Akihisa Matsuda

Overview

Best Publications

• Formation kinetics and control of microcrystallite in μc-Si:H from glow discharge plasma

  Unknown

  505
  Citations

• High rate growth of microcrystalline silicon at low temperatures

  Michio Kondo;Makoto Fukawa;Lihui Guo;Akihisa Matsuda

  397
  Citations

• Microcrystalline silicon.. Growth and device application

  Akihisa Matsuda

  380
  Citations

• Temperature dependence of the sticking and loss probabilities of silyl radicals on hydrogenated amorphous silicon

  Akihisa Matsuda;Katsuhiko Nomoto;Yoshiaki Takeuchi;Atsushi Suzuki

  331
  Citations

• HIGH RATE DEPOSITION OF MICROCRYSTALLINE SILICON USING CONVENTIONAL PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION

  Lihui Guo;Michio Kondo;Makoto Fukawa;Kimihiko Saitoh

  300
  Citations

• Growth mechanism of microcrystalline silicon obtained from reactive plasmas

  Unknown

  295
  Citations

• Plasma spectroscopy—Glow discharge deposition of hydrogenated amorphous silicon☆

  Akihisa Matsuda;Kazunobu Tanaka

  249
  Citations

• Sticking and recombination of the SiH3 radical on hydrogenated amorphous silicon: The catalytic effect of diborane

  Jérôme Perrin;Yoshihiko Takeda;Naoto Hirano;Yoshiaki Takeuchi

  241
  Citations

• Electrical and Structural Properties of Phosphorous-Doped Glow-Discharge Si:F:H and Si:H Films

  Akihisa Matsuda;Satoshi Yamasaki;Katsumi Nakagawa;Hideyo Okushi

  236
  Citations

• Guiding principle for preparing highly photosensitive Si-based amorphous alloys

  Akihisa Matsuda;Kazunobu Tanaka

  218
  Citations

• Defect formation during growth of hydrogenated amorphous silicon.

  Gautam Ganguly;Akihisa Matsuda

  207
  Citations

• Real-time spectroscopic ellipsometry studies of the nucleation and grain growth processes in microcrystalline silicon thin films

  Hiroyuki Fujiwara;Michio Kondo;Akihisa Matsuda

  200
  Citations

• Spatial Distribution of SiH3 Radicals in RF Silane Plasma

  Naoshi Itabashi;Nobuki Nishiwaki;Mitsuo Magane;Susumu Naito

  198
  Citations

• Effects of Substrate Surface Morphology on Microcrystalline Silicon Solar Cells

  Yoshiyuki Nasuno;Michio Kondo;Akihisa Matsuda

  196
  Citations

• Preparation of highly photosensitive hydrogenated amorphous Si‐C alloys from a glow‐discharge plasma

  A. Matsuda;T. Yamaoka;S. Wolff;M. Koyama

  187
  Citations

• Glow-discharge amorphous silicon: Growth process and structure

  Kazunobu Tanaka;Akihisa Matsuda

  178
  Citations

• Thin-Film Silicon –Growth Process and Solar Cell Application–

  Unknown

  178
  Citations

• Investigation of the growth kinetics of glow-discharge hydrogenated amorphous silicon using a radical separation technique

  Akihisa Matsuda;Kazunobu Tanaka

  174
  Citations

• High rate growth of microcrystalline silicon using a high-pressure depletion method with VHF plasma

  Makoto Fukawa;Susumu Suzuki;Lihui Guo;Michio Kondo

  158
  Citations

• Control of plasma chemistry for preparing highly stabilized amorphous silicon at high growth rate

  Akihisa Matsuda;Madoka Takai;Tomonori Nishimoto;Michio Kondo

  156
  Citations

• Guiding Principle in the Preparation of High-Photosensitive Hydrogenated Amorphous Si–Ge Alloys from Glow-Discharge Plasma

  Akihisa Matsuda;Masato Koyama;Nozomu Ikuchi;Yuichiro Imanishi

  151
  Citations

• Effects of embedded crystallites in amorphous silicon on light-induced defect creation

  Toshihiro Kamei;Paul Stradins;Akihisa Matsuda

  137
  Citations

• Hydrogenated microcrystalline silicon germanium: A bottom cell material for amorphous silicon-based tandem solar cells

  G. Ganguly;T. Ikeda;T. Nishimiya;K. Saitoh

  129
  Citations