The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Naoki Ohashi sits on this spectrum.
This scientist: 443 publications — 82nd percentile
82% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 1,163 publications or more.
The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Naoki Ohashi sits on this spectrum.
This scientist: 48 D-Index — 17th percentile
17% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 165 D-Index or more.
Naoki Ohashi is affiliated with the National Institute for Materials Science in Japan and has made significant contributions to the field of Materials Science, particularly within materials chemistry. Their research portfolio includes over 110 publications, with substantial work in subfields such as Materials Chemistry, Electrical and Electronic Engineering, and Inorganic Chemistry.
Their publications frequently appear in prominent venues including The Cambridge Structural Database, Physical Review B, the Journal of the Ceramic Society of Japan, Science and Technology of Advanced Materials, and the Journal of Crystal Growth.
Major topics covered in their research encompass crystallization and solubility studies, inorganic chemistry and materials, X-ray diffraction in crystallography, electronic and structural properties of oxides, perovskite materials and applications, ZnO doping and properties, as well as semiconductor materials and devices.
Among recent scientific papers attributed to Naoki Ohashi are:
Naoki Ohashi's frequent coauthors comprise Fabien Grasset, Takeo Ohsawa, Stéphane Cordier, Yoshitaka Matsushita, and Norio Saito, indicating collaborative research efforts particularly in materials and chemical sciences.
Noriko Saito;Hajime Haneda;Takashi Sekiguchi;Naoki Ohashi
Di Li;Hajime Haneda;Nitin K. Labhsetwar;Shunichi Hishita
Di Li;Hajime Haneda;Shunichi Hishita;Naoki Ohashi
Di Li;Hajime Haneda;Shunichi Hishita;Naoki Ohashi
Di Li;Hajime Haneda;Shunichi Hishita;Naoki Ohashi
Di Li;Naoki Ohashi;Shunichi Hishita;Taras Kolodiazhnyi
Wang Xh;Li Jg;Kamiyama H;Katada M
Di Li;Hajime Haneda;Shunichi Hishita;Naoki Ohashi
Naoki Ohashi;Takamasa Ishigaki;Nobuhiro Okada;Takashi Sekiguchi
Srinivasan Anandan;Naoki Ohashi;Masahiro Miyauchi
Takashi Sekiguchi;Naoki Ohashi;Yoshihiro Terada
Fabien Grasset;N. Saito;D. Li;D. Park
Yuji Goto;Kota Taniguchi;Takahisa Omata;Shinya Otsuka-Yao-Matsuo
Takeshi Ohgaki;Naoki Ohashi;Hirofumi Kakemoto;Satoshi Wada
Naoki Ohashi;Takamasa Ishigaki;Nobuhiro Okada;Hiroyuki Taguchi
Rong-Jun Xie;Naoto Hirosaki;Mamoru Mitomo;Yoshinobu Yamamoto
Junghwan Kim;Takumi Sekiya;Norihiko Miyokawa;Naoto Watanabe
Takaaki Tsurumi;Yutaka Kumano;Naoki Ohashi;Tadashi Takenaka
Stéphane Cordier;F. Grasset;Y. Molard;M. Amela-Cortes
Takehiko Hiraga;Chihiro Tachibana;Naoki Ohashi;Satoru Sano
Rongguo Xie;Takashi Sekiguchi;Takamasa Ishigaki;Naoki Ohashi
Di Li;Hajime Haneda;Naoki Ohashi;Shunichi Hishita
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