World's Best Scientists 2026 revealed!

D-Index & Metrics

Electronics and Electrical Engineering

D-Index
43
Citations
11829
World Ranking
3814
National Ranking
1378

Scott E. Thompson publication distribution in Electronics and Electrical Engineering in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Electronics and Electrical Engineering in 2026. The highlighted bar marks where Scott E. Thompson sits on this spectrum.

34–53 publications: 24 scientists 54–73 publications: 52 scientists 74–93 publications: 114 scientists 94–113 publications: 203 scientists 114–133 publications: 269 scientists 134–153 publications: 355 scientists 154–173 publications: 403 scientists 174–193 publications: 445 scientists 194–213 publications: 430 scientists 214–233 publications: 431 scientists 234–253 publications: 399 scientists 254–273 publications: 366 scientists 274–293 publications: 335 scientists 294–313 publications: 300 scientists 314–333 publications: 276 scientists 334–353 publications: 250 scientists 354–373 publications: 214 scientists 374–393 publications: 187 scientists 394–413 publications: 152 scientists 414–433 publications: 169 scientists 434–453 publications: 147 scientists 454–473 publications: 111 scientists 474–493 publications: 117 scientists 494–513 publications: 103 scientists 514–533 publications: 99 scientists 534–553 publications: 92 scientists 554–573 publications: 75 scientists 574–593 publications: 58 scientists 594–613 publications: 69 scientists 614–633 publications: 50 scientists 634–653 publications: 62 scientists 654–673 publications: 54 scientists 674–693 publications: 44 scientists 694–713 publications: 37 scientists 714–733 publications: 28 scientists 734–753 publications: 26 scientists 754–773 publications: 26 scientists 774–793 publications: 19 scientists 794–813 publications: 23 scientists 814–833 publications: 20 scientists 834–853 publications: 16 scientists 854–873 publications: 20 scientists 874–893 publications: 11 scientists 894–913 publications: 11 scientists 914–933 publications: 16 scientists 934–953 publications: 13 scientists 954–973 publications: 10 scientists 974–993 publications: 11 scientists 994–1,013 publications: 9 scientists 1,014–1,033 publications: 9 scientists 1,034–1,053 publications: 10 scientists 1,054–1,064 publications: 6 scientists 1,065+ publications: 99 scientists
34 publications 1,065+

This scientist: 137 publications — 11th percentile

11% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,065 publications or more.

Scott E. Thompson D-index placement in Electronics and Electrical Engineering in 2026

The chart shows the D-index (discipline H-index) distribution of Electronics and Electrical Engineering scientists ranked by Research.com in 2026. The highlighted bar marks where Scott E. Thompson sits on this spectrum.

30 D-Index: 178 scientists 31 D-Index: 257 scientists 32 D-Index: 263 scientists 33 D-Index: 262 scientists 34 D-Index: 244 scientists 35 D-Index: 236 scientists 36 D-Index: 211 scientists 37 D-Index: 220 scientists 38 D-Index: 214 scientists 39 D-Index: 214 scientists 40 D-Index: 205 scientists 41 D-Index: 187 scientists 42 D-Index: 194 scientists 43 D-Index: 201 scientists 44 D-Index: 155 scientists 45 D-Index: 189 scientists 46 D-Index: 148 scientists 47 D-Index: 160 scientists 48 D-Index: 134 scientists 49 D-Index: 130 scientists 50 D-Index: 141 scientists 51 D-Index: 156 scientists 52 D-Index: 108 scientists 53 D-Index: 130 scientists 54 D-Index: 112 scientists 55 D-Index: 97 scientists 56 D-Index: 111 scientists 57 D-Index: 102 scientists 58 D-Index: 108 scientists 59 D-Index: 120 scientists 60 D-Index: 103 scientists 61 D-Index: 93 scientists 62 D-Index: 92 scientists 63 D-Index: 74 scientists 64 D-Index: 77 scientists 65 D-Index: 73 scientists 66 D-Index: 64 scientists 67 D-Index: 69 scientists 68 D-Index: 60 scientists 69 D-Index: 39 scientists 70 D-Index: 57 scientists 71 D-Index: 59 scientists 72 D-Index: 46 scientists 73 D-Index: 49 scientists 74 D-Index: 38 scientists 75 D-Index: 35 scientists 76 D-Index: 32 scientists 77 D-Index: 35 scientists 78 D-Index: 31 scientists 79 D-Index: 22 scientists 80 D-Index: 34 scientists 81 D-Index: 31 scientists 82 D-Index: 34 scientists 83 D-Index: 23 scientists 84 D-Index: 18 scientists 85 D-Index: 30 scientists 86 D-Index: 19 scientists 87 D-Index: 19 scientists 88 D-Index: 20 scientists 89 D-Index: 8 scientists 90 D-Index: 17 scientists 91 D-Index: 7 scientists 92 D-Index: 14 scientists 93 D-Index: 9 scientists 94 D-Index: 15 scientists 95 D-Index: 10 scientists 96 D-Index: 12 scientists 97 D-Index: 10 scientists 98 D-Index: 10 scientists 99 D-Index: 12 scientists 100 D-Index: 16 scientists 101 D-Index: 5 scientists 102 D-Index: 7 scientists 103 D-Index: 7 scientists 104 D-Index: 8 scientists 105 D-Index: 9 scientists 106 D-Index: 13 scientists 107 D-Index: 4 scientists 108 D-Index: 5 scientists 109 D-Index: 10 scientists 110 D-Index: 8 scientists 111+ D-Index: 96 scientists
30 D-Index 111+

This scientist: 43 D-Index — 45th percentile

45% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 111 D-Index or more.

Research.com Recognitions

  • 2007 - IEEE Fellow For contributions to common metal oxide semiconductor technology for high-volume manufacturing

Overview

Scott E. Thompson is affiliated with the University of Florida in the United States. Their research spans primarily the field of engineering, with a focus on electrical and electronic engineering, biophysics, artificial intelligence, and computer vision and pattern recognition.

The scientist's recent publications include:

  • Negative Impact of Compressive Biaxial Stress on High Precision Bipolar Devices, 2021, IEEE Transactions on Components Packaging and Manufacturing Technology
  • "Émile Zola and the Naturalistic School, or Realism in French Literature" by Mary Elizabeth Braddon, edited with an Introduction and Textual Notes., 2020, Victorian Popular Fictions Journal
  • WITHDRAWN: Novel machine learning models for flow imaging microscopy sub-visible particle classification in protein formulations, 2023, International Journal of Pharmaceutics
  • Case Study: AI-Driven Early Detection of Cancer Using Deep Learning Models, 2024, International Journal of Emerging Research in Engineering and Technology

Frequent co-authors in their work include:

  • Thomas Weingartner
  • Chiao-Han Kuo
  • Andrew Thomas
  • Mark E. Law
  • Mary Elizabeth

Scott E. Thompson frequently publishes in venues such as:

  • IEEE Transactions on Components Packaging and Manufacturing Technology
  • Victorian Popular Fictions Journal
  • International Journal of Pharmaceutics
  • International Journal of Emerging Research in Engineering and Technology

The main research topics addressed by Thompson include:

  • Electronic Packaging and Soldering Technologies
  • Electrostatic Discharge in Electronics
  • Advanced MEMS and NEMS Technologies
  • Cell Image Analysis Techniques
  • Machine Learning and Data Classification
  • Digital Imaging for Blood Diseases

Among the awards received, Scott E. Thompson was recognized as an IEEE Fellow in 2007 for contributions to common metal oxide semiconductor technology for high-volume manufacturing.

Best Publications

  • A 90nm high volume manufacturing logic technology featuring novel 45nm gate length strained silicon CMOS transistors

    T. Ghani;M. Armstrong;C. Auth;M. Bost

  • Moore's law: the future of Si microelectronics

    Scott E. Thompson;Srivatsan Parthasarathy

  • A 90-nm logic technology featuring strained-silicon

    S.E. Thompson;M. Armstrong;C. Auth;M. Alavi

  • Uniaxial-process-induced strained-Si: extending the CMOS roadmap

    S.E. Thompson;Guangyu Sun;Youn Sung Choi;T. Nishida

  • A logic nanotechnology featuring strained-silicon

    S.E. Thompson;M. Armstrong;C. Auth;S. Cea

  • Physics of strain effects in semiconductors and metal-oxide-semiconductor field-effect transistors

    Y. Sun;S. E. Thompson;T. Nishida

  • MOS Scaling: Transistor Challenges for the 21st Century

    Scott Thompson

  • Strain: A Solution for Higher Carrier Mobility in Nanoscale MOSFETs

    Min Chu;Yongke Sun;Umamaheswari Aghoram;Scott E. Thompson

  • A 90 nm logic technology featuring 50 nm strained silicon channel transistors, 7 layers of Cu interconnects, low k ILD, and 1 /spl mu/m/sup 2/ SRAM cell

    S. Thompson;N. Anand;M. Armstrong;C. Auth

  • Strain effect in semiconductors : theory and device applications

    Yongke Sun;Scott E. Thompson;Toshikazu Nishida

  • Key differences for process-induced uniaxial vs. substrate-induced biaxial stressed Si and Ge channel MOSFETs

    S. Thompson;G. Sun;K. Wu;J. Lim

  • In search of "Forever," continued transistor scaling one new material at a time

    S.E. Thompson;R.S. Chau;T. Ghani;K. Mistry

  • Scaling challenges and device design requirements for high performance sub-50 nm gate length planar CMOS transistors

    T. Ghani;K. Mistry;P. Packan;S. Thompson

  • Comparison of threshold-voltage shifts for uniaxial and biaxial tensile-stressed n-MOSFETs

    Ji-Song Lim;S.E. Thompson;J.G. Fossum

  • Electronic devices and systems, and methods for making and using the same

    Scott E. Thompson;Damodar R. Thummalapally

  • Delaying forever: Uniaxial strained silicon transistors in a 90nm CMOS technology

    K. Mistry;M. Armstrong;C. Auth;S. Cea

  • Strain Effect in Semiconductors

    Yongke Sun;Scott E. Thompson;Toshikazu Nishida

  • CMOS fabrication process utilizing special transistor orientation

    Mark Armstrong;Gerhard Schrom;Sunit Tyagi;Paul A. Packan

  • A 130 nm generation logic technology featuring 70 nm transistors, dual Vt transistors and 6 layers of Cu interconnects

    S. Tyagi;M. Alavi;R. Bigwood;T. Bramblett

  • Hole mobility in silicon inversion layers: Stress and surface orientation

    Guangyu Sun;Yongke Sun;Toshikazu Nishida;Scott E. Thompson

  • Transistor with threshold voltage set notch and method of fabrication thereof

    Reza Arghavani;Pushkar Ranade;Lucian Shifren;Scott E. Thompson

Frequent Co-Authors

Toshikazu Nishida
Toshikazu Nishida University of Florida
Mark T. Bohr
Mark T. Bohr Intel (United States)
Tahir Ghani
Tahir Ghani Intel (United States)
Prashant Majhi
Prashant Majhi Intel (United States)
Muhammad Mustafa Hussain
Muhammad Mustafa Hussain Purdue University West Lafayette
Paul Kirsch
Paul Kirsch Samsung Austin Semiconductor
Ronald D. Schrimpf
Ronald D. Schrimpf Vanderbilt University
Byoung Hun Lee
Byoung Hun Lee Pohang University of Science and Technology
Daniel M. Fleetwood
Daniel M. Fleetwood Vanderbilt University
Rino Choi
Rino Choi Inha University

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Related Online Degrees & Career Pathways

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Additionally, flexibility is enhanced by institutions offering best online colleges with weekly start dates, which allow students to enroll at various times throughout the year, reducing wait times and accommodating diverse schedules for those pursuing engineering degrees remotely.

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