2010 - IEEE Fellow For contributions to understanding of radiation damage and reliabilityof metal-oxide semiconductor devices
His primary scientific interests are in Electron paramagnetic resonance, Silicon, Optoelectronics, Dangling bond and Crystallographic defect. His Electron paramagnetic resonance research includes elements of Annealing, Molecular physics, Resonance and Paramagnetism. The concepts of his Silicon study are interwoven with issues in Oxide, Condensed matter physics, Irradiation and Voltage.
The High-κ dielectric research he does as part of his general Optoelectronics study is frequently linked to other disciplines of science, such as Electric field, therefore creating a link between diverse domains of science. His Dangling bond study combines topics from a wide range of disciplines, such as Silicon nitride, Mineralogy and MOSFET. His Crystallographic defect study integrates concerns from other disciplines, such as Radiation damage and Atomic physics.
Patrick M. Lenahan mainly focuses on Silicon, Electron paramagnetic resonance, Optoelectronics, Condensed matter physics and MOSFET. His work on Dangling bond as part of general Silicon study is frequently connected to Atomic units, therefore bridging the gap between diverse disciplines of science and establishing a new relationship between them. His Electron paramagnetic resonance study incorporates themes from Crystallographic defect, Paramagnetism, Molecular physics and Analytical chemistry.
His research investigates the connection between Optoelectronics and topics such as Field-effect transistor that intersect with issues in Wide-bandgap semiconductor. His work carried out in the field of Condensed matter physics brings together such families of science as Electron, Hyperfine structure and Magnetoresistance. His study in MOSFET is interdisciplinary in nature, drawing from both Resonance and Electronic engineering.
His primary areas of investigation include Optoelectronics, Condensed matter physics, Electrically detected magnetic resonance, Magnetoresistance and Transistor. His Optoelectronics research incorporates elements of Oxide and MOSFET. His MOSFET study also includes
His studies deal with areas such as Charge pumping and Zero field as well as Condensed matter physics. His specific area of interest is Silicon, where Patrick M. Lenahan studies Dangling bond. His research in Absorbed dose focuses on subjects like Electron paramagnetic resonance, which are connected to Radiation damage.
Patrick M. Lenahan mostly deals with Optoelectronics, Condensed matter physics, MOSFET, Spin and Quantum tunnelling. His Optoelectronics study combines topics from a wide range of disciplines, such as Radiation, Transistor, Bipolar junction transistor and Electron paramagnetic resonance. In MOSFET, he works on issues like Semiconductor, which are connected to Resonator, Resonance, Wafer and Wide-bandgap semiconductor.
His Spin research is multidisciplinary, relying on both Spins and Hyperfine structure. As part of the same scientific family, he usually focuses on Hyperfine structure, concentrating on Dielectric and intersecting with Atomic physics. His research in Quantum tunnelling intersects with topics in Silicon and Magnetoresistance.
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Hole traps and trivalent silicon centers in metal/oxide/silicon devices
Patrick M. Lenahan;P. V. Dressendorfer.
Journal of Applied Physics (1984)
What can electron paramagnetic resonance tell us about the Si/SiO2 system?
Patrick M. Lenahan;J. F. Conley.
Journal of Vacuum Science & Technology B (1998)
Electrically active point defects in amorphous silicon nitride: An illumination and charge injection study
D. T. Krick;P. M. Lenahan;J. Kanicki.
Journal of Applied Physics (1988)
The effect of interfacial layer properties on the performance of Hf-based gate stack devices
G. Bersuker;C. S. Park;J. Barnett;P. S. Lysaght.
Journal of Applied Physics (2006)
An electron spin resonance study of radiation‐induced electrically active paramagnetic centers at the Si/SiO2 interface
P. M. Lenahan;P. V. Dressendorfer.
Journal of Applied Physics (1983)
Thermal-equilibrium defect processes in hydrogenated amorphous silicon
Z. E. Smith;S. Aljishi;D. Slobodin;V. Chu.
Physical Review Letters (1986)
Electron‐spin‐resonance study of radiation‐induced paramagnetic defects in oxides grown on (100) silicon substrates
Yong Yun Kim;P. M. Lenahan.
Journal of Applied Physics (1988)
Effect of bias on radiation-induced paramagnetic defects at the silicon-silicon dioxide interface
P. M. Lenahan;P. V. Dressendorfer.
Applied Physics Letters (1982)
First observation of paramagnetic nitrogen dangling-bond centers in silicon nitride
William L. Warren;Patrick M. Lenahan;Sean E. Curry.
Physical Review Letters (1990)
Electron spin resonance observation of trapped electron centers in atomic-layer-deposited hafnium oxide on Si
A. Y. Kang;P. M. Lenahan;J. F. Conley.
Applied Physics Letters (2003)
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