lee.
(2010)

338 Citations

Method for ion implanting insulator material to reduce dielectric constant

Amir Al-Bayati;Rick J. Roberts;Kenneth S. Collins;Ken MacWilliams.
(2004)

314 Citations

Chemical vapor deposition plasma process using an ion shower grid

Hiroji Hanawa;Tsutomu Tanaka;Kenneth S. Collins;Amir Al-Bayati.
(2004)

293 Citations

Dual mode inductively coupled plasma reactor with adjustable phase coil assembly

Samer Banna;Valentin N. Todorow;Kenneth S. Collins;Andrew Nguyen.
(2010)

286 Citations

Plasma immersion ion implantation process

Kenneth S. Collins;Hiroji Hanawa;Kartik Ramaswamy;Andrew Nguyen.
(2005)

278 Citations

Low temperature CVD process with selected stress of the CVD layer on CMOS devices

Hiroji Hanawa;Kartik Ramaswamy;Kenneth S. Collins;Amir Al-Bayati.
(2007)

272 Citations

Substrate support having heat transfer system

Andrew Nguyen;Wing Lau Cheng;Hiroji Hanawa;Semyon L. Kats.
(2007)

266 Citations

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