World's Best Scientists 2026 revealed!

D-Index & Metrics

Materials Science

D-Index
45
Citations
6933
World Ranking
11814
National Ranking
530

Hyeong Joon Kim publication distribution in Materials Science in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Hyeong Joon Kim sits on this spectrum.

50–69 publications: 28 scientists 70–89 publications: 152 scientists 90–109 publications: 356 scientists 110–129 publications: 487 scientists 130–149 publications: 724 scientists 150–169 publications: 835 scientists 170–189 publications: 850 scientists 190–209 publications: 891 scientists 210–229 publications: 862 scientists 230–249 publications: 766 scientists 250–269 publications: 726 scientists 270–289 publications: 665 scientists 290–309 publications: 593 scientists 310–329 publications: 537 scientists 330–349 publications: 478 scientists 350–369 publications: 441 scientists 370–389 publications: 356 scientists 390–409 publications: 321 scientists 410–429 publications: 257 scientists 430–449 publications: 246 scientists 450–469 publications: 216 scientists 470–489 publications: 212 scientists 490–509 publications: 174 scientists 510–529 publications: 194 scientists 530–549 publications: 162 scientists 550–569 publications: 131 scientists 570–589 publications: 111 scientists 590–609 publications: 103 scientists 610–629 publications: 99 scientists 630–649 publications: 77 scientists 650–669 publications: 92 scientists 670–689 publications: 56 scientists 690–709 publications: 53 scientists 710–729 publications: 53 scientists 730–749 publications: 38 scientists 750–769 publications: 52 scientists 770–789 publications: 43 scientists 790–809 publications: 38 scientists 810–829 publications: 34 scientists 830–849 publications: 25 scientists 850–869 publications: 18 scientists 870–889 publications: 20 scientists 890–909 publications: 24 scientists 910–929 publications: 27 scientists 930–949 publications: 20 scientists 950–969 publications: 17 scientists 970–989 publications: 10 scientists 990–1,009 publications: 16 scientists 1,010–1,029 publications: 13 scientists 1,030–1,049 publications: 12 scientists 1,050–1,069 publications: 9 scientists 1,070–1,089 publications: 8 scientists 1,090–1,109 publications: 7 scientists 1,110–1,129 publications: 9 scientists 1,130–1,149 publications: 2 scientists 1,150–1,162 publications: 5 scientists 1,163+ publications: 100 scientists
50 publications 1,163+

This scientist: 311 publications — 62nd percentile

62% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,163 publications or more.

Hyeong Joon Kim D-index placement in Materials Science in 2026

The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Hyeong Joon Kim sits on this spectrum.

40–41 D-Index: 211 scientists 42–43 D-Index: 451 scientists 44–45 D-Index: 613 scientists 46–47 D-Index: 612 scientists 48–49 D-Index: 598 scientists 50–51 D-Index: 657 scientists 52–53 D-Index: 667 scientists 54–55 D-Index: 621 scientists 56–57 D-Index: 597 scientists 58–59 D-Index: 610 scientists 60–61 D-Index: 587 scientists 62–63 D-Index: 606 scientists 64–65 D-Index: 533 scientists 66–67 D-Index: 490 scientists 68–69 D-Index: 469 scientists 70–71 D-Index: 378 scientists 72–73 D-Index: 421 scientists 74–75 D-Index: 359 scientists 76–77 D-Index: 323 scientists 78–79 D-Index: 299 scientists 80–81 D-Index: 230 scientists 82–83 D-Index: 210 scientists 84–85 D-Index: 195 scientists 86–87 D-Index: 204 scientists 88–89 D-Index: 175 scientists 90–91 D-Index: 175 scientists 92–93 D-Index: 142 scientists 94–95 D-Index: 121 scientists 96–97 D-Index: 118 scientists 98–99 D-Index: 107 scientists 100–101 D-Index: 88 scientists 102–103 D-Index: 85 scientists 104–105 D-Index: 68 scientists 106–107 D-Index: 62 scientists 108–109 D-Index: 57 scientists 110–111 D-Index: 45 scientists 112–113 D-Index: 49 scientists 114–115 D-Index: 50 scientists 116–117 D-Index: 34 scientists 118–119 D-Index: 38 scientists 120–121 D-Index: 37 scientists 122–123 D-Index: 29 scientists 124–125 D-Index: 28 scientists 126–127 D-Index: 24 scientists 128–129 D-Index: 33 scientists 130–131 D-Index: 28 scientists 132–133 D-Index: 21 scientists 134–135 D-Index: 20 scientists 136–137 D-Index: 23 scientists 138–139 D-Index: 17 scientists 140–141 D-Index: 12 scientists 142–143 D-Index: 17 scientists 144–145 D-Index: 21 scientists 146–147 D-Index: 13 scientists 148–149 D-Index: 11 scientists 150–151 D-Index: 14 scientists 152–153 D-Index: 13 scientists 154–155 D-Index: 9 scientists 156–157 D-Index: 10 scientists 158–159 D-Index: 7 scientists 160–161 D-Index: 4 scientists 162–163 D-Index: 4 scientists 164 D-Index: 3 scientists 165+ D-Index: 98 scientists
40 D-Index 165+

This scientist: 45 D-Index — 10th percentile

10% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 165 D-Index or more.

Overview

Hyeong Joon Kim is affiliated with Seoul National University in South Korea. Their research spans multiple fields within medicine and biochemistry, genetics, and molecular biology, with a particular focus on hematology and genetic aspects of cancer.

The main fields of their scholarly work include:

  • Medicine
  • Biochemistry, Genetics and Molecular Biology

The research further sharpens into specific subfields such as:

  • Genetics
  • Hematology
  • Molecular Biology
  • Pathology and Forensic Medicine
  • Cancer Research

Key topics in their publications address:

  • Chronic Myeloid Leukemia Treatments
  • Myeloproliferative Neoplasms: Diagnosis and Treatment
  • Chronic Lymphocytic Leukemia Research
  • Lymphoma Diagnosis and Treatment
  • Acute Myeloid Leukemia Research
  • Epigenetics and DNA Methylation
  • Cancer Genomics and Diagnostics

Their recent publications include:

  • "Clinical Genome Data Model (cGDM) provides Interactive Clinical Decision Support for Precision Medicine", 2020, Scientific Reports
  • "IDH1/2 mutations in acute myeloid leukemia", 2022, Blood Research
  • "Smart Decentralization of Personal Health Records with Physician Apps and Helper Agents on Blockchain: Platform Design and Implementation Study", 2021, JMIR Medical Informatics
  • "Effect of BCR::ABL1 transcript type and droplet digital polymerase chain reaction on successful treatment-free remission in chronic myeloid leukemia patients who discontinued tyrosine kinase inhibitor", 2023, Therapeutic Advances in Hematology
  • "Ultra-deep sequencing mutation analysis of the BCR/ABL1 kinase domain in newly diagnosed chronic myeloid leukemia patients", 2021, Leukemia Research

Frequent co-authors in their work are:

  • Jae-Sook Ahn
  • Hyunkyung Park
  • Sang-Kyun Sohn
  • Hawk Kim
  • Dong-Yeop Shin

Typical publication venues where they have contributed include:

  • Leukemia Research
  • Blood Research
  • Scientific Reports
  • JMIR Medical Informatics
  • Therapeutic Advances in Hematology

Best Publications

  • Infrared spectroscopy study of low-dielectric-constant fluorine-incorporated and carbon-incorporated silicon oxide films

    Yoon-Hae Kim;Moo Sung Hwang;Hyeong Joon Kim;Jin Yong Kim

  • Low Temperature Formation of Silicon Oxide Thin Films by Atomic Layer Deposition Using NH3/O2 Plasma

    Jong-Sik Choi;Jong-Sik Choi;Bong Seob Yang;Seok-Jun Won;Jun Rae Kim

  • Dielectric and electrical properties of sputter grown (Ba,Sr)TiO3 thin films

    Ju Cheol Shin;Jaehoo Park;Cheol Seong Hwang;Hyeong Joon Kim

  • Current conduction mechanisms in atomic-layer-deposited HfO2/nitrided SiO2 stacked gate on 4H silicon carbide

    Kuan Yew Cheong;Jeong Hyun Moon;Hyeong Joon Kim;Wook Bahng

  • Low-k Si-O-C-H composite films prepared by plasma-enhanced chemical vapor deposition using bis-trimethylsilylmethane precursor

    Yoon-Hae Kim;Seok-Kiu Lee;Hyeong Joon Kim

  • Deposition of ZnO thin films by magnetron sputtering for a film bulk acoustic resonator

    Jae Bin Lee;Hyeong Joon Kim;Soo Gil Kim;Cheol Seong Hwang

  • Origin of low dielectric constant of carbon-incorporated silicon oxide film deposited by plasma enhanced chemical vapor deposition

    Jin Yong Kim;Moo Sung Hwang;Yoon-Hae Kim;Hyeong Joon Kim

  • Spectrophotometric analysis of aluminum nitride thin films

    Han-Yong Joo;Hyeong Joon Kim;Sang June Kim;Sang Youl Kim

  • Microstructural evolution and preferred orientation change of radio‐frequency‐magnetron sputtered ZnO thin films

    Yong Eui Lee;Jae Bin Lee;Young Jin Kim;Hyung Kook Yang

  • Improvement of the photo-bias stability of the Zn–Sn–O field effect transistors by an ozone treatment

    Bong Seob Yang;Sanghyun Park;Seungha Oh;Yoon Jang Kim

  • Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants

    Gyu-Jin Choi;Seong Keun Kim;Seok-Jun Won;Hyeong Joon Kim

  • EFFECTS OF SURFACE ROUGHNESS OF SUBSTRATES ON THE C-AXIS PREFERRED ORIENTATION OF ZNO FILMS DEPOSITED BY R.F. MAGNETRON SPUTTERING

    Jae Bin Lee;Sang Hyun Kwak;Hyeong Joon Kim

  • Characterization of low-dielectric-constant SiOC thin films deposited by PECVD for interlayer dielectrics of multilevel interconnection

    Hyeong Joon Kim;Qingyi Shao;Yoon-Hae Kim

  • Epitaxial growth of ZnO thin films on R-plane sapphire substrate by radio frequency magnetron sputtering

    Young Jin Kim;Yoo Taek Kim;Hyung Kook Yang;Jong Chul Park

  • High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal–Organic Silicon Precursor and Oxygen Radical

    Seok-Jun Won;Sungin Suh;Myung Soo Huh;Hyeong Joon Kim

  • Leakage current of sol-gel derived Pb(Zr, Ti)O3 thin films having Pt electrodes

    Ju Cheol Shin;Cheol Seong Hwang;Hyeong Joon Kim;Soon Oh Park

  • Fabrication of CuIn1−xGaxSe2 thin film solar cells by sputtering and selenization process

    Ho Keun Song;Jae Kyeong Jeong;Hyeong Joon Kim;Suk Ki Kim

  • Role of ZrO2 incorporation in the suppression of negative bias illumination- induced instability in Zn-Sn-O thin film transistors

    Bong Seob Yang;Myung Soo Huh;Seungha Oh;Ung Soo Lee

  • Improvement in Photo-Bias Stability of High-Mobility Indium Zinc Oxide Thin-Film Transistors by Oxygen High-Pressure Annealing

    Se Yeob Park;Ji Hun Song;Chang-Kyu Lee;Byeong Geun Son

  • Photobias Instability of High Performance Solution Processed Amorphous Zinc Tin Oxide Transistors

    Yoon Jang Kim;Bong Seob Yang;Seungha Oh;Sang Jin Han

  • THICKNESS DEPENDENCE OF MICROSTRUCTURAL EVOLUTION OF ZNO FILMS DEPOSITED BY RF MAGNETRON SPUTTERING

    Yong Eui Lee;Young Jin Kim;Hyeong Joon Kim

  • Properties of lanthanum oxide thin films deposited by cyclic chemical vapor deposition using tris(isopropyl-cyclopentadienyl)lanthanum precursor

    Sang Yong No;Dail Eom;Cheol Seong Hwang;Hyeong Joon Kim

Frequent Co-Authors

Cheol Seong Hwang
Cheol Seong Hwang Seoul National University
Jae Kyeong Jeong
Jae Kyeong Jeong Hanyang University
Jong-Ho Lee
Jong-Ho Lee Soongsil University
Young Hee Lee
Young Hee Lee Sungkyunkwan University
Yoshio Nishi
Yoshio Nishi Stanford University
Seong-Hyeon Hong
Seong-Hyeon Hong Seoul National University
Wen-li Wu
Wen-li Wu National Institute of Standards and Technology
Hoichang Yang
Hoichang Yang Inha University
Hideyo Okushi
Hideyo Okushi National Institute of Advanced Industrial Science and Technology
Young Moo Lee
Young Moo Lee Hanyang University

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