The chart shows the distribution of publications by all Research.com ranked scientists in the field of Engineering and Technology in 2026. The highlighted bar marks where Hiromichi Ohashi sits on this spectrum.
This scientist: 347 publications — 83rd percentile
83% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 804 publications or more.
The chart shows the D-index (discipline H-index) distribution of Engineering and Technology scientists ranked by Research.com in 2026. The highlighted bar marks where Hiromichi Ohashi sits on this spectrum.
This scientist: 45 D-Index — 46th percentile
46% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 107 D-Index or more.
Hiromichi Ohashi is affiliated with the Tokyo Institute of Technology in Japan, where their research contributions span both medicine and engineering. Their work covers interdisciplinary fields including Pediatrics, Perinatology and Child Health, Electrical and Electronic Engineering, Molecular Biology, and Urology. This blend of expertise is reflected in the diverse publication topics and venues associated with their research output.
The scientist's recent publications demonstrate a focus on renal and fetal medicine, alongside semiconductor technologies. Notable papers include:
Hiromichi Ohashi's frequent coauthors include Shutaro Yamamoto, Nagisa Koda, Takashi Yokoo, Kei Matsumoto, and Kenji Matsui. Collaboration appears consistent, with multiple joint works particularly in nephrology and fetal therapy research.
The primary publication venues reflect a mix of medical and engineering focuses:
Their research topics include:
This blend of clinical and engineering themes highlights a multidisciplinary approach, crossing between biomedical applications in fetal and renal health and semiconductor device research. The work on fetal metanephros development and kidney transplantation projects addresses regenerative and transplant medicine challenges.
The integration of semiconductor manufacturing expertise aids in understanding device reliability and characteristics, as seen in their contribution to studies on bipolar transistor test structures and material properties relevant to silicon carbide technology. This cross-field engagement underscores a diverse scientific portfolio encompassing both experimental biological research and applied engineering technologies.
W. Saito;Y. Takada;M. Kuraguchi;K. Tsuda
Ichiro Omura;Wataru Saito;Tsuneo Ogura;Hiromichi Ohashi
K Tono;T Togashi;Y Inubushi;T Sato
Hiromichi Ohashi;弘通 大橋;Yukihiko Sato;之彦 佐藤
Wataru Saito;Ichiro Omura;Tsuneo Ogura;Hiromichi Ohashi
Akio Nakagawa;Hiromichi Ohashi;Yoshihiro Yamaguchi;Kiminori Watanabe
M. Taguchi;M. Matsunami;Y. Ishida;R. Eguchi
M. Mulazzi;A. Chainani;N. Katayama;R. Eguchi
Akio Nakagawa;Hiromichi Ohashi;Yoshihiro Yamaguchi;Kiminori Watanabe
Yukihiko Sato;Yasunori Tanaka;Akiyoshi Fukui;Mikio Yamasaki
Y. Takata;Y. Kayanuma;M. Yabashi;K. Tamasaku
S. Yagi;M. Shimizu;M. Inada;Y. Yamamoto
K. Horiba;H. Kawanaka;Y. Aiura;Tomohiko Saitoh
Akio Nakagawa;Hiromichi Ohashi;Kiminori Watanabe;Yoshihiro Yamaguchi
I. Omura;W. Fichtner;H. Ohashi
R. Eguchi;A. Chainani;M. Taguchi;M. Matsunami
P. A. Bhobe;A. Chainani;M. Taguchi;T. Takeuchi
R. Eguchi;M. Taguchi;M. Matsunami;K. Horiba
K. Horiba;Y. Nakamura;N. Nagamura;S. Toyoda
Wataru Saito;Ichiro Omura;Hiromichi Ohashi
Toshiharu Makino;Satoshi Tanimoto;Yusuke Hayashi;Hiromitsu Kato
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