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Kazumasa Hiramatsu

Kazumasa Hiramatsu

D-Index & Metrics

Materials Science

D-Index
64
Citations
19068
World Ranking
5793
National Ranking
279

Overview

Kazumasa Hiramatsu is affiliated with Mie University in Japan and has contributed extensively to the fields of Engineering and Materials Science. Their research spans several subfields, including Biomedical Engineering, Electronic, Optical and Magnetic Materials, Civil and Structural Engineering, Electrical and Electronic Engineering, and Surfaces, Coatings and Films.

Their main research topics include Plasmonic and Surface Plasmon Research, Metamaterials and Metasurfaces Applications, Thermal Radiation and Cooling Technologies, Advanced Fiber Optic Sensors, Optical Coatings and Gratings, Gold and Silver Nanoparticles Synthesis and Applications, and Photonic Crystals and Applications.

Hiramatsu has published in various venues, with notable frequent publications in Research Square (Research Square), Journal of the European Optical Society Rapid Publications, Applied Physics B, Plasmonics, and Optics and Photonics Journal.

Recent papers authored or coauthored by Hiramatsu cover diverse topics in plasmonics and optical materials. These include:

  • Fabrication of perfect plasmonic absorbers for blue and near-ultraviolet lights using double-layer wire-grid structures, 2021, Journal of the European Optical Society Rapid Publications
  • TM- and TE-polarization-selective narrowband perfect absorber for near-ultraviolet light using Fano resonance in an aluminum nanohole array structure, 2024, Applied Physics B
  • Fabrication and Operation Analysis of a Surface-Plasmon Sensor Using a Nonpropagating Mode, 2023, Plasmonics
  • Fabrication of Polarization Control Devices Using Metal Grating Structures, 2022, Optics and Photonics Journal
  • Fabrication and characterization of plasmonic band-stop filter using Ag grating, 2020, EPJ Web of Conferences

Their work frequently involves collaboration with several coauthors, including Atsushi Motogaito, Ryoga Tanaka, K. Akatsuka, Akitaka Harada, and Yukino Hayashi. Atsushi Motogaito appears as the most frequent coauthor, contributing to multiple publications.

Best Publications

  • P-Type Conduction in Mg-Doped GaN Treated with Low-Energy Electron Beam Irradiation (LEEBI)

    Hiroshi Amano;Masahiro Kito;Kazumasa Hiramatsu;Isamu Akasaki

  • Effects of ain buffer layer on crystallographic structure and on electrical and optical properties of GaN and Ga1−xAlxN (0 < x ≦ 0.4) films grown on sapphire substrate by MOVPE

    Isamu Akasaki;Hiroshi Amano;Yasuo Koide;Kazumasa Hiramatsu

  • Fabrication and characterization of low defect density GaN using facet-controlled epitaxial lateral overgrowth (FACELO)

    Kazumasa Hiramatsu;Katsuya Nishiyama;Masaru Onishi;Hiromitsu Mizutani

  • Growth mechanism of GaN grown on sapphire with A1N buffer layer by MOVPE

    K. Hiramatsu;S. Itoh;H. Amano;I. Akasaki

  • Selective growth of wurtzite GaN and AlxGa1-xN on GaN/sapphire substrates by metalorganic vapor phase epitaxy

    Yoshiki Kato;Shota Kitamura;Kazumasa Hiramatsu;Nobuhiko Sawaki

  • Effects of the buffer layer in metalorganic vapour phase epitaxy of GaN on sapphire substrate

    Hiroshi Amano;Isamu Akasaki;Kazumasa Hiramatsu;Norikatsu Koide

  • Photoluminescence of Mg-doped p-type GaN and electroluminescence of GaN p-n junction LED

    Isamu Akasaki;Hiroshi Amano;Masahiro Kito;Kazumasa Hiramatsu

  • Schottky barrier on n‐type GaN grown by hydride vapor phase epitaxy

    P. Hacke;T. Detchprohm;K. Hiramatsu;N. Sawaki

  • The growth of single crystalline GaN on a Si substrate using AIN as an intermediate layer

    A. Watanabe;T. Takeuchi;K. Hirosawa;H. Amano

  • Relaxation Process of the Thermal Strain in the GaN/α-Al2O3 Heterostructure and Determination of the Intrinsic Lattice Constants of GaN Free from the Strain

    Theeradetch Detchprohm;Kazumasa Hiramatsu;Kenji Itoh;Isamu Akasaki

  • Recent Progress in Selective Area Growth and Epitaxial Lateral Overgrowth of III‐Nitrides: Effects of Reactor Pressure in MOVPE Growth

    K. Hiramatsu;K. Nishiyama;A. Motogaito;H. Miyake

  • Analysis of deep levels in n‐type GaN by transient capacitance methods

    P. Hacke;T. Detchprohm;K. Hiramatsu;N. Sawaki

  • Hydride vapor phase epitaxial growth of a high quality GaN film using a ZnO buffer layer

    T. Detchprohm;K. Hiramatsu;H. Amano;I. Akasaki

  • Preparation of high-quality AlN on sapphire by high-temperature face-to-face annealing

    Hideto Miyake;Chia-Hung Lin;Kenta Tokoro;Kazumasa Hiramatsu

  • Relaxation mechanism of thermal stresses in the heterostructure of GaN grown on sapphire by vapor phase epitaxy

    Kazumasa Hiramatsu;Theeradetch Detchprohm;Isamu Akasaki

  • Growth and Luminescence Properties of Mg‐Doped GaN Prepared by MOVPE

    Hiroshi Amano;Masahiro Kitoh;Kazumasa Hiramatsu;Isamu Akasaki

  • Verfahren und vorrichtung zur zuechtung von galliumnitrid aus der gasphase

    Katsuhide Manabe;Nobuo Okazaki;Isamu Akazaki;Kazumasa Hiramatsu

  • Growth of single crystalline GaN film on Si substrate using 3C-SiC as an intermediate layer

    Tetsuya Takeuchi;Hiroshi Amano;Kazumasa Hiramatsu;Nobuhiko Sawaki

  • Growth of single crystal GaN substrate using hydride vapor phase epitaxy

    Kouichi Naniwae;Shigetoshi Itoh;Hiroshi Amano;Kenji Itoh

  • Exciton fine structure in undoped GaN epitaxial films.

    D Volm;K Oettinger;T Streibl;D Kovalev

Frequent Co-Authors

Nobuhiko Sawaki
Nobuhiko Sawaki Aichi Institute of Technology
Hiroshi Amano
Hiroshi Amano Nagoya University
Theeradetch Detchprohm
Theeradetch Detchprohm Georgia Institute of Technology
Yahachi Saito
Yahachi Saito Nagoya University
Shigefusa F. Chichibu
Shigefusa F. Chichibu Tohoku University
Jürgen Christen
Jürgen Christen Otto-von-Guericke University Magdeburg
Christian Thomsen
Christian Thomsen Technical University of Berlin
Tamotsu Hashizume
Tamotsu Hashizume Hokkaido University
Bernard Gil
Bernard Gil University of Montpellier
Bruno K. Meyer
Bruno K. Meyer University of Giessen

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