World's Best Scientists 2026 revealed!

D-Index & Metrics

Materials Science

D-Index
57
Citations
10866
World Ranking
8000
National Ranking
464

Friedhelm Finger publication distribution in Materials Science in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Friedhelm Finger sits on this spectrum.

50–69 publications: 28 scientists 70–89 publications: 152 scientists 90–109 publications: 356 scientists 110–129 publications: 487 scientists 130–149 publications: 723 scientists 150–169 publications: 835 scientists 170–189 publications: 850 scientists 190–209 publications: 891 scientists 210–229 publications: 862 scientists 230–249 publications: 766 scientists 250–269 publications: 726 scientists 270–289 publications: 665 scientists 290–309 publications: 593 scientists 310–329 publications: 537 scientists 330–349 publications: 477 scientists 350–369 publications: 440 scientists 370–389 publications: 356 scientists 390–409 publications: 321 scientists 410–429 publications: 256 scientists 430–449 publications: 246 scientists 450–469 publications: 216 scientists 470–489 publications: 212 scientists 490–509 publications: 174 scientists 510–529 publications: 194 scientists 530–549 publications: 162 scientists 550–569 publications: 131 scientists 570–589 publications: 111 scientists 590–609 publications: 103 scientists 610–629 publications: 99 scientists 630–649 publications: 77 scientists 650–669 publications: 92 scientists 670–689 publications: 56 scientists 690–709 publications: 53 scientists 710–729 publications: 53 scientists 730–749 publications: 38 scientists 750–769 publications: 52 scientists 770–789 publications: 43 scientists 790–809 publications: 38 scientists 810–829 publications: 34 scientists 830–849 publications: 25 scientists 850–869 publications: 18 scientists 870–889 publications: 20 scientists 890–909 publications: 24 scientists 910–929 publications: 27 scientists 930–949 publications: 20 scientists 950–969 publications: 17 scientists 970–989 publications: 10 scientists 990–1,009 publications: 16 scientists 1,010–1,029 publications: 13 scientists 1,030–1,049 publications: 12 scientists 1,050–1,069 publications: 9 scientists 1,070–1,089 publications: 8 scientists 1,090–1,109 publications: 7 scientists 1,110–1,129 publications: 9 scientists 1,130–1,149 publications: 2 scientists 1,150–1,162 publications: 5 scientists 1,163+ publications: 100 scientists
50 publications 1,163+

This scientist: 389 publications — 76th percentile

76% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,163 publications or more.

Friedhelm Finger D-index placement in Materials Science in 2026

The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Friedhelm Finger sits on this spectrum.

40–41 D-Index: 211 scientists 42–43 D-Index: 450 scientists 44–45 D-Index: 612 scientists 46–47 D-Index: 612 scientists 48–49 D-Index: 598 scientists 50–51 D-Index: 657 scientists 52–53 D-Index: 667 scientists 54–55 D-Index: 621 scientists 56–57 D-Index: 597 scientists 58–59 D-Index: 610 scientists 60–61 D-Index: 587 scientists 62–63 D-Index: 606 scientists 64–65 D-Index: 533 scientists 66–67 D-Index: 490 scientists 68–69 D-Index: 469 scientists 70–71 D-Index: 378 scientists 72–73 D-Index: 421 scientists 74–75 D-Index: 359 scientists 76–77 D-Index: 323 scientists 78–79 D-Index: 299 scientists 80–81 D-Index: 230 scientists 82–83 D-Index: 210 scientists 84–85 D-Index: 195 scientists 86–87 D-Index: 203 scientists 88–89 D-Index: 175 scientists 90–91 D-Index: 175 scientists 92–93 D-Index: 142 scientists 94–95 D-Index: 121 scientists 96–97 D-Index: 117 scientists 98–99 D-Index: 107 scientists 100–101 D-Index: 88 scientists 102–103 D-Index: 85 scientists 104–105 D-Index: 68 scientists 106–107 D-Index: 62 scientists 108–109 D-Index: 57 scientists 110–111 D-Index: 45 scientists 112–113 D-Index: 49 scientists 114–115 D-Index: 50 scientists 116–117 D-Index: 34 scientists 118–119 D-Index: 38 scientists 120–121 D-Index: 37 scientists 122–123 D-Index: 29 scientists 124–125 D-Index: 28 scientists 126–127 D-Index: 24 scientists 128–129 D-Index: 33 scientists 130–131 D-Index: 28 scientists 132–133 D-Index: 21 scientists 134–135 D-Index: 20 scientists 136–137 D-Index: 23 scientists 138–139 D-Index: 17 scientists 140–141 D-Index: 12 scientists 142–143 D-Index: 17 scientists 144–145 D-Index: 21 scientists 146–147 D-Index: 13 scientists 148–149 D-Index: 11 scientists 150–151 D-Index: 14 scientists 152–153 D-Index: 13 scientists 154–155 D-Index: 9 scientists 156–157 D-Index: 10 scientists 158–159 D-Index: 7 scientists 160–161 D-Index: 4 scientists 162–163 D-Index: 4 scientists 164 D-Index: 3 scientists 165+ D-Index: 98 scientists
40 D-Index 165+

This scientist: 57 D-Index — 39th percentile

39% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 165 D-Index or more.

Overview

Friedhelm Finger is affiliated with Forschungszentrum Jülich in Germany. Their research primarily focuses on engineering, materials science, and energy, with specific attention to electrical and electronic engineering, materials chemistry, and renewable energy and sustainability. The subfields also include atomic and molecular physics, optics, and computational mechanics.

The scientist's work concentrates on several main topics:

  • Silicon and Solar Cell Technologies
  • Thin-Film Transistor Technologies
  • Silicon Nanostructures and Photoluminescence
  • Electrocatalysts for Energy Conversion
  • Advanced Photocatalysis Techniques
  • Semiconductor materials and devices
  • Semiconductor materials and interfaces

Frequent coauthors in their publications include:

  • Uwe Rau
  • Vladimir Smirnov
  • Manuel Pomaska
  • Shenghao Li
  • Kaining Ding

Typical publication venues for Friedhelm Finger are diverse, with repeated contributions to journals such as:

  • physica status solidi (a)
  • Progress in Photovoltaics Research and Applications
  • Zeitschrift für Physikalische Chemie
  • ACS Applied Materials & Interfaces
  • Nature Energy

Some recent papers authored by or involving Friedhelm Finger include:

  • A silicon carbide-based highly transparent passivating contact for crystalline silicon solar cells approaching efficiencies of 24%, 2021, Nature Energy
  • Transparent-conductive-oxide-free front contacts for high-efficiency silicon heterojunction solar cells, 2021, Joule
  • Bifunctional CoFeVOx Catalyst for Solar Water Splitting by using Multijunction and Heterojunction Silicon Solar Cells, 2020, Advanced Materials Technologies
  • Transparent silicon carbide/tunnel SiO2 passivation for c-Si solar cell front side: Enabling Jsc > 42 mA/cm2 and iVoc of 742 mV, 2020, Progress in Photovoltaics Research and Applications
  • A Bias-Free, Stand-Alone, and Scalable Photovoltaic-Electrochemical Device for Solar Hydrogen Production, 2020, Advanced Sustainable Systems

Best Publications

  • Intrinsic microcrystalline silicon: A new material for photovoltaics

    O Vetterl;F Finger;R Carius;P Hapke

  • Structural properties of microcrystalline silicon in the transition from highly crystalline to amorphous growth

    L. Houben;M. Luysberg;P. Hapke;R. Carius

  • Microcrystalline silicon solar cells deposited at high rates

    Y. Mai;S. Klein;R. Carius;J. Wolff

  • Multijunction Si photocathodes with tunable photovoltages from 2.0 V to 2.8 V for light induced water splitting

    Félix Urbain;Vladimir Smirnov;Jan-Philipp Becker;Andreas Lambertz

  • Frequency effects in silane plasmas for plasma enhanced chemical vapor deposition

    A. A. Howling;J.‐L. Dorier;Ch. Hollenstein;U. Kroll

  • Improvement of grain size and deposition rate of microcrystalline silicon by use of very high frequency glow discharge

    F. Finger;P. Hapke;M. Luysberg;R. Carius

  • How to reach more precise interpretation of subgap absorption spectra in terms of deep defect density in a-Si:H

    N. Wyrsch;F. Finger;T.J. McMahon;M. Vanecek

  • New materials and deposition techniques for highly efficient silicon thin film solar cells

    B Rech;O Kluth;T Repmann;T Roschek

  • Intrinsic microcrystalline silicon prepared by hot-wire chemical vapour deposition for thin film solar cells

    Stefan Klein;Stefan Klein;Friedhelm Finger;Reinhard Carius;Thorsten Dylla

  • A silicon carbide-based highly transparent passivating contact for crystalline silicon solar cells approaching efficiencies of 24%

    Malte Köhler;Malte Köhler;Manuel Pomaska;Paul Procel;Rudi Santbergen

  • Deposition of microcrystalline silicon prepared by hot-wire chemical-vapor deposition: The influence of the deposition parameters on the material properties and solar cell performance

    Stefan Klein;Friedhelm Finger;Reinhard Carius;Martin Stutzmann

  • Hydrogenated amorphous silicon oxide containing a microcrystalline silicon phase and usage as an intermediate reflector in thin-film silicon solar cells

    A. Lambertz;T. Grundler;F. Finger

  • Structure and growth of hydrogenated microcrystalline silicon : investigation by transmission electron microscopy and Raman spectroscopy of films grown at different plasma excitation frequencies

    M. Luysberg;P. Hapke;R. Carius;F. Finger

  • Upscaling of integrated photoelectrochemical water-splitting devices to large areas

    Bugra Turan;Jan-Philipp Becker;Félix Urbain;Friedhelm Finger

  • Microcrystalline silicon-oxygen alloys for application in silicon solar cells and modules

    A Lambertz;V Smirnov;T Merdzhanova;K Kang Ding

  • Influences of a high excitation frequency (70 MHz) in the glow discharge technique on the process plasma and the properties of hydrogenated amorphous silicon

    F. Finger;U. Kroll;V. Viret;Arvind Shah

  • Development of highly efficient thin film silicon solar cells on texture-etched zinc oxide-coated glass substrates

    J Müller;O Kluth;S Wieder;H Siekmann

  • Optical and transport studies on thin microcrystalline silicon films prepared by very high frequency glow discharge for solar cell applications

    M. Tzolov;F. Finger;R. Carius;P. Hapke

  • Open circuit voltage improvement of high-deposition-rate microcrystalline silicon solar cells by hot wire interface layers

    Y Mai;S Klein;R Carius;Helmut Stiebig

  • Improved high-temperature stability of Si incorporated a-C:H films

    S.S Camargo;A.L Baia Neto;A.L Baia Neto;R.A Santos;F.L Freire

  • Relation between mechanical and structural properties of silicon-incorporated hard a-C:H films

    A.L. Baia Neto;A.L. Baia Neto;R.A. Santos;F.L. Freire;S.S. Camargo

Frequent Co-Authors

Uwe Rau
Uwe Rau Forschungszentrum Jülich
Lothar Houben
Lothar Houben Weizmann Institute of Science
Wolfram Jaegermann
Wolfram Jaegermann Technical University of Darmstadt
Bernd Rech
Bernd Rech Helmholtz-Zentrum Berlin für Materialien und Energie
Helmut Stiebig
Helmut Stiebig Bielefeld University
Martin Stutzmann
Martin Stutzmann Technical University of Munich
Thomas Kirchartz
Thomas Kirchartz Forschungszentrum Jülich
Deren Yang
Deren Yang Zhejiang University
Ulrich W. Paetzold
Ulrich W. Paetzold Karlsruhe Institute of Technology
Robert Bittl
Robert Bittl Freie Universität Berlin

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