World's Best Scientists 2026 revealed!

D-Index & Metrics

Engineering and Technology

D-Index
41
Citations
7983
World Ranking
6875
National Ranking
1877

Andrew Nguyen publication distribution in Engineering and Technology in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Engineering and Technology in 2026. The highlighted bar marks where Andrew Nguyen sits on this spectrum.

38–47 publications: 20 scientists 48–57 publications: 35 scientists 58–67 publications: 96 scientists 68–77 publications: 135 scientists 78–87 publications: 190 scientists 88–97 publications: 259 scientists 98–107 publications: 283 scientists 108–117 publications: 369 scientists 118–127 publications: 341 scientists 128–137 publications: 386 scientists 138–147 publications: 372 scientists 148–157 publications: 457 scientists 158–167 publications: 415 scientists 168–177 publications: 407 scientists 178–187 publications: 421 scientists 188–197 publications: 378 scientists 198–207 publications: 403 scientists 208–217 publications: 317 scientists 218–227 publications: 346 scientists 228–237 publications: 321 scientists 238–247 publications: 260 scientists 248–257 publications: 280 scientists 258–267 publications: 240 scientists 268–277 publications: 214 scientists 278–287 publications: 242 scientists 288–297 publications: 203 scientists 298–307 publications: 166 scientists 308–317 publications: 154 scientists 318–327 publications: 175 scientists 328–337 publications: 159 scientists 338–347 publications: 99 scientists 348–357 publications: 131 scientists 358–367 publications: 106 scientists 368–377 publications: 118 scientists 378–387 publications: 97 scientists 388–397 publications: 108 scientists 398–407 publications: 82 scientists 408–417 publications: 71 scientists 418–427 publications: 64 scientists 428–437 publications: 55 scientists 438–447 publications: 54 scientists 448–457 publications: 60 scientists 458–467 publications: 47 scientists 468–477 publications: 40 scientists 478–487 publications: 30 scientists 488–497 publications: 29 scientists 498–507 publications: 38 scientists 508–517 publications: 40 scientists 518–527 publications: 32 scientists 528–537 publications: 23 scientists 538–547 publications: 28 scientists 548–557 publications: 23 scientists 558–567 publications: 19 scientists 568–577 publications: 16 scientists 578–587 publications: 17 scientists 588–597 publications: 18 scientists 598–607 publications: 22 scientists 608–617 publications: 15 scientists 618–627 publications: 9 scientists 628–637 publications: 11 scientists 638–647 publications: 21 scientists 648–657 publications: 12 scientists 658–667 publications: 9 scientists 668–677 publications: 11 scientists 678–687 publications: 9 scientists 688–697 publications: 6 scientists 698–707 publications: 14 scientists 708–717 publications: 7 scientists 718–727 publications: 8 scientists 728–737 publications: 10 scientists 738–747 publications: 9 scientists 748–757 publications: 5 scientists 758–767 publications: 5 scientists 768–777 publications: 11 scientists 778–787 publications: 7 scientists 788–797 publications: 2 scientists 798–803 publications: 4 scientists 804+ publications: 100 scientists
38 publications 804+

This scientist: 83 publications — 4th percentile

4% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 804 publications or more.

Andrew Nguyen D-index placement in Engineering and Technology in 2026

The chart shows the D-index (discipline H-index) distribution of Engineering and Technology scientists ranked by Research.com in 2026. The highlighted bar marks where Andrew Nguyen sits on this spectrum.

30 D-Index: 59 scientists 31 D-Index: 114 scientists 32 D-Index: 129 scientists 33 D-Index: 189 scientists 34 D-Index: 200 scientists 35 D-Index: 262 scientists 36 D-Index: 311 scientists 37 D-Index: 312 scientists 38 D-Index: 350 scientists 39 D-Index: 385 scientists 40 D-Index: 348 scientists 41 D-Index: 362 scientists 42 D-Index: 426 scientists 43 D-Index: 380 scientists 44 D-Index: 310 scientists 45 D-Index: 341 scientists 46 D-Index: 301 scientists 47 D-Index: 306 scientists 48 D-Index: 271 scientists 49 D-Index: 246 scientists 50 D-Index: 210 scientists 51 D-Index: 253 scientists 52 D-Index: 213 scientists 53 D-Index: 221 scientists 54 D-Index: 195 scientists 55 D-Index: 186 scientists 56 D-Index: 170 scientists 57 D-Index: 167 scientists 58 D-Index: 166 scientists 59 D-Index: 144 scientists 60 D-Index: 152 scientists 61 D-Index: 141 scientists 62 D-Index: 138 scientists 63 D-Index: 131 scientists 64 D-Index: 118 scientists 65 D-Index: 114 scientists 66 D-Index: 119 scientists 67 D-Index: 95 scientists 68 D-Index: 87 scientists 69 D-Index: 77 scientists 70 D-Index: 89 scientists 71 D-Index: 69 scientists 72 D-Index: 54 scientists 73 D-Index: 46 scientists 74 D-Index: 55 scientists 75 D-Index: 54 scientists 76 D-Index: 49 scientists 77 D-Index: 53 scientists 78 D-Index: 46 scientists 79 D-Index: 28 scientists 80 D-Index: 39 scientists 81 D-Index: 36 scientists 82 D-Index: 24 scientists 83 D-Index: 26 scientists 84 D-Index: 36 scientists 85 D-Index: 18 scientists 86 D-Index: 25 scientists 87 D-Index: 19 scientists 88 D-Index: 26 scientists 89 D-Index: 27 scientists 90 D-Index: 23 scientists 91 D-Index: 15 scientists 92 D-Index: 12 scientists 93 D-Index: 9 scientists 94 D-Index: 15 scientists 95 D-Index: 10 scientists 96 D-Index: 13 scientists 97 D-Index: 13 scientists 98 D-Index: 9 scientists 99 D-Index: 7 scientists 100 D-Index: 7 scientists 101 D-Index: 8 scientists 102 D-Index: 7 scientists 103 D-Index: 7 scientists 104 D-Index: 9 scientists 105 D-Index: 6 scientists 106 D-Index: 9 scientists 107+ D-Index: 99 scientists
30 D-Index 107+

This scientist: 41 D-Index — 31st percentile

31% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 107 D-Index or more.

Overview

What is he best known for?

The fields of study he is best known for:

  • Mechanical engineering
  • Electrical engineering
  • Semiconductor

Andrew Nguyen mostly deals with Optoelectronics, Electronic engineering, Toroid, Annealing and Biasing. His work deals with themes such as Coating, Masking and Analytical chemistry, which intersect with Optoelectronics. Andrew Nguyen combines subjects such as Microelectronics, Thin film, Dielectric, Transistor and Composite material with his study of Electronic engineering.

His biological study spans a wide range of topics, including Layer, Substrate, Nanotechnology, Stress and Coupling. His work in Wafer addresses subjects such as Voltage, which are connected to disciplines such as Plasma-immersion ion implantation. His Plasma reactor research focuses on subjects like Electrical conduit, which are linked to Substrate.

His most cited work include:

  • Twin chamber processing system (245 citations)
  • Plasma immersion ion implantation process using a capacitively coupled plasma source having low dissociation and low minimum plasma voltage (227 citations)
  • Semiconductor substrate process using a low temperature-deposited carbon-containing hard mask (227 citations)

What are the main themes of his work throughout his whole career to date?

The scientist’s investigation covers issues in Optoelectronics, Electrical engineering, Substrate, Plasma reactor and Wafer. His Optoelectronics research is multidisciplinary, relying on both Electronic engineering, Toroid and Inductively coupled plasma. In his research, Electrical conduit, Enclosure and Remote plasma is intimately related to Acoustics, which falls under the overarching field of Electrical engineering.

His Substrate study integrates concerns from other disciplines, such as Mechanical engineering and Flow. His work investigates the relationship between Plasma reactor and topics such as Optics that intersect with problems in Electromagnetic coil and Coaxial. His research on Wafer also deals with topics like

  • Analytical chemistry which intersects with area such as Plasma-immersion ion implantation,
  • Vacuum chamber and related Cathode.

He most often published in these fields:

  • Optoelectronics (31.79%)
  • Electrical engineering (23.18%)
  • Substrate (22.52%)

What were the highlights of his more recent work (between 2014-2020)?

  • Substrate (22.52%)
  • Mechanical engineering (11.26%)
  • Composite material (11.26%)

In recent papers he was focusing on the following fields of study:

His primary scientific interests are in Substrate, Mechanical engineering, Composite material, Volume and Ring. His work in Substrate covers topics such as Electrical engineering which are related to areas like Support surface and Plasma chamber. His research brings together the fields of Structural engineering and Mechanical engineering.

His Composite material research incorporates elements of Radiofrequency coil and Ceiling. His study on Volume is intertwined with other disciplines of science such as Cathode, Vacuum chamber, Flow, Optoelectronics and Adapter. His research in Optoelectronics intersects with topics in Joule heating, Coupling and Inductively coupled plasma.

Between 2014 and 2020, his most popular works were:

  • Multiple electrode substrate support assembly and phase control system (6 citations)
  • Method and apparatus for controlling plasma near the edge of a substrate (6 citations)
  • Temperature ramping using gas distribution plate heat (5 citations)

In his most recent research, the most cited papers focused on:

  • Mechanical engineering
  • Electrical engineering
  • Semiconductor

His primary areas of study are Optoelectronics, Substrate, Electrical engineering, Optics and Plasma processing. His work in the fields of Optoelectronics, such as Dielectric, overlaps with other areas such as Radio frequency power transmission. His Substrate research integrates issues from Mechanical engineering, Structural engineering, Plasma technology and Phase control.

His Electrical engineering study combines topics in areas such as Vacuum pump and Plasma chamber. Andrew Nguyen interconnects Electronic engineering and Magnet in the investigation of issues within Optics. His research integrates issues of Rf filters, Joule heating, Flow, Electrical impedance and Coupling in his study of Plasma processing.

Best Publications

  • Low temperature CVD process with selected stress of the CVD layer on CMOS devices

    Hiroji Hanawa;Kartik Ramaswamy;Kenneth S. Collins;Amir Al-Bayati

  • Semiconductor substrate process using a low temperature-deposited carbon-containing hard mask

    Kartik Ramaswamy;Hiroji Hanawa;Biagio Gallo;Kenneth S. Collins

  • Plasma immersion ion implantation process using a capacitively coupled plasma source having low dissociation and low minimum plasma voltage

    Kenneth S. Collins;Hiroji Hanawa;Kartik Ramaswamy;Andrew Nguyen

  • Methods for processing substrates in process systems having shared resources

    James P. Cruse;Dermot Cantwell;Ming Xu;Charles Hardy

  • Twin chamber processing system

    Ming Xu;Andrew Nguyen;Evans Lee;Jared Ahmad Lee

  • Method for ion implanting insulator material to reduce dielectric constant

    Amir Al-Bayati;Rick J. Roberts;Kenneth S. Collins;Ken MacWilliams

  • Chemical vapor deposition plasma process using an ion shower grid

    Hiroji Hanawa;Tsutomu Tanaka;Kenneth S. Collins;Amir Al-Bayati

  • Dual mode inductively coupled plasma reactor with adjustable phase coil assembly

    Samer Banna;Valentin N. Todorow;Kenneth S. Collins;Andrew Nguyen

  • Copper conductor annealing process employing high speed optical annealing with a low temperature-deposited optical absorber layer

    Kartik Ramaswamy;Hiroji Hanawa;Biagio Gallo;Kenneth S. Collins

  • Substrate support having heat transfer system

    Andrew Nguyen;Wing Lau Cheng;Hiroji Hanawa;Semyon L. Kats

  • Copper barrier reflow process employing high speed optical annealing

    Kartik Ramaswamy;Hiroji Hanawa;Biagio Gallo;Kenneth S Collins

  • Semiconductor substrate process using an optically writable carbon-containing mask

    Kartik Ramaswamy;Hiroji Hanawa;Biagio Gallo;Kenneth S. Collins

  • A semiconductor junction formation process includi

    Ramaswamy Kartik;Hanawa Hiroji;Gallo Biagio;Collins Kenneth S

  • Low temperature absorption layer deposition and hi

    Ramaswamy Kartik;Hanawa Hiroji;Gallo Biagio;Collins Kenneth S

  • A process for low temperature plasma deposition of

    Ramaswamy Kartik;Hanawa Hiroji;Gallo Biagio;Collins Kenneth S

  • Methods and apparatus for calibrating flow controllers in substrate processing systems

    James P. Cruse;John W. Lane;Mariusch Gregor;Duc Buckius

  • Chemical vapor deposition plasma reactor having plural ion shower grids

    Hiroji Hanawa;Tsutomu Tanaka;Kenneth S. Collins;Amir Al-Bayati

  • Inductively-coupled parallel flat plasma reactor with conical dome

    Andrew Nguyen;Gerhard Schneider;Viktor Shel;Robert W Wu

  • Apparatus for controlling temperature uniformity of a showerhead

    Kallol Bera;James D. Carducci;Hamid Noorbakhsh;Larry D. Elizaga

  • Pressure controller configuration for semiconductor processing applications

    Sergey G. Belostotskiy;Andrew Nguyen;Jonathan Dinh;Ying-Sheng Lin

Frequent Co-Authors

Kartik Ramaswamy
Kartik Ramaswamy Applied Materials (United States)
Kenneth S. Collins
Kenneth S. Collins Applied Materials (United States)
Hiroji Hanawa
Hiroji Hanawa Applied Materials (United States)
Shahid Rauf
Shahid Rauf Applied Materials (United States)
Srinivas D. Nemani
Srinivas D. Nemani Applied Materials (United States)
Dmitry Lubomirsky
Dmitry Lubomirsky Applied Materials (United States)
Scott M. Williams
Scott M. Williams Case Western Reserve University
Matthew L. Miller
Matthew L. Miller NEC (United States)

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