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Materials Science

D-Index
55
Citations
11844
World Ranking
8545
National Ranking
486

Overview

Gerhard Pensl is affiliated with the University of Erlangen-Nuremberg in Germany. Their academic contributions are associated primarily with this institution.

Information regarding recent papers, co-authors, book publications, main fields of study, subfields, and main topics of work is not available for Gerhard Pensl. Likewise, there are no recorded awards or frequent publication venues linked to their profile.

The academic record for Gerhard Pensl currently does not include specific details about published research articles, collaborators, or thematic focus areas. This absence of detailed entries suggests a limited publicly accessible research output or a profile pending further documentation.

As such, the available data provides a basic affiliation and general identification of the scholar without the elaboration on scholarly activities, thematic contributions, or impact metrics.

Best Publications

  • Intrinsic SiC/SiO2 Interface States

    Valeri Afanas'ev;M. Bassler;G. Pensl;M. J. Schulz

  • Silicon carbide : recent major advances

    W. J. Choyke;弘之 松波;G. Pensl

  • Deep Defect Centers in Silicon Carbide Monitored with Deep Level Transient Spectroscopy

    T. Dalibor;G. Pensl;H. Matsunami;T. Kimoto

  • Insulating Films on Semiconductors

    Max J. Schulz;Gerhard Pensl

  • Electrical and optical characterization of SiC

    G. Pensl;W.J. Choyke

  • Doping of SiC by Implantation of Boron and Aluminum

    T. Troffer;M. Schadt;T. Frank;H. Itoh

  • Band offsets and electronic structure of SiC/SiO2 interfaces

    Valeri Afanas'ev;M. Bassler;G. Pensl;M. Schulz

  • Mechanisms responsible for improvement of 4H-SiC/SiO2 interface properties by nitridation

    V. V. Afanas'ev;A. Stesmans;F. Ciobanu;G. Pensl

  • Physical Properties of SiC

    Unknown

  • Nitrogen donors in 4H‐silicon carbide

    W. Götz;A. Schöner;G. Pensl;W. Suttrop

  • Properties of the oxygen vacancy in ZnO

    D.M. Hofmann;D. Pfisterer;J. Sann;B.K. Meyer

  • Hall effect and infrared absorption measurements on nitrogen donors in 6H‐silicon carbide

    W. Suttrop;G. Pensl;W. J. Choyke;R. Stein

  • Shallow electron traps at the 4H–SiC/SiO2 interface

    Valeri Afanas'ev;Andre Stesmans;M Bassler;G Pensl

  • Band alignment and defect states at SiC/oxide interfaces

    Valeri Afanas'ev;F Ciobanu;S Dimitrijev;G Pensl

  • Boron-related deep centers in 6H-SiC

    W. Suttrop;G. Pensl;P. Lanig

  • Electrical activation of high concentrations of N+ and P+ ions implanted into 4H–SiC

    M. Laube;F. Schmid;G. Pensl;G. Wagner

  • Photoluminescence and transport studies of boron in 4H SiC

    S. G. Sridhara;L. L. Clemen;R. P. Devaty;W. J. Choyke

  • Elimination of SiC/SiO2 interface states by preoxidation ultraviolet‐ozone cleaning

    Valeri Afanas'ev;Andre Stesmans;M. Bassler;G. Pensl

  • Nitrogen donors and deep levels in high‐quality 4H–SiC epilayers grown by chemical vapor deposition

    T. Kimoto;A. Itoh;H. Matsunami;S. Sridhara

  • Al2O3 prepared by atomic layer deposition as gate dielectric on 6H-SiC(0001)

    K. Y. Gao;T. Seyller;Lothar. Ley;F. Ciobanu

  • Electrical and Optical Characterization of SiC

    Gerhard Pensl;Frank Schmid;Florin Ciobanu;Michael Laube

Frequent Co-Authors

Tsunenobu Kimoto
Tsunenobu Kimoto Kyoto University
Wolfgang J. Choyke
Wolfgang J. Choyke University of Pittsburgh
Lothar Ley
Lothar Ley University of Erlangen-Nuremberg
Takeshi Ohshima
Takeshi Ohshima Japan Atomic Energy Agency
Hiroyuki Matsunami
Hiroyuki Matsunami Kyoto University
Thomas Seyller
Thomas Seyller Chemnitz University of Technology
Sima Dimitrijev
Sima Dimitrijev Griffith University
Bruno K. Meyer
Bruno K. Meyer University of Giessen

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