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D-Index & Metrics

Materials Science

D-Index
62
Citations
12429
World Ranking
6547
National Ranking
336

Akihisa Matsuda publication distribution in Materials Science in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Akihisa Matsuda sits on this spectrum.

50–69 publications: 28 scientists 70–89 publications: 152 scientists 90–109 publications: 356 scientists 110–129 publications: 487 scientists 130–149 publications: 723 scientists 150–169 publications: 835 scientists 170–189 publications: 850 scientists 190–209 publications: 891 scientists 210–229 publications: 862 scientists 230–249 publications: 766 scientists 250–269 publications: 726 scientists 270–289 publications: 665 scientists 290–309 publications: 593 scientists 310–329 publications: 537 scientists 330–349 publications: 477 scientists 350–369 publications: 440 scientists 370–389 publications: 356 scientists 390–409 publications: 321 scientists 410–429 publications: 256 scientists 430–449 publications: 246 scientists 450–469 publications: 216 scientists 470–489 publications: 212 scientists 490–509 publications: 174 scientists 510–529 publications: 194 scientists 530–549 publications: 162 scientists 550–569 publications: 131 scientists 570–589 publications: 111 scientists 590–609 publications: 103 scientists 610–629 publications: 99 scientists 630–649 publications: 77 scientists 650–669 publications: 92 scientists 670–689 publications: 56 scientists 690–709 publications: 53 scientists 710–729 publications: 53 scientists 730–749 publications: 38 scientists 750–769 publications: 52 scientists 770–789 publications: 43 scientists 790–809 publications: 38 scientists 810–829 publications: 34 scientists 830–849 publications: 25 scientists 850–869 publications: 18 scientists 870–889 publications: 20 scientists 890–909 publications: 24 scientists 910–929 publications: 27 scientists 930–949 publications: 20 scientists 950–969 publications: 17 scientists 970–989 publications: 10 scientists 990–1,009 publications: 16 scientists 1,010–1,029 publications: 13 scientists 1,030–1,049 publications: 12 scientists 1,050–1,069 publications: 9 scientists 1,070–1,089 publications: 8 scientists 1,090–1,109 publications: 7 scientists 1,110–1,129 publications: 9 scientists 1,130–1,149 publications: 2 scientists 1,150–1,162 publications: 5 scientists 1,163+ publications: 100 scientists
50 publications 1,163+

This scientist: 374 publications — 74th percentile

74% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,163 publications or more.

Akihisa Matsuda D-index placement in Materials Science in 2026

The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Akihisa Matsuda sits on this spectrum.

40–41 D-Index: 211 scientists 42–43 D-Index: 450 scientists 44–45 D-Index: 612 scientists 46–47 D-Index: 612 scientists 48–49 D-Index: 598 scientists 50–51 D-Index: 657 scientists 52–53 D-Index: 667 scientists 54–55 D-Index: 621 scientists 56–57 D-Index: 597 scientists 58–59 D-Index: 610 scientists 60–61 D-Index: 587 scientists 62–63 D-Index: 606 scientists 64–65 D-Index: 533 scientists 66–67 D-Index: 490 scientists 68–69 D-Index: 469 scientists 70–71 D-Index: 378 scientists 72–73 D-Index: 421 scientists 74–75 D-Index: 359 scientists 76–77 D-Index: 323 scientists 78–79 D-Index: 299 scientists 80–81 D-Index: 230 scientists 82–83 D-Index: 210 scientists 84–85 D-Index: 195 scientists 86–87 D-Index: 203 scientists 88–89 D-Index: 175 scientists 90–91 D-Index: 175 scientists 92–93 D-Index: 142 scientists 94–95 D-Index: 121 scientists 96–97 D-Index: 117 scientists 98–99 D-Index: 107 scientists 100–101 D-Index: 88 scientists 102–103 D-Index: 85 scientists 104–105 D-Index: 68 scientists 106–107 D-Index: 62 scientists 108–109 D-Index: 57 scientists 110–111 D-Index: 45 scientists 112–113 D-Index: 49 scientists 114–115 D-Index: 50 scientists 116–117 D-Index: 34 scientists 118–119 D-Index: 38 scientists 120–121 D-Index: 37 scientists 122–123 D-Index: 29 scientists 124–125 D-Index: 28 scientists 126–127 D-Index: 24 scientists 128–129 D-Index: 33 scientists 130–131 D-Index: 28 scientists 132–133 D-Index: 21 scientists 134–135 D-Index: 20 scientists 136–137 D-Index: 23 scientists 138–139 D-Index: 17 scientists 140–141 D-Index: 12 scientists 142–143 D-Index: 17 scientists 144–145 D-Index: 21 scientists 146–147 D-Index: 13 scientists 148–149 D-Index: 11 scientists 150–151 D-Index: 14 scientists 152–153 D-Index: 13 scientists 154–155 D-Index: 9 scientists 156–157 D-Index: 10 scientists 158–159 D-Index: 7 scientists 160–161 D-Index: 4 scientists 162–163 D-Index: 4 scientists 164 D-Index: 3 scientists 165+ D-Index: 98 scientists
40 D-Index 165+

This scientist: 62 D-Index — 51st percentile

51% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 165 D-Index or more.

Overview

Akihisa Matsuda is affiliated with the National Institute of Advanced Industrial Science and Technology in Japan. Their research primarily focuses on medicine, with an emphasis on surgery, oncology, and cancer research. Within these fields, Matsuda has contributed extensively to studies involving colorectal cancer surgical treatments, colorectal cancer treatments and studies, cancer genomics and diagnostics, and genetic factors in colorectal cancer. Additional areas of interest include colorectal and anal carcinomas, gastric cancer management and outcomes, as well as diverticular disease and complications.

The scientist has frequently published in several medical and surgical journals. These publication venues include:

  • Annals of Gastroenterological Surgery
  • Surgery Today
  • Surgical Case Reports
  • Journal of the Anus Rectum and Colon
  • Cancer Research

Matsuda's collaborative network features several frequent co-authors, notably:

  • Hiroshi Yoshida
  • Takeshi Yamada
  • Seiichi Shinji
  • Goro Takahashi
  • Takuma Iwai

Among select recent papers associated with Akihisa Matsuda, the following are highlighted:

  • "Surgical Site Infections in Gastroenterological Surgery," 2022, Journal of Nippon Medical School
  • "Methanotroph (Methylococcus capsulatus, Bath) bacteria meal as an alternative protein source for Japanese yellowtail, Seriola quinqueradiata," 2020, Aquaculture
  • "Combination of TAS-102 and bevacizumab as third-line treatment for metastatic colorectal cancer: TAS-CC3 study," 2020, International Journal of Clinical Oncology
  • "Methylation status and long-fragment cell-free DNA are prognostic biomarkers for gastric cancer," 2021, Cancer Medicine
  • "Colonic stent as a bridge to surgery versus emergency resection for right-sided malignant large bowel obstruction: a meta-analysis," 2022, Surgical Endoscopy

Best Publications

  • Formation kinetics and control of microcrystallite in μc-Si:H from glow discharge plasma

    Unknown

  • High rate growth of microcrystalline silicon at low temperatures

    Michio Kondo;Makoto Fukawa;Lihui Guo;Akihisa Matsuda

  • Microcrystalline silicon.. Growth and device application

    Akihisa Matsuda

  • Temperature dependence of the sticking and loss probabilities of silyl radicals on hydrogenated amorphous silicon

    Akihisa Matsuda;Katsuhiko Nomoto;Yoshiaki Takeuchi;Atsushi Suzuki

  • HIGH RATE DEPOSITION OF MICROCRYSTALLINE SILICON USING CONVENTIONAL PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION

    Lihui Guo;Michio Kondo;Makoto Fukawa;Kimihiko Saitoh

  • Growth mechanism of microcrystalline silicon obtained from reactive plasmas

    Unknown

  • Plasma spectroscopy—Glow discharge deposition of hydrogenated amorphous silicon☆

    Akihisa Matsuda;Kazunobu Tanaka

  • Sticking and recombination of the SiH3 radical on hydrogenated amorphous silicon: The catalytic effect of diborane

    Jérôme Perrin;Yoshihiko Takeda;Naoto Hirano;Yoshiaki Takeuchi

  • Electrical and Structural Properties of Phosphorous-Doped Glow-Discharge Si:F:H and Si:H Films

    Akihisa Matsuda;Satoshi Yamasaki;Katsumi Nakagawa;Hideyo Okushi

  • Guiding principle for preparing highly photosensitive Si-based amorphous alloys

    Akihisa Matsuda;Kazunobu Tanaka

  • Defect formation during growth of hydrogenated amorphous silicon.

    Gautam Ganguly;Akihisa Matsuda

  • Real-time spectroscopic ellipsometry studies of the nucleation and grain growth processes in microcrystalline silicon thin films

    Hiroyuki Fujiwara;Michio Kondo;Akihisa Matsuda

  • Spatial Distribution of SiH3 Radicals in RF Silane Plasma

    Naoshi Itabashi;Nobuki Nishiwaki;Mitsuo Magane;Susumu Naito

  • Effects of Substrate Surface Morphology on Microcrystalline Silicon Solar Cells

    Yoshiyuki Nasuno;Michio Kondo;Akihisa Matsuda

  • Preparation of highly photosensitive hydrogenated amorphous Si‐C alloys from a glow‐discharge plasma

    A. Matsuda;T. Yamaoka;S. Wolff;M. Koyama

  • Glow-discharge amorphous silicon: Growth process and structure

    Kazunobu Tanaka;Akihisa Matsuda

  • Thin-Film Silicon –Growth Process and Solar Cell Application–

    Unknown

  • Investigation of the growth kinetics of glow-discharge hydrogenated amorphous silicon using a radical separation technique

    Akihisa Matsuda;Kazunobu Tanaka

  • High rate growth of microcrystalline silicon using a high-pressure depletion method with VHF plasma

    Makoto Fukawa;Susumu Suzuki;Lihui Guo;Michio Kondo

  • Control of plasma chemistry for preparing highly stabilized amorphous silicon at high growth rate

    Akihisa Matsuda;Madoka Takai;Tomonori Nishimoto;Michio Kondo

  • Guiding Principle in the Preparation of High-Photosensitive Hydrogenated Amorphous Si–Ge Alloys from Glow-Discharge Plasma

    Akihisa Matsuda;Masato Koyama;Nozomu Ikuchi;Yuichiro Imanishi

  • Effects of embedded crystallites in amorphous silicon on light-induced defect creation

    Toshihiro Kamei;Paul Stradins;Akihisa Matsuda

  • Hydrogenated microcrystalline silicon germanium: A bottom cell material for amorphous silicon-based tandem solar cells

    G. Ganguly;T. Ikeda;T. Nishimiya;K. Saitoh

Frequent Co-Authors

Michio Kondo
Michio Kondo Waseda University
Hideyo Okushi
Hideyo Okushi National Institute of Advanced Industrial Science and Technology
Madoka Takai
Madoka Takai University of Tokyo
Kikuko Hayamizu
Kikuko Hayamizu University of Tsukuba
Hiroaki Okamoto
Hiroaki Okamoto Jichi Medical University
Kunji Chen
Kunji Chen Nanjing University
Ryo Hayashi
Ryo Hayashi Canon (Japan)
Toshio Goto
Toshio Goto Nagoya University
Eizi Hirota
Eizi Hirota The Graduate University for Advanced Studies, SOKENDAI
Hideomi Koinuma
Hideomi Koinuma Tokyo Institute of Technology

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