World's Best Scientists 2026 revealed!

D-Index & Metrics

Chemistry

D-Index
45
Citations
9336
World Ranking
16289
National Ranking
308

Seong Keun Kim publication distribution in Chemistry in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Chemistry in 2026. The highlighted bar marks where Seong Keun Kim sits on this spectrum.

61–80 publications: 66 scientists 81–100 publications: 302 scientists 101–120 publications: 623 scientists 121–140 publications: 918 scientists 141–160 publications: 1,218 scientists 161–180 publications: 1,350 scientists 181–200 publications: 1,344 scientists 201–220 publications: 1,281 scientists 221–240 publications: 1,216 scientists 241–260 publications: 1,100 scientists 261–280 publications: 979 scientists 281–300 publications: 939 scientists 301–320 publications: 764 scientists 321–340 publications: 643 scientists 341–360 publications: 628 scientists 361–380 publications: 522 scientists 381–400 publications: 459 scientists 401–420 publications: 397 scientists 421–440 publications: 327 scientists 441–460 publications: 270 scientists 461–480 publications: 265 scientists 481–500 publications: 252 scientists 501–520 publications: 201 scientists 521–540 publications: 185 scientists 541–560 publications: 148 scientists 561–580 publications: 148 scientists 581–600 publications: 132 scientists 601–620 publications: 114 scientists 621–640 publications: 104 scientists 641–660 publications: 91 scientists 661–680 publications: 92 scientists 681–700 publications: 73 scientists 701–720 publications: 57 scientists 721–740 publications: 54 scientists 741–760 publications: 67 scientists 761–780 publications: 45 scientists 781–800 publications: 46 scientists 801–820 publications: 39 scientists 821–840 publications: 32 scientists 841–860 publications: 36 scientists 861–880 publications: 29 scientists 881–900 publications: 26 scientists 901–920 publications: 24 scientists 921–940 publications: 14 scientists 941–960 publications: 23 scientists 961–980 publications: 28 scientists 981–1,000 publications: 15 scientists 1,001–1,020 publications: 29 scientists 1,021–1,040 publications: 12 scientists 1,041–1,060 publications: 19 scientists 1,061–1,080 publications: 12 scientists 1,081–1,100 publications: 6 scientists 1,101–1,120 publications: 8 scientists 1,121–1,140 publications: 12 scientists 1,141–1,160 publications: 5 scientists 1,161–1,180 publications: 6 scientists 1,181–1,200 publications: 14 scientists 1,201–1,220 publications: 7 scientists 1,221–1,240 publications: 2 scientists 1,241–1,260 publications: 6 scientists 1,261–1,280 publications: 4 scientists 1,281–1,294 publications: 6 scientists 1,295+ publications: 100 scientists
61 publications 1,295+

This scientist: 162 publications — 18th percentile

18% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,295 publications or more.

Seong Keun Kim D-index placement in Chemistry in 2026

The chart shows the D-index (discipline H-index) distribution of Chemistry scientists ranked by Research.com in 2026. The highlighted bar marks where Seong Keun Kim sits on this spectrum.

40–41 D-Index: 289 scientists 42–43 D-Index: 612 scientists 44–45 D-Index: 808 scientists 46–47 D-Index: 776 scientists 48–49 D-Index: 835 scientists 50–51 D-Index: 861 scientists 52–53 D-Index: 872 scientists 54–55 D-Index: 933 scientists 56–57 D-Index: 1,051 scientists 58–59 D-Index: 930 scientists 60–61 D-Index: 882 scientists 62–63 D-Index: 834 scientists 64–65 D-Index: 731 scientists 66–67 D-Index: 775 scientists 68–69 D-Index: 683 scientists 70–71 D-Index: 646 scientists 72–73 D-Index: 561 scientists 74–75 D-Index: 501 scientists 76–77 D-Index: 437 scientists 78–79 D-Index: 388 scientists 80–81 D-Index: 354 scientists 82–83 D-Index: 292 scientists 84–85 D-Index: 275 scientists 86–87 D-Index: 254 scientists 88–89 D-Index: 235 scientists 90–91 D-Index: 185 scientists 92–93 D-Index: 192 scientists 94–95 D-Index: 155 scientists 96–97 D-Index: 163 scientists 98–99 D-Index: 125 scientists 100–101 D-Index: 105 scientists 102–103 D-Index: 105 scientists 104–105 D-Index: 112 scientists 106–107 D-Index: 88 scientists 108–109 D-Index: 68 scientists 110–111 D-Index: 69 scientists 112–113 D-Index: 65 scientists 114–115 D-Index: 79 scientists 116–117 D-Index: 61 scientists 118–119 D-Index: 44 scientists 120–121 D-Index: 37 scientists 122–123 D-Index: 40 scientists 124–125 D-Index: 33 scientists 126–127 D-Index: 26 scientists 128–129 D-Index: 34 scientists 130–131 D-Index: 35 scientists 132–133 D-Index: 25 scientists 134–135 D-Index: 27 scientists 136–137 D-Index: 17 scientists 138–139 D-Index: 16 scientists 140–141 D-Index: 20 scientists 142–143 D-Index: 20 scientists 144–145 D-Index: 15 scientists 146–147 D-Index: 9 scientists 148–149 D-Index: 9 scientists 150–151 D-Index: 16 scientists 152–153 D-Index: 11 scientists 154–155 D-Index: 9 scientists 156–157 D-Index: 3 scientists 158 D-Index: 3 scientists 159+ D-Index: 98 scientists
40 D-Index 159+

This scientist: 45 D-Index — 10th percentile

10% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 159 D-Index or more.

Overview

Seong Keun Kim is affiliated with the Korea Institute of Science and Technology in South Korea. Their research spans the fields of Materials Science and Engineering, with a particular focus on Materials Chemistry and Electrical and Electronic Engineering. Additional subfields include Nuclear and High Energy Physics, Electronic, Optical and Magnetic Materials, and Civil and Structural Engineering.

The scientist's work concentrates on several main topics, including:

  • Semiconductor materials and devices
  • Advanced Thermoelectric Materials and Devices
  • Electronic and Structural Properties of Oxides
  • Thermal properties of materials
  • ZnO doping and properties
  • Thermal Radiation and Cooling Technologies
  • Thin-Film Transistor Technologies

Seong Keun Kim has published extensively in multiple recognized scientific journals. Frequent publication venues include:

  • Journal of Materials Chemistry C
  • Chemistry of Materials
  • Small
  • Journal of Alloys and Compounds
  • SSRN Electronic Journal

Recent papers reflect a focus on thermoelectric materials, sensor technology, and thin film deposition techniques. Selected papers include:

  • "Porous organic filler for high efficiency of flexible thermoelectric generator," 2020, Nano Energy
  • "Highly sensitive flexible NO2 sensor composed of vertically aligned 2D SnS2 operating at room temperature," 2020, Journal of Materials Chemistry C
  • "Exploring coherent elastic neutrino-nucleus scattering using reactor electron antineutrinos in the NEON experiment," 2023, The European Physical Journal C
  • "Atomic-layer deposition of TiO2 thin films with a thermally stable (CpMe5)Ti(OMe)3 precursor," 2021, Applied Surface Science
  • "Geometric design of Cu2Se-based thermoelectric materials for enhancing power generation," 2024, Nature Energy

Throughout their career, Seong Keun Kim has collaborated closely with several researchers. Frequent co-authors include:

  • Seung-Hyub Baek
  • Sung Ok Won
  • Jinsang Kim
  • Jihoon Jeon
  • Sung-Jin Jung

Best Publications

  • Resistive switching mechanism of TiO2 thin films grown by atomic-layer deposition

    B. J. Choi;Doo Seok Jeong;S. K. Kim;C. Rohde

  • Band-gap transition induced by interlayer van der Waals interaction in MoS 2

    S. W. Han;Hyuksang Kwon;Seong Keun Kim;Sunmin Ryu

  • High dielectric constant TiO2 thin films on a Ru electrode grown at 250 °C by atomic-layer deposition

    Seong Keun Kim;Wan-Don Kim;Kyung-Min Kim;Cheol Seong Hwang

  • Highly luminescent InP/GaP/ZnS nanocrystals and their application to white light-emitting diodes.

    Sungwoo Kim;Taehoon Kim;Meejae Kang;Seong Kwon Kwak

  • Al‐Doped TiO2 Films with Ultralow Leakage Currents for Next Generation DRAM Capacitors

    Seong Keun Kim;Gyu-Jin Choi;Sang Young Lee;Minha Seo

  • First-principles study of point defects in rutile Ti O 2 − x

    Eunae Cho;Seungwu Han;Hyo-Shin Ahn;Kwang-Ryeol Lee

  • Comparison between ZnO films grown by atomic layer deposition using H2O or O3 as oxidant

    Seong Keun Kim;Cheol Seong Hwang;Sang-Hee Ko Park;Sun Jin Yun

  • Low Temperature ( < 100 ° C ) Deposition of Aluminum Oxide Thin Films by ALD with O3 as Oxidant

    Seong Keun Kim;Suk Woo Lee;Cheol Seong Hwang;Yo-Sep Min

  • Wafer-scale growth of MoS2 thin films by atomic layer deposition

    Jung Joon Pyeon;Jung Joon Pyeon;Soo Hyun Kim;Doo Seok Jeong;Doo Seok Jeong;Seung Hyub Baek;Seung Hyub Baek

  • Atomic Layer Deposition of SrTiO3 Thin Films with Highly Enhanced Growth Rate for Ultrahigh Density Capacitors

    Sang Woon Lee;Jeong Hwan Han;Sora Han;Woongkyu Lee

  • Comparative Photophysics of [26]- and [28]Hexaphyrins(1.1.1.1.1.1): Large Two-Photon Absorption Cross Section of Aromatic [26]Hexaphyrins(1.1.1.1.1.1)

    Tae Kyu Ahn;Tae Kyu Ahn;Jung Ho Kwon;Deok Yun Kim;Dae Won Cho

  • First results from the AMoRE-Pilot neutrinoless double beta decay experiment

    V. Alenkov;H. W. Bae;J. Beyer;R. S. Boiko

  • Atomic Layer Deposition of Ru Thin Films Using 2,4-(Dimethylpentadienyl)(ethylcyclopentadienyl)Ru by a Liquid Injection System

    Seong Keun Kim;Sang Young Lee;Sang Woon Lee;Gyu Weon Hwang

  • Fabrication of high-performance p-type thin film transistors using atomic-layer-deposited SnO films

    Soo Hyun Kim;In-Hwan Baek;In-Hwan Baek;Da Hye Kim;Jung Joon Pyeon;Jung Joon Pyeon

  • Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants

    Gyu-Jin Choi;Seong Keun Kim;Seok-Jun Won;Hyeong Joon Kim

  • Excited-State Energy Transfer Processes in Phenylene- and Biphenylene-Linked and Directly-Linked Zinc(II) and Free-Base Hybrid Diporphyrins

    Hyun Sun Cho;Dae Hong Jeong;Min Chul Yoon;Yong Hee Kim

  • Synthesis of SnS Thin Films by Atomic Layer Deposition at Low Temperatures

    In Hwan Baek;In Hwan Baek;Jung Joon Pyeon;Jung Joon Pyeon;Young Geun Song;Young Geun Song;Taek Mo Chung

  • Atomic Layer Deposition of SrTiO3 Films with Cyclopentadienyl-Based Precursors for Metal–Insulator–Metal Capacitors

    Woongkyu Lee;Jeong Hwan Han;Woojin Jeon;Yeon Woo Yoo

  • Interfacial control of oxygen vacancy doping and electrical conduction in thin film oxide heterostructures.

    Boyd W. Veal;Seong Keun Kim;Seong Keun Kim;Peter Zapol;Hakim Iddir

  • Growth of p-Type Tin(II) Monoxide Thin Films by Atomic Layer Deposition from Bis(1-dimethylamino-2-methyl-2propoxy)tin and H2O

    Jeong Hwan Han;Yoon Jang Chung;Bo Keun Park;Seong Keun Kim

  • Atomic-layer-deposited Al2O3 thin films with thin SiO2 layers grown by in situ O3 oxidation

    Seong Keun Kim;Cheol Seong Hwang

  • Growth Behavior of Al-Doped TiO2 Thin Films by Atomic Layer Deposition

    Seong Keun Kim;Gyu Jin Choi;Jeong Hwan Kim;Cheol Seong Hwang

  • Growth Characteristics of Atomic Layer Deposited TiO2 Thin Films on Ru and Si Electrodes for Memory Capacitor Applications

    Wan Don Kim;Gyu Weon Hwang;Oh Seong Kwon;Seong Keun Kim

Frequent Co-Authors

Seung-Hyub Baek
Seung-Hyub Baek Korea Institute of Science and Technology
Cheol Seong Hwang
Cheol Seong Hwang Seoul National University
Chong-Yun Kang
Chong-Yun Kang Korea Institute of Science and Technology
Hyung-Ho Park
Hyung-Ho Park Yonsei University
Jinsang Kim
Jinsang Kim University of Michigan–Ann Arbor
Jeffrey A. Eastman
Jeffrey A. Eastman Argonne National Laboratory
Sokrates T. Pantelides
Sokrates T. Pantelides Vanderbilt University
Hyun Jae Kim
Hyun Jae Kim Yonsei University
Albina Y. Borisevich
Albina Y. Borisevich Oak Ridge National Laboratory
Byungkyu Kim
Byungkyu Kim Korea Aerospace University

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