World's Best Scientists 2026 revealed!
Seiichi Miyazaki

Seiichi Miyazaki

D-Index & Metrics

Discipline name D-Index World Ranking Current World Ranking National Ranking Current National Ranking Publications Citations
Electronics and Electrical Engineering 33 5960 5723 252 238 624 5807

Seiichi Miyazaki publications per year

The chart shows the history of publications by Seiichi Miyazaki between 1963 and 2025, highlighting the no. of papers published in each year and offering an overview of the publication velocity of this scholar. Seiichi Miyazaki published across 63 years, from 1963 to 2025, averaging 12.7 papers a year. Output peaked at 43 publications in 2008. 13 of the 802 publications appeared in the last two years.

No. of publications
10 20 30 40
Bar chart. Horizontal axis: year, 1963 to 2025. Vertical axis: number of publications, 0 to 43. Peak 43 publications in 2008. 1963: 1 publication 1964: 0 publications 1965: 0 publications 1966: 0 publications 1967: 0 publications 1968: 0 publications 1969: 0 publications 1970: 0 publications 1971: 1 publication 1972: 2 publications 1973: 0 publications 1974: 1 publication 1975: 0 publications 1976: 0 publications 1977: 0 publications 1978: 0 publications 1979: 0 publications 1980: 0 publications 1981: 1 publication 1982: 1 publication 1983: 3 publications 1984: 3 publications 1985: 4 publications 1986: 2 publications 1987: 10 publications 1988: 11 publications 1989: 12 publications 1990: 6 publications 1991: 16 publications 1992: 13 publications 1993: 8 publications 1994: 13 publications 1995: 18 publications 1996: 23 publications 1997: 19 publications 1998: 16 publications 1999: 12 publications 2000: 17 publications 2001: 12 publications 2002: 15 publications 2003: 10 publications 2004: 16 publications 2005: 12 publications 2006: 37 publications 2007: 42 publications 2008: 43 publications 2009: 28 publications 2010: 37 publications 2011: 38 publications 2012: 27 publications 2013: 31 publications 2014: 17 publications 2015: 15 publications 2016: 28 publications 2017: 40 publications 2018: 41 publications 2019: 22 publications 2020: 15 publications 2021: 16 publications 2022: 15 publications 2023: 19 publications 2024: 8 publications 2025: 5 publications
1963 2025

802 publications in total across all disciplines

View publications per year as a table
Seiichi Miyazaki: publications per year, 1963 to 2025
Year Publications
1963 1
1964 0
1965 0
1966 0
1967 0
1968 0
1969 0
1970 0
1971 1
1972 2
1973 0
1974 1
1975 0
1976 0
1977 0
1978 0
1979 0
1980 0
1981 1
1982 1
1983 3
1984 3
1985 4
1986 2
1987 10
1988 11
1989 12
1990 6
1991 16
1992 13
1993 8
1994 13
1995 18
1996 23
1997 19
1998 16
1999 12
2000 17
2001 12
2002 15
2003 10
2004 16
2005 12
2006 37
2007 42
2008 43
2009 28
2010 37
2011 38
2012 27
2013 31
2014 17
2015 15
2016 28
2017 40
2018 41
2019 22
2020 15
2021 16
2022 15
2023 19
2024 8
2025 5
Total 802
Download as CSV

Seiichi Miyazaki publications per year - data summary

  • Seiichi Miyazaki, a Electronics and Electrical Engineering scholar from Hiroshima University, has 802 publications recorded across 63 years, from 1963 to 2025.
  • The oldest publication on record dates to 1963 and the most recent to 2025.
  • The most productive year is 2008, with 43 publications.
  • The least productive years with any output are 1963, 1971, 1974, 1981 and others, with 1 publication each.
  • 14 of the 63 years in the span carry no publications at all (1964, 1965, 1966, 1967 and others).
  • The rate of publication averages 12.7 papers per year over the whole span, or 16.4 per year counting only the 49 years with at least one publication.
  • The last 5 years on the chart (2021-2025) hold 63 publications, 8% of the career total.
  • Split into equal eras - 1963-1983: 10 publications (0.5 per year); 1984-2004: 256 publications (12.2 per year); 2005-2025: 536 publications (25.5 per year).
  • Comparing the opening and closing eras, the overall trend of publication is rising.

Seiichi Miyazaki publication distribution in Electronics and Electrical Engineering in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Electronics and Electrical Engineering in 2026. The highlighted bar marks where Seiichi Miyazaki sits on this spectrum.

No. of scientists
100 200 300 400
Bar chart with 53 bars. Horizontal axis: publications, 34–53 to 1,065+. Vertical axis: number of scientists, 0 to 445. Most scientists, 445, have 174–193 publications. The last bar groups every scientist with 1,065 publications or more. The highlighted bar, 614–633 publications, is where this scientist sits. 34–53 publications: 24 scientists 54–73 publications: 52 scientists 74–93 publications: 114 scientists 94–113 publications: 203 scientists 114–133 publications: 269 scientists 134–153 publications: 355 scientists 154–173 publications: 403 scientists 174–193 publications: 445 scientists 194–213 publications: 430 scientists 214–233 publications: 431 scientists 234–253 publications: 399 scientists 254–273 publications: 366 scientists 274–293 publications: 335 scientists 294–313 publications: 300 scientists 314–333 publications: 276 scientists 334–353 publications: 250 scientists 354–373 publications: 214 scientists 374–393 publications: 187 scientists 394–413 publications: 152 scientists 414–433 publications: 169 scientists 434–453 publications: 147 scientists 454–473 publications: 111 scientists 474–493 publications: 117 scientists 494–513 publications: 103 scientists 514–533 publications: 99 scientists 534–553 publications: 92 scientists 554–573 publications: 75 scientists 574–593 publications: 58 scientists 594–613 publications: 69 scientists 614–633 publications: 50 scientists 634–653 publications: 62 scientists 654–673 publications: 54 scientists 674–693 publications: 44 scientists 694–713 publications: 37 scientists 714–733 publications: 28 scientists 734–753 publications: 26 scientists 754–773 publications: 26 scientists 774–793 publications: 19 scientists 794–813 publications: 23 scientists 814–833 publications: 20 scientists 834–853 publications: 16 scientists 854–873 publications: 20 scientists 874–893 publications: 11 scientists 894–913 publications: 11 scientists 914–933 publications: 16 scientists 934–953 publications: 13 scientists 954–973 publications: 10 scientists 974–993 publications: 11 scientists 994–1,013 publications: 9 scientists 1,014–1,033 publications: 9 scientists 1,034–1,053 publications: 10 scientists 1,054–1,064 publications: 6 scientists 1,065+ publications: 99 scientists
34–53 publications 1,065+

This scientist: 624 publications — 91st percentile

91% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,065 publications or more.

View publications distribution as a table
Number of Electronics and Electrical Engineering scientists by publication count, Research.com 2026 ranking edition. Based on 6,875 ranked scientists.
Publications Scientists This scientist
34–53 24
54–73 52
74–93 114
94–113 203
114–133 269
134–153 355
154–173 403
174–193 445
194–213 430
214–233 431
234–253 399
254–273 366
274–293 335
294–313 300
314–333 276
334–353 250
354–373 214
374–393 187
394–413 152
414–433 169
434–453 147
454–473 111
474–493 117
494–513 103
514–533 99
534–553 92
554–573 75
574–593 58
594–613 69
614–633 50 624
634–653 62
654–673 54
674–693 44
694–713 37
714–733 28
734–753 26
754–773 26
774–793 19
794–813 23
814–833 20
834–853 16
854–873 20
874–893 11
894–913 11
914–933 16
934–953 13
954–973 10
974–993 11
994–1,013 9
1,014–1,033 9
1,034–1,053 10
1,054–1,064 6
1,065+ 99
Download as CSV

Seiichi Miyazaki publication distribution in Electronics and Electrical Engineering in 2026 - data summary

  • The chart plots the publication count of all 6,875 Electronics and Electrical Engineering scientists ranked by Research.com in 2026, grouped into 53 ranges running from 34–53 to 1,065+ publications.
  • Seiichi Miyazaki, a Electronics and Electrical Engineering scholar from Hiroshima University, records 624 publications - the 91st percentile of the discipline.
  • 91% of ranked Electronics and Electrical Engineering scientists score the same or lower than Seiichi Miyazaki, and about 9% score higher.
  • The median of the discipline falls in the 254–273 publications range, and Seiichi Miyazaki ranks above the median.
  • The most crowded range is 174–193 publications, holding 445 scientists (6% of the field).
  • 60% of the field sits in the lowest quarter of the value range (up to 294–313 publications), so the distribution is heavily right-skewed and high scores are rare.
  • The final bar has no upper bound: it groups every scientist with 1,065 publications or more, 99 scientists in all (1% of the field).

Seiichi Miyazaki D-index placement in Electronics and Electrical Engineering in 2026

The chart shows the D-index (discipline H-index) distribution of Electronics and Electrical Engineering scientists ranked by Research.com in 2026. The highlighted bar marks where Seiichi Miyazaki sits on this spectrum.

No. of scientists
50 100 150 200 250
Bar chart with 82 bars. Horizontal axis: D-Index, 30 to 111+. Vertical axis: number of scientists, 0 to 263. Most scientists, 263, have 32 D-Index. The last bar groups every scientist with 111 D-Index or more. The highlighted bar, 33 D-Index, is where this scientist sits. 30 D-Index: 178 scientists 31 D-Index: 257 scientists 32 D-Index: 263 scientists 33 D-Index: 262 scientists 34 D-Index: 244 scientists 35 D-Index: 236 scientists 36 D-Index: 211 scientists 37 D-Index: 220 scientists 38 D-Index: 214 scientists 39 D-Index: 214 scientists 40 D-Index: 205 scientists 41 D-Index: 187 scientists 42 D-Index: 194 scientists 43 D-Index: 201 scientists 44 D-Index: 155 scientists 45 D-Index: 189 scientists 46 D-Index: 148 scientists 47 D-Index: 160 scientists 48 D-Index: 134 scientists 49 D-Index: 130 scientists 50 D-Index: 141 scientists 51 D-Index: 156 scientists 52 D-Index: 108 scientists 53 D-Index: 130 scientists 54 D-Index: 112 scientists 55 D-Index: 97 scientists 56 D-Index: 111 scientists 57 D-Index: 102 scientists 58 D-Index: 108 scientists 59 D-Index: 120 scientists 60 D-Index: 103 scientists 61 D-Index: 93 scientists 62 D-Index: 92 scientists 63 D-Index: 74 scientists 64 D-Index: 77 scientists 65 D-Index: 73 scientists 66 D-Index: 64 scientists 67 D-Index: 69 scientists 68 D-Index: 60 scientists 69 D-Index: 39 scientists 70 D-Index: 57 scientists 71 D-Index: 59 scientists 72 D-Index: 46 scientists 73 D-Index: 49 scientists 74 D-Index: 38 scientists 75 D-Index: 35 scientists 76 D-Index: 32 scientists 77 D-Index: 35 scientists 78 D-Index: 31 scientists 79 D-Index: 22 scientists 80 D-Index: 34 scientists 81 D-Index: 31 scientists 82 D-Index: 34 scientists 83 D-Index: 23 scientists 84 D-Index: 18 scientists 85 D-Index: 30 scientists 86 D-Index: 19 scientists 87 D-Index: 19 scientists 88 D-Index: 20 scientists 89 D-Index: 8 scientists 90 D-Index: 17 scientists 91 D-Index: 7 scientists 92 D-Index: 14 scientists 93 D-Index: 9 scientists 94 D-Index: 15 scientists 95 D-Index: 10 scientists 96 D-Index: 12 scientists 97 D-Index: 10 scientists 98 D-Index: 10 scientists 99 D-Index: 12 scientists 100 D-Index: 16 scientists 101 D-Index: 5 scientists 102 D-Index: 7 scientists 103 D-Index: 7 scientists 104 D-Index: 8 scientists 105 D-Index: 9 scientists 106 D-Index: 13 scientists 107 D-Index: 4 scientists 108 D-Index: 5 scientists 109 D-Index: 10 scientists 110 D-Index: 8 scientists 111+ D-Index: 96 scientists
30 D-Index 111+

This scientist: 33 D-Index — 14th percentile

14% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 111 D-Index or more.

View D-Index distribution as a table
Number of Electronics and Electrical Engineering scientists by D-index, Research.com 2026 ranking edition. Based on 6,875 ranked scientists.
D-Index Scientists This scientist
30 178
31 257
32 263
33 262 33
34 244
35 236
36 211
37 220
38 214
39 214
40 205
41 187
42 194
43 201
44 155
45 189
46 148
47 160
48 134
49 130
50 141
51 156
52 108
53 130
54 112
55 97
56 111
57 102
58 108
59 120
60 103
61 93
62 92
63 74
64 77
65 73
66 64
67 69
68 60
69 39
70 57
71 59
72 46
73 49
74 38
75 35
76 32
77 35
78 31
79 22
80 34
81 31
82 34
83 23
84 18
85 30
86 19
87 19
88 20
89 8
90 17
91 7
92 14
93 9
94 15
95 10
96 12
97 10
98 10
99 12
100 16
101 5
102 7
103 7
104 8
105 9
106 13
107 4
108 5
109 10
110 8
111+ 96
Download as CSV

Seiichi Miyazaki D-index placement in Electronics and Electrical Engineering in 2026 - data summary

  • The chart plots the discipline H-index (D-index) of all 6,875 Electronics and Electrical Engineering scientists ranked by Research.com in 2026, grouped into 82 ranges running from 30 to 111+ D-Index.
  • Seiichi Miyazaki, a Electronics and Electrical Engineering scholar from Hiroshima University, records 33 D-Index - the 14th percentile of the discipline.
  • 14% of ranked Electronics and Electrical Engineering scientists score the same or lower than Seiichi Miyazaki, and about 86% score higher.
  • The median of the discipline falls in the 46 D-Index range, and Seiichi Miyazaki ranks below the median.
  • The most crowded range is 32 D-Index, holding 263 scientists (4% of the field).
  • 60% of the field sits in the lowest quarter of the value range (up to 50 D-Index), so the distribution is heavily right-skewed and high scores are rare.
  • The final bar has no upper bound: it groups every scientist with 111 D-Index or more, 96 scientists in all (1% of the field).

Overview

Seiichi Miyazaki is affiliated with Nagoya University in Japan and has made significant contributions to the fields of engineering, materials science, and physics and astronomy. Their research has a strong focus on electrical and electronic engineering, atomic and molecular physics and optics, as well as materials chemistry. Additional interests include biomedical engineering and the study of surfaces, coatings, and films.

The scientist's primary research topics cover a range of semiconductor and nanostructure-related subjects. These include silicon nanostructures and photoluminescence, semiconductor materials and devices, and semiconductor materials and interfaces. Their work also addresses nanowire synthesis and applications, graphene research and applications, electron and X-ray spectroscopy techniques, and silicon and solar cell technologies.

Seiichi Miyazaki has published extensively in several recognized scientific venues. Frequent publication outlets include the Japanese Journal of Applied Physics, ECS Transactions, ECS Meeting Abstracts, Materials Science in Semiconductor Processing, and Nanomaterials.

  • Japanese Journal of Applied Physics
  • ECS Transactions
  • ECS Meeting Abstracts
  • Materials Science in Semiconductor Processing
  • Nanomaterials

Miyazaki's recent published papers demonstrate ongoing research into semiconductor material phases and crystal formation. Notable works include:

  • Single germanene phase formed by segregation through Al(111) thin films on Ge(111), 2021, 2D Materials
  • Epitaxial growth of massively parallel germanium nanoribbons by segregation through Ag(1 1 0) thin films on Ge(1 1 0), 2021, Applied Surface Science
  • Formation of ultrathin segregated-Ge crystal on Al/Ge(111) surface, 2020, Japanese Journal of Applied Physics
  • Formation of germanene with free-standing lattice constant, 2023, Surface Science
  • Characterization of magnesium channeled implantation layers in GaN(0001), 2023, Japanese Journal of Applied Physics

The research collaborations of Seiichi Miyazaki have involved frequent coauthors such as Katsunori Makihara, Akio Ohta, Noriyuki Taoka, Mitsuhisa Ikeda, and Yuki Imai. These collaborations indicate a consistent team effort in advancing semiconductor and materials science fields.

Best Publications

  • Photoemission study of energy-band alignments and gap-state density distributions for high-k gate dielectrics

    Seiichi Miyazaki

  • Structure and electronic states of ultrathin SiO2 thermally grown on Si(100) and Si(111) surfaces

    S. Miyazaki;H. Nishimura;M. Fukuda;L. Ley

  • Characterization of high-k gate dielectric/silicon interfaces

    Seiichi Miyazaki

  • Resonant tunneling through amorphous silicon-silicon nitride double-barrier structures.

    Seiichi Miyazaki;Yohji Ihara;Masataka Hirose

  • Control of self-assembling formation of nanometer silicon dots by low pressure chemical vapor deposition

    S Miyazaki;Y Hamamoto;E Yoshida;M Ikeda

  • Characterization of plasma-deposited microcrystalline silicon

    Y. Mishima;S. Miyazaki;M. Hirose;Y. Osaka

  • Luminescence and transport in a-Si:H/a-Si1−xNx:H quantum well structures

    Masataka Hirose;Seiichi Miyazaki

  • Limit of gate oxide thickness scaling in MOSFETs due to apparent threshold voltage fluctuation induced by tunnel leakage current

    M. Koh;W. Mizubayashi;K. Iwamoto;H. Murakami

  • Memory Operation of Silicon Quantum-Dot Floating-Gate Metal-Oxide-Semiconductor Field-Effect Transistors

    Atsushi Kohno;Hideki Murakami;Mitsuhisa Ikeda;Seiichi Miyazaki

  • Analytic model of direct tunnel current through ultrathin gate oxides

    Khairurrijal;W. Mizubayashi;S. Miyazaki;M. Hirose

  • The Role of Fluorine Termination in the Chemical Stability of HF-Treated Si Surfaces

    Takeshi Sunada;Tatsuhiro Yasaka;Masaru Takakura;Tsutomu Sugiyama

  • Photoluminescence from anodized and thermally oxidized porous germanium

    S. Miyazaki;K. Sakamoto;K. Shiba;M. Hirose

  • Digital chemical vapor deposition and etching technologies for semiconductor processing

    Y. Horiike;T. Tanaka;M. Nakano;S. Iseda

  • Effective-Work-Function Control by Varying the TiN Thickness in Poly-Si/TiN Gate Electrodes for Scaled High- $k$ CMOSFETs

    M. Kadoshima;T. Matsuki;S. Miyazaki;K. Shiraishi

  • Physical model of BTI, TDDB and SILC in HfO/sub 2/-based high-k gate dielectrics

    K. Torii;H. Kitajima;T. Arikado;K. Shiraishi

  • Quantitative analysis of tunneling current through ultrathin gate oxides

    Takeshi Yoshida;Daisuke Imafuku;Josep Lluis Alay;Seiichi Miyazaki

  • Analysis of Tunnel Current through Ultrathin Gate Oxides

    Masatoshi Fukuda;Wataru Mizubayashi;Atsushi Kohno;Seiichi Miyazaki

  • Native Oxidation Growth on Ge(111) and (100) Surfaces

    Siti Kudnie Sahari;Hideki Murakami;Tomohiro Fujioka;Tatsuya Bando

  • Praseodymium silicate formed by postdeposition high-temperature annealing

    Akira Sakai;Shinsuke Sakashita;Mitsuo Sakashita;Yukio Yasuda

  • Photoemission Study of Ultrathin GeO2/Ge Heterostructures Formed by UV-O3 Oxidation

    Akio Ohta;Hiroshi Nakagawa;Hideki Murakami;Seiichirou Higashi

  • Fundamental limit of gate oxide thickness scaling in advanced MOSFETs

    M Hirose;M Koh;W Mizubayashi;H Murakami

  • Multiple-Step Electron Charging in Silicon-Quantum-Dot Floating Gate Metal-Oxide-Semiconductor Memories

    Mitsuhisa Ikeda;Yusuke Shimizu;Hideki Murakami;Seiichi Miyazaki

  • Photoelectron spectroscopy of ultrathin Yttrium Oxide films on Si(100)

    A. Ohta;M. Yamaoka;S. Miyazaki

  • Electron Tunneling through Ultrathin Gate Oxide Formed on Hydrogen-Terminated Si(100) Surfaces

    Masahito Hiroshima;Tatsuhiro Yasaka;Seiichi Miyazaki;Masataka Hirose

  • Characterization of ultrathin zirconium oxide films on silicon using photoelectron spectroscopy

    S Miyazaki;M Narasaki;M Ogasawara;M Hirose

  • High-Rate GaAs Epitaxial Lift-Off Technique for Optoelectronic Integrated Circuits

    Jun–ichi Maeda;Yasushi Sasaki;Nikolaus Dietz;Kentaro Shibahara

  • Amorphous Silicon Superlattice Thin Film Transistors

    Masaki Tsukude;Susumu Akamatsu;Seiichi Miyazaki;Masataka Hirose

Frequent Co-Authors

Kenji Shiraishi
Kenji Shiraishi Nagoya University
Toyohiro Chikyow
Toyohiro Chikyow National Institute for Materials Science
Akira Uedono
Akira Uedono University of Tsukuba
Naoto Umezawa
Naoto Umezawa Samsung (South Korea)
Tetsuo Endoh
Tetsuo Endoh Tohoku University
Mitsumasa Koyanagi
Mitsumasa Koyanagi Tohoku University
Kunji Chen
Kunji Chen Nanjing University
Satoshi Kamiyama
Satoshi Kamiyama Meijo University
Lothar Ley
Lothar Ley University of Erlangen-Nuremberg
Kiyotaka Asakura
Kiyotaka Asakura Hokkaido University

If you think any of the details on this page are incorrect, let us know.

Report an issue

We appreciate your kind effort to assist us to improve this page, it would be helpful providing us with as much detail as possible in the text box below:

Related Online Degrees & Career Pathways

Studying Electronics and Electrical Engineering in the USA opens doors to various career options, including many roles well-suited for introverts, such as research and development or technical design. For those considering a broader scope, exploring good jobs for introverts can provide insight into fulfilling careers that match different personality types.

Many students and working professionals opt for flexible learning through accelerated online degrees. These programs allow learners to advance their education efficiently while managing other commitments. This is especially valuable for Electronics and Electrical Engineering students seeking to diversify their skillset.

Integrating project management skills can enhance career prospects in engineering fields. Pursuing an accelerated project management degree online can quickly provide the necessary credentials for leadership roles.

Additionally, earning a bachelor's degree in project management complements technical expertise with organizational and management skills, making graduates valuable assets in multidisciplinary teams.

Best Scientists Citing Seiichi Miyazaki

Trending Scientists

Recently Published Articles