D-Index & Metrics Best Publications

D-Index & Metrics

Discipline name D-index D-index (Discipline H-index) only includes papers and citation values for an examined discipline in contrast to General H-index which accounts for publications across all disciplines. Citations Publications World Ranking National Ranking
Electronics and Electrical Engineering D-index 53 Citations 21,197 158 World Ranking 947 National Ranking 19
Materials Science D-index 57 Citations 21,881 188 World Ranking 4022 National Ranking 149

Overview

What is he best known for?

The fields of study he is best known for:

  • Semiconductor
  • Optoelectronics
  • Transistor

His scientific interests lie mostly in Optoelectronics, Thin-film transistor, Transistor, Threshold voltage and Layer. His Optoelectronics research integrates issues from Oxide, Thin film, OLED, Substrate and Electrical engineering. He has researched Thin-film transistor in several fields, including Field-effect transistor, Subthreshold conduction, Gate oxide and Amorphous solid.

Jae Kyeong Jeong has included themes like Etching, Dry etching, Critical thickness and Sputtering in his Transistor study. Jae Kyeong Jeong combines subjects such as Wide-bandgap semiconductor, Stress, Gate dielectric and Indium gallium zinc oxide with his study of Threshold voltage. His Layer study combines topics in areas such as Flat panel display, Plasma-enhanced chemical vapor deposition, Semiconductor and Photolithography.

His most cited work include:

  • Electronic transport properties of amorphous indium-gallium-zinc oxide semiconductor upon exposure to water (1334 citations)
  • Improvements in the device characteristics of amorphous indium gallium zinc oxide thin-film transistors by Ar plasma treatment (1241 citations)
  • 3.1: Distinguished Paper: 12.1‐Inch WXGA AMOLED Display Driven by Indium‐Gallium‐Zinc Oxide TFTs Array (1090 citations)

What are the main themes of his work throughout his whole career to date?

Jae Kyeong Jeong mainly investigates Optoelectronics, Thin-film transistor, Layer, Transistor and Threshold voltage. His primary area of study in Optoelectronics is in the field of Semiconductor. Jae Kyeong Jeong interconnects Amorphous solid, Subthreshold conduction, Substrate and Analytical chemistry in the investigation of issues within Thin-film transistor.

His research integrates issues of Flat panel display and Display device in his study of Layer. His study on Indium gallium zinc oxide is often connected to Instability as part of broader study in Transistor. In his work, FOIL method is strongly intertwined with AMOLED, which is a subfield of Threshold voltage.

He most often published in these fields:

  • Optoelectronics (75.98%)
  • Thin-film transistor (67.69%)
  • Layer (28.82%)

What were the highlights of his more recent work (between 2016-2021)?

  • Thin-film transistor (67.69%)
  • Optoelectronics (75.98%)
  • Transistor (28.82%)

In recent papers he was focusing on the following fields of study:

His primary scientific interests are in Thin-film transistor, Optoelectronics, Transistor, Amorphous solid and Threshold voltage. His Thin-film transistor research incorporates themes from Oxide, Electron mobility, Indium, Atomic layer deposition and Analytical chemistry. His Optoelectronics research is multidisciplinary, incorporating perspectives in Layer, Tin, Gate dielectric and Field-effect transistor.

Jae Kyeong Jeong has researched Transistor in several fields, including Wavelength, Polymer dielectric and Laser. His Amorphous solid research includes elements of Thermal conduction, Composite material, Diffusion barrier and Biosensor. In his study, which falls under the umbrella issue of Threshold voltage, Microstructure is strongly linked to Subthreshold conduction.

Between 2016 and 2021, his most popular works were:

  • The Mobility Enhancement of Indium Gallium Zinc Oxide Transistors via Low-temperature Crystallization using a Tantalum Catalytic Layer. (27 citations)
  • High-Performance Amorphous Indium Gallium Zinc Oxide Thin-Film Transistors Fabricated by Atomic Layer Deposition (19 citations)
  • Comparative Study on Performance of IGZO Transistors With Sputtered and Atomic Layer Deposited Channel Layer (18 citations)

In his most recent research, the most cited papers focused on:

  • Semiconductor
  • Transistor
  • Silicon

Jae Kyeong Jeong mainly focuses on Thin-film transistor, Transistor, Optoelectronics, Threshold voltage and Amorphous solid. He has included themes like Analytical chemistry, Electron mobility, Zinc, Annealing and Atomic layer deposition in his Thin-film transistor study. His research investigates the connection with Transistor and areas like Layer which intersect with concerns in Subthreshold conduction, Sputter deposition and Stress.

His research on Optoelectronics frequently links to adjacent areas such as Oxide. His biological study spans a wide range of topics, including Vacancy defect and Activation energy. His work focuses on many connections between Amorphous solid and other disciplines, such as Tantalum, that overlap with his field of interest in Active layer, Crystallization, Indium gallium zinc oxide and Chemical engineering.

This overview was generated by a machine learning system which analysed the scientist’s body of work. If you have any feedback, you can contact us here.

Best Publications

Thin film transistor and organic light-emitting display device having the thin film transistor

Jin-Seong Park;Yeon-Gon Mo;Jae-Kyeong Jeong;Jong-Han Jeong.
(2008)

3451 Citations

Organic light emitting display (OLED) and its method of fabrication

Hyun Soo Shin;Jae Kyeong Jeong;Yeon Gon Mo;Dong Un Jin.
(2006)

3400 Citations

Thin film transistor, method of manufacturing the same, and flat panel display having the same

Ha Jae-Heung;Song Young-Woo;Lee Jong-Hyuk;Jeong Jong-Han.
(2009)

1741 Citations

Electronic transport properties of amorphous indium-gallium-zinc oxide semiconductor upon exposure to water

Jin-Seong Park;Jae Kyeong Jeong;Hyun-Joong Chung;Yeon-Gon Mo.
Applied Physics Letters (2008)

1334 Citations

Improvements in the device characteristics of amorphous indium gallium zinc oxide thin-film transistors by Ar plasma treatment

Jin-Seong Park;Jae Kyeong Jeong;Yeon-Gon Mo;Hye Dong Kim.
Applied Physics Letters (2007)

1241 Citations

3.1: Distinguished Paper: 12.1‐Inch WXGA AMOLED Display Driven by Indium‐Gallium‐Zinc Oxide TFTs Array

Jae Kyeong Jeong;Jong Han Jeong;Jong Hyun Choi;Jang Soon Im.
SID Symposium Digest of Technical Papers (2008)

1090 Citations

Amorphous oxide TFT backplanes for large size AMOLED displays

Yeon Gon Mo;Jae Kyeong Jeong;Hye Dong Kim;Ho Kyoon Chung.
15th International Display Workshops, IDW '08 (2008)

866 Citations

Origin of threshold voltage instability in indium-gallium-zinc oxide thin film transistors

Jae Kyeong Jeong;Hui Won Yang;Jong Han Jeong;Yeon-Gon Mo.
Applied Physics Letters (2008)

856 Citations

High mobility bottom gate InGaZnO thin film transistors with SiOx etch stopper

Minkyu Kim;Jong Han Jeong;Hun Jung Lee;Tae Kyung Ahn.
Applied Physics Letters (2007)

645 Citations

Thin film transistor, method of manufacturing the same, and flat panel display device having the same

Min-Kyu Kim;Jong-Han Jeong;Tae-kyung Ahn;Jae-Kyeong Jeong.
(2009)

578 Citations

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