D-Index & Metrics Best Publications

D-Index & Metrics D-index (Discipline H-index) only includes papers and citation values for an examined discipline in contrast to General H-index which accounts for publications across all disciplines.

Discipline name D-index D-index (Discipline H-index) only includes papers and citation values for an examined discipline in contrast to General H-index which accounts for publications across all disciplines. Citations Publications World Ranking National Ranking
Materials Science D-index 70 Citations 52,565 148 World Ranking 1824 National Ranking 602

Overview

What is he best known for?

The fields of study he is best known for:

  • Semiconductor
  • Optoelectronics
  • Transistor

Optoelectronics, Thin-film transistor, Amorphous solid, Transistor and Oxide thin-film transistor are his primary areas of study. His Optoelectronics research includes elements of Layer, Oxide, Amorphous oxide, Field-effect transistor and Amorphous silicon. His Thin-film transistor research is multidisciplinary, incorporating elements of Subthreshold conduction, Annealing, Semiconductor and Gate oxide.

Kenji Nomura combines subjects such as Thin film and Electrical resistivity and conductivity with his study of Semiconductor. His research integrates issues of Amorphous oxide semiconductor, Electronic structure, Mineralogy, Analytical chemistry and Effective mass in his study of Amorphous solid. His Transistor study integrates concerns from other disciplines, such as Plasma-enhanced chemical vapor deposition, Amorphous semiconductors, Electron mobility and Barrier layer.

His most cited work include:

  • Room-temperature fabrication of transparent flexible thin-film transistors using amorphous oxide semiconductors (6119 citations)
  • Thin-Film Transistor Fabricated in Single-Crystalline Transparent Oxide Semiconductor (2444 citations)
  • Amorphous Oxide Semiconductors for High-Performance Flexible Thin-Film Transistors (1523 citations)

What are the main themes of his work throughout his whole career to date?

Kenji Nomura mostly deals with Optoelectronics, Thin-film transistor, Amorphous solid, Transistor and Thin film. He is interested in Semiconductor, which is a field of Optoelectronics. His Thin-film transistor research includes themes of Electron mobility, Passivation, Amorphous oxide, Threshold voltage and Subthreshold conduction.

His study in Amorphous solid is interdisciplinary in nature, drawing from both Sputter deposition, Sputtering, Annealing, Electronic structure and Analytical chemistry. Within one scientific family, he focuses on topics pertaining to Nanotechnology under Transistor, and may sometimes address concerns connected to Oxide semiconductor. He has researched Thin film in several fields, including Composite material, Superlattice, Mineralogy and Epitaxy.

He most often published in these fields:

  • Optoelectronics (58.47%)
  • Thin-film transistor (44.81%)
  • Amorphous solid (44.81%)

What were the highlights of his more recent work (between 2011-2020)?

  • Optoelectronics (58.47%)
  • Thin-film transistor (44.81%)
  • Amorphous solid (44.81%)

In recent papers he was focusing on the following fields of study:

The scientist’s investigation covers issues in Optoelectronics, Thin-film transistor, Amorphous solid, Transistor and Annealing. The various areas that Kenji Nomura examines in his Optoelectronics study include Oxide, Amorphous oxide semiconductor, Oxide thin-film transistor and Electronic circuit. His biological study spans a wide range of topics, including Passivation, Semiconductor, Amorphous oxide and Voltage.

The study incorporates disciplines such as Flat panel display and Electronic structure in addition to Semiconductor. His Amorphous solid research incorporates themes from Indium, Thin film, Heterojunction, Analytical chemistry and Threshold voltage. His biological study focuses on Subthreshold slope.

Between 2011 and 2020, his most popular works were:

  • Effects of Diffusion of Hydrogen and Oxygen on Electrical Properties of Amorphous Oxide Semiconductor, In-Ga-Zn-O (126 citations)
  • Hydrogen passivation of electron trap in amorphous In-Ga-Zn-O thin-film transistors (77 citations)
  • Structural relaxation in amorphous oxide semiconductor, a-In-Ga-Zn-O (67 citations)

In his most recent research, the most cited papers focused on:

  • Semiconductor
  • Transistor
  • Silicon

His primary areas of investigation include Amorphous solid, Thin-film transistor, Inorganic chemistry, Optoelectronics and Annealing. The Amorphous solid study combines topics in areas such as Oxide, Indium, Electron spectroscopy, Oxygen-18 and Gallium. His work deals with themes such as Capacitance and Semiconductor, which intersect with Thin-film transistor.

His Inorganic chemistry research includes elements of Thin film, Sputtering, Amorphous oxide semiconductor and Ultra-high vacuum. The concepts of his Optoelectronics study are interwoven with issues in Threshold voltage, Excess oxygen and Amorphous oxide. His Annealing research incorporates themes from Passivation and Analytical chemistry.

This overview was generated by a machine learning system which analysed the scientist’s body of work. If you have any feedback, you can contact us here.

Best Publications

Room-temperature fabrication of transparent flexible thin-film transistors using amorphous oxide semiconductors

Kenji Nomura;Hiromichi Ohta;Akihiro Takagi;Toshio Kamiya.
Nature (2004)

7134 Citations

Amorphous oxide and thin film transistor

Hosono Hideo;Hirano Masahiro;Ota Hiromichi;Kamiya Toshio.
(2005)

3601 Citations

Integrated circuits utilizing amorphous oxides

Abe Katsumi;Hosono Hideo;Kamiya Toshio;Nomura Kenji.
(2010)

3498 Citations

Sensor and image pickup device

Hideo Hosono;Toshio Kamiya;Kenji Nomura;Keishi Saito.
(2005)

3463 Citations

Amorphous oxide and field effect transistor

Masafumi Sano;Katsumi Nakagawa;Hideo Hosono;Toshio Kamiya.
(2005)

3382 Citations

Field effect transistor manufacturing method

Hisato Yabuta;Masafumi Sano;Tatsuya Iwasaki;Hideo Hosono.
(2005)

3375 Citations

Thin-Film Transistor Fabricated in Single-Crystalline Transparent Oxide Semiconductor

Kenji Nomura;Hiromichi Ohta;Kazushige Ueda;Toshio Kamiya.
Science (2003)

2734 Citations

Light-emitting device

Den Toru;Iwasaki Tatsuya;Hosono Hideo;Kamiya Toshio.
(2006)

2465 Citations

Present status of amorphous In–Ga–Zn–O thin-film transistors

Toshio Kamiya;Kenji Nomura;Hideo Hosono.
Science and Technology of Advanced Materials (2010)

1575 Citations

High-mobility thin-film transistor with amorphous InGaZnO4 channel fabricated by room temperature rf-magnetron sputtering

Hisato Yabuta;Masafumi Sano;Katsumi Abe;Toshiaki Aiba.
Applied Physics Letters (2006)

1448 Citations

If you think any of the details on this page are incorrect, let us know.

Contact us

Best Scientists Citing Kenji Nomura

Shunpei Yamazaki

Shunpei Yamazaki

Semiconductor Energy Laboratory (Japan)

Publications: 363

Ting-Chang Chang

Ting-Chang Chang

National Sun Yat-sen University

Publications: 152

Jin Jang

Jin Jang

Kyung Hee University

Publications: 146

Hideo Hosono

Hideo Hosono

Tokyo Institute of Technology

Publications: 140

Shengdong Zhang

Shengdong Zhang

Peking University

Publications: 138

Hyun Jae Kim

Hyun Jae Kim

Yonsei University

Publications: 127

Jae Kyeong Jeong

Jae Kyeong Jeong

Hanyang University

Publications: 123

Jin-Seong Park

Jin-Seong Park

Hanyang University

Publications: 115

Elvira Fortunato

Elvira Fortunato

Universidade Nova de Lisboa

Publications: 114

Hiromichi Ohta

Hiromichi Ohta

Hokkaido University

Publications: 113

Rodrigo Martins

Rodrigo Martins

Universidade Nova de Lisboa

Publications: 108

Junbiao Peng

Junbiao Peng

South China University of Technology

Publications: 108

Chi-Sun Hwang

Chi-Sun Hwang

Electronics and Telecommunications Research Institute

Publications: 103

Pedro Barquinha

Pedro Barquinha

Universidade Nova de Lisboa

Publications: 92

Toshio Kamiya

Toshio Kamiya

Tokyo Institute of Technology

Publications: 83

Jun Koyama

Jun Koyama

Toshiba (Japan)

Publications: 83

Trending Scientists

Colin Campbell

Colin Campbell

University of Bristol

Anders Björner

Anders Björner

Royal Institute of Technology

John D. Whitcomb

John D. Whitcomb

Texas A&M University

Cameron Faustman

Cameron Faustman

University of Connecticut

Sanford A. Asher

Sanford A. Asher

University of Pittsburgh

Manuela Bartolini

Manuela Bartolini

University of Bologna

Aristidis Moustakas

Aristidis Moustakas

Uppsala University

Eren Turak

Eren Turak

Office of Environment and Heritage

Felicity E. B. May

Felicity E. B. May

Newcastle University

Johannes A. Eble

Johannes A. Eble

University of Münster

David J. Lawrence

David J. Lawrence

Johns Hopkins University Applied Physics Laboratory

Larry Benson

Larry Benson

University of Colorado Boulder

W. M. Cowan

W. M. Cowan

Washington University in St. Louis

Alan L. Schmaljohn

Alan L. Schmaljohn

University of Maryland, Baltimore

Matthew A. Allison

Matthew A. Allison

University of California, San Diego

Norman Daniels

Norman Daniels

Harvard University

Something went wrong. Please try again later.