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Tetsuya Takeuchi

Tetsuya Takeuchi

D-Index & Metrics

Materials Science

D-Index
45
Citations
11559
World Ranking
11607
National Ranking
716

Overview

Tetsuya Takeuchi is a researcher affiliated with Meijo University in Japan. Their work spans several fields primarily focused on physics, engineering, and materials science, reflecting a multidisciplinary approach to semiconductor and optical device research.

The main areas of study for their research include:

  • Physics and Astronomy
  • Engineering
  • Materials Science

Within these broader fields, Takeuchi has specialized in several subfields such as:

  • Condensed Matter Physics
  • Electronic, Optical and Magnetic Materials
  • Biomedical Engineering
  • Materials Chemistry
  • Electrical and Electronic Engineering

Their research extensively addresses topics related to semiconductor materials and devices, with a particular emphasis on:

  • GaN-based semiconductor devices and materials
  • Ga2O3 and related materials
  • ZnO doping and properties
  • Semiconductor Quantum Structures and Devices
  • Metal and Thin Film Mechanics
  • Photocathodes and Microchannel Plates
  • Semiconductor materials and devices

Takeuchi has contributed to notable research on AlGaN-based ultraviolet-B laser diodes and their optical properties. Some representative recent publications include:

  • Room-temperature operation of AlGaN ultraviolet-B laser diode at 298 nm on lattice-relaxed Al0.6Ga0.4N/AlN/sapphire, 2020, Applied Physics Express
  • AlGaN-based UV-B laser diode with a high optical confinement factor, 2021, Applied Physics Letters
  • Internal loss of AlGaN-based ultraviolet-B band laser diodes with p-type AlGaN cladding layer using polarization doping, 2020, Applied Physics Express
  • Effect of dislocation density on optical gain and internal loss of AlGaN-based ultraviolet-B band lasers, 2020, Applied Physics Express
  • RGB monolithic GaInN-based μLED arrays connected via tunnel junctions, 2023, Applied Physics Express

The researcher often publishes in the following journals:

  • Applied Physics Express
  • Japanese Journal of Applied Physics
  • physica status solidi (a)
  • Applied Physics Letters
  • physica status solidi (b)

Frequent collaborators in their work include:

  • Satoshi Kamiyama
  • Motoaki Iwaya
  • Isamu Akasaki
  • Sho Iwayama
  • Hideto Miyake

Best Publications

  • Quantum-Confined Stark Effect due to Piezoelectric Fields in GaInN Strained Quantum Wells

    Tetsuya Takeuchi;Shigetoshi Sota;Maki Katsuragawa;Miho Komori

  • Determination of piezoelectric fields in strained GaInN quantum wells using the quantum-confined Stark effect

    Tetsuya Takeuchi;Christian Wetzel;Shigeo Yamaguchi;Hiromitsu Sakai

  • Theoretical Study of Orientation Dependence of Piezoelectric Effects in Wurtzite Strained GaInN/GaN Heterostructures and Quantum Wells

    Tetsuya Takeuchi;Hiroshi Amano;Isamu Akasaki

  • Optical Properties of Strained AlGaN and GaInN on GaN

    Tetsuya Takeuchi;Hideo Takeuchi;Shigetoshi Sota;Hiromitsu Sakai

  • The growth of single crystalline GaN on a Si substrate using AIN as an intermediate layer

    A. Watanabe;T. Takeuchi;K. Hirosawa;H. Amano

  • Pit formation in GaInN quantum wells

    Y. Chen;T. Takeuchi;H. Amano;I. Akasaki

  • Internal Quantum Efficiency of Whole-Composition-Range AlGaN Multiquantum Wells

    Kazuhito Ban;Jun-ichi Yamamoto;Kenichiro Takeda;Kimiyasu Ide

  • Reduction of Etch Pit Density in Organometallic Vapor Phase Epitaxy-Grown GaN on Sapphire by Insertion of a Low-Temperature-Deposited Buffer Layer between High-Temperature-Grown GaN

    Motoaki Iwaya;Tetsuya Takeuchi;Shigeo Yamaguchi;Christian Wetzel

  • Growth of single crystalline GaN film on Si substrate using 3C-SiC as an intermediate layer

    Tetsuya Takeuchi;Hiroshi Amano;Kazumasa Hiramatsu;Nobuhiko Sawaki

  • Optical band gap in Ga1−xInxN (0<x<0.2) on GaN by photoreflection spectroscopy

    C. Wetzel;T. Takeuchi;S. Yamaguchi;H. Katoh

  • A dual-wavelength indium gallium nitride quantum well light emitting diode

    I. Ozden;E. Makarona;A. V. Nurmikko;T. Takeuchi

  • Thermal ionization energy of Si and Mg in AlGaN

    Maki Katsuragawa;Shigetoshi Sota;Miho Komori;Chitoshi Anbe

  • Structural properties of InN on GaN grown by metalorganic vapor-phase epitaxy

    Shigeo Yamaguchi;Michihiko Kariya;Shugo Nitta;Tetsuya Takeuchi

  • Lateral Hydrogen Diffusion at p-GaN Layers in Nitride-Based Light Emitting Diodes with Tunnel Junctions

    Yuka Kuwano;Mitsuru Kaga;Takatoshi Morita;Kouji Yamashita

  • Anomalous features in the optical properties of Al1−xInxN on GaN grown by metal organic vapor phase epitaxy

    Shigeo Yamaguchi;Michihiko Kariya;Shugo Nitta;Tetsuya Takeuchi

  • Vertical cavity violet light emitting diode incorporating an aluminum gallium nitride distributed Bragg mirror and a tunnel junction

    M. Diagne;Y. He;H. Zhou;E. Makarona

  • Piezoelectric Franz-Keldysh effect in strained GaInN/GaN heterostructures

    C. Wetzel;T. Takeuchi;H. Amano;I. Akasaki

  • Resonant-cavity InGaN quantum-well blue light-emitting diodes

    Y.-K. Song;M. Diagne;H. Zhou;A. V. Nurmikko

  • Low-temperature-deposited AlGaN interlayer for improvement of AlGaN/GaN heterostructure

    Satoshi Kamiyama;Motoaki Iwaya;Nobuaki Hayashi;Tetsuya Takeuchi

  • Structural and optical properties of AlInN and AlGaInN on GaN grown by metalorganic vapor phase epitaxy

    Shigeo Yamaguchi;Michihiko Kariya;Shugo Nitta;Hisaki Kato

Frequent Co-Authors

isamu akasaki
isamu akasaki Meijo University
Motoaki Iwaya
Motoaki Iwaya Meijo University
Satoshi Kamiyama
Satoshi Kamiyama Meijo University
Hiroshi Amano
Hiroshi Amano Nagoya University
Takashi Egawa
Takashi Egawa Nagoya Institute of Technology
Akira Yoshikawa
Akira Yoshikawa Tohoku University
Tadakatsu Ohkubo
Tadakatsu Ohkubo National Institute for Materials Science
Theeradetch Detchprohm
Theeradetch Detchprohm Georgia Institute of Technology
Shigefusa F. Chichibu
Shigefusa F. Chichibu Tohoku University
Kazuhiro Hono
Kazuhiro Hono National Institute for Materials Science

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