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Tamotsu Hashizume

Tamotsu Hashizume

D-Index & Metrics

Materials Science

D-Index
44
Citations
8396
World Ranking
11985
National Ranking
750

Tamotsu Hashizume publication distribution in Materials Science in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Tamotsu Hashizume sits on this spectrum.

50–69 publications: 28 scientists 70–89 publications: 152 scientists 90–109 publications: 356 scientists 110–129 publications: 487 scientists 130–149 publications: 723 scientists 150–169 publications: 835 scientists 170–189 publications: 850 scientists 190–209 publications: 891 scientists 210–229 publications: 862 scientists 230–249 publications: 766 scientists 250–269 publications: 726 scientists 270–289 publications: 665 scientists 290–309 publications: 593 scientists 310–329 publications: 537 scientists 330–349 publications: 477 scientists 350–369 publications: 440 scientists 370–389 publications: 356 scientists 390–409 publications: 321 scientists 410–429 publications: 256 scientists 430–449 publications: 246 scientists 450–469 publications: 216 scientists 470–489 publications: 212 scientists 490–509 publications: 174 scientists 510–529 publications: 194 scientists 530–549 publications: 162 scientists 550–569 publications: 131 scientists 570–589 publications: 111 scientists 590–609 publications: 103 scientists 610–629 publications: 99 scientists 630–649 publications: 77 scientists 650–669 publications: 92 scientists 670–689 publications: 56 scientists 690–709 publications: 53 scientists 710–729 publications: 53 scientists 730–749 publications: 38 scientists 750–769 publications: 52 scientists 770–789 publications: 43 scientists 790–809 publications: 38 scientists 810–829 publications: 34 scientists 830–849 publications: 25 scientists 850–869 publications: 18 scientists 870–889 publications: 20 scientists 890–909 publications: 24 scientists 910–929 publications: 27 scientists 930–949 publications: 20 scientists 950–969 publications: 17 scientists 970–989 publications: 10 scientists 990–1,009 publications: 16 scientists 1,010–1,029 publications: 13 scientists 1,030–1,049 publications: 12 scientists 1,050–1,069 publications: 9 scientists 1,070–1,089 publications: 8 scientists 1,090–1,109 publications: 7 scientists 1,110–1,129 publications: 9 scientists 1,130–1,149 publications: 2 scientists 1,150–1,162 publications: 5 scientists 1,163+ publications: 100 scientists
50 publications 1,163+

This scientist: 381 publications — 75th percentile

75% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,163 publications or more.

Tamotsu Hashizume D-index placement in Materials Science in 2026

The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Tamotsu Hashizume sits on this spectrum.

40–41 D-Index: 211 scientists 42–43 D-Index: 450 scientists 44–45 D-Index: 612 scientists 46–47 D-Index: 612 scientists 48–49 D-Index: 598 scientists 50–51 D-Index: 657 scientists 52–53 D-Index: 667 scientists 54–55 D-Index: 621 scientists 56–57 D-Index: 597 scientists 58–59 D-Index: 610 scientists 60–61 D-Index: 587 scientists 62–63 D-Index: 606 scientists 64–65 D-Index: 533 scientists 66–67 D-Index: 490 scientists 68–69 D-Index: 469 scientists 70–71 D-Index: 378 scientists 72–73 D-Index: 421 scientists 74–75 D-Index: 359 scientists 76–77 D-Index: 323 scientists 78–79 D-Index: 299 scientists 80–81 D-Index: 230 scientists 82–83 D-Index: 210 scientists 84–85 D-Index: 195 scientists 86–87 D-Index: 203 scientists 88–89 D-Index: 175 scientists 90–91 D-Index: 175 scientists 92–93 D-Index: 142 scientists 94–95 D-Index: 121 scientists 96–97 D-Index: 117 scientists 98–99 D-Index: 107 scientists 100–101 D-Index: 88 scientists 102–103 D-Index: 85 scientists 104–105 D-Index: 68 scientists 106–107 D-Index: 62 scientists 108–109 D-Index: 57 scientists 110–111 D-Index: 45 scientists 112–113 D-Index: 49 scientists 114–115 D-Index: 50 scientists 116–117 D-Index: 34 scientists 118–119 D-Index: 38 scientists 120–121 D-Index: 37 scientists 122–123 D-Index: 29 scientists 124–125 D-Index: 28 scientists 126–127 D-Index: 24 scientists 128–129 D-Index: 33 scientists 130–131 D-Index: 28 scientists 132–133 D-Index: 21 scientists 134–135 D-Index: 20 scientists 136–137 D-Index: 23 scientists 138–139 D-Index: 17 scientists 140–141 D-Index: 12 scientists 142–143 D-Index: 17 scientists 144–145 D-Index: 21 scientists 146–147 D-Index: 13 scientists 148–149 D-Index: 11 scientists 150–151 D-Index: 14 scientists 152–153 D-Index: 13 scientists 154–155 D-Index: 9 scientists 156–157 D-Index: 10 scientists 158–159 D-Index: 7 scientists 160–161 D-Index: 4 scientists 162–163 D-Index: 4 scientists 164 D-Index: 3 scientists 165+ D-Index: 98 scientists
40 D-Index 165+

This scientist: 44 D-Index — 7th percentile

7% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 165 D-Index or more.

Overview

Tamotsu Hashizume is affiliated with Hokkaido University in Japan and conducts research primarily in the fields of Physics and Astronomy, Engineering, and Materials Science. Their work spans subfields such as Condensed Matter Physics, Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials, Materials Chemistry, and Mechanics of Materials.

Their main research topics involve GaN-based semiconductor devices and materials, semiconductor materials and devices, Ga2O3 and related materials, Silicon Carbide Semiconductor Technologies, ZnO doping and properties, metal and thin film mechanics, and semiconductor materials and interfaces.

The scientist has contributed to multiple publications in well-known venues, including:

  • Journal of Applied Physics
  • AIP Advances
  • Applied Physics Express
  • Semiconductor Science and Technology
  • Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Recent papers by Tamotsu Hashizume include:

  • Controlling surface/interface states in GaN-based transistors: Surface model, insulated gate, and surface passivation (2021, Journal of Applied Physics)
  • Interface characterization of Al2O3/m-plane GaN structure (2021, AIP Advances)
  • Gate controllability of HfSiOx/AlGaN/GaN MOS high-electron-mobility transistor (2020, AIP Advances)
  • Improved DC performance and current stability of ultrathin-Al 2O3/InAlN/GaN MOS-HEMTs with post-metallization-annealing process (2020, Semiconductor Science and Technology)
  • Analysis of inverse-piezoelectric-effect-induced lattice deformation in AlGaN/GaN high-electron-mobility transistors by time-resolved synchrotron radiation nanobeam X-ray diffraction (2021, Applied Physics Express)

Frequent co-authors collaborating with Hashizume are:

  • Ryota Ochi
  • Erika Maeda
  • Toshihide Nabatame
  • Koji Shiozaki
  • Mari Inoue

Best Publications

  • Suppression of current collapse in insulated gate AlGaN/GaN heterostructure field-effect transistors using ultrathin Al2O3 dielectric

    Tamotsu Hashizume;Shinya Ootomo;Hideki Hasegawa

  • Mechanisms of current collapse and gate leakage currents in AlGaN/GaN heterostructure field effect transistors

    Hideki Hasegawa;Takanori Inagaki;Shinya Ootomo;Tamotsu Hashizume

  • Capacitance?Voltage Characteristics of Al2O3/AlGaN/GaN Structures and State Density Distribution at Al2O3/AlGaN Interface

    Chihoko Mizue;Yujin Hori;Marcin Miczek;Tamotsu Hashizume

  • Surface passivation of GaN and GaN/AlGaN heterostructures by dielectric films and its application to insulated-gate heterostructure transistors

    Tamotsu Hashizume;Shinya Ootomo;Takanori Inagaki;Hideki Hasegawa

  • Minority carrier diffusion length in GaN: Dislocation density and doping concentration dependence

    K. Kumakura;K. Kumakura;K. Kumakura;T. Makimoto;T. Makimoto;T. Makimoto;N. Kobayashi;N. Kobayashi;T. Hashizume

  • Effects of interface states and temperature on the C-V behavior of metal/ insulator/AlGaN/GaN heterostructure capacitors

    Marcin Miczek;Chihoko Mizue;Tamotsu Hashizume;Bogusława Adamowicz

  • Leakage mechanism in GaN and AlGaN Schottky interfaces

    Tamotsu Hashizume;Junji Kotani;Hideki Hasegawa

  • Insulated gate and surface passivation structures for GaN-based power transistors

    Zenji Yatabe;Joel T Asubar;Tamotsu Hashizume

  • Effects of nitrogen deficiency on electronic properties of AlGaN surfaces subjected to thermal and plasma processes

    Tamotsu Hashizume;Hideki Hasegawa

  • Chemistry and electrical properties of surfaces of GaN and GaN/AlGaN heterostructures

    Tamotsu Hashizume;Shinya Ootomo;Susumu Oyama;Masanobu Konishi

  • Characterization of interface states in Al2O3/AlGaN/GaN structures for improved performance of high-electron-mobility transistors

    Y. Hori;Z. Yatabe;T. Hashizume

  • Discrete surface state related to nitrogen-vacancy defect on plasma-treated GaN surfaces

    Tamotsu Hashizume;Ryusuke Nakasaki

  • Process Conditions for Improvement of Electrical Properties of Al2O3/n-GaN Structures Prepared by Atomic Layer Deposition

    Yujin Hori;Chihoko Mizue;Tamotsu Hashizume

  • Capacitance–voltage characterization of AlN/GaN metal–insulator–semiconductor structures grown on sapphire substrate by metalorganic chemical vapor deposition

    Tamotsu Hashizume;Tamotsu Hashizume;Egor Alekseev;Dimitris Pavlidis;Karim S. Boutros

  • State of the art on gate insulation and surface passivation for GaN-based power HEMTs

    Tamotsu Hashizume;Kenya Nishiguchi;Shota Kaneki;Jan Kuzmik

  • Capacitance–Voltage Characteristics of Al<sub>2</sub>O<sub>3</sub>/AlGaN/GaN Structures and State Density Distribution at Al<sub>2</sub>O<sub>3</sub>/AlGaN Interface

    Unknown

  • Mechanism of surface conduction in the vicinity of Schottky gates on AlGaN∕GaN heterostructures

    Junji Kotani;Masafumi Tajima;Seiya Kasai;Tamotsu Hashizume

  • Drain Current Stability and Controllability of Threshold Voltage and Subthreshold Current in a Multi-Mesa-Channel AlGaN/GaN High Electron Mobility Transistor

    Kota Ohi;Tamotsu Hashizume

  • Al2O3 Insulated-Gate Structure for AlGaN/GaN Heterostructure Field Effect Transistors Having Thin AlGaN Barrier Layers

    Tamotsu Hashizume;Sanguan Anantathanasarn;Noboru Negoro;Eiichi Sano

  • Controlling surface/interface states in GaN-based transistors: Surface model, insulated gate, and surface passivation

    Joel T. Asubar;Zenji Yatabe;Dagmar Gregusova;Tamotsu Hashizume;Tamotsu Hashizume

  • Pt Schottky diode gas sensors formed on GaN and AlGaN/GaN heterostructure

    Kazushi Matsuo;Noboru Negoro;Junji Kotani;Tamotsu Hashizume

  • Analysis and control of excess leakage currents in nitride-based Schottky diodes based on thin surface barrier model

    Junji Kotani;Tamotsu Hashizume;Hideki Hasegawa

Frequent Co-Authors

Hideki Hasegawa
Hideki Hasegawa Hokkaido University
Kazumasa Hiramatsu
Kazumasa Hiramatsu Mie University
Jun Suda
Jun Suda Nagoya University
Toshiki Makimoto
Toshiki Makimoto Waseda University
Naoki Kobayashi
Naoki Kobayashi University of Electro-Communications
Yasuo Koide
Yasuo Koide National Institute for Materials Science
Takashi Fukui
Takashi Fukui Hokkaido University
Hideo Ohno
Hideo Ohno Tohoku University
Tetsuzo Ueda
Tetsuzo Ueda Panasonic (Japan)
Hiromichi Ohta
Hiromichi Ohta Hokkaido University

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