The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Keisuke Kobayashi sits on this spectrum.
This scientist: 398 publications — 77th percentile
77% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 1,163 publications or more.
The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Keisuke Kobayashi sits on this spectrum.
This scientist: 63 D-Index — 53rd percentile
53% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 165 D-Index or more.
Keisuke Kobayashi is affiliated with the Japan Atomic Energy Agency in Japan and has a strong research focus in materials science, engineering, and chemical engineering. Their work primarily engages with topics related to ammonia synthesis and nitrogen reduction, catalytic processes in materials science, and hydrogen storage and materials. Additional areas of interest include silicon carbide semiconductor technologies, nanomaterials for catalytic reactions, semiconductor materials and devices, and phase-change materials and chalcogenides.
The scientist has contributed to several recent papers demonstrating a commitment to advancing understanding in catalytic reactions and material applications. Notable publications include:
Frequent collaborators in their research include:
Their published work frequently appears in the following venues:
Keisuke Kobayashi's research spans several subfields, with a particular emphasis on materials chemistry, electrical and electronic engineering, and catalysis. This interdisciplinary approach is evident in the integration of chemical engineering principles with advanced materials and semiconductor technologies in their projects.
K. Kobayashi;M. Yabashi;Y. Takata;T. Tokushima
Kenji Nomura;Toshio Kamiya;Hiroshi Yanagi;Eiji Ikenaga
Y. Yamamoto;T. Miura;M. Suzuki;N. Kawamura
Benjamin Balke;Gerhard H. Fecher;Hem C. Kandpal;Claudia Felser
Y. Yamamoto;T. Miura;T. Teranishi;M. Miyake
Yoshitake Toda;Hiroshi Yanagi;Eiji Ikenaga;Jung Jin Kim
Toshiyuki Matsunaga;Jaakko Akola;Jaakko Akola;Jaakko Akola;Shinji Kohara;Tetsuo Honma
Vajiheh Alijani;Siham Ouardi;Gerhard H. Fecher;Jürgen Winterlik
Keisuke Kobayashi
Kenji Nomura;Toshio Kamiya;Eiji Ikenaga;Hiroshi Yanagi
A. X. Gray;A. X. Gray;C. Papp;C. Papp;C. Papp;S. Ueda;B. Balke;B. Balke;B. Balke
Mao Ye;Akio Kimura;Yoshio Miura;Masafumi Shirai
Yuji Goto;Kota Taniguchi;Takahisa Omata;Shinya Otsuka-Yao-Matsuo
Sen Yang;Sen Yang;Huixin Bao;Chao Zhou;Yu Wang
Takuya Masuda;Hitoshi Fukumitsu;Hitoshi Fukumitsu;Keisuke Fugane;Keisuke Fugane;Hirotaka Togasaki;Hirotaka Togasaki
A. X. Gray;J. Minár;S. Ueda;P. R. Stone;P. R. Stone
Y. F. Guo;Y. G. Shi;S. Yu;A. A. Belik
Shigenori Ueda;Yoshio Katsuya;Masahiko Tanaka;Hideki Yoshikawa
Sabine Wurmehl;Gerhard H. Fecher;Kristian Kroth;Florian Kronast
T. Takabatake;F. Iga;T. Yoshino;Y. Echizen
Siham Ouardi;Chandra Shekhar;Gerhard H. Fecher;Xeniya Kozina
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