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Ian D. Sharp

D-Index & Metrics

Discipline name D-Index World Ranking Current World Ranking National Ranking Current National Ranking Publications Citations
Materials Science 62 6429 6216 374 362 245 15146

Ian D. Sharp publications per year

The chart shows the history of publications by Ian D. Sharp between 1994 and 2026, highlighting the no. of papers published in each year and offering an overview of the publication velocity of this scholar. Ian D. Sharp published across 33 years, from 1994 to 2026, averaging 11.7 papers a year. Output peaked at 54 publications in 2022. 23 of the 387 publications appeared in the last two years.

No. of publications
10 20 30 40 50
Bar chart. Horizontal axis: year, 1994 to 2026. Vertical axis: number of publications, 0 to 54. Peak 54 publications in 2022. 1994: 1 publication 1995: 0 publications 1996: 0 publications 1997: 0 publications 1998: 0 publications 1999: 0 publications 2000: 0 publications 2001: 0 publications 2002: 3 publications 2003: 4 publications 2004: 9 publications 2005: 11 publications 2006: 18 publications 2007: 10 publications 2008: 6 publications 2009: 20 publications 2010: 5 publications 2011: 10 publications 2012: 10 publications 2013: 12 publications 2014: 15 publications 2015: 16 publications 2016: 18 publications 2017: 20 publications 2018: 18 publications 2019: 24 publications 2020: 10 publications 2021: 16 publications 2022: 54 publications 2023: 20 publications 2024: 34 publications 2025: 22 publications 2026: 1 publication
1994 2026

387 publications in total across all disciplines

View publications per year as a table
Ian D. Sharp: publications per year, 1994 to 2026
Year Publications
1994 1
1995 0
1996 0
1997 0
1998 0
1999 0
2000 0
2001 0
2002 3
2003 4
2004 9
2005 11
2006 18
2007 10
2008 6
2009 20
2010 5
2011 10
2012 10
2013 12
2014 15
2015 16
2016 18
2017 20
2018 18
2019 24
2020 10
2021 16
2022 54
2023 20
2024 34
2025 22
2026 1
Total 387
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Ian D. Sharp publication distribution in Materials Science in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Ian D. Sharp sits on this spectrum.

No. of scientists
200 400 600 800
Bar chart with 57 bars. Horizontal axis: publications, 50–69 to 1,163+. Vertical axis: number of scientists, 0 to 891. Most scientists, 891, have 190–209 publications. The last bar groups every scientist with 1,163 publications or more. The highlighted bar, 230–249 publications, is where this scientist sits. 50–69 publications: 28 scientists 70–89 publications: 152 scientists 90–109 publications: 356 scientists 110–129 publications: 487 scientists 130–149 publications: 723 scientists 150–169 publications: 835 scientists 170–189 publications: 850 scientists 190–209 publications: 891 scientists 210–229 publications: 862 scientists 230–249 publications: 766 scientists 250–269 publications: 726 scientists 270–289 publications: 665 scientists 290–309 publications: 593 scientists 310–329 publications: 537 scientists 330–349 publications: 477 scientists 350–369 publications: 440 scientists 370–389 publications: 356 scientists 390–409 publications: 321 scientists 410–429 publications: 256 scientists 430–449 publications: 246 scientists 450–469 publications: 216 scientists 470–489 publications: 212 scientists 490–509 publications: 174 scientists 510–529 publications: 194 scientists 530–549 publications: 162 scientists 550–569 publications: 131 scientists 570–589 publications: 111 scientists 590–609 publications: 103 scientists 610–629 publications: 99 scientists 630–649 publications: 77 scientists 650–669 publications: 92 scientists 670–689 publications: 56 scientists 690–709 publications: 53 scientists 710–729 publications: 53 scientists 730–749 publications: 38 scientists 750–769 publications: 52 scientists 770–789 publications: 43 scientists 790–809 publications: 38 scientists 810–829 publications: 34 scientists 830–849 publications: 25 scientists 850–869 publications: 18 scientists 870–889 publications: 20 scientists 890–909 publications: 24 scientists 910–929 publications: 27 scientists 930–949 publications: 20 scientists 950–969 publications: 17 scientists 970–989 publications: 10 scientists 990–1,009 publications: 16 scientists 1,010–1,029 publications: 13 scientists 1,030–1,049 publications: 12 scientists 1,050–1,069 publications: 9 scientists 1,070–1,089 publications: 8 scientists 1,090–1,109 publications: 7 scientists 1,110–1,129 publications: 9 scientists 1,130–1,149 publications: 2 scientists 1,150–1,162 publications: 5 scientists 1,163+ publications: 100 scientists
50–69 publications 1,163+

This scientist: 245 publications — 45th percentile

45% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,163 publications or more.

View publications distribution as a table
Number of Materials Science scientists by publication count, Research.com 2026 ranking edition. Based on 12,847 ranked scientists.
Publications Scientists This scientist
50–69 28
70–89 152
90–109 356
110–129 487
130–149 723
150–169 835
170–189 850
190–209 891
210–229 862
230–249 766 245
250–269 726
270–289 665
290–309 593
310–329 537
330–349 477
350–369 440
370–389 356
390–409 321
410–429 256
430–449 246
450–469 216
470–489 212
490–509 174
510–529 194
530–549 162
550–569 131
570–589 111
590–609 103
610–629 99
630–649 77
650–669 92
670–689 56
690–709 53
710–729 53
730–749 38
750–769 52
770–789 43
790–809 38
810–829 34
830–849 25
850–869 18
870–889 20
890–909 24
910–929 27
930–949 20
950–969 17
970–989 10
990–1,009 16
1,010–1,029 13
1,030–1,049 12
1,050–1,069 9
1,070–1,089 8
1,090–1,109 7
1,110–1,129 9
1,130–1,149 2
1,150–1,162 5
1,163+ 100
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Ian D. Sharp D-index placement in Materials Science in 2026

The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Ian D. Sharp sits on this spectrum.

No. of scientists
200 400 600
Bar chart with 64 bars. Horizontal axis: D-Index, 40–41 to 165+. Vertical axis: number of scientists, 0 to 667. Most scientists, 667, have 52–53 D-Index. The last bar groups every scientist with 165 D-Index or more. The highlighted bar, 62–63 D-Index, is where this scientist sits. 40–41 D-Index: 211 scientists 42–43 D-Index: 450 scientists 44–45 D-Index: 612 scientists 46–47 D-Index: 612 scientists 48–49 D-Index: 598 scientists 50–51 D-Index: 657 scientists 52–53 D-Index: 667 scientists 54–55 D-Index: 621 scientists 56–57 D-Index: 597 scientists 58–59 D-Index: 610 scientists 60–61 D-Index: 587 scientists 62–63 D-Index: 606 scientists 64–65 D-Index: 533 scientists 66–67 D-Index: 490 scientists 68–69 D-Index: 469 scientists 70–71 D-Index: 378 scientists 72–73 D-Index: 421 scientists 74–75 D-Index: 359 scientists 76–77 D-Index: 323 scientists 78–79 D-Index: 299 scientists 80–81 D-Index: 230 scientists 82–83 D-Index: 210 scientists 84–85 D-Index: 195 scientists 86–87 D-Index: 203 scientists 88–89 D-Index: 175 scientists 90–91 D-Index: 175 scientists 92–93 D-Index: 142 scientists 94–95 D-Index: 121 scientists 96–97 D-Index: 117 scientists 98–99 D-Index: 107 scientists 100–101 D-Index: 88 scientists 102–103 D-Index: 85 scientists 104–105 D-Index: 68 scientists 106–107 D-Index: 62 scientists 108–109 D-Index: 57 scientists 110–111 D-Index: 45 scientists 112–113 D-Index: 49 scientists 114–115 D-Index: 50 scientists 116–117 D-Index: 34 scientists 118–119 D-Index: 38 scientists 120–121 D-Index: 37 scientists 122–123 D-Index: 29 scientists 124–125 D-Index: 28 scientists 126–127 D-Index: 24 scientists 128–129 D-Index: 33 scientists 130–131 D-Index: 28 scientists 132–133 D-Index: 21 scientists 134–135 D-Index: 20 scientists 136–137 D-Index: 23 scientists 138–139 D-Index: 17 scientists 140–141 D-Index: 12 scientists 142–143 D-Index: 17 scientists 144–145 D-Index: 21 scientists 146–147 D-Index: 13 scientists 148–149 D-Index: 11 scientists 150–151 D-Index: 14 scientists 152–153 D-Index: 13 scientists 154–155 D-Index: 9 scientists 156–157 D-Index: 10 scientists 158–159 D-Index: 7 scientists 160–161 D-Index: 4 scientists 162–163 D-Index: 4 scientists 164 D-Index: 3 scientists 165+ D-Index: 98 scientists
40–41 D-Index 165+

This scientist: 62 D-Index — 51st percentile

51% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 165 D-Index or more.

View D-Index distribution as a table
Number of Materials Science scientists by D-index, Research.com 2026 ranking edition. Based on 12,847 ranked scientists.
D-Index Scientists This scientist
40–41 211
42–43 450
44–45 612
46–47 612
48–49 598
50–51 657
52–53 667
54–55 621
56–57 597
58–59 610
60–61 587
62–63 606 62
64–65 533
66–67 490
68–69 469
70–71 378
72–73 421
74–75 359
76–77 323
78–79 299
80–81 230
82–83 210
84–85 195
86–87 203
88–89 175
90–91 175
92–93 142
94–95 121
96–97 117
98–99 107
100–101 88
102–103 85
104–105 68
106–107 62
108–109 57
110–111 45
112–113 49
114–115 50
116–117 34
118–119 38
120–121 37
122–123 29
124–125 28
126–127 24
128–129 33
130–131 28
132–133 21
134–135 20
136–137 23
138–139 17
140–141 12
142–143 17
144–145 21
146–147 13
148–149 11
150–151 14
152–153 13
154–155 9
156–157 10
158–159 7
160–161 4
162–163 4
164 3
165+ 98
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Overview

Ian D. Sharp is affiliated with the Technical University of Munich in Germany. Their research predominantly spans the fields of Materials Science and Engineering, with significant contributions to various subfields including Materials Chemistry, Electrical and Electronic Engineering, Renewable Energy, Sustainability and the Environment, as well as Genetics and Ecology, Evolution, Behavior, and Systematics.

The scientist's work covers multiple main topics such as Lepidoptera: Biology and Taxonomy, Advanced Photocatalysis Techniques, Electrocatalysts for Energy Conversion, Insect Pheromone Research and Control, Entomological Studies and Ecology, Electronic and Structural Properties of Oxides, and Semiconductor Materials and Devices.

Ian D. Sharp has published extensively across several notable venues. The most frequent publication venues include Metamorphosis, arXiv (Cornell University), Advanced Functional Materials, Advanced Energy Materials, and ACS Nano.

Coauthorship patterns reveal frequent collaboration with researchers Allison Sharp, Hermann S. Staude, Marion Maclean, Silvia Mecenero, and Rudolph J. Pretorius.

Among their recent publications are:

  • Band structure engineering and defect control of Ta3N5 for efficient photoelectrochemical water oxidation, 2020, Nature Catalysis
  • A self-healing catalyst for electrocatalytic and photoelectrochemical oxygen evolution in highly alkaline conditions, 2021, Nature Communications
  • The 2022 solar fuels roadmap, 2022, Journal of Physics D Applied Physics
  • Identifying Performance-Limiting Deep Traps in Ta3N5 for Solar Water Splitting, 2020, ACS Catalysis
  • Bright circularly polarized photoluminescence in chiral layered hybrid lead-halide perovskites, 2023, Science Advances

Best Publications

  • Scalable water splitting on particulate photocatalyst sheets with a solar-to-hydrogen energy conversion efficiency exceeding 1%

    Qian Wang;Takashi Hisatomi;Qingxin Jia;Hiromasa Tokudome

  • Experimental demonstrations of spontaneous, solar-driven photoelectrochemical water splitting

    Joel W. Ager;Matthew R. Shaner;Karl A. Walczak;Ian D. Sharp

  • Hole Selective MoOx Contact for Silicon Solar Cells

    Corsin Battaglia;Xingtian Yin;Xingtian Yin;Xingtian Yin;Maxwell Zheng;Maxwell Zheng;Ian D. Sharp

  • Electronic Structure of Monoclinic BiVO4

    Jason K. Cooper;Sheraz Gul;Francesca M. Toma;Le Chen

  • Facet-dependent photovoltaic efficiency variations in single grains of hybrid halide perovskite

    Sibel Y. Leblebici;Sibel Y. Leblebici;Linn Leppert;Linn Leppert;Yanbo Li;Sebastian E. Reyes-Lillo;Sebastian E. Reyes-Lillo

  • High Photoluminescence Quantum Yield in Band Gap Tunable Bromide Containing Mixed Halide Perovskites

    Carolin M. Sutter-Fella;Yanbo Li;Matin Amani;Joel W. Ager

  • Band structure engineering and defect control of Ta3N5 for efficient photoelectrochemical water oxidation

    Yequan Xiao;Chao Feng;Jie Fu;Faze Wang;Faze Wang

  • Tunable electrical conductivity in oriented thin films of tetrathiafulvalene-based covalent organic framework

    Song-Liang Cai;Song-Liang Cai;Yue-Biao Zhang;Yue-Biao Zhang;Andrew B. Pun;Bo He

  • Mechanistic insights into chemical and photochemical transformations of bismuth vanadate photoanodes

    Francesca M. Toma;Jason K. Cooper;Viktoria Kunzelmann;Viktoria Kunzelmann;Matthew T. McDowell;Matthew T. McDowell

  • Understanding the Oxygen Evolution Reaction Mechanism on CoOx using Operando Ambient-Pressure X-ray Photoelectron Spectroscopy

    Marco Favaro;Jinhui Yang;Silvia Nappini;Elena Magnano

  • Indirect Bandgap and Optical Properties of Monoclinic Bismuth Vanadate

    Jason K. Cooper;Sheraz Gul;Francesca M. Toma;Le Chen

  • Hole Selective MoO x Contact for Silicon Solar Cells

    Corsin Battaglia;Xingtian Yin;Maxwell Zheng;Ian D. Sharp

  • Graphene Transistor Arrays for Recording Action Potentials from Electrogenic Cells

    Lucas H. Hess;Michael Jansen;Vanessa Maybeck;Moritz V. Hauf

  • Ground-Based Wireless Positioning

    Kegen Yu;Ian Sharp;Y. Jay Guo;Y. Jay Guo

  • A multifunctional biphasic water splitting catalyst tailored for integration with high-performance semiconductor photoanodes

    Jinhui Yang;Jason K. Cooper;Francesca M. Toma;Karl A. Walczak

  • Efficient and sustained photoelectrochemical water oxidation by cobalt oxide/silicon photoanodes with nanotextured interfaces.

    Jinhui Yang;Karl Walczak;Eitan Anzenberg;Francesca M. Toma

  • Life-cycle net energy assessment of large-scale hydrogen production via photoelectrochemical water splitting

    Roger Sathre;Corinne D. Scown;William R. Morrow;John C. Stevens

  • Interfacial band-edge energetics for solar fuels production

    Wilson A. Smith;Ian D. Sharp;Nicholas C. Strandwitz;Juan Bisquert;Juan Bisquert

  • The Technical and Energetic Challenges of Separating (Photo)Electrochemical Carbon Dioxide Reduction Products

    Jeffery B. Greenblatt;Daniel J. Miller;Joel W. Ager;Frances A. Houle

  • Reactive Sputtering of Bismuth Vanadate Photoanodes for Solar Water Splitting

    Le Chen;Esther Alarcón-Lladó;Esther Alarcón-Lladó;Mark Hettick;Mark Hettick;Ian D. Sharp

  • Graphene Solution‐Gated Field‐Effect Transistor Array for Sensing Applications

    Markus Dankerl;Moritz V. Hauf;Andreas Lippert;Lucas H. Hess

Frequent Co-Authors

Joel W. Ager
Joel W. Ager Lawrence Berkeley National Laboratory
Francesca M. Toma
Francesca M. Toma Lawrence Berkeley National Laboratory
Eugene E. Haller
Eugene E. Haller Lawrence Berkeley National Laboratory
Martin Stutzmann
Martin Stutzmann Technical University of Munich
Daryl C. Chrzan
Daryl C. Chrzan University of California, Berkeley
Kin Man Yu
Kin Man Yu City University of Hong Kong
Ali Javey
Ali Javey University of California, Berkeley
Jeffrey B. Neaton
Jeffrey B. Neaton University of California, Berkeley
Jose A. Garrido
Jose A. Garrido Institut Català de Nanociència i Nanotecnologia
Andrew M. Minor
Andrew M. Minor University of California, Berkeley

External Links

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Best Scientists Citing Ian D. Sharp

Kazunari Domen

Kazunari Domen

University of Tokyo

Publications: 84

Joel W. Ager

Joel W. Ager

Lawrence Berkeley National Laboratory

Publications: 52

Can Li

Can Li

Dalian Institute of Chemical Physics

Publications: 42

Roel van de Krol

Roel van de Krol

Helmholtz-Zentrum Berlin für Materialien und Energie

Publications: 36

Nathan S. Lewis

Nathan S. Lewis

California Institute of Technology

Publications: 36

Takashi Hisatomi

Takashi Hisatomi

Shinshu University

Publications: 36

Tsutomu Minegishi

Tsutomu Minegishi

University of Tokyo

Publications: 35

Ali Javey

Ali Javey

University of California, Berkeley

Publications: 31

Licheng Sun

Licheng Sun

Royal Institute of Technology

Publications: 30

Jose A. Garrido

Jose A. Garrido

Institut Català de Nanociència i Nanotecnologia

Publications: 29

Erwin Reisner

Erwin Reisner

University of Cambridge

Publications: 26

Kin Man Yu

Kin Man Yu

City University of Hong Kong

Publications: 25

Hui-Ming Cheng

Hui-Ming Cheng

Shenzhen Institutes of Advanced Technology

Publications: 24

Eugene E. Haller

Eugene E. Haller

Lawrence Berkeley National Laboratory

Publications: 24

Antonio Luque

Antonio Luque

Technical University of Madrid

Publications: 24

Martin Stutzmann

Martin Stutzmann

Technical University of Munich

Publications: 23

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