World's Best Scientists 2026 revealed!
Toshiki Makimoto

Toshiki Makimoto

D-Index & Metrics

Materials Science

D-Index
46
Citations
9639
World Ranking
11354
National Ranking
703

Toshiki Makimoto publication distribution in Materials Science in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Toshiki Makimoto sits on this spectrum.

50–69 publications: 28 scientists 70–89 publications: 152 scientists 90–109 publications: 356 scientists 110–129 publications: 487 scientists 130–149 publications: 723 scientists 150–169 publications: 835 scientists 170–189 publications: 850 scientists 190–209 publications: 891 scientists 210–229 publications: 862 scientists 230–249 publications: 766 scientists 250–269 publications: 726 scientists 270–289 publications: 665 scientists 290–309 publications: 593 scientists 310–329 publications: 537 scientists 330–349 publications: 477 scientists 350–369 publications: 440 scientists 370–389 publications: 356 scientists 390–409 publications: 321 scientists 410–429 publications: 256 scientists 430–449 publications: 246 scientists 450–469 publications: 216 scientists 470–489 publications: 212 scientists 490–509 publications: 174 scientists 510–529 publications: 194 scientists 530–549 publications: 162 scientists 550–569 publications: 131 scientists 570–589 publications: 111 scientists 590–609 publications: 103 scientists 610–629 publications: 99 scientists 630–649 publications: 77 scientists 650–669 publications: 92 scientists 670–689 publications: 56 scientists 690–709 publications: 53 scientists 710–729 publications: 53 scientists 730–749 publications: 38 scientists 750–769 publications: 52 scientists 770–789 publications: 43 scientists 790–809 publications: 38 scientists 810–829 publications: 34 scientists 830–849 publications: 25 scientists 850–869 publications: 18 scientists 870–889 publications: 20 scientists 890–909 publications: 24 scientists 910–929 publications: 27 scientists 930–949 publications: 20 scientists 950–969 publications: 17 scientists 970–989 publications: 10 scientists 990–1,009 publications: 16 scientists 1,010–1,029 publications: 13 scientists 1,030–1,049 publications: 12 scientists 1,050–1,069 publications: 9 scientists 1,070–1,089 publications: 8 scientists 1,090–1,109 publications: 7 scientists 1,110–1,129 publications: 9 scientists 1,130–1,149 publications: 2 scientists 1,150–1,162 publications: 5 scientists 1,163+ publications: 100 scientists
50 publications 1,163+

This scientist: 283 publications — 56th percentile

56% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,163 publications or more.

Toshiki Makimoto D-index placement in Materials Science in 2026

The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Toshiki Makimoto sits on this spectrum.

40–41 D-Index: 211 scientists 42–43 D-Index: 450 scientists 44–45 D-Index: 612 scientists 46–47 D-Index: 612 scientists 48–49 D-Index: 598 scientists 50–51 D-Index: 657 scientists 52–53 D-Index: 667 scientists 54–55 D-Index: 621 scientists 56–57 D-Index: 597 scientists 58–59 D-Index: 610 scientists 60–61 D-Index: 587 scientists 62–63 D-Index: 606 scientists 64–65 D-Index: 533 scientists 66–67 D-Index: 490 scientists 68–69 D-Index: 469 scientists 70–71 D-Index: 378 scientists 72–73 D-Index: 421 scientists 74–75 D-Index: 359 scientists 76–77 D-Index: 323 scientists 78–79 D-Index: 299 scientists 80–81 D-Index: 230 scientists 82–83 D-Index: 210 scientists 84–85 D-Index: 195 scientists 86–87 D-Index: 203 scientists 88–89 D-Index: 175 scientists 90–91 D-Index: 175 scientists 92–93 D-Index: 142 scientists 94–95 D-Index: 121 scientists 96–97 D-Index: 117 scientists 98–99 D-Index: 107 scientists 100–101 D-Index: 88 scientists 102–103 D-Index: 85 scientists 104–105 D-Index: 68 scientists 106–107 D-Index: 62 scientists 108–109 D-Index: 57 scientists 110–111 D-Index: 45 scientists 112–113 D-Index: 49 scientists 114–115 D-Index: 50 scientists 116–117 D-Index: 34 scientists 118–119 D-Index: 38 scientists 120–121 D-Index: 37 scientists 122–123 D-Index: 29 scientists 124–125 D-Index: 28 scientists 126–127 D-Index: 24 scientists 128–129 D-Index: 33 scientists 130–131 D-Index: 28 scientists 132–133 D-Index: 21 scientists 134–135 D-Index: 20 scientists 136–137 D-Index: 23 scientists 138–139 D-Index: 17 scientists 140–141 D-Index: 12 scientists 142–143 D-Index: 17 scientists 144–145 D-Index: 21 scientists 146–147 D-Index: 13 scientists 148–149 D-Index: 11 scientists 150–151 D-Index: 14 scientists 152–153 D-Index: 13 scientists 154–155 D-Index: 9 scientists 156–157 D-Index: 10 scientists 158–159 D-Index: 7 scientists 160–161 D-Index: 4 scientists 162–163 D-Index: 4 scientists 164 D-Index: 3 scientists 165+ D-Index: 98 scientists
40 D-Index 165+

This scientist: 46 D-Index — 12th percentile

12% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 165 D-Index or more.

Overview

Toshiki Makimoto is affiliated with Waseda University in Japan. Their research primarily spans the fields of Physics and Astronomy as well as Engineering, with focused contributions in subfields such as Condensed Matter Physics, Atomic and Molecular Physics, and Optics, along with Electrical and Electronic Engineering and Biomedical Engineering.

The main topics of Makimoto's work include GaN-based semiconductor devices and materials, Semiconductor Quantum Structures and Devices, Advanced Semiconductor Detectors and Materials, Thermal properties of materials, Semiconductor materials and devices, Thin-Film Transistor Technologies, and Nanowire Synthesis and Applications.

Makimoto has published in several scientific venues, among them:

  • Crystal Research and Technology
  • Journal of Applied Physics
  • Physica B Condensed Matter
  • arXiv (Cornell University)
  • Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Their recent papers include:

  • "Revealing the simultaneous increase in transient transmission and reflectivity in InN," Journal of Applied Physics, 2022
  • "Photoluminescence Mechanism in Heavily Si-Doped GaAsN," Crystal Research and Technology, 2021
  • "Electrical properties of heavily Si-doped GaAsN after annealing," Physica B Condensed Matter, 2021
  • "Photoluminescence Mechanism in Heavily Si-Doped GaAsN," Crystal Research and Technology, 2021
  • "Ultrafast dynamics of electronic structure in InN thin film," arXiv (Cornell University), 2021

Frequently collaborating researchers include:

  • Takashi Tsukasaki
  • Miki Fujita
  • Junjun Jia
  • Takashi Yagi
  • Ren Hiyoshi

Best Publications

  • An aluminium nitride light-emitting diode with a wavelength of 210 nanometres

    Yoshitaka Taniyasu;Makoto Kasu;Toshiki Makimoto

  • Layered boron nitride as a release layer for mechanical transfer of GaN-based devices

    Yasuyuki Kobayashi;Kazuhide Kumakura;Tetsuya Akasaka;Toshiki Makimoto

  • Minority carrier diffusion length in GaN: Dislocation density and doping concentration dependence

    K. Kumakura;K. Kumakura;K. Kumakura;T. Makimoto;T. Makimoto;T. Makimoto;N. Kobayashi;N. Kobayashi;T. Hashizume

  • Diamond FET using high-quality polycrystalline diamond with f/sub T/ of 45 GHz and f/sub max/ of 120 GHz

    K. Ueda;M. Kasu;Y. Yamauchi;T. Makimoto

  • Abrupt p‐type doping profile of carbon atomic layer doped GaAs grown by flow‐rate modulation epitaxy

    Naoki Kobayashi;Toshiki Makimoto;Yoshiji Horikoshi

  • Mg-acceptor activation mechanism and transport characteristics in p-type InGaN grown by metalorganic vapor phase epitaxy

    Kazuhide Kumakura;Toshiki Makimoto;Naoki Kobayashi

  • High luminescent efficiency of InGaN multiple quantum wells grown on InGaN underlying layers

    Tetsuya Akasaka;Hideki Gotoh;Tadashi Saito;Toshiki Makimoto

  • Electrical conduction properties of n-type Si-doped AlN with high electron mobility (>100cm2V−1s−1)

    Yoshitaka Taniyasu;Makoto Kasu;Toshiki Makimoto

  • 2 W/mm output power density at 1 GHz for diamond FETs

    M. Kasu;K. Ueda;H. Ye;Y. Yamauchi

  • Diamond-based RF power transistors: Fundamentals and applications

    M. Kasu;K. Ueda;Y. Yamauchi;A. Tallaire

  • Activation Energy and Electrical Activity of Mg in Mg-Doped InxGa1-xN (x<0.2)

    Kazuhide Kumakura;Toshiki Makimoto;Naoki Kobayashi

  • Threading dislocations in heteroepitaxial AlN layer grown by MOVPE on SiC (0 0 0 1) substrate

    Yoshitaka Taniyasu;Makoto Kasu;Toshiki Makimoto

  • Field emission properties of heavily Si-doped AlN in triode-type display structure

    Yoshitaka Taniyasu;Makoto Kasu;Toshiki Makimoto

  • Flow-Rate Modulation Epitaxy of GaAs

    Naoki Kobayashi;Toshiki Makimoto;Yoshiji Horikoshi

  • Increased electron mobility in n-type Si-doped AlN by reducing dislocation density

    Yoshitaka Taniyasu;Makoto Kasu;Toshiki Makimoto

  • Excitonic luminescence and absorption in dilute GaAs1−xNx alloy (x<0.3%)

    Toshiki Makimoto;Hisao Saito;Toshio Nishida;Naoki Kobayashi

  • Al2O3 Insulated-Gate Structure for AlGaN/GaN Heterostructure Field Effect Transistors Having Thin AlGaN Barrier Layers

    Tamotsu Hashizume;Sanguan Anantathanasarn;Noboru Negoro;Eiichi Sano

  • MOVPE growth of strained InGaAsN/GaAs quantum wells

    Hisao Saito;Toshiki Makimoto;Naoki Kobayashi

  • Systematic Study of Insulator Deposition Effect (Si3N4, SiO2, AlN, and Al2O3) on Electrical Properties in AlGaN/GaN Heterostructures

    Narihiko Maeda;Masanobu Hiroki;Noriyuki Watanabe;Yasuhiro Oda

  • Influence of epitaxy on the surface conduction of diamond film

    M Kasu;M Kasu;M Kubovic;A Aleksov;N Teofilov

Frequent Co-Authors

Naoki Kobayashi
Naoki Kobayashi University of Electro-Communications
Makoto Kasu
Makoto Kasu Saga University
Yoshiji Horikoshi
Yoshiji Horikoshi Waseda University
Takatomo Enoki
Takatomo Enoki NTT (Japan)
Hiroki Hibino
Hiroki Hibino Kwansei Gakuin University
Tamotsu Hashizume
Tamotsu Hashizume Hokkaido University
Hideki Hasegawa
Hideki Hasegawa Hokkaido University
Tadao Ishibashi
Tadao Ishibashi NTT (Japan)
Erhard Kohn
Erhard Kohn North Carolina State University
Takashi Fukui
Takashi Fukui Hokkaido University

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