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Toshiki Makimoto

Toshiki Makimoto

D-Index & Metrics

Materials Science

D-Index
46
Citations
9639
World Ranking
11356
National Ranking
703

Overview

Toshiki Makimoto is affiliated with Waseda University in Japan. Their research primarily spans the fields of Physics and Astronomy as well as Engineering, with focused contributions in subfields such as Condensed Matter Physics, Atomic and Molecular Physics, and Optics, along with Electrical and Electronic Engineering and Biomedical Engineering.

The main topics of Makimoto's work include GaN-based semiconductor devices and materials, Semiconductor Quantum Structures and Devices, Advanced Semiconductor Detectors and Materials, Thermal properties of materials, Semiconductor materials and devices, Thin-Film Transistor Technologies, and Nanowire Synthesis and Applications.

Makimoto has published in several scientific venues, among them:

  • Crystal Research and Technology
  • Journal of Applied Physics
  • Physica B Condensed Matter
  • arXiv (Cornell University)
  • Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Their recent papers include:

  • "Revealing the simultaneous increase in transient transmission and reflectivity in InN," Journal of Applied Physics, 2022
  • "Photoluminescence Mechanism in Heavily Si-Doped GaAsN," Crystal Research and Technology, 2021
  • "Electrical properties of heavily Si-doped GaAsN after annealing," Physica B Condensed Matter, 2021
  • "Photoluminescence Mechanism in Heavily Si-Doped GaAsN," Crystal Research and Technology, 2021
  • "Ultrafast dynamics of electronic structure in InN thin film," arXiv (Cornell University), 2021

Frequently collaborating researchers include:

  • Takashi Tsukasaki
  • Miki Fujita
  • Junjun Jia
  • Takashi Yagi
  • Ren Hiyoshi

Best Publications

  • An aluminium nitride light-emitting diode with a wavelength of 210 nanometres

    Yoshitaka Taniyasu;Makoto Kasu;Toshiki Makimoto

  • Layered boron nitride as a release layer for mechanical transfer of GaN-based devices

    Yasuyuki Kobayashi;Kazuhide Kumakura;Tetsuya Akasaka;Toshiki Makimoto

  • Minority carrier diffusion length in GaN: Dislocation density and doping concentration dependence

    K. Kumakura;K. Kumakura;K. Kumakura;T. Makimoto;T. Makimoto;T. Makimoto;N. Kobayashi;N. Kobayashi;T. Hashizume

  • Diamond FET using high-quality polycrystalline diamond with f/sub T/ of 45 GHz and f/sub max/ of 120 GHz

    K. Ueda;M. Kasu;Y. Yamauchi;T. Makimoto

  • Abrupt p‐type doping profile of carbon atomic layer doped GaAs grown by flow‐rate modulation epitaxy

    Naoki Kobayashi;Toshiki Makimoto;Yoshiji Horikoshi

  • Mg-acceptor activation mechanism and transport characteristics in p-type InGaN grown by metalorganic vapor phase epitaxy

    Kazuhide Kumakura;Toshiki Makimoto;Naoki Kobayashi

  • High luminescent efficiency of InGaN multiple quantum wells grown on InGaN underlying layers

    Tetsuya Akasaka;Hideki Gotoh;Tadashi Saito;Toshiki Makimoto

  • Electrical conduction properties of n-type Si-doped AlN with high electron mobility (>100cm2V−1s−1)

    Yoshitaka Taniyasu;Makoto Kasu;Toshiki Makimoto

  • 2 W/mm output power density at 1 GHz for diamond FETs

    M. Kasu;K. Ueda;H. Ye;Y. Yamauchi

  • Diamond-based RF power transistors: Fundamentals and applications

    M. Kasu;K. Ueda;Y. Yamauchi;A. Tallaire

  • Activation Energy and Electrical Activity of Mg in Mg-Doped InxGa1-xN (x<0.2)

    Kazuhide Kumakura;Toshiki Makimoto;Naoki Kobayashi

  • Threading dislocations in heteroepitaxial AlN layer grown by MOVPE on SiC (0 0 0 1) substrate

    Yoshitaka Taniyasu;Makoto Kasu;Toshiki Makimoto

  • Field emission properties of heavily Si-doped AlN in triode-type display structure

    Yoshitaka Taniyasu;Makoto Kasu;Toshiki Makimoto

  • Flow-Rate Modulation Epitaxy of GaAs

    Naoki Kobayashi;Toshiki Makimoto;Yoshiji Horikoshi

  • Increased electron mobility in n-type Si-doped AlN by reducing dislocation density

    Yoshitaka Taniyasu;Makoto Kasu;Toshiki Makimoto

  • Excitonic luminescence and absorption in dilute GaAs1−xNx alloy (x<0.3%)

    Toshiki Makimoto;Hisao Saito;Toshio Nishida;Naoki Kobayashi

  • Al2O3 Insulated-Gate Structure for AlGaN/GaN Heterostructure Field Effect Transistors Having Thin AlGaN Barrier Layers

    Tamotsu Hashizume;Sanguan Anantathanasarn;Noboru Negoro;Eiichi Sano

  • MOVPE growth of strained InGaAsN/GaAs quantum wells

    Hisao Saito;Toshiki Makimoto;Naoki Kobayashi

  • Systematic Study of Insulator Deposition Effect (Si3N4, SiO2, AlN, and Al2O3) on Electrical Properties in AlGaN/GaN Heterostructures

    Narihiko Maeda;Masanobu Hiroki;Noriyuki Watanabe;Yasuhiro Oda

  • Influence of epitaxy on the surface conduction of diamond film

    M Kasu;M Kasu;M Kubovic;A Aleksov;N Teofilov

Frequent Co-Authors

Naoki Kobayashi
Naoki Kobayashi University of Electro-Communications
Makoto Kasu
Makoto Kasu Saga University
Yoshiji Horikoshi
Yoshiji Horikoshi Waseda University
Takatomo Enoki
Takatomo Enoki NTT (Japan)
Hiroki Hibino
Hiroki Hibino Kwansei Gakuin University
Tamotsu Hashizume
Tamotsu Hashizume Hokkaido University
Hideki Hasegawa
Hideki Hasegawa Hokkaido University
Tadao Ishibashi
Tadao Ishibashi NTT (Japan)
Erhard Kohn
Erhard Kohn North Carolina State University
Takashi Fukui
Takashi Fukui Hokkaido University

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