Hiroji Hanawa

What is he best known for?

The fields of study he is best known for:

• Electrical engineering
• Mechanical engineering
• Semiconductor

His primary areas of study are Optoelectronics, Analytical chemistry, Toroid, Electronic engineering and Layer. His study in Optoelectronics is interdisciplinary in nature, drawing from both Annealing and Deposition. His Analytical chemistry research incorporates elements of Metalorganic vapour phase epitaxy, Wafer, Sputtering, Plasma reactor and Plasma-immersion ion implantation.

Hiroji Hanawa has included themes like Pedestal, Capacitively coupled plasma and Surface layer in his Wafer study. His work is dedicated to discovering how Toroid, Biasing are connected with Coupling and other disciplines. His biological study spans a wide range of topics, including Thin film and Dielectric.

His most cited work include:

• Gas distribution showerhead and method of cleaning (263 citations)
• Symmetric tunable inductively coupled HDP-CVD reactor (246 citations)
• Plasma immersion ion implantation process using a capacitively coupled plasma source having low dissociation and low minimum plasma voltage (227 citations)

What are the main themes of his work throughout his whole career to date?

Hiroji Hanawa spends much of his time researching Optoelectronics, Wafer, Electrical engineering, Analytical chemistry and Plasma reactor. His studies deal with areas such as Electrical conductor, Toroid, Substrate and Electromagnetic coil as well as Optoelectronics. His biological study deals with issues like Electronic engineering, which deal with fields such as Thin film.

The study incorporates disciplines such as Composite material, Deposition, Polymer and Vacuum chamber in addition to Wafer. His Electrical engineering research is multidisciplinary, incorporating perspectives in Acoustics, Optics and Pedestal. The concepts of his Analytical chemistry study are interwoven with issues in Sputtering, Plasma-immersion ion implantation, Layer, Signal and Inductively coupled plasma.

He most often published in these fields:

• Optoelectronics (42.95%)
• Wafer (32.21%)
• Electrical engineering (26.17%)

What were the highlights of his more recent work (between 2009-2018)?

• Substrate (12.75%)
• Electrical engineering (26.17%)
• Optoelectronics (42.95%)

In recent papers he was focusing on the following fields of study:

His primary areas of investigation include Substrate, Electrical engineering, Optoelectronics, Plasma reactor and Analytical chemistry. His Substrate research includes elements of Metalorganic vapour phase epitaxy, Pedestal, Radio frequency, Radio frequency signal and Electromagnetic coil. Many of his studies involve connections with topics such as Electronic engineering and Electrical engineering.

Hiroji Hanawa has researched Optoelectronics in several fields, including Outer diameter, Ceramic and Plasma processing. His work deals with themes such as Nuclear engineering, Coaxial cable and Voltage, which intersect with Plasma reactor. His research integrates issues of Layer, Substrate, Deposition process and Dielectric in his study of Analytical chemistry.

Between 2009 and 2018, his most popular works were:

• Gas distribution showerhead and method of cleaning (263 citations)
• Novel method for conformal plasma immersed ion implantation assisted by atomic layer deposition (193 citations)
• Methods of directing magnetic fields in a plasma source, and associated systems (59 citations)

In his most recent research, the most cited papers focused on:

• Electrical engineering
• Mechanical engineering
• Semiconductor

His primary scientific interests are in Substrate, Composite material, Mechanics, Chemical engineering and Analytical chemistry. His Composite material research includes themes of Turbulence, Structural engineering and Retention time. His Mechanics research is multidisciplinary, incorporating elements of Inlet, Geotechnical engineering, Trench and Electrical engineering, Dielectric.

His Chemical engineering research includes elements of Metalorganic vapour phase epitaxy, Deposition process, Chlorine and Ceramic coating. His studies in Analytical chemistry integrate themes in fields like Ion plating, Optoelectronics, Ion implantation, Atomic layer deposition and Substrate. His Layer study integrates concerns from other disciplines, such as Dopant and Plasma processing.