Wmm Erwin Kessels

Wmm Erwin Kessels publication distribution in Materials Science in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Wmm Erwin Kessels sits on this spectrum.

Wmm Erwin Kessels D-index placement in Materials Science in 2026

The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Wmm Erwin Kessels sits on this spectrum.

Overview

Best Publications

• Plasma-Assisted Atomic Layer Deposition: Basics, Opportunities, and Challenges

  HB Harald Profijt;SE Stephen Potts;van de Mcm Richard Sanden;Wmm Erwin Kessels

  1101
  Citations

• Ultralow surface recombination of c-Si substrates passivated by plasma-assisted atomic layer deposited Al2O3

  B Bram Hoex;Sbs Stephan Heil;E Erik Langereis;van de Mcm Richard Sanden

  942
  Citations

• Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells

  G Gijs Dingemans;Wmm Erwin Kessels

  940
  Citations

• On the c-Si surface passivation mechanism by the negative-charge-dielectric Al2O3

  B Bram Hoex;Jjh Joost Gielis;van de Mcm Richard Sanden;Wmm Erwin Kessels

  739
  Citations

• Silicon surface passivation by atomic layer deposited Al2O3

  B Bram Hoex;J Jeroen Schmidt;P Pohl;van de Mcm Richard Sanden

  611
  Citations

• Surface passivation of high‐efficiency silicon solar cells by atomic‐layer‐deposited Al2O3

  J Jeroen Schmidt;A Merkle;R Brendel;B Bram Hoex

  600
  Citations

• Excellent passivation of highly doped p-type Si surfaces by the negative-charge-dielectric Al2O3

  B Bram Hoex;J Jeroen Schmidt;R Bock;PP Altermatt

  577
  Citations

• Determining the material structure of microcrystalline silicon from Raman spectra

  C Chiel Smit;van Racmm René Swaaij;H Donker;Amhn Petit

  478
  Citations

• The use of atomic layer deposition in advanced nanopatterning

  Ajm Adrie Mackus;AA Ageeth Bol;Wmm Erwin Kessels

  420
  Citations

• In situ spectroscopic ellipsometry as a versatile tool for studying atomic layer deposition

  E Erik Langereis;Sbs Stephan Heil;Hcm Harm Knoops;W Wytze Keuning

  396
  Citations

• Plasma and thermal ALD of Al2O3 in a commercial 200 mm ALD reactor

  van Jl Hans Hemmen;Sbs Stephan Heil;JH Klootwijk;F Fred Roozeboom

  361
  Citations

• Vacancies and voids in hydrogenated amorphous silicon

  Ahm Arno Smets;Wmm Erwin Kessels;van de Mcm Richard Sanden

  347
  Citations

• Low temperature plasma-enhanced atomic layer deposition of metal oxide thin films

  SE Stephen Potts;W Wytze Keuning;E Erik Langereis;G Gijs Dingemans

  300
  Citations

• Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD

  G Gijs Dingemans;van de Mcm Richard Sanden;Wmm Erwin Kessels

  258
  Citations

• Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition

  G Gijs Dingemans;R Seguin;P Engelhart;van de Mcm Richard Sanden

  249
  Citations

• Hydrogen induced passivation of Si interfaces by Al2O3 films and SiO2/Al2O3 stacks

  G Gijs Dingemans;W Beyer;van de Mcm Richard Sanden;Wmm Erwin Kessels

  234
  Citations

• Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes

  Ajm Adrie Mackus;Sbs Stephan Heil;E Erik Langereis;Hcm Harm Knoops

  225
  Citations

• Conformality of Plasma-Assisted ALD: Physical Processes and Modeling

  Hcm Harm Knoops;E Erik Langereis;van de Mcm Richard Sanden;Wmm Erwin Kessels

  223
  Citations

• Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3

  G Gijs Dingemans;NM Nick Terlinden;D Pierreux;HB Harald Profijt

  221
  Citations

• Negative charge and charging dynamics in Al2O3 films on Si characterized by second-harmonic generation

  Jjh Joost Gielis;B Bram Hoex;van de Mcm Richard Sanden;Wmm Erwin Kessels

  211
  Citations