The chart shows the distribution of publications by all Research.com ranked scientists in the field of Engineering and Technology in 2026. The highlighted bar marks where Charles Whitmer sits on this spectrum.
This scientist: 294 publications — 75th percentile
75% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 804 publications or more.
The chart shows the D-index (discipline H-index) distribution of Engineering and Technology scientists ranked by Research.com in 2026. The highlighted bar marks where Charles Whitmer sits on this spectrum.
This scientist: 33 D-Index — 5th percentile
5% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 107 D-Index or more.
Charles Whitmer is affiliated with Microsoft in the United States. Their research spans multiple fields, notably Engineering, Computer Science, and Materials Science, with contributions intersecting specialized subfields such as Aerospace Engineering, Computational Theory and Mathematics, and Materials Chemistry.
Their scholarly work focuses on topics related to nuclear reactor physics and engineering, matrix theory and algorithms, and materials relevant to nuclear technology including graphite and radiation studies.
Whitmer has authored research published in recognized venues, including:
Co-authorship collaborations include work with G. B. Zimmerman, indicating engagement with peers in advancing research in their fields of interest.
Whitmer's contributions have appeared primarily in the journal Nuclear Science and Engineering, reflecting a focus on topics within nuclear science and related engineering disciplines.
Edward S. Boyden;Roderick A. Hyde;Muriel Y. Ishikawa;Eric C. Leuthardt
Edward S. Boyden;Roderick A. Hyde;Muriel Y. Ishikawa;Eric C. Leuthardt
Edward S. Boyden;Roderick A. Hyde;Muriel Y. Ishikawa;Eric C. Leuthardt
Edward S. Boyden;Roderick A. Hyde;Muriel Y. Ishikawa;Eric C. Leuthardt
Richard T. Lord;Robert W. Lord;Nathan P. Myhrvold;Clarence T. Tegreene
Edward S. Boyden;Roderick A. Hyde;Muriel Y. Ishikawa;Eric C. Leuthardt
Edward S. Boyden;Roderick A. Hyde;Muriel Y. Ishikawa;Eric C. Leuthardt
Roderick A. Hyde;Muriel Y. Ishikawa;Jordin T. Kare;Thomas J. Nugent
Ehren J. Brav;Alistair K. Chan;William David Duncan;Russell J. Hannigan
Kenneth G. Caldeira;Alistair K. Chan;Daniel B. Cook;William David Duncan
Edward K.Y. Jung;Roderick A. Hyde;Muriel Y. Ishikawa;Jordin T. Kare
Gary W. Flake;William H. Gates;Roderick A. Hyde;Edward K. Y. Jung
Richard T. Lord;Robert W. Lord;Nathan P. Myhrvold;Clarence T. Tegreene
Howard Lee Davidson;James Robert Hamilton;Roderick A. Hyde;Arne Josefsberg
Roderick A. Hyde;Muriel Y. Ishikawa;Jordin T. Kare;Thomas J. Nugent
Roderick A. Hyde;Muriel Y. Ishikawa;Edward K.Y. Jung;William Gates
Edwards S. Boyden;Roderick A. Hyde;Muriel Y. Ishikawa;Jordin T. Kare
Roderick A. Hyde;Muriel Y. Ishikawa;Jordin T. Kare;Thomas J. Nugent
Richard T. Lord;Robert W. Lord;Nathan P. Myhrvold;Clarence T. Tegreene
Kenneth G. Caldeira;Peter L. Hagelstein;Roderick A. Hyde;Edward K. Y. Jung
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