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Sadafumi Yoshida publication distribution in Materials Science in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Sadafumi Yoshida sits on this spectrum.

50–69 publications: 28 scientists 70–89 publications: 152 scientists 90–109 publications: 356 scientists 110–129 publications: 487 scientists 130–149 publications: 723 scientists 150–169 publications: 835 scientists 170–189 publications: 850 scientists 190–209 publications: 891 scientists 210–229 publications: 862 scientists 230–249 publications: 766 scientists 250–269 publications: 726 scientists 270–289 publications: 665 scientists 290–309 publications: 593 scientists 310–329 publications: 537 scientists 330–349 publications: 477 scientists 350–369 publications: 440 scientists 370–389 publications: 356 scientists 390–409 publications: 321 scientists 410–429 publications: 256 scientists 430–449 publications: 246 scientists 450–469 publications: 216 scientists 470–489 publications: 212 scientists 490–509 publications: 174 scientists 510–529 publications: 194 scientists 530–549 publications: 162 scientists 550–569 publications: 131 scientists 570–589 publications: 111 scientists 590–609 publications: 103 scientists 610–629 publications: 99 scientists 630–649 publications: 77 scientists 650–669 publications: 92 scientists 670–689 publications: 56 scientists 690–709 publications: 53 scientists 710–729 publications: 53 scientists 730–749 publications: 38 scientists 750–769 publications: 52 scientists 770–789 publications: 43 scientists 790–809 publications: 38 scientists 810–829 publications: 34 scientists 830–849 publications: 25 scientists 850–869 publications: 18 scientists 870–889 publications: 20 scientists 890–909 publications: 24 scientists 910–929 publications: 27 scientists 930–949 publications: 20 scientists 950–969 publications: 17 scientists 970–989 publications: 10 scientists 990–1,009 publications: 16 scientists 1,010–1,029 publications: 13 scientists 1,030–1,049 publications: 12 scientists 1,050–1,069 publications: 9 scientists 1,070–1,089 publications: 8 scientists 1,090–1,109 publications: 7 scientists 1,110–1,129 publications: 9 scientists 1,130–1,149 publications: 2 scientists 1,150–1,162 publications: 5 scientists 1,163+ publications: 100 scientists
50 publications 1,163+

The last bar groups every scientist with 1,163 publications or more.

Sadafumi Yoshida D-index placement in Materials Science in 2026

The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Sadafumi Yoshida sits on this spectrum.

40–41 D-Index: 211 scientists 42–43 D-Index: 450 scientists 44–45 D-Index: 612 scientists 46–47 D-Index: 612 scientists 48–49 D-Index: 598 scientists 50–51 D-Index: 657 scientists 52–53 D-Index: 667 scientists 54–55 D-Index: 621 scientists 56–57 D-Index: 597 scientists 58–59 D-Index: 610 scientists 60–61 D-Index: 587 scientists 62–63 D-Index: 606 scientists 64–65 D-Index: 533 scientists 66–67 D-Index: 490 scientists 68–69 D-Index: 469 scientists 70–71 D-Index: 378 scientists 72–73 D-Index: 421 scientists 74–75 D-Index: 359 scientists 76–77 D-Index: 323 scientists 78–79 D-Index: 299 scientists 80–81 D-Index: 230 scientists 82–83 D-Index: 210 scientists 84–85 D-Index: 195 scientists 86–87 D-Index: 203 scientists 88–89 D-Index: 175 scientists 90–91 D-Index: 175 scientists 92–93 D-Index: 142 scientists 94–95 D-Index: 121 scientists 96–97 D-Index: 117 scientists 98–99 D-Index: 107 scientists 100–101 D-Index: 88 scientists 102–103 D-Index: 85 scientists 104–105 D-Index: 68 scientists 106–107 D-Index: 62 scientists 108–109 D-Index: 57 scientists 110–111 D-Index: 45 scientists 112–113 D-Index: 49 scientists 114–115 D-Index: 50 scientists 116–117 D-Index: 34 scientists 118–119 D-Index: 38 scientists 120–121 D-Index: 37 scientists 122–123 D-Index: 29 scientists 124–125 D-Index: 28 scientists 126–127 D-Index: 24 scientists 128–129 D-Index: 33 scientists 130–131 D-Index: 28 scientists 132–133 D-Index: 21 scientists 134–135 D-Index: 20 scientists 136–137 D-Index: 23 scientists 138–139 D-Index: 17 scientists 140–141 D-Index: 12 scientists 142–143 D-Index: 17 scientists 144–145 D-Index: 21 scientists 146–147 D-Index: 13 scientists 148–149 D-Index: 11 scientists 150–151 D-Index: 14 scientists 152–153 D-Index: 13 scientists 154–155 D-Index: 9 scientists 156–157 D-Index: 10 scientists 158–159 D-Index: 7 scientists 160–161 D-Index: 4 scientists 162–163 D-Index: 4 scientists 164 D-Index: 3 scientists 165+ D-Index: 98 scientists
40 D-Index 165+

The last bar groups every scientist with 165 D-Index or more.

Overview

Sadafumi Yoshida is affiliated with the National Institute of Advanced Industrial Science and Technology in Japan. Their research encompasses several interrelated scientific topics and fields, reflecting a multidisciplinary approach.

The primary topics covered by their work include:

  • Innovative Microfluidic and Catalytic Techniques Innovation
  • Mesoporous Materials and Catalysis
  • Supramolecular Chemistry and Complexes
  • Computational Drug Discovery Methods
  • Protein Structure and Dynamics
  • Monoclonal and Polyclonal Antibodies Research

Their fields and subfields of study consist of:

  • Biomedical Engineering
  • Materials Chemistry
  • Organic Chemistry
  • Computational Theory and Mathematics
  • Molecular Biology

Sadafumi Yoshida has contributed to the scientific literature with papers published in prominent venues such as:

  • Angewandte Chemie
  • Journal of the American Chemical Society

Notable publications include:

  • Host-Guest Chemistry in a Capillary Applied to the Facilitation of the Crystalline Sponge Method, 2025, Angewandte Chemie
  • Micro Crystalline Sponge Method Combined with Small-Wedge Synchrotron Crystallography for Nanogram Scale Molecular Structure Elucidation, 2025, Journal of the American Chemical Society

Co-authorship collaborations frequently involve:

  • Sota Sato
  • Makoto Fujita
  • Wei He
  • Hiroki Takezawa
  • Ryo Yakushiji

The combination of advanced crystallographic methods and supramolecular chemistry is a consistent theme in their research, focusing notably on microfluidic techniques and catalytic innovations. These efforts integrate chemical synthesis, physical analysis, and computational approaches to address structural and functional aspects within molecular and materials chemistry.

Best Publications

  • Properties of AlxGa1−xN films prepared by reactive molecular beam epitaxy

    S. Yoshida;S. Misawa;S. Gonda

  • Epitaxial growth of cubic and hexagonal GaN on GaAs by gas‐source molecular‐beam epitaxy

    H. Okumura;S. Misawa;S. Yoshida

  • Growth and characterization of cubic GaN

    H. Okumura;K. Ohta;G. Feuillet;K. Balakrishnan

  • Preparation and structure of carbon film deposited by a mass‐separated C+ ion beam

    Takeo Miyazawa;Shunji Misawa;Sadafumi Yoshida;Shun‐ichi Gonda

  • Intrinsic defects in cubic silicon carbide

    H. Itoh;A. Kawasuso;T. Ohshima;M. Yoshikawa

  • Temperature dependence of electrical properties of n‐ and p‐type 3C‐SiC

    M. Yamanaka;H. Daimon;E. Sakuma;S. Misawa

  • The origin of persistent photoconductivity and its relationship with yellow luminescence in molecular beam epitaxy grown undoped GaN

    C. V. Reddy;K. Balakrishnan;H. Okumura;S. Yoshida

  • Raman scattering of SiC: Application to the identification of heteroepitaxy of SiC polytypes

    H. Okumura;E. Sakuma;J. H. Lee;H. Mukaida

  • Composition analysis of SiO2/SiC interfaces by electron spectroscopic measurements using slope-shaped oxide films

    Y. Hijikata;H. Yaguchi;M. Yoshikawa;S. Yoshida

  • Monitoring surface stoichiometry with the (2×2) reconstruction during growth of hexagonal‐phase GaN by molecular beam epitaxy

    P. Hacke;G. Feuillet;H. Okumura;S. Yoshida

  • Determination of the conduction‐band discontinuities of GaAs/AlxGa1−xAs interfaces by capacitance‐voltage measurements

    H. Okumura;S. Misawa;S. Yoshida;S. Gonda

  • OPTICAL PROPERTIES NEAR THE BAND GAP ON HEXAGONAL AND CUBIC GAN

    H. Okumura;S. Yoshida;T. Okahisa

  • Growth of cubic III-nitrides by gas source MBE using atomic nitrogen plasma: GaN, AlGaN and AlN

    H Okumura;H Hamaguchi;T Koizumi;K Balakrishnan

  • Raman scattering of SiC: Estimation of the internal stress in 3C-SiC on Si

    H. Mukaida;H. Okumura;J. H. Lee;H. Daimon

  • Radiation induced defects in CVD-grown 3C-SiC

    H. Itoh;M. Yoshikawa;I. Nashiyama;S. Misawa

  • Raman studies on phonon modes in cubic AlGaN alloy

    H. Harima;T. Inoue;S. Nakashima;H. Okumura

  • Arsenic mediated reconstructions on cubic (001) GaN

    G. Feuillet;H. Hamaguchi;K. Ohta;P. Hacke

  • Arsenic surfactant effects and arsenic mediated molecular beam epitaxial growth for cubic GaN

    H. Okumura;H. Hamaguchi;G. Feuillet;Y. Ishida

  • Photoluminescence of radiation induced defects in 3C‐SiC epitaxially grown on Si

    Hisayoshi Itoh;Masahito Yoshikawa;Isamu Nashiyama;Hajime Okumura

  • Improvement of SiO2/4H-SiC Interface Using High-Temperature Hydrogen Annealing at Low Pressure and Vacuum Annealing

    Kenji Fukuda;Kiyoko Nagai;Toshihiro Sekigawa;Sadafumi Yoshida

Frequent Co-Authors

Hajime Okumura
Hajime Okumura National Institute of Advanced Industrial Science and Technology
Takeshi Ohshima
Takeshi Ohshima Japan Atomic Energy Agency
Akira Uedono
Akira Uedono University of Tsukuba
Shigefusa F. Chichibu
Shigefusa F. Chichibu Tohoku University
Hideyo Okushi
Hideyo Okushi National Institute of Advanced Industrial Science and Technology
Noritaka Usami
Noritaka Usami Nagoya University
Keisuke Kobayashi
Keisuke Kobayashi Japan Atomic Energy Agency
Yoshinobu Aoyagi
Yoshinobu Aoyagi Ritsumeikan University
Kazumasa Hiramatsu
Kazumasa Hiramatsu Mie University

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