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Tamotsu Hashizume

Tamotsu Hashizume

D-Index & Metrics

Materials Science

D-Index
44
Citations
8396
World Ranking
11987
National Ranking
750

Overview

Tamotsu Hashizume is affiliated with Hokkaido University in Japan and conducts research primarily in the fields of Physics and Astronomy, Engineering, and Materials Science. Their work spans subfields such as Condensed Matter Physics, Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials, Materials Chemistry, and Mechanics of Materials.

Their main research topics involve GaN-based semiconductor devices and materials, semiconductor materials and devices, Ga2O3 and related materials, Silicon Carbide Semiconductor Technologies, ZnO doping and properties, metal and thin film mechanics, and semiconductor materials and interfaces.

The scientist has contributed to multiple publications in well-known venues, including:

  • Journal of Applied Physics
  • AIP Advances
  • Applied Physics Express
  • Semiconductor Science and Technology
  • Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Recent papers by Tamotsu Hashizume include:

  • Controlling surface/interface states in GaN-based transistors: Surface model, insulated gate, and surface passivation (2021, Journal of Applied Physics)
  • Interface characterization of Al2O3/m-plane GaN structure (2021, AIP Advances)
  • Gate controllability of HfSiOx/AlGaN/GaN MOS high-electron-mobility transistor (2020, AIP Advances)
  • Improved DC performance and current stability of ultrathin-Al 2O3/InAlN/GaN MOS-HEMTs with post-metallization-annealing process (2020, Semiconductor Science and Technology)
  • Analysis of inverse-piezoelectric-effect-induced lattice deformation in AlGaN/GaN high-electron-mobility transistors by time-resolved synchrotron radiation nanobeam X-ray diffraction (2021, Applied Physics Express)

Frequent co-authors collaborating with Hashizume are:

  • Ryota Ochi
  • Erika Maeda
  • Toshihide Nabatame
  • Koji Shiozaki
  • Mari Inoue

Best Publications

  • Suppression of current collapse in insulated gate AlGaN/GaN heterostructure field-effect transistors using ultrathin Al2O3 dielectric

    Tamotsu Hashizume;Shinya Ootomo;Hideki Hasegawa

  • Mechanisms of current collapse and gate leakage currents in AlGaN/GaN heterostructure field effect transistors

    Hideki Hasegawa;Takanori Inagaki;Shinya Ootomo;Tamotsu Hashizume

  • Capacitance?Voltage Characteristics of Al2O3/AlGaN/GaN Structures and State Density Distribution at Al2O3/AlGaN Interface

    Chihoko Mizue;Yujin Hori;Marcin Miczek;Tamotsu Hashizume

  • Surface passivation of GaN and GaN/AlGaN heterostructures by dielectric films and its application to insulated-gate heterostructure transistors

    Tamotsu Hashizume;Shinya Ootomo;Takanori Inagaki;Hideki Hasegawa

  • Minority carrier diffusion length in GaN: Dislocation density and doping concentration dependence

    K. Kumakura;K. Kumakura;K. Kumakura;T. Makimoto;T. Makimoto;T. Makimoto;N. Kobayashi;N. Kobayashi;T. Hashizume

  • Effects of interface states and temperature on the C-V behavior of metal/ insulator/AlGaN/GaN heterostructure capacitors

    Marcin Miczek;Chihoko Mizue;Tamotsu Hashizume;Bogusława Adamowicz

  • Leakage mechanism in GaN and AlGaN Schottky interfaces

    Tamotsu Hashizume;Junji Kotani;Hideki Hasegawa

  • Insulated gate and surface passivation structures for GaN-based power transistors

    Zenji Yatabe;Joel T Asubar;Tamotsu Hashizume

  • Effects of nitrogen deficiency on electronic properties of AlGaN surfaces subjected to thermal and plasma processes

    Tamotsu Hashizume;Hideki Hasegawa

  • Chemistry and electrical properties of surfaces of GaN and GaN/AlGaN heterostructures

    Tamotsu Hashizume;Shinya Ootomo;Susumu Oyama;Masanobu Konishi

  • Characterization of interface states in Al2O3/AlGaN/GaN structures for improved performance of high-electron-mobility transistors

    Y. Hori;Z. Yatabe;T. Hashizume

  • Discrete surface state related to nitrogen-vacancy defect on plasma-treated GaN surfaces

    Tamotsu Hashizume;Ryusuke Nakasaki

  • Process Conditions for Improvement of Electrical Properties of Al2O3/n-GaN Structures Prepared by Atomic Layer Deposition

    Yujin Hori;Chihoko Mizue;Tamotsu Hashizume

  • Capacitance–voltage characterization of AlN/GaN metal–insulator–semiconductor structures grown on sapphire substrate by metalorganic chemical vapor deposition

    Tamotsu Hashizume;Tamotsu Hashizume;Egor Alekseev;Dimitris Pavlidis;Karim S. Boutros

  • State of the art on gate insulation and surface passivation for GaN-based power HEMTs

    Tamotsu Hashizume;Kenya Nishiguchi;Shota Kaneki;Jan Kuzmik

  • Capacitance–Voltage Characteristics of Al<sub>2</sub>O<sub>3</sub>/AlGaN/GaN Structures and State Density Distribution at Al<sub>2</sub>O<sub>3</sub>/AlGaN Interface

    Unknown

  • Mechanism of surface conduction in the vicinity of Schottky gates on AlGaN∕GaN heterostructures

    Junji Kotani;Masafumi Tajima;Seiya Kasai;Tamotsu Hashizume

  • Drain Current Stability and Controllability of Threshold Voltage and Subthreshold Current in a Multi-Mesa-Channel AlGaN/GaN High Electron Mobility Transistor

    Kota Ohi;Tamotsu Hashizume

  • Al2O3 Insulated-Gate Structure for AlGaN/GaN Heterostructure Field Effect Transistors Having Thin AlGaN Barrier Layers

    Tamotsu Hashizume;Sanguan Anantathanasarn;Noboru Negoro;Eiichi Sano

  • Controlling surface/interface states in GaN-based transistors: Surface model, insulated gate, and surface passivation

    Joel T. Asubar;Zenji Yatabe;Dagmar Gregusova;Tamotsu Hashizume;Tamotsu Hashizume

  • Pt Schottky diode gas sensors formed on GaN and AlGaN/GaN heterostructure

    Kazushi Matsuo;Noboru Negoro;Junji Kotani;Tamotsu Hashizume

  • Analysis and control of excess leakage currents in nitride-based Schottky diodes based on thin surface barrier model

    Junji Kotani;Tamotsu Hashizume;Hideki Hasegawa

Frequent Co-Authors

Hideki Hasegawa
Hideki Hasegawa Hokkaido University
Kazumasa Hiramatsu
Kazumasa Hiramatsu Mie University
Jun Suda
Jun Suda Nagoya University
Toshiki Makimoto
Toshiki Makimoto Waseda University
Naoki Kobayashi
Naoki Kobayashi University of Electro-Communications
Yasuo Koide
Yasuo Koide National Institute for Materials Science
Takashi Fukui
Takashi Fukui Hokkaido University
Hideo Ohno
Hideo Ohno Tohoku University
Tetsuzo Ueda
Tetsuzo Ueda Panasonic (Japan)
Hiromichi Ohta
Hiromichi Ohta Hokkaido University

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