Wmm Erwin Kessels

Overview

Best Publications

• Plasma-Assisted Atomic Layer Deposition: Basics, Opportunities, and Challenges

  HB Harald Profijt;SE Stephen Potts;van de Mcm Richard Sanden;Wmm Erwin Kessels

  1101
  Citations

• Ultralow surface recombination of c-Si substrates passivated by plasma-assisted atomic layer deposited Al2O3

  B Bram Hoex;Sbs Stephan Heil;E Erik Langereis;van de Mcm Richard Sanden

  942
  Citations

• Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells

  G Gijs Dingemans;Wmm Erwin Kessels

  940
  Citations

• On the c-Si surface passivation mechanism by the negative-charge-dielectric Al2O3

  B Bram Hoex;Jjh Joost Gielis;van de Mcm Richard Sanden;Wmm Erwin Kessels

  739
  Citations

• Silicon surface passivation by atomic layer deposited Al2O3

  B Bram Hoex;J Jeroen Schmidt;P Pohl;van de Mcm Richard Sanden

  611
  Citations

• Surface passivation of high‐efficiency silicon solar cells by atomic‐layer‐deposited Al2O3

  J Jeroen Schmidt;A Merkle;R Brendel;B Bram Hoex

  600
  Citations

• Excellent passivation of highly doped p-type Si surfaces by the negative-charge-dielectric Al2O3

  B Bram Hoex;J Jeroen Schmidt;R Bock;PP Altermatt

  577
  Citations

• Determining the material structure of microcrystalline silicon from Raman spectra

  C Chiel Smit;van Racmm René Swaaij;H Donker;Amhn Petit

  478
  Citations

• The use of atomic layer deposition in advanced nanopatterning

  Ajm Adrie Mackus;AA Ageeth Bol;Wmm Erwin Kessels

  420
  Citations

• In situ spectroscopic ellipsometry as a versatile tool for studying atomic layer deposition

  E Erik Langereis;Sbs Stephan Heil;Hcm Harm Knoops;W Wytze Keuning

  396
  Citations

• Plasma and thermal ALD of Al2O3 in a commercial 200 mm ALD reactor

  van Jl Hans Hemmen;Sbs Stephan Heil;JH Klootwijk;F Fred Roozeboom

  361
  Citations

• Vacancies and voids in hydrogenated amorphous silicon

  Ahm Arno Smets;Wmm Erwin Kessels;van de Mcm Richard Sanden

  347
  Citations

• Low temperature plasma-enhanced atomic layer deposition of metal oxide thin films

  SE Stephen Potts;W Wytze Keuning;E Erik Langereis;G Gijs Dingemans

  300
  Citations

• Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD

  G Gijs Dingemans;van de Mcm Richard Sanden;Wmm Erwin Kessels

  258
  Citations

• Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition

  G Gijs Dingemans;R Seguin;P Engelhart;van de Mcm Richard Sanden

  249
  Citations

• Hydrogen induced passivation of Si interfaces by Al2O3 films and SiO2/Al2O3 stacks

  G Gijs Dingemans;W Beyer;van de Mcm Richard Sanden;Wmm Erwin Kessels

  234
  Citations

• Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes

  Ajm Adrie Mackus;Sbs Stephan Heil;E Erik Langereis;Hcm Harm Knoops

  225
  Citations

• Conformality of Plasma-Assisted ALD: Physical Processes and Modeling

  Hcm Harm Knoops;E Erik Langereis;van de Mcm Richard Sanden;Wmm Erwin Kessels

  223
  Citations

• Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3

  G Gijs Dingemans;NM Nick Terlinden;D Pierreux;HB Harald Profijt

  221
  Citations

• Negative charge and charging dynamics in Al2O3 films on Si characterized by second-harmonic generation

  Jjh Joost Gielis;B Bram Hoex;van de Mcm Richard Sanden;Wmm Erwin Kessels

  211
  Citations