World's Best Scientists 2026 revealed!

Overview

Sadafumi Yoshida is affiliated with the National Institute of Advanced Industrial Science and Technology in Japan. Their research encompasses several interrelated scientific topics and fields, reflecting a multidisciplinary approach.

The primary topics covered by their work include:

  • Innovative Microfluidic and Catalytic Techniques Innovation
  • Mesoporous Materials and Catalysis
  • Supramolecular Chemistry and Complexes
  • Computational Drug Discovery Methods
  • Protein Structure and Dynamics
  • Monoclonal and Polyclonal Antibodies Research

Their fields and subfields of study consist of:

  • Biomedical Engineering
  • Materials Chemistry
  • Organic Chemistry
  • Computational Theory and Mathematics
  • Molecular Biology

Sadafumi Yoshida has contributed to the scientific literature with papers published in prominent venues such as:

  • Angewandte Chemie
  • Journal of the American Chemical Society

Notable publications include:

  • Host-Guest Chemistry in a Capillary Applied to the Facilitation of the Crystalline Sponge Method, 2025, Angewandte Chemie
  • Micro Crystalline Sponge Method Combined with Small-Wedge Synchrotron Crystallography for Nanogram Scale Molecular Structure Elucidation, 2025, Journal of the American Chemical Society

Co-authorship collaborations frequently involve:

  • Sota Sato
  • Makoto Fujita
  • Wei He
  • Hiroki Takezawa
  • Ryo Yakushiji

The combination of advanced crystallographic methods and supramolecular chemistry is a consistent theme in their research, focusing notably on microfluidic techniques and catalytic innovations. These efforts integrate chemical synthesis, physical analysis, and computational approaches to address structural and functional aspects within molecular and materials chemistry.

Best Publications

  • Properties of AlxGa1−xN films prepared by reactive molecular beam epitaxy

    S. Yoshida;S. Misawa;S. Gonda

  • Epitaxial growth of cubic and hexagonal GaN on GaAs by gas‐source molecular‐beam epitaxy

    H. Okumura;S. Misawa;S. Yoshida

  • Growth and characterization of cubic GaN

    H. Okumura;K. Ohta;G. Feuillet;K. Balakrishnan

  • Preparation and structure of carbon film deposited by a mass‐separated C+ ion beam

    Takeo Miyazawa;Shunji Misawa;Sadafumi Yoshida;Shun‐ichi Gonda

  • Intrinsic defects in cubic silicon carbide

    H. Itoh;A. Kawasuso;T. Ohshima;M. Yoshikawa

  • Temperature dependence of electrical properties of n‐ and p‐type 3C‐SiC

    M. Yamanaka;H. Daimon;E. Sakuma;S. Misawa

  • The origin of persistent photoconductivity and its relationship with yellow luminescence in molecular beam epitaxy grown undoped GaN

    C. V. Reddy;K. Balakrishnan;H. Okumura;S. Yoshida

  • Raman scattering of SiC: Application to the identification of heteroepitaxy of SiC polytypes

    H. Okumura;E. Sakuma;J. H. Lee;H. Mukaida

  • Composition analysis of SiO2/SiC interfaces by electron spectroscopic measurements using slope-shaped oxide films

    Y. Hijikata;H. Yaguchi;M. Yoshikawa;S. Yoshida

  • Monitoring surface stoichiometry with the (2×2) reconstruction during growth of hexagonal‐phase GaN by molecular beam epitaxy

    P. Hacke;G. Feuillet;H. Okumura;S. Yoshida

  • Determination of the conduction‐band discontinuities of GaAs/AlxGa1−xAs interfaces by capacitance‐voltage measurements

    H. Okumura;S. Misawa;S. Yoshida;S. Gonda

  • OPTICAL PROPERTIES NEAR THE BAND GAP ON HEXAGONAL AND CUBIC GAN

    H. Okumura;S. Yoshida;T. Okahisa

  • Growth of cubic III-nitrides by gas source MBE using atomic nitrogen plasma: GaN, AlGaN and AlN

    H Okumura;H Hamaguchi;T Koizumi;K Balakrishnan

  • Raman scattering of SiC: Estimation of the internal stress in 3C-SiC on Si

    H. Mukaida;H. Okumura;J. H. Lee;H. Daimon

  • Radiation induced defects in CVD-grown 3C-SiC

    H. Itoh;M. Yoshikawa;I. Nashiyama;S. Misawa

  • Raman studies on phonon modes in cubic AlGaN alloy

    H. Harima;T. Inoue;S. Nakashima;H. Okumura

  • Arsenic mediated reconstructions on cubic (001) GaN

    G. Feuillet;H. Hamaguchi;K. Ohta;P. Hacke

  • Arsenic surfactant effects and arsenic mediated molecular beam epitaxial growth for cubic GaN

    H. Okumura;H. Hamaguchi;G. Feuillet;Y. Ishida

  • Photoluminescence of radiation induced defects in 3C‐SiC epitaxially grown on Si

    Hisayoshi Itoh;Masahito Yoshikawa;Isamu Nashiyama;Hajime Okumura

  • Improvement of SiO2/4H-SiC Interface Using High-Temperature Hydrogen Annealing at Low Pressure and Vacuum Annealing

    Kenji Fukuda;Kiyoko Nagai;Toshihiro Sekigawa;Sadafumi Yoshida

Frequent Co-Authors

Hajime Okumura
Hajime Okumura National Institute of Advanced Industrial Science and Technology
Takeshi Ohshima
Takeshi Ohshima Japan Atomic Energy Agency
Akira Uedono
Akira Uedono University of Tsukuba
Shigefusa F. Chichibu
Shigefusa F. Chichibu Tohoku University
Hideyo Okushi
Hideyo Okushi National Institute of Advanced Industrial Science and Technology
Noritaka Usami
Noritaka Usami Nagoya University
Keisuke Kobayashi
Keisuke Kobayashi Japan Atomic Energy Agency
Yoshinobu Aoyagi
Yoshinobu Aoyagi Ritsumeikan University
Kazumasa Hiramatsu
Kazumasa Hiramatsu Mie University

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