The chart shows the distribution of publications by all Research.com ranked scientists in the field of Electronics and Electrical Engineering in 2026. The highlighted bar marks where Toshikazu Nishida sits on this spectrum.
This scientist: 218 publications — 35th percentile
35% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 1,065 publications or more.
The chart shows the D-index (discipline H-index) distribution of Electronics and Electrical Engineering scientists ranked by Research.com in 2026. The highlighted bar marks where Toshikazu Nishida sits on this spectrum.
This scientist: 50 D-Index — 60th percentile
60% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 111 D-Index or more.
Toshikazu Nishida is affiliated with the University of Florida in the United States. Their research spans the fields of engineering and materials science, with a particular focus on electrical and electronic engineering, materials chemistry, and biomedical engineering. Additional subfields include automotive engineering and atomic and molecular physics, and optics.
The scientist has contributed to topics related to ferroelectric and negative capacitance devices, advanced memory and neural computing, and additive manufacturing and 3D printing technologies. Their work also addresses semiconductor materials and devices, MXene and MAX phase materials, electronic and structural properties of oxides, as well as ferroelectric and piezoelectric materials.
Recent papers authored or co-authored by Nishida include:
Frequent coauthors in Nishida's research include Glen Walters, Aniruddh Shekhawat, Saeed Moghaddam, Paul Chojecki, and Roozbeh Tabrizian.
Their work has appeared in multiple scientific venues, including:
S.E. Thompson;Guangyu Sun;Youn Sung Choi;T. Nishida
Y. Sun;S. E. Thompson;T. Nishida
Quentin Gallas;Ryan Holman;Toshikazu Nishida;Bruce Carroll
Abhishek Prasad;Qing Shan Xue;Viswanath Sankar;Toshikazu Nishida
Yongke Sun;Scott E. Thompson;Toshikazu Nishida
S B Horowitz;M Sheplak;L N Cattafesta;T Nishida
S. Thompson;G. Sun;K. Wu;J. Lim
A. Neugroschel;Chih-Tang Sah;K.M. Han;M.S. Carroll
Yongke Sun;Scott E. Thompson;Toshikazu Nishida
Abhishek Prasad;Qing-Shan Xue;Robert Dieme;Viswanath Sankar
Patrick D. Lomenzo;Qanit Takmeel;Chuanzhen Zhou;Chris M. Fancher
Erin Patrick;Mark E. Orazem;Justin C. Sanchez;Toshikazu Nishida
Patrick D. Lomenzo;Peng Zhao;Qanit Takmeel;Saeed Moghaddam
Guangyu Sun;Yongke Sun;Toshikazu Nishida;Scott E. Thompson
E.M. Chow;V. Chandrasekaran;A. Partridge;T. Nishida
B. S. Kang;S. Kim;J. Kim;F. Ren
Stephen Horowitz;Toshikazu Nishida;Louis Cattafesta;Mark Sheplak
S. Suthram;J.C. Ziegert;T. Nishida;S.E. Thompson
S. E. Thompson;S. Suthram;Y. Sun;G. Sun
D.T. Martin;Jian Liu;K. Kadirvel;R.M. Fox
Shengwen Xu;K.D.T. Ngo;T. Nishida;Gyo-Bum Chung
Patrick D. Lomenzo;Ching-Chang Chung;Chuanzhen Zhou;Jacob L. Jones
Yanwei Wang;Jian Li;Petre Stoica;Mark Sheplak
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