World's Best Scientists 2026 revealed!
Michio Kondo

Michio Kondo

D-Index & Metrics

Materials Science

D-Index
72
Citations
16566
World Ranking
4100
National Ranking
183

Michio Kondo publication distribution in Materials Science in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Michio Kondo sits on this spectrum.

50–69 publications: 28 scientists 70–89 publications: 152 scientists 90–109 publications: 356 scientists 110–129 publications: 487 scientists 130–149 publications: 723 scientists 150–169 publications: 835 scientists 170–189 publications: 850 scientists 190–209 publications: 891 scientists 210–229 publications: 862 scientists 230–249 publications: 766 scientists 250–269 publications: 726 scientists 270–289 publications: 665 scientists 290–309 publications: 593 scientists 310–329 publications: 537 scientists 330–349 publications: 477 scientists 350–369 publications: 440 scientists 370–389 publications: 356 scientists 390–409 publications: 321 scientists 410–429 publications: 256 scientists 430–449 publications: 246 scientists 450–469 publications: 216 scientists 470–489 publications: 212 scientists 490–509 publications: 174 scientists 510–529 publications: 194 scientists 530–549 publications: 162 scientists 550–569 publications: 131 scientists 570–589 publications: 111 scientists 590–609 publications: 103 scientists 610–629 publications: 99 scientists 630–649 publications: 77 scientists 650–669 publications: 92 scientists 670–689 publications: 56 scientists 690–709 publications: 53 scientists 710–729 publications: 53 scientists 730–749 publications: 38 scientists 750–769 publications: 52 scientists 770–789 publications: 43 scientists 790–809 publications: 38 scientists 810–829 publications: 34 scientists 830–849 publications: 25 scientists 850–869 publications: 18 scientists 870–889 publications: 20 scientists 890–909 publications: 24 scientists 910–929 publications: 27 scientists 930–949 publications: 20 scientists 950–969 publications: 17 scientists 970–989 publications: 10 scientists 990–1,009 publications: 16 scientists 1,010–1,029 publications: 13 scientists 1,030–1,049 publications: 12 scientists 1,050–1,069 publications: 9 scientists 1,070–1,089 publications: 8 scientists 1,090–1,109 publications: 7 scientists 1,110–1,129 publications: 9 scientists 1,130–1,149 publications: 2 scientists 1,150–1,162 publications: 5 scientists 1,163+ publications: 100 scientists
50 publications 1,163+

This scientist: 503 publications — 87th percentile

87% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,163 publications or more.

Michio Kondo D-index placement in Materials Science in 2026

The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Michio Kondo sits on this spectrum.

40–41 D-Index: 211 scientists 42–43 D-Index: 450 scientists 44–45 D-Index: 612 scientists 46–47 D-Index: 612 scientists 48–49 D-Index: 598 scientists 50–51 D-Index: 657 scientists 52–53 D-Index: 667 scientists 54–55 D-Index: 621 scientists 56–57 D-Index: 597 scientists 58–59 D-Index: 610 scientists 60–61 D-Index: 587 scientists 62–63 D-Index: 606 scientists 64–65 D-Index: 533 scientists 66–67 D-Index: 490 scientists 68–69 D-Index: 469 scientists 70–71 D-Index: 378 scientists 72–73 D-Index: 421 scientists 74–75 D-Index: 359 scientists 76–77 D-Index: 323 scientists 78–79 D-Index: 299 scientists 80–81 D-Index: 230 scientists 82–83 D-Index: 210 scientists 84–85 D-Index: 195 scientists 86–87 D-Index: 203 scientists 88–89 D-Index: 175 scientists 90–91 D-Index: 175 scientists 92–93 D-Index: 142 scientists 94–95 D-Index: 121 scientists 96–97 D-Index: 117 scientists 98–99 D-Index: 107 scientists 100–101 D-Index: 88 scientists 102–103 D-Index: 85 scientists 104–105 D-Index: 68 scientists 106–107 D-Index: 62 scientists 108–109 D-Index: 57 scientists 110–111 D-Index: 45 scientists 112–113 D-Index: 49 scientists 114–115 D-Index: 50 scientists 116–117 D-Index: 34 scientists 118–119 D-Index: 38 scientists 120–121 D-Index: 37 scientists 122–123 D-Index: 29 scientists 124–125 D-Index: 28 scientists 126–127 D-Index: 24 scientists 128–129 D-Index: 33 scientists 130–131 D-Index: 28 scientists 132–133 D-Index: 21 scientists 134–135 D-Index: 20 scientists 136–137 D-Index: 23 scientists 138–139 D-Index: 17 scientists 140–141 D-Index: 12 scientists 142–143 D-Index: 17 scientists 144–145 D-Index: 21 scientists 146–147 D-Index: 13 scientists 148–149 D-Index: 11 scientists 150–151 D-Index: 14 scientists 152–153 D-Index: 13 scientists 154–155 D-Index: 9 scientists 156–157 D-Index: 10 scientists 158–159 D-Index: 7 scientists 160–161 D-Index: 4 scientists 162–163 D-Index: 4 scientists 164 D-Index: 3 scientists 165+ D-Index: 98 scientists
40 D-Index 165+

This scientist: 72 D-Index — 69th percentile

69% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 165 D-Index or more.

Overview

Michio Kondo is affiliated with Waseda University in Japan and has contributed to the field of engineering through research primarily focused on electrical, electronic, and mechanical engineering. Their work spans several subfields including renewable energy, sustainability, catalysis, and polymers and plastics.

The research topics that Michio Kondo has explored include:

  • Ionic liquids properties and applications
  • Transition Metal Oxide Nanomaterials
  • Solar Thermal and Photovoltaic Systems
  • Building Energy and Comfort Optimization
  • Advanced Memory and Neural Computing
  • Gas Sensing Nanomaterials and Sensors
  • Electrochemical Analysis and Applications

The scientist's publications have appeared mainly in the following venues:

  • Japanese Journal of Applied Physics
  • Journal of The Electrochemical Society
  • Chemistry Letters
  • Journal of Materials Science Materials in Electronics
  • Vacuum and Surface Science

Among the recent papers authored or co-authored by Michio Kondo are:

  • Highly efficient color-control technique for building-integrated photovoltaics using optical dielectric thin film, 2023, Japanese Journal of Applied Physics
  • Room-Temperature Preparation of Ta Ions-Containing Ionic Liquid and its Vapor Deposition toward Ta-Oxide Film Coating, 2022, Journal of The Electrochemical Society
  • A New Route to Carbon Film Coating by Anodic Electrodeposition from Ionic Liquid Containing Different Phenylsilane Derivatives, 2020, Chemistry Letters
  • Advanced damage-free neutral beam etching technology to texture Si wafer with honeycomb pattern for broadband light trapping in photovoltaics, 2021, Journal of Materials Science Materials in Electronics
  • Thin-film Silicon Growth by Plasma-enhanced CVD: Gas-phase, Surface and In-film Reactions for High-quality Film Formation, 2024, Vacuum and Surface Science

Michio Kondo has collaborated frequently with several researchers including Leo Adachi, Hiroyuki Wada, Sou Kubota, Hidetaka Takato, and Genki Hanashi, with multiple publications co-authored alongside these colleagues.

Best Publications

  • Photocatalytic generation of hydrogen by core-shell WO3/BiVO4 nanorods with ultimate water splitting efficiency

    Yuriy Pihosh;Ivan Turkevych;Kazuma Mawatari;Jin Uemura

  • Effects of carrier concentration on the dielectric function of ZnO:Ga and In 2 O 3 : Sn studied by spectroscopic ellipsometry: Analysis of free-carrier and band-edge absorption

    Hiroyuki Fujiwara;Michio Kondo

  • High rate growth of microcrystalline silicon at low temperatures

    Michio Kondo;Makoto Fukawa;Lihui Guo;Akihisa Matsuda

  • Impact of epitaxial growth at the heterointerface of a-Si:H∕c-Si solar cells

    Hiroyuki Fujiwara;Michio Kondo

  • HIGH RATE DEPOSITION OF MICROCRYSTALLINE SILICON USING CONVENTIONAL PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION

    Lihui Guo;Michio Kondo;Makoto Fukawa;Kimihiko Saitoh

  • Nature of doped a-Si:H / c-Si interface recombination

    Stefaan De Wolf;Michio Kondo

  • Abruptness of a-Si :H/c-Si interface revealed by carrier lifetime measurements

    Stefaan De Wolf;Michio Kondo

  • Hydrogen-doped In2O3 as High-mobility Transparent Conductive Oxide

    Takashi Koida;Hiroyuki Fujiwara;Michio Kondo

  • Effects of a‐Si:H layer thicknesses on the performance of a‐Si:H∕c‐Si heterojunction solar cells

    Hiroyuki Fujiwara;Michio Kondo

  • High-Mobility C60 Field-Effect Transistors Fabricated on Molecular- Wetting Controlled Substrates

    Kenji Itaka;Mitsugu Yamashiro;Jun Yamaguchi;Masamitsu Haemori

  • Photovoltaic Rudorffites: Lead-Free Silver Bismuth Halides Alternative to Hybrid Lead Halide Perovskites.

    Ivan Turkevych;Said Kazaoui;Eisuke Ito;Toshiyuki Urano

  • Real-time spectroscopic ellipsometry studies of the nucleation and grain growth processes in microcrystalline silicon thin films

    Hiroyuki Fujiwara;Michio Kondo;Akihisa Matsuda

  • Effects of Substrate Surface Morphology on Microcrystalline Silicon Solar Cells

    Yoshiyuki Nasuno;Michio Kondo;Akihisa Matsuda

  • Direct Solar Energy

    Dan Arvizu;Palani Balaya;Luisa F. Cabeza;K.G. Terry Hollands

  • Enhancement of light trapping in thin-film hydrogenated microcrystalline Si solar cells using back reflectors with self-ordered dimple pattern

    Hitoshi Sai;Hiroyuki Fujiwara;Michio Kondo;Yoshiaki Kanamori

  • Hydrogen-doped In2O3 transparent conducting oxide films prepared by solid-phase crystallization method

    Takashi Koida;Michio Kondo;Koichi Tsutsumi;Akio Sakaguchi

  • Application of hydrogenated amorphous silicon oxide layers to c-Si heterojunction solar cells

    Hiroyuki Fujiwara;Tetsuya Kaneko;Michio Kondo

  • Boron-doped a-Si:H∕c-Si interface passivation: Degradation mechanism

    Stefaan De Wolf;Michio Kondo

  • High-mobility hydrogen-doped In2O3 transparent conductive oxide for a-Si:H/c-Si heterojunction solar cells

    T. Koida;H. Fujiwara;M. Kondo

  • Relationship between the cell thickness and the optimum period of textured back reflectors in thin-film microcrystalline silicon solar cells

    Hitoshi Sai;Kimihiko Saito;Nana Hozuki;Michio Kondo

  • Nanostructured Photoelectrodes for Dye Sensitized Solar Cells

    Ivan Turkevych;Koji Matsubara;Michio Kondo

Frequent Co-Authors

Akihisa Matsuda
Akihisa Matsuda National Institute of Advanced Industrial Science and Technology
Hitoshi Sai
Hitoshi Sai National Institute of Advanced Industrial Science and Technology
Davide Mariotti
Davide Mariotti University of Ulster
Sarah Kurtz
Sarah Kurtz University of California, Merced
Takeshi Ohshima
Takeshi Ohshima Japan Atomic Energy Agency
Madoka Takai
Madoka Takai University of Tokyo
Takehiko Kitamori
Takehiko Kitamori University of Tokyo
Kazuma Mawatari
Kazuma Mawatari Waseda University
Stefaan De Wolf
Stefaan De Wolf King Abdullah University of Science and Technology
Hideomi Koinuma
Hideomi Koinuma Tokyo Institute of Technology

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