The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Takeshi Ohshima sits on this spectrum.
This scientist: 817 publications — 97th percentile
97% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 1,163 publications or more.
The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Takeshi Ohshima sits on this spectrum.
This scientist: 71 D-Index — 68th percentile
68% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 165 D-Index or more.
Takeshi Ohshima is affiliated with the Japan Atomic Energy Agency in Japan. Their research primarily spans the fields of Engineering, Materials Science, and Physics and Astronomy, with a notable focus on Electrical and Electronic Engineering, Materials Chemistry, and Atomic and Molecular Physics, and Optics.
The scientist has contributed to several main topics including Diamond and Carbon-based Materials Research, Semiconductor Materials and Devices, Silicon Carbide Semiconductor Technologies, High-pressure Geophysics and Materials, Radiation Effects in Electronics, Advanced Fiber Laser Technologies, and Atomic and Subatomic Physics Research.
Takeshi Ohshima has published extensively in various scientific venues. The most frequent publication venues include:
Their recent papers include:
Takeshi Ohshima has collaborated frequently with several co-authors, including Hiroshi Abe, Shinobu Onoda, Takahiro Makino, Brant C. Gibson, and Philipp Reineck.
In addition to journal publications, they have contributed to book publications. One identified work appears as a chapter in the book titled Silicon Carbide and Related Materials 2019 published by Trans Tech Publications Ltd. eBooks in 2020.
S. Castelletto;B. C. Johnson;V. Ivady;N. Stavrias
G. Waldherr;Y. Wang;S. Zaiser;M. Jamali
Matthias Widmann;Sang-Yun Lee;Torsten Rendler;Nguyen Tien Son
Jan Jeske;Desmond W. M. Lau;Xavier Vidal;Liam P. McGuinness
J. G. Lu;S. Fujita;T. Kawaharamura;H. Nishinaka
Thomas Wolf;Philipp Neumann;Kazuo Nakamura;Hitoshi Sumiya
Matthias Widmann;Sang-Yun Lee;Torsten Rendler;Nguyen Tien Son
Y. Kubo;C. Grezes;A. Dewes;T. Umeda
David J. Christle;Abram L. Falk;Paolo Andrich;Paolo Andrich;Paul V. Klimov;Paul V. Klimov
NT Son;X T Trinh;Lars Sundnes Løvlie;Bengt Gunnar Svensson
Roland Nagy;Matthias Niethammer;Matthias Widmann;Yu-Chen Chen
N. T. Son;P. Carlsson;J. ul Hassan;E. Janzén
Yu Miyazawa;Masashi Ikegami;Hsin-Wei Chen;Takeshi Ohshima
A. Lohrmann;N. Iwamoto;Z. Bodrog;S. Castelletto
Jingfu Zhang;Jeong Hyun Shim;Ingo Niemeyer;T. Taniguchi
Marina Radulaski;Matthias Widmann;Matthias Niethammer;Jingyuan Linda Zhang
Robert Bernat;Ivana Capan;Luka Bakrač;Tomislav Brodar
J.G. Lu;T. Kawaharamura;H. Nishinaka;Y. Kamada
T. Yamamoto;T. Umeda;K. Watanabe;S. Onoda
Daisuke Kobayashi;Yoshiharu Mori;Daisuke Matsuura;Masaki Kusano
H. Itoh;A. Kawasuso;T. Ohshima;M. Yoshikawa
Christopher P. Anderson;Alexandre Bourassa;Kevin C. Miao;Gary Wolfowicz
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