The chart shows the distribution of publications by all Research.com ranked scientists in the field of Engineering and Technology in 2026. The highlighted bar marks where Srinivas D. Nemani sits on this spectrum.
This scientist: 138 publications — 22nd percentile
22% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 804 publications or more.
The chart shows the D-index (discipline H-index) distribution of Engineering and Technology scientists ranked by Research.com in 2026. The highlighted bar marks where Srinivas D. Nemani sits on this spectrum.
This scientist: 38 D-Index — 20th percentile
20% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 107 D-Index or more.
Srinivas D. Nemani is affiliated with Applied Materials in the United States and has contributed extensively to the fields of engineering and materials science, with a particular focus on electrical and electronic engineering, and the mechanics and chemistry of materials. Their research spans a number of subfields including electronic, optical and magnetic materials, atomic and molecular physics, and optics.
The main topics of their work include semiconductor materials and devices, copper interconnects and reliability, metal and thin film mechanics, molecular junctions and nanostructures, electronic and structural properties of oxides, integrated circuits and semiconductor failure analysis, as well as advancements in semiconductor devices and circuit design.
Recent publications by Srinivas D. Nemani feature studies on nanoscale deposition techniques and materials engineering. These include:
Srinivas D. Nemani's work has been published frequently in venues such as ACS Applied Nano Materials, ACS Applied Materials & Interfaces, Applied Surface Science, and the Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. These publications reflect consistent contributions to the advancement of nanomaterials and semiconductor technology.
Their collaborative efforts include frequent co-authors such as Keith T. Wong, Andrew C. Kummel, Ellie Yieh, James Huang, and Yunil Cho, highlighting an active role in team-based research projects. These collaborations often intersect with the fields of thin film deposition and nanoscale materials engineering.
Li-Qun Xia;Visweswaren Sivaramakrishnan;Srinivas Nemani;Ellie Yieh
David W Cheung;Frederick Gaillard;Shin-Puu Jeng;Chi-I Lang
Abhijit Basu Mallick;Jeffrey C. Munro;Linlin Wang;Srinivas D. Nemani
Ju-hyung Lee;Ping Xu;Shankar Venkataraman;Li-Qun Xia
Abhijit Basu Mallick;Srinivas D. Nemani;Timothy W. Weidman
Abhijit Basu Mallick;Srinivas D. Nemani
Srinivas D. Nemani;Li-Qun Xia;Ellie Yieh
Srinivas D Nemani;Li-Qun Xia;Dian Sugiarto;Ellie Yieh
Francimar Campana;Srinivas Nemani;Michael Chapin;Shankar Venkataraman
Jong Mun Kim;Kenny Linh Doan;Li Ling;Jairaj Payyapilly
Yi Zheng;Srinivas D Nemani;Li Qun Xia
Chia-Ling Kao;Kwang-Soo Kim;Sean S. Kang;Srinivas D. Nemani
Srinivas D. Nemani;Takehito Koshizawa
Mang-Mang Ling;Sean S. Kang;Jeremiah T. P. Pender;Srinivas D. Nemani
Lina Zhu;Sean S. Kang;Srinivas D. Nemani;Chia-Ling Kao
Lina Zhu;Sean S. Kang;Srinivas D. Nemani;Sergey G. Belostotskiy
Andrew Nguyen;Kartik Ramaswamy;Srinivas Nemani;Bradley Howard
Sergey G. Belostotskiy;Alexander Marcacci;Kartik Ramaswamy;Srinivas D. Nemani
Srinivas D. Nemani;Sumit Agarwal;Jeremiah T. Pender;Jonathan Germain
Srinivas D. Nemani;Jeremiah T. Pender;Qingjun Zhou;Dmitry Lubomirsky
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