D-Index & Metrics Best Publications

D-Index & Metrics D-index (Discipline H-index) only includes papers and citation values for an examined discipline in contrast to General H-index which accounts for publications across all disciplines.

Discipline name D-index D-index (Discipline H-index) only includes papers and citation values for an examined discipline in contrast to General H-index which accounts for publications across all disciplines. Citations Publications World Ranking National Ranking
Materials Science D-index 59 Citations 8,898 305 World Ranking 4691 National Ranking 1324

Research.com Recognitions

Awards & Achievements

2010 - IEEE Fellow For contributions to understanding of radiation damage and reliabilityof metal-oxide semiconductor devices

Overview

What is he best known for?

The fields of study he is best known for:

  • Electron
  • Semiconductor
  • Silicon

His primary scientific interests are in Electron paramagnetic resonance, Silicon, Optoelectronics, Dangling bond and Crystallographic defect. His Electron paramagnetic resonance research includes elements of Annealing, Molecular physics, Resonance and Paramagnetism. The concepts of his Silicon study are interwoven with issues in Oxide, Condensed matter physics, Irradiation and Voltage.

The High-κ dielectric research he does as part of his general Optoelectronics study is frequently linked to other disciplines of science, such as Electric field, therefore creating a link between diverse domains of science. His Dangling bond study combines topics from a wide range of disciplines, such as Silicon nitride, Mineralogy and MOSFET. His Crystallographic defect study integrates concerns from other disciplines, such as Radiation damage and Atomic physics.

His most cited work include:

  • Hole traps and trivalent silicon centers in metal/oxide/silicon devices (586 citations)
  • What can electron paramagnetic resonance tell us about the Si/SiO2 system? (265 citations)
  • Electrically active point defects in amorphous silicon nitride: An illumination and charge injection study (156 citations)

What are the main themes of his work throughout his whole career to date?

Patrick M. Lenahan mainly focuses on Silicon, Electron paramagnetic resonance, Optoelectronics, Condensed matter physics and MOSFET. His work on Dangling bond as part of general Silicon study is frequently connected to Atomic units, therefore bridging the gap between diverse disciplines of science and establishing a new relationship between them. His Electron paramagnetic resonance study incorporates themes from Crystallographic defect, Paramagnetism, Molecular physics and Analytical chemistry.

His research investigates the connection between Optoelectronics and topics such as Field-effect transistor that intersect with issues in Wide-bandgap semiconductor. His work carried out in the field of Condensed matter physics brings together such families of science as Electron, Hyperfine structure and Magnetoresistance. His study in MOSFET is interdisciplinary in nature, drawing from both Resonance and Electronic engineering.

He most often published in these fields:

  • Silicon (45.03%)
  • Electron paramagnetic resonance (37.89%)
  • Optoelectronics (37.27%)

What were the highlights of his more recent work (between 2016-2021)?

  • Optoelectronics (37.27%)
  • Condensed matter physics (27.33%)
  • Electrically detected magnetic resonance (7.14%)

In recent papers he was focusing on the following fields of study:

His primary areas of investigation include Optoelectronics, Condensed matter physics, Electrically detected magnetic resonance, Magnetoresistance and Transistor. His Optoelectronics research incorporates elements of Oxide and MOSFET. His MOSFET study also includes

  • Resonance that intertwine with fields like Crystallographic defect,
  • Semiconductor which intersects with area such as Wide-bandgap semiconductor.

His studies deal with areas such as Charge pumping and Zero field as well as Condensed matter physics. His specific area of interest is Silicon, where Patrick M. Lenahan studies Dangling bond. His research in Absorbed dose focuses on subjects like Electron paramagnetic resonance, which are connected to Radiation damage.

Between 2016 and 2021, his most popular works were:

  • Multi-resonance frequency spin dependent charge pumping and spin dependent recombination - applied to the 4H-SiC/SiO2 interface (14 citations)
  • Physical nature of electrically detected magnetic resonance through spin dependent trap assisted tunneling in insulators (7 citations)
  • A New Analytical Tool for the Study of Radiation Effects in 3-D Integrated Circuits: Near-Zero Field Magnetoresistance Spectroscopy (7 citations)

In his most recent research, the most cited papers focused on:

  • Electron
  • Semiconductor
  • Electrical engineering

Patrick M. Lenahan mostly deals with Optoelectronics, Condensed matter physics, MOSFET, Spin and Quantum tunnelling. His Optoelectronics study combines topics from a wide range of disciplines, such as Radiation, Transistor, Bipolar junction transistor and Electron paramagnetic resonance. In MOSFET, he works on issues like Semiconductor, which are connected to Resonator, Resonance, Wafer and Wide-bandgap semiconductor.

His Spin research is multidisciplinary, relying on both Spins and Hyperfine structure. As part of the same scientific family, he usually focuses on Hyperfine structure, concentrating on Dielectric and intersecting with Atomic physics. His research in Quantum tunnelling intersects with topics in Silicon and Magnetoresistance.

This overview was generated by a machine learning system which analysed the scientist’s body of work. If you have any feedback, you can contact us here.

Best Publications

Hole traps and trivalent silicon centers in metal/oxide/silicon devices

Patrick M. Lenahan;P. V. Dressendorfer.
Journal of Applied Physics (1984)

840 Citations

What can electron paramagnetic resonance tell us about the Si/SiO2 system?

Patrick M. Lenahan;J. F. Conley.
Journal of Vacuum Science & Technology B (1998)

386 Citations

Electrically active point defects in amorphous silicon nitride: An illumination and charge injection study

D. T. Krick;P. M. Lenahan;J. Kanicki.
Journal of Applied Physics (1988)

217 Citations

The effect of interfacial layer properties on the performance of Hf-based gate stack devices

G. Bersuker;C. S. Park;J. Barnett;P. S. Lysaght.
Journal of Applied Physics (2006)

192 Citations

An electron spin resonance study of radiation‐induced electrically active paramagnetic centers at the Si/SiO2 interface

P. M. Lenahan;P. V. Dressendorfer.
Journal of Applied Physics (1983)

190 Citations

Thermal-equilibrium defect processes in hydrogenated amorphous silicon

Z. E. Smith;S. Aljishi;D. Slobodin;V. Chu.
Physical Review Letters (1986)

186 Citations

Electron‐spin‐resonance study of radiation‐induced paramagnetic defects in oxides grown on (100) silicon substrates

Yong Yun Kim;P. M. Lenahan.
Journal of Applied Physics (1988)

178 Citations

Effect of bias on radiation-induced paramagnetic defects at the silicon-silicon dioxide interface

P. M. Lenahan;P. V. Dressendorfer.
Applied Physics Letters (1982)

169 Citations

First observation of paramagnetic nitrogen dangling-bond centers in silicon nitride

William L. Warren;Patrick M. Lenahan;Sean E. Curry.
Physical Review Letters (1990)

167 Citations

Electron spin resonance observation of trapped electron centers in atomic-layer-deposited hafnium oxide on Si

A. Y. Kang;P. M. Lenahan;J. F. Conley.
Applied Physics Letters (2003)

137 Citations

If you think any of the details on this page are incorrect, let us know.

Contact us

Best Scientists Citing Patrick M. Lenahan

Daniel M. Fleetwood

Daniel M. Fleetwood

Vanderbilt University

Publications: 117

Andre Stesmans

Andre Stesmans

KU Leuven

Publications: 69

Tibor Grasser

Tibor Grasser

TU Wien

Publications: 64

Ronald D. Schrimpf

Ronald D. Schrimpf

Vanderbilt University

Publications: 58

Gennadi Bersuker

Gennadi Bersuker

The Aerospace Corporation

Publications: 53

Sokrates T. Pantelides

Sokrates T. Pantelides

Vanderbilt University

Publications: 48

Marty R. Shaneyfelt

Marty R. Shaneyfelt

Sandia National Laboratories

Publications: 45

William L. Warren

William L. Warren

Sanofi Pasteur

Publications: 40

Valeri Afanas'ev

Valeri Afanas'ev

KU Leuven

Publications: 40

P.S. Winokur

P.S. Winokur

Sandia National Laboratories

Publications: 39

J.R. Schwank

J.R. Schwank

Sandia National Laboratories

Publications: 36

Jerzy Kanicki

Jerzy Kanicki

University of Michigan–Ann Arbor

Publications: 35

Hans Reisinger

Hans Reisinger

Infineon Technologies (Germany)

Publications: 27

Takeshi Ohshima

Takeshi Ohshima

Japan Atomic Energy Agency

Publications: 26

Souvik Mahapatra

Souvik Mahapatra

Indian Institute of Technology Bombay

Publications: 26

Alexander L. Shluger

Alexander L. Shluger

University College London

Publications: 24

Trending Scientists

Timothy M. McGloughlin

Timothy M. McGloughlin

University of Limerick

Erdogan Gulari

Erdogan Gulari

University of Michigan–Ann Arbor

Xiong Zhang

Xiong Zhang

Chinese Academy of Sciences

Akihiro Shima

Akihiro Shima

University of Tokyo

Jesús Piedrafita

Jesús Piedrafita

Autonomous University of Barcelona

Emmie de Wit

Emmie de Wit

National Institutes of Health

Stefan Mulitza

Stefan Mulitza

University of Bremen

Fred Hattermann

Fred Hattermann

Potsdam Institute for Climate Impact Research

Johannes Frasnelli

Johannes Frasnelli

Université du Québec à Trois-Rivières

Ruth L. Stornetta

Ruth L. Stornetta

University of Virginia

Peter Liljeström

Peter Liljeström

Karolinska Institute

Verónica Benet-Martínez

Verónica Benet-Martínez

Pompeu Fabra University

Victor G. Cicirelli

Victor G. Cicirelli

Purdue University West Lafayette

Monique J. Roobol

Monique J. Roobol

Erasmus MC

David Bergqvist

David Bergqvist

Uppsala University

Ruth Milkman

Ruth Milkman

The Graduate Center, CUNY

Something went wrong. Please try again later.