World's Best Scientists 2026 revealed!
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Materials Science
Germany
2022

D-Index & Metrics

Materials Science

D-Index
98
Citations
43343
World Ranking
1140
National Ranking
64

Physics

D-Index
98
Citations
43172
World Ranking
1738
National Ranking
148

Martin Stutzmann publication distribution in Materials Science in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Martin Stutzmann sits on this spectrum.

50–69 publications: 28 scientists 70–89 publications: 152 scientists 90–109 publications: 356 scientists 110–129 publications: 487 scientists 130–149 publications: 723 scientists 150–169 publications: 835 scientists 170–189 publications: 850 scientists 190–209 publications: 891 scientists 210–229 publications: 862 scientists 230–249 publications: 766 scientists 250–269 publications: 726 scientists 270–289 publications: 665 scientists 290–309 publications: 593 scientists 310–329 publications: 537 scientists 330–349 publications: 477 scientists 350–369 publications: 440 scientists 370–389 publications: 356 scientists 390–409 publications: 321 scientists 410–429 publications: 256 scientists 430–449 publications: 246 scientists 450–469 publications: 216 scientists 470–489 publications: 212 scientists 490–509 publications: 174 scientists 510–529 publications: 194 scientists 530–549 publications: 162 scientists 550–569 publications: 131 scientists 570–589 publications: 111 scientists 590–609 publications: 103 scientists 610–629 publications: 99 scientists 630–649 publications: 77 scientists 650–669 publications: 92 scientists 670–689 publications: 56 scientists 690–709 publications: 53 scientists 710–729 publications: 53 scientists 730–749 publications: 38 scientists 750–769 publications: 52 scientists 770–789 publications: 43 scientists 790–809 publications: 38 scientists 810–829 publications: 34 scientists 830–849 publications: 25 scientists 850–869 publications: 18 scientists 870–889 publications: 20 scientists 890–909 publications: 24 scientists 910–929 publications: 27 scientists 930–949 publications: 20 scientists 950–969 publications: 17 scientists 970–989 publications: 10 scientists 990–1,009 publications: 16 scientists 1,010–1,029 publications: 13 scientists 1,030–1,049 publications: 12 scientists 1,050–1,069 publications: 9 scientists 1,070–1,089 publications: 8 scientists 1,090–1,109 publications: 7 scientists 1,110–1,129 publications: 9 scientists 1,130–1,149 publications: 2 scientists 1,150–1,162 publications: 5 scientists 1,163+ publications: 100 scientists
50 publications 1,163+

This scientist: 778 publications — 97th percentile

97% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,163 publications or more.

Martin Stutzmann D-index placement in Materials Science in 2026

The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Martin Stutzmann sits on this spectrum.

40–41 D-Index: 211 scientists 42–43 D-Index: 450 scientists 44–45 D-Index: 612 scientists 46–47 D-Index: 612 scientists 48–49 D-Index: 598 scientists 50–51 D-Index: 657 scientists 52–53 D-Index: 667 scientists 54–55 D-Index: 621 scientists 56–57 D-Index: 597 scientists 58–59 D-Index: 610 scientists 60–61 D-Index: 587 scientists 62–63 D-Index: 606 scientists 64–65 D-Index: 533 scientists 66–67 D-Index: 490 scientists 68–69 D-Index: 469 scientists 70–71 D-Index: 378 scientists 72–73 D-Index: 421 scientists 74–75 D-Index: 359 scientists 76–77 D-Index: 323 scientists 78–79 D-Index: 299 scientists 80–81 D-Index: 230 scientists 82–83 D-Index: 210 scientists 84–85 D-Index: 195 scientists 86–87 D-Index: 203 scientists 88–89 D-Index: 175 scientists 90–91 D-Index: 175 scientists 92–93 D-Index: 142 scientists 94–95 D-Index: 121 scientists 96–97 D-Index: 117 scientists 98–99 D-Index: 107 scientists 100–101 D-Index: 88 scientists 102–103 D-Index: 85 scientists 104–105 D-Index: 68 scientists 106–107 D-Index: 62 scientists 108–109 D-Index: 57 scientists 110–111 D-Index: 45 scientists 112–113 D-Index: 49 scientists 114–115 D-Index: 50 scientists 116–117 D-Index: 34 scientists 118–119 D-Index: 38 scientists 120–121 D-Index: 37 scientists 122–123 D-Index: 29 scientists 124–125 D-Index: 28 scientists 126–127 D-Index: 24 scientists 128–129 D-Index: 33 scientists 130–131 D-Index: 28 scientists 132–133 D-Index: 21 scientists 134–135 D-Index: 20 scientists 136–137 D-Index: 23 scientists 138–139 D-Index: 17 scientists 140–141 D-Index: 12 scientists 142–143 D-Index: 17 scientists 144–145 D-Index: 21 scientists 146–147 D-Index: 13 scientists 148–149 D-Index: 11 scientists 150–151 D-Index: 14 scientists 152–153 D-Index: 13 scientists 154–155 D-Index: 9 scientists 156–157 D-Index: 10 scientists 158–159 D-Index: 7 scientists 160–161 D-Index: 4 scientists 162–163 D-Index: 4 scientists 164 D-Index: 3 scientists 165+ D-Index: 98 scientists
40 D-Index 165+

This scientist: 98 D-Index — 91st percentile

91% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 165 D-Index or more.

Research.com Recognitions

  • 2022 - Research.com Materials Science in Germany Leader Award
  • 2006 - Fellow of American Physical Society (APS) Citation For contributions to the microscopic understanding of electronic processes in semiconductors and the development of novel semiconductor devices

Overview

Martin Stutzmann is affiliated with the Technical University of Munich in Germany. Their research spans multiple fields, primarily focused on engineering, materials science, and physics and astronomy. Subfields of particular emphasis include electrical and electronic engineering, materials chemistry, condensed matter physics, electronic, optical and magnetic materials, and biomedical engineering.

The primary topics of Stutzmann's work cover a range of semiconductor materials and devices. Key areas include:

  • GaN-based semiconductor devices and materials
  • Semiconductor materials and devices
  • Ga2O3 and related materials
  • ZnO doping and properties
  • Nanowire synthesis and applications
  • Electronic and structural properties of oxides
  • Molecular junctions and nanostructures

The scientist has a record of frequent collaboration. Among their regular co-authors are Florian Pantle, Ian D. Sharp, Christoph Csoklich, Max Kraut, and Johannes D. Bartl.

Stutzmann has published in various journals multiple times, with recurrent publication venues including:

  • Journal of Applied Physics
  • The Journal of Physical Chemistry C
  • Nanoscale Advances
  • Nanotechnology
  • Advanced Materials Interfaces

Recent papers representative of their research contributions include:

  • "Crystal side facet-tuning of GaN nanowires and nanofins grown by molecular beam epitaxy," 2022, Journal of Applied Physics
  • "Atomic Layer Deposition and Strain Analysis of Epitaxial GaN-ZnO Core-Shell Nanowires," 2023, Nano Letters
  • "Selective area growth of GaN nanowires and nanofins by molecular beam epitaxy on heteroepitaxial diamond (001) substrates," 2021, Nanoscale Advances
  • "Sub-bandgap optical spectroscopy of epitaxial β-Ga2O3 thin films," 2020, Applied Physics Letters
  • "Silicon Nanoparticle Films Infilled with Al2O3 Using Atomic Layer Deposition for Photosensor, Light Emission, and Photovoltaic Applications," 2020, ACS Applied Nano Materials

In addition to journal articles, Stutzmann has contributed to book publications. Notably, one book titled "The Physics of Renewable Energy" was published by Springer Nature in 2022 and has received citations as well.

Recognition for Stutzmann's work includes being awarded the status of Fellow of the American Physical Society (APS) in 2006, with a citation highlighting contributions to the microscopic understanding of electronic processes in semiconductors and the development of novel semiconductor devices.

Best Publications

  • Two-dimensional electron gases induced by spontaneous and piezoelectric polarization charges in N- and Ga-face AlGaN/GaN heterostructures

    O. Ambacher;J. Smart;J. R. Shealy;N. G. Weimann

  • Two dimensional electron gases induced by spontaneous and piezoelectric polarization in undoped and doped AlGaN/GaN heterostructures

    O. Ambacher;B. Foutz;J. Smart;J. R. Shealy

  • Light-induced metastable defects in hydrogenated amorphous silicon: A systematic study.

    M. Stutzmann;W. B. Jackson;C. C. Tsai

  • Pyroelectric properties of Al(In)GaN/GaN hetero- and quantum well structures

    O Ambacher;J Majewski;C Miskys;A Link

  • The origin of visible luminescencefrom “porous silicon”: A new interpretation

    M.S. Brandt;H.D. Fuchs;M. Stutzmann;J. Weber

  • Optical constants of epitaxial AlGaN films and their temperature dependence

    D. Brunner;H. Angerer;E. Bustarret;F. Freudenberg

  • Defect structure of epitaxial GaN films determined by transmission electron microscopy and triple-axis X-ray diffractometry

    T. Metzger;R. Höpler;E. Born;O. Ambacher

  • Protein-modified nanocrystalline diamond thin films for biosensor applications

    Andreas Härtl;Evelyn Schmich;Jose A. Garrido;Jorge Hernando

  • Black nonreflecting silicon surfaces for solar cells

    Svetoslav Koynov;Martin S. Brandt;Martin Stutzmann

  • The defect density in amorphous silicon

    M. Stutzmann

  • Chemical control of the charge state of nitrogen-vacancy centers in diamond

    M. V. Hauf;B. Grotz;B. Naydenov;M. Dankerl

  • Large Free-Standing GaN Substrates by Hydride Vapor Phase Epitaxy and Laser-Induced Liftoff

    Michael K. Kelly;Robert P. Vaudo;Vivek M. Phanse;Lutz Görgens

  • Electronic components produced by a method of separating two layers of material from one another

    Michael Kelly;Oliver Ambacher;Martin Stutzmann;Martin Brandt

  • Thermal stability and desorption of Group III nitrides prepared by metal organic chemical vapor deposition

    O. Ambacher;M. S. Brandt;R. Dimitrov;T. Metzger

  • pH response of GaN surfaces and its application for pH-sensitive field-effect transistors

    G. Steinhoff;M. Hermann;W. J. Schaff;L. F. Eastman

  • Detailed investigation of doping in hydrogenated amorphous silicon and germanium.

    M Stutzmann;DK Biegelsen;RA Street

  • Determination of the Al mole fraction and the band gap bowing of epitaxial AlxGa1−xN films

    H. Angerer;D. Brunner;F. Freudenberg;O. Ambacher

  • Electronic properties of semiconducting FeSi2 films

    C. A. Dimitriadis;J. H. Werner;S. Logothetidis;M. Stutzmann

  • Sound velocity of AlxGa1−xN thin films obtained by surface acoustic-wave measurements

    C. Deger;Eberhard Born;Helmut Angerer;Oliver Ambacher

  • Electronic and optical properties of boron-doped nanocrystalline diamond films

    Wojciech Gajewski;Philipp Achatz;O. A. Williams;Ken Haenen

  • Influence of substrate‐induced biaxial compressive stress on the optical properties of thin GaN films

    W. Rieger;T. Metzger;H. Angerer;R. Dimitrov

Frequent Co-Authors

Martin S. Brandt
Martin S. Brandt Technical University of Munich
Oliver Ambacher
Oliver Ambacher University of Freiburg
Jose A. Garrido
Jose A. Garrido Institut Català de Nanociència i Nanotecnologia
Christoph E. Nebel
Christoph E. Nebel Diamond and Carbon Applications
Martin Eickhoff
Martin Eickhoff University of Bremen
Ian D. Sharp
Ian D. Sharp Technical University of Munich
Hartmut Wiggers
Hartmut Wiggers University of Duisburg-Essen
Warren B. Jackson
Warren B. Jackson Palo Alto Research Center
Oliver Aneurin Williams
Oliver Aneurin Williams Cardiff University
Friedhelm Finger
Friedhelm Finger Forschungszentrum Jülich

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