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Materials Science

D-Index
61
Citations
13013
World Ranking
6808
National Ranking
358

Overview

Hajime Okumura is affiliated with the National Institute of Advanced Industrial Science and Technology in Japan, focusing primarily on engineering disciplines. Their research is concentrated in the field of Electrical and Electronic Engineering, with significant contributions spanning 50 publications. Additional subfields include Atomic and Molecular Physics, and Optics; Materials Chemistry; Electronic, Optical and Magnetic Materials; and Epidemiology.

The scientist's research topics predominantly encompass Silicon Carbide Semiconductor Technologies, a field covered in 42 of their publications. Further areas of study include Semiconductor materials and devices, Semiconductor materials and interfaces, Thin-Film Transistor Technologies, Silicon and Solar Cell Technologies, Advanced ceramic materials synthesis, and Bacterial Identification and Susceptibility Testing.

Notable frequent co-authors working closely with Hajime Okumura include:

  • Tomohisa Kato
  • Kazutoshi Kojima
  • Kazuma Eto
  • Shiyang Ji
  • Sadafumi Yoshida

Publications with multiple contributions have appeared in key venues such as:

  • Japanese Journal of Applied Physics
  • Journal of Crystal Growth
  • Extended Abstracts of the 2020 International Conference on Solid State Devices and Materials
  • Applied Physics Letters
  • Materials science forum

Representative recent papers by Hajime Okumura illustrate a focus on semiconductor interfaces, epitaxial layers, and device performance:

  • Difference in electron mobility at 4H-SiC/SiO2 interfaces with various crystal faces originating from effective-field-dependent scattering (2020), Applied Physics Letters
  • Nondestructive measurements of depth distribution of carrier lifetimes in 4H-SiC thick epitaxial layers using time-resolved free carrier absorption with intersectional lights (2020), Review of Scientific Instruments
  • Influence of CMP damage induced during flattening SiC epitaxial layer on device performances (2020), Materials Science in Semiconductor Processing
  • Single-phase high-quality semipolar (10-13) AlN epilayers on m-plane (10-10) sapphire substrates (2020), Applied Physics Express
  • Photoluminescence wavelength from stacking fault with complicated structure in 4H-SiC epitaxial layer (2022), Japanese Journal of Applied Physics

Best Publications

  • Present Status and Future Prospect of Widegap Semiconductor High-Power Devices

    Hajime Okumura

  • Epitaxial growth of cubic and hexagonal GaN on GaAs by gas‐source molecular‐beam epitaxy

    H. Okumura;S. Misawa;S. Yoshida

  • Growth and characterization of cubic GaN

    H. Okumura;K. Ohta;G. Feuillet;K. Balakrishnan

  • GAN HETEROEPITAXIAL GROWTH ON SILICON NITRIDE BUFFER LAYERS FORMED ON SI (111) SURFACES BY PLASMA-ASSISTED MOLECULAR BEAM EPITAXY

    Yoshinobu Nakada;Igor Aksenov;Hajime Okumura

  • Intrinsic defects in cubic silicon carbide

    H. Itoh;A. Kawasuso;T. Ohshima;M. Yoshikawa

  • The origin of persistent photoconductivity and its relationship with yellow luminescence in molecular beam epitaxy grown undoped GaN

    C. V. Reddy;K. Balakrishnan;H. Okumura;S. Yoshida

  • Raman scattering of SiC: Application to the identification of heteroepitaxy of SiC polytypes

    H. Okumura;E. Sakuma;J. H. Lee;H. Mukaida

  • Monitoring surface stoichiometry with the (2×2) reconstruction during growth of hexagonal‐phase GaN by molecular beam epitaxy

    P. Hacke;G. Feuillet;H. Okumura;S. Yoshida

  • Reduction of the threading dislocation density in GaN films grown on vicinal sapphire (0001) substrates

    X. Q. Shen;H. Matsuhata;H. Okumura

  • Short minority carrier lifetimes in highly nitrogen-doped 4H-SiC epilayers for suppression of the stacking fault formation in PiN diodes

    T. Tawara;T. Miyazawa;M. Ryo;M. Miyazato

  • Determination of the conduction‐band discontinuities of GaAs/AlxGa1−xAs interfaces by capacitance‐voltage measurements

    H. Okumura;S. Misawa;S. Yoshida;S. Gonda

  • Characterization of traps at nitrided SiO2/SiC interfaces near the conduction band edge by using Hall effect measurements

    Tetsuo Hatakeyama;Yuji Kiuchi;Mitsuru Sometani;Shinsuke Harada

  • High breakdown voltage AlGaN/GaN MIS–HEMT with SiN and TiO2 gate insulator

    S. Yagi;M. Shimizu;M. Inada;Y. Yamamoto

  • Localized exciton dynamics in strained cubic In0.1Ga0.9N/GaN multiple quantum wells

    S. F. Chichibu;M. Sugiyama;T. Onuma;T. Kitamura

  • OPTICAL PROPERTIES NEAR THE BAND GAP ON HEXAGONAL AND CUBIC GAN

    H. Okumura;S. Yoshida;T. Okahisa

  • Growth of cubic III-nitrides by gas source MBE using atomic nitrogen plasma: GaN, AlGaN and AlN

    H Okumura;H Hamaguchi;T Koizumi;K Balakrishnan

  • Cloning of the Membrane-Bound Aldehyde Dehydrogenase Gene of Acetobacter polyoxogenes and Improvement of Acetic Acid Production by Use of the Cloned Gene.

    Masahiro Fukaya;Kenji Tayama;Toshimi Tamaki;Haruko Tagami

  • Homoepitaxial growth of 4H-SiC on on-axis (0001) C-face substrates by chemical vapor depositon

    K. Kojima;H. Okumura;S. Kuroda;K. Arai

  • Raman scattering of SiC: Estimation of the internal stress in 3C-SiC on Si

    H. Mukaida;H. Okumura;J. H. Lee;H. Daimon

  • Radiation induced defects in CVD-grown 3C-SiC

    H. Itoh;M. Yoshikawa;I. Nashiyama;S. Misawa

  • Raman studies on phonon modes in cubic AlGaN alloy

    H. Harima;T. Inoue;S. Nakashima;H. Okumura

Frequent Co-Authors

Sadafumi Yoshida
Sadafumi Yoshida National Institute of Advanced Industrial Science and Technology
Shigefusa F. Chichibu
Shigefusa F. Chichibu Tohoku University
Tsunenobu Kimoto
Tsunenobu Kimoto Kyoto University
Takeshi Ohshima
Takeshi Ohshima Japan Atomic Energy Agency
Takashi Sekiguchi
Takashi Sekiguchi University of Tsukuba
Hiromichi Ohashi
Hiromichi Ohashi Tokyo Institute of Technology
Yasuo Cho
Yasuo Cho Tohoku University
Yuji Matsumoto
Yuji Matsumoto Nara Institute of Science and Technology
Teruhiko Beppu
Teruhiko Beppu University of Tokyo
Shuji Nakamura
Shuji Nakamura University of California, Santa Barbara

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