Gerhard Pensl focuses on Analytical chemistry, Silicon carbide, Ion implantation, Annealing and Wide-bandgap semiconductor. The various areas that he examines in his Analytical chemistry study include Hall effect, Doping and Chemical vapor deposition. His work in Doping addresses issues such as Silicon, which are connected to fields such as Atomic physics, Semiconductor materials, Acceptor and Wafer.
Gerhard Pensl interconnects Titanium, Capacitor, Semiconductor and Thermal oxidation in the investigation of issues within Silicon carbide. His work in Ion implantation covers topics such as Inorganic chemistry which are related to areas like Shallow donor and Atmospheric temperature range. His study focuses on the intersection of Wide-bandgap semiconductor and fields such as Oxide with connections in the field of Nanotechnology and Passivation.
His primary areas of study are Analytical chemistry, Optoelectronics, Deep-level transient spectroscopy, Silicon and Silicon carbide. His Analytical chemistry research is multidisciplinary, incorporating elements of Hall effect, Ion implantation, Annealing and Doping. The study incorporates disciplines such as Oxide and Admittance spectroscopy in addition to Optoelectronics.
His Deep-level transient spectroscopy study combines topics from a wide range of disciplines, such as Band gap and Atomic physics. Gerhard Pensl has included themes like Crystallography, Passivation and Activation energy in his Silicon study. His research in Silicon carbide intersects with topics in Wide-bandgap semiconductor, Nanotechnology, Semiconductor and Sublimation.
Gerhard Pensl focuses on Analytical chemistry, Deep-level transient spectroscopy, Optoelectronics, Atomic physics and Electron beam processing. The Analytical chemistry study combines topics in areas such as Doping, Annealing, Hall effect, Conductivity and Band gap. His work investigates the relationship between Band gap and topics such as Thermal oxidation that intersect with problems in Ion implantation and Deep level.
His work is dedicated to discovering how Deep-level transient spectroscopy, Schottky diode are connected with Epitaxy, Activation energy, Poole–Frenkel effect and Vacancy defect and other disciplines. His Optoelectronics research includes themes of Power and Silicon carbide. His study in Silicon carbide is interdisciplinary in nature, drawing from both Nanotechnology, Semiconductor, Volume and Power semiconductor device.
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Intrinsic SiC/SiO2 Interface States
Valeri Afanas'ev;M. Bassler;G. Pensl;M. J. Schulz.
Physica Status Solidi (a) (1997)
Deep Defect Centers in Silicon Carbide Monitored with Deep Level Transient Spectroscopy
T. Dalibor;G. Pensl;H. Matsunami;T. Kimoto.
Physica Status Solidi (a) (1997)
Insulating Films on Semiconductors
Max J. Schulz;Gerhard Pensl.
(1981)
Electrical and optical characterization of SiC
G. Pensl;W.J. Choyke.
Physica B-condensed Matter (1993)
Doping of SiC by Implantation of Boron and Aluminum
T. Troffer;M. Schadt;T. Frank;H. Itoh.
Physica Status Solidi (a) (1997)
Band offsets and electronic structure of SiC/SiO2 interfaces
Valeri Afanas'ev;M. Bassler;G. Pensl;M. Schulz.
Journal of Applied Physics (1996)
Mechanisms responsible for improvement of 4H-SiC/SiO2 interface properties by nitridation
V. V. Afanas'ev;A. Stesmans;F. Ciobanu;G. Pensl.
Applied Physics Letters (2003)
Nitrogen donors in 4H‐silicon carbide
W. Götz;A. Schöner;G. Pensl;W. Suttrop.
Journal of Applied Physics (1993)
Hall effect and infrared absorption measurements on nitrogen donors in 6H‐silicon carbide
W. Suttrop;G. Pensl;W. J. Choyke;R. Stein.
Journal of Applied Physics (1992)
Properties of the oxygen vacancy in ZnO
D.M. Hofmann;D. Pfisterer;J. Sann;B.K. Meyer.
Applied Physics A (2007)
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