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Kenji Nomura

D-Index & Metrics

Discipline name D-Index World Ranking Current World Ranking National Ranking Current National Ranking Publications Citations
Materials Science 76 3203 3091 891 834 239 59193

Kenji Nomura publications per year

The chart shows the history of publications by Kenji Nomura between 1973 and 2025, highlighting the no. of papers published in each year and offering an overview of the publication velocity of this scholar. Kenji Nomura published across 53 years, from 1973 to 2025, averaging 5.1 papers a year. Output peaked at 30 publications in 2008. 20 of the 271 publications appeared in the last two years.

No. of publications
10 20 30
Bar chart. Horizontal axis: year, 1973 to 2025. Vertical axis: number of publications, 0 to 30. Peak 30 publications in 2008. 1973: 1 publication 1974: 0 publications 1975: 1 publication 1976: 0 publications 1977: 1 publication 1978: 0 publications 1979: 0 publications 1980: 0 publications 1981: 0 publications 1982: 0 publications 1983: 0 publications 1984: 0 publications 1985: 0 publications 1986: 0 publications 1987: 0 publications 1988: 1 publication 1989: 2 publications 1990: 2 publications 1991: 0 publications 1992: 0 publications 1993: 1 publication 1994: 1 publication 1995: 3 publications 1996: 1 publication 1997: 2 publications 1998: 3 publications 1999: 2 publications 2000: 3 publications 2001: 1 publication 2002: 6 publications 2003: 5 publications 2004: 12 publications 2005: 13 publications 2006: 16 publications 2007: 13 publications 2008: 30 publications 2009: 16 publications 2010: 20 publications 2011: 14 publications 2012: 20 publications 2013: 8 publications 2014: 6 publications 2015: 4 publications 2016: 0 publications 2017: 1 publication 2018: 5 publications 2019: 5 publications 2020: 8 publications 2021: 6 publications 2022: 13 publications 2023: 5 publications 2024: 10 publications 2025: 10 publications
1973 2025

271 publications in total across all disciplines

View publications per year as a table
Kenji Nomura: publications per year, 1973 to 2025
Year Publications
1973 1
1974 0
1975 1
1976 0
1977 1
1978 0
1979 0
1980 0
1981 0
1982 0
1983 0
1984 0
1985 0
1986 0
1987 0
1988 1
1989 2
1990 2
1991 0
1992 0
1993 1
1994 1
1995 3
1996 1
1997 2
1998 3
1999 2
2000 3
2001 1
2002 6
2003 5
2004 12
2005 13
2006 16
2007 13
2008 30
2009 16
2010 20
2011 14
2012 20
2013 8
2014 6
2015 4
2016 0
2017 1
2018 5
2019 5
2020 8
2021 6
2022 13
2023 5
2024 10
2025 10
Total 271
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Kenji Nomura publication distribution in Materials Science in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Kenji Nomura sits on this spectrum.

No. of scientists
200 400 600 800
Bar chart with 57 bars. Horizontal axis: publications, 50–69 to 1,163+. Vertical axis: number of scientists, 0 to 891. Most scientists, 891, have 190–209 publications. The last bar groups every scientist with 1,163 publications or more. The highlighted bar, 230–249 publications, is where this scientist sits. 50–69 publications: 28 scientists 70–89 publications: 152 scientists 90–109 publications: 356 scientists 110–129 publications: 487 scientists 130–149 publications: 723 scientists 150–169 publications: 835 scientists 170–189 publications: 850 scientists 190–209 publications: 891 scientists 210–229 publications: 862 scientists 230–249 publications: 766 scientists 250–269 publications: 726 scientists 270–289 publications: 665 scientists 290–309 publications: 593 scientists 310–329 publications: 537 scientists 330–349 publications: 477 scientists 350–369 publications: 440 scientists 370–389 publications: 356 scientists 390–409 publications: 321 scientists 410–429 publications: 256 scientists 430–449 publications: 246 scientists 450–469 publications: 216 scientists 470–489 publications: 212 scientists 490–509 publications: 174 scientists 510–529 publications: 194 scientists 530–549 publications: 162 scientists 550–569 publications: 131 scientists 570–589 publications: 111 scientists 590–609 publications: 103 scientists 610–629 publications: 99 scientists 630–649 publications: 77 scientists 650–669 publications: 92 scientists 670–689 publications: 56 scientists 690–709 publications: 53 scientists 710–729 publications: 53 scientists 730–749 publications: 38 scientists 750–769 publications: 52 scientists 770–789 publications: 43 scientists 790–809 publications: 38 scientists 810–829 publications: 34 scientists 830–849 publications: 25 scientists 850–869 publications: 18 scientists 870–889 publications: 20 scientists 890–909 publications: 24 scientists 910–929 publications: 27 scientists 930–949 publications: 20 scientists 950–969 publications: 17 scientists 970–989 publications: 10 scientists 990–1,009 publications: 16 scientists 1,010–1,029 publications: 13 scientists 1,030–1,049 publications: 12 scientists 1,050–1,069 publications: 9 scientists 1,070–1,089 publications: 8 scientists 1,090–1,109 publications: 7 scientists 1,110–1,129 publications: 9 scientists 1,130–1,149 publications: 2 scientists 1,150–1,162 publications: 5 scientists 1,163+ publications: 100 scientists
50–69 publications 1,163+

This scientist: 239 publications — 43rd percentile

43% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,163 publications or more.

View publications distribution as a table
Number of Materials Science scientists by publication count, Research.com 2026 ranking edition. Based on 12,847 ranked scientists.
Publications Scientists This scientist
50–69 28
70–89 152
90–109 356
110–129 487
130–149 723
150–169 835
170–189 850
190–209 891
210–229 862
230–249 766 239
250–269 726
270–289 665
290–309 593
310–329 537
330–349 477
350–369 440
370–389 356
390–409 321
410–429 256
430–449 246
450–469 216
470–489 212
490–509 174
510–529 194
530–549 162
550–569 131
570–589 111
590–609 103
610–629 99
630–649 77
650–669 92
670–689 56
690–709 53
710–729 53
730–749 38
750–769 52
770–789 43
790–809 38
810–829 34
830–849 25
850–869 18
870–889 20
890–909 24
910–929 27
930–949 20
950–969 17
970–989 10
990–1,009 16
1,010–1,029 13
1,030–1,049 12
1,050–1,069 9
1,070–1,089 8
1,090–1,109 7
1,110–1,129 9
1,130–1,149 2
1,150–1,162 5
1,163+ 100
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Kenji Nomura D-index placement in Materials Science in 2026

The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Kenji Nomura sits on this spectrum.

No. of scientists
200 400 600
Bar chart with 64 bars. Horizontal axis: D-Index, 40–41 to 165+. Vertical axis: number of scientists, 0 to 667. Most scientists, 667, have 52–53 D-Index. The last bar groups every scientist with 165 D-Index or more. The highlighted bar, 76–77 D-Index, is where this scientist sits. 40–41 D-Index: 211 scientists 42–43 D-Index: 450 scientists 44–45 D-Index: 612 scientists 46–47 D-Index: 612 scientists 48–49 D-Index: 598 scientists 50–51 D-Index: 657 scientists 52–53 D-Index: 667 scientists 54–55 D-Index: 621 scientists 56–57 D-Index: 597 scientists 58–59 D-Index: 610 scientists 60–61 D-Index: 587 scientists 62–63 D-Index: 606 scientists 64–65 D-Index: 533 scientists 66–67 D-Index: 490 scientists 68–69 D-Index: 469 scientists 70–71 D-Index: 378 scientists 72–73 D-Index: 421 scientists 74–75 D-Index: 359 scientists 76–77 D-Index: 323 scientists 78–79 D-Index: 299 scientists 80–81 D-Index: 230 scientists 82–83 D-Index: 210 scientists 84–85 D-Index: 195 scientists 86–87 D-Index: 203 scientists 88–89 D-Index: 175 scientists 90–91 D-Index: 175 scientists 92–93 D-Index: 142 scientists 94–95 D-Index: 121 scientists 96–97 D-Index: 117 scientists 98–99 D-Index: 107 scientists 100–101 D-Index: 88 scientists 102–103 D-Index: 85 scientists 104–105 D-Index: 68 scientists 106–107 D-Index: 62 scientists 108–109 D-Index: 57 scientists 110–111 D-Index: 45 scientists 112–113 D-Index: 49 scientists 114–115 D-Index: 50 scientists 116–117 D-Index: 34 scientists 118–119 D-Index: 38 scientists 120–121 D-Index: 37 scientists 122–123 D-Index: 29 scientists 124–125 D-Index: 28 scientists 126–127 D-Index: 24 scientists 128–129 D-Index: 33 scientists 130–131 D-Index: 28 scientists 132–133 D-Index: 21 scientists 134–135 D-Index: 20 scientists 136–137 D-Index: 23 scientists 138–139 D-Index: 17 scientists 140–141 D-Index: 12 scientists 142–143 D-Index: 17 scientists 144–145 D-Index: 21 scientists 146–147 D-Index: 13 scientists 148–149 D-Index: 11 scientists 150–151 D-Index: 14 scientists 152–153 D-Index: 13 scientists 154–155 D-Index: 9 scientists 156–157 D-Index: 10 scientists 158–159 D-Index: 7 scientists 160–161 D-Index: 4 scientists 162–163 D-Index: 4 scientists 164 D-Index: 3 scientists 165+ D-Index: 98 scientists
40–41 D-Index 165+

This scientist: 76 D-Index — 75th percentile

75% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 165 D-Index or more.

View D-Index distribution as a table
Number of Materials Science scientists by D-index, Research.com 2026 ranking edition. Based on 12,847 ranked scientists.
D-Index Scientists This scientist
40–41 211
42–43 450
44–45 612
46–47 612
48–49 598
50–51 657
52–53 667
54–55 621
56–57 597
58–59 610
60–61 587
62–63 606
64–65 533
66–67 490
68–69 469
70–71 378
72–73 421
74–75 359
76–77 323 76
78–79 299
80–81 230
82–83 210
84–85 195
86–87 203
88–89 175
90–91 175
92–93 142
94–95 121
96–97 117
98–99 107
100–101 88
102–103 85
104–105 68
106–107 62
108–109 57
110–111 45
112–113 49
114–115 50
116–117 34
118–119 38
120–121 37
122–123 29
124–125 28
126–127 24
128–129 33
130–131 28
132–133 21
134–135 20
136–137 23
138–139 17
140–141 12
142–143 17
144–145 21
146–147 13
148–149 11
150–151 14
152–153 13
154–155 9
156–157 10
158–159 7
160–161 4
162–163 4
164 3
165+ 98
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Overview

Kenji Nomura is affiliated with the University of California, San Diego in the United States. Their research largely focuses on engineering and materials science, contributing to various subfields including electrical and electronic engineering, materials chemistry, electronic, optical and magnetic materials, polymers and plastics, and biomedical engineering.

Their scholarly work centers on topics such as thin-film transistor technologies, ZnO doping and properties, semiconductor materials and devices, advanced memory and neural computing, transition metal oxide nanomaterials, ferroelectric and negative capacitance devices, and Ga2O3 and related materials.

Kenji Nomura has published in several scientific venues, with frequent contributions to:

  • ACS Applied Materials & Interfaces
  • Applied Physics Letters
  • ECS Meeting Abstracts
  • ACS Nano
  • ACS Applied Electronic Materials

Some of their recent notable publications include:

  • Recent progress of oxide-TFT-based inverter technology, 2021, Journal of Information Display
  • Artificial Synapse Based on a 2D-SnO2 Memtransistor with Dynamically Tunable Analog Switching for Neuromorphic Computing, 2021, ACS Applied Materials & Interfaces
  • Vacuum-Free Liquid-Metal-Printed 2D Indium-Tin Oxide Thin-Film Transistor for Oxide Inverters, 2022, ACS Nano
  • Hydrogen-Defect Termination in SnO for p-Channel TFTs, 2020, ACS Applied Electronic Materials
  • Switching Mechanism behind the Device Operation Mode in SnO-TFT, 2020, Advanced Electronic Materials

Frequent collaborators in their research include:

  • Chi-Hsin Huang
  • Yong Zhang
  • Yalun Tang
  • Kosuke Matsuzaki
  • Yu-Lun Chueh

Best Publications

  • Room-temperature fabrication of transparent flexible thin-film transistors using amorphous oxide semiconductors

    Kenji Nomura;Hiromichi Ohta;Akihiro Takagi;Toshio Kamiya

  • SEMICONDUCTOR DEVICE WITH AMORPHOUS OXIDE UTILIZED THEREIN

    Abe Katsumi;Hosono Hideo;Kamiya Toshio;Nomura Kenji

  • LCD AND ORGANIC EL DISPLAY

    Hosono Hideo;Hirano Masahiro;Ota Hiromichi;Kamiya Toshio

  • Amorphous oxide and field effect transistor

    Masafumi Sano;Katsumi Nakagawa;Hideo Hosono;Toshio Kamiya

  • Field effect transistor manufacturing method

    Hisato Yabuta;Masafumi Sano;Tatsuya Iwasaki;Hideo Hosono

  • Sensor and nonplanar imaging device

    Hideo Hosono;Toshio Kamiya;Kenji Nomura;Keishi Saito

  • Thin-Film Transistor Fabricated in Single-Crystalline Transparent Oxide Semiconductor

    Kenji Nomura;Hiromichi Ohta;Kazushige Ueda;Toshio Kamiya

  • Present status of amorphous In–Ga–Zn–O thin-film transistors

    Toshio Kamiya;Kenji Nomura;Hideo Hosono

  • Amorphous Oxide Semiconductors for High-Performance Flexible Thin-Film Transistors

    Kenji Nomura;Akihiro Takagi;Toshio Kamiya;Hiromichi Ohta

  • High-mobility thin-film transistor with amorphous InGaZnO4 channel fabricated by room temperature rf-magnetron sputtering

    Hisato Yabuta;Masafumi Sano;Katsumi Abe;Toshiaki Aiba

  • Carrier transport in transparent oxide semiconductor with intrinsic structural randomness probed using single-crystalline InGaO3(ZnO)5 films

    Kenji Nomura;Toshio Kamiya;Hiromichi Ohta;Kazushige Ueda

  • Giant thermoelectric Seebeck coefficient of a two-dimensional electron gas in SrTiO3

    Hiromichi Ohta;Hiromichi Ohta;SungWng Kim;Yoriko Mune;Teruyasu Mizoguchi

  • P‐29: Modeling of Amorphous Oxide Semiconductor Thin Film Transistors and Subgap Density of States

    Hsing-Hung Hsieh;Hsing-Hung Hsieh;Toshio Kamiya;Kenji Nomura;Hideo Hosono

  • 42.1: Invited Paper: Improved Amorphous In‐Ga‐Zn‐O TFTs

    Ryo Hayashi;Ayumu Sato;Masato Ofuji;Katsumi Abe

  • Origins of High Mobility and Low Operation Voltage of Amorphous Oxide TFTs: Electronic Structure, Electron Transport, Defects and Doping

    T. Kamiya;K. Nomura;H. Hosono

  • Amorphous oxide and electric field effect transistor

    Hideo Hosono;Toshio Kamiya;Katsumi Nakagawa;Kenji Nomura

  • p-channel thin-film transistor using p-type oxide semiconductor, SnO

    Yoichi Ogo;Hidenori Hiramatsu;Kenji Nomura;Hiroshi Yanagi

  • Modeling of amorphous InGaZnO4 thin film transistors and their subgap density of states

    Hsing-Hung Hsieh;Toshio Kamiya;Kenji Nomura;Hideo Hosono

  • Carrier transport and electronic structure in amorphous oxide semiconductor, a-InGaZnO4

    Akihiro Takagi;Kenji Nomura;Hiromichi Ohta;Hiromichi Ohta;Hiroshi Yanagi

  • Subgap states in transparent amorphous oxide semiconductor, In–Ga–Zn–O, observed by bulk sensitive x-ray photoelectron spectroscopy

    Kenji Nomura;Toshio Kamiya;Hiroshi Yanagi;Eiji Ikenaga

Frequent Co-Authors

Hideo Hosono
Hideo Hosono Tokyo Institute of Technology
Toshio Kamiya
Toshio Kamiya Tokyo Institute of Technology
Hiromichi Ohta
Hiromichi Ohta Hokkaido University
Hiroshi Yanagi
Hiroshi Yanagi University of Yamanashi
Masahiro Hirano
Masahiro Hirano Tokyo Institute of Technology
Hidenori Hiramatsu
Hidenori Hiramatsu Tokyo Institute of Technology
Yuichi Ikuhara
Yuichi Ikuhara University of Tokyo
Kazushige Ueda
Kazushige Ueda Kyushu Institute of Technology
Kunihito Koumoto
Kunihito Koumoto Nagoya University
Ryo Hayashi
Ryo Hayashi Canon (Japan)

External Links

Google Scholar page

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Best Scientists Citing Kenji Nomura

Shunpei Yamazaki

Shunpei Yamazaki

Semiconductor Energy Laboratory (Japan)

Publications: 363

Ting-Chang Chang

Ting-Chang Chang

National Sun Yat-sen University

Publications: 152

Jin Jang

Jin Jang

Kyung Hee University

Publications: 146

Hideo Hosono

Hideo Hosono

Tokyo Institute of Technology

Publications: 140

Shengdong Zhang

Shengdong Zhang

Peking University

Publications: 138

Hyun Jae Kim

Hyun Jae Kim

Yonsei University

Publications: 127

Jae Kyeong Jeong

Jae Kyeong Jeong

Hanyang University

Publications: 123

Jin-Seong Park

Jin-Seong Park

Hanyang University

Publications: 115

Elvira Fortunato

Elvira Fortunato

Universidade Nova de Lisboa

Publications: 114

Hiromichi Ohta

Hiromichi Ohta

Hokkaido University

Publications: 113

Junbiao Peng

Junbiao Peng

South China University of Technology

Publications: 108

Rodrigo Martins

Rodrigo Martins

Universidade Nova de Lisboa

Publications: 108

Chi-Sun Hwang

Chi-Sun Hwang

Electronics and Telecommunications Research Institute

Publications: 103

Pedro Barquinha

Pedro Barquinha

Universidade Nova de Lisboa

Publications: 92

Jun Koyama

Jun Koyama

Semiconductor Energy Laboratory (Japan)

Publications: 83

Toshio Kamiya

Toshio Kamiya

Tokyo Institute of Technology

Publications: 83

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University of Illinois at Urbana-Champaign

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