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Materials Science

D-Index
102
Citations
33850
World Ranking
976
National Ranking
320

Research.com Recognitions

  • 2001 - Member of the National Academy of Engineering For contributions in the development of silicon carbide and group III-nitrides as practical electronic materials for devices.

Overview

Robert F. Davis is affiliated with Carnegie Mellon University in the United States. Their research primarily spans the fields of Materials Science and Energy, with a significant focus on subfields including Materials Chemistry, Electronic, Optical and Magnetic Materials, Renewable Energy, Sustainability and the Environment, Mechanics of Materials, and Electrical and Electronic Engineering.

The main topics of their research include Ga2O3 and related materials, Advanced Photocatalysis Techniques, ZnO doping and properties, Boron and Carbon Nanomaterials Research, Metal and Thin Film Mechanics, Diamond and Carbon-based Materials Research, and Thermal properties of materials.

Among their frequent coauthors are Lisa M. Porter, Jingyu Tang, Kunyao Jiang, Matthew J. Cabral, and Philip M. Jean-Remy. Their publications are commonly found in venues such as Applied Physics Letters, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films, Journal of Applied Physics, arXiv (Cornell University), and IEEE Transactions on Electromagnetic Compatibility.

Recent papers by Robert F. Davis include:

  • Layered phase composition and microstructure of κ-Ga2O3-dominant heteroepitaxial films grown via MOCVD (2022, Journal of Applied Physics)
  • Characterization of Epitaxial β-(Al,Ga,In)2O3-Based Films and Applications as UV Photodetectors (2020, Journal of Electronic Materials)
  • Thermal stability and phase transformation of α-, κ(ε)-, and γ-Ga2O3 films under different ambient conditions (2024, Applied Physics Letters)
  • Mg and Al-induced phase transformation and stabilization of Ga2O3-based γ-phase spinels (2023, Applied Physics Letters)
  • Atomic-scale investigation of γ-Ga2O3 deposited on MgAl2O4 and its relationship with β-Ga2O3 (2024, APL Materials)

Robert F. Davis was awarded membership in the National Academy of Engineering in 2001 for contributions in the development of silicon carbide and group III-nitrides as practical electronic materials for devices.

Best Publications

  • Strain-related phenomena in GaN thin films

    C. Kisielowski;J. Krüger;S. Ruvimov;T. Suski

  • Lateral epitaxy of low defect density GaN layers via organometallic vapor phase epitaxy

    Ok-Hyun Nam;Michael D. Bremser;Tsvetanka S. Zheleva;Robert F. Davis

  • Dislocation density reduction via lateral epitaxy in selectively grown GaN structures

    Tsvetanka S. Zheleva;Ok-Hyun Nam;Michael D. Bremser;Robert F. Davis

  • III-V nitrides for electronic and optoelectronic applications

    R.F. Davis

  • Thin film deposition and microelectronic and optoelectronic device fabrication and characterization in monocrystalline alpha and beta silicon carbide

    R.F. Davis;G. Kelner;M. Shur;J.W. Palmour

  • A critical review of ohmic and rectifying contacts for silicon carbide

    Lisa M. Porter;Robert F. Davis

  • METHOD FOR GROWING LARGE-SIZED SINGLE-POLYTYPE SILICON CARBIDE SINGLE CRYSTAL

    Davis Robert F;Carter Jr Calvin H;Hunter Charles E

  • Growth of cubic phase gallium nitride by modified molecular‐beam epitaxy

    M. J. Paisley;Z. Sitar;J. B. Posthill;R. F. Davis

  • Cleaning of AlN and GaN surfaces

    S. W. King;J. P. Barnak;M. D. Bremser;K. M. Tracy

  • Gold Schottky contacts on oxygen plasma-treated, n-type ZnO(0001̄)

    B. J. Coppa;R. F. Davis;R. J. Nemanich

  • Methods of fabricating gallium nitride semiconductor layers by lateral overgrowth

    Robert F. Davis;Ok-Hyun Nam;Tsvetanka Zheleva;Michael D. Bremser

  • Epitaxial Growth and Characterization of β ‐ SiC Thin Films

    P. Liaw;R. F. Davis

  • GaN thin films deposited via organometallic vapor phase epitaxy on α(6H)–SiC(0001) using high‐temperature monocrystalline AlN buffer layers

    T. Warren Weeks;Michael D. Bremser;K. Shawn Ailey;Eric Carlson

  • Methods of fabricating gallium nitride microelectronic layers on silicon layers and gallium nitride microelectronic structures formed thereby

    Kevin J. Linthicum;Thomas Gehrke;Robert F. Davis;Darren B. Thomson

  • Pendeo-Epitaxy - A New Approach for Lateral Growth of Gallium Nitride Structures

    Tsvetanka S. Zheleva;Scott A. Smith;Darren B. Thomson;Thomas Gehrke

  • Chemical vapor deposition and characterization of 6H‐SiC thin films on off‐axis 6H‐SiC substrates

    H. S. Kong;J. T. Glass;R. F. Davis

  • Critical evaluation of the status of the areas for future research regarding the wide band gap semiconductors diamond, gallium nitride and silicon carbide

    R.F. Davis;Z. Sitar;B.E. Williams;H.S. Kong

  • Observation of a negative electron affinity for heteroepitaxial AlN on α(6H)-SiC(0001)

    M. C. Benjamin;Cheng Wang;R. F. Davis;R. J. Nemanich

  • Pendeoepitaxial gallium nitride semiconductor layers on silicon carbide substrates

    Kevin J. Linthicum;Thomas Gehrke;Darren B. Thomson;Eric P. Carlson

  • Methods of forming compound semiconductor layers using spaced trench arrays and semiconductor substrates formed thereby

    Thomas Gehrke;Kevin J. Linthicum;Robert F. Davis

Frequent Co-Authors

Robert Nemanich
Robert Nemanich Arizona State University
Kevin J. Linthicum
Kevin J. Linthicum MACOM (United States)
Zlatko Sitar
Zlatko Sitar North Carolina State University
Jeffrey T. Glass
Jeffrey T. Glass Duke University
Carsten Ronning
Carsten Ronning Friedrich Schiller University Jena
D. A. Shirley
D. A. Shirley University of California, Berkeley
Zuzanna Liliental-Weber
Zuzanna Liliental-Weber Lawrence Berkeley National Laboratory
John F. Muth
John F. Muth North Carolina State University
Michael Dudley
Michael Dudley Stony Brook University
Detlef Hommel
Detlef Hommel University of Wrocław

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