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Materials Science

D-Index
47
Citations
9124
World Ranking
11071
National Ranking
2606

Overview

Michael Dudley is affiliated with Stony Brook University in the United States and specializes in engineering, particularly within the subfields of electrical and electronic engineering, condensed matter physics, atomic and molecular physics and optics, biomedical engineering, and mechanics of materials.

Their research primarily covers topics related to semiconductor technologies and materials. Key areas of focus include:

  • Silicon Carbide Semiconductor Technologies
  • Silicon and Solar Cell Technologies
  • GaN-based semiconductor devices and materials
  • Semiconductor materials and interfaces
  • Thin-Film Transistor Technologies
  • Semiconductor materials and devices
  • Integrated Circuits and Semiconductor Failure Analysis

Michael Dudley has contributed numerous papers, with publications appearing in several academic venues. Frequent publication venues include:

  • ECS Meeting Abstracts
  • ECS Transactions
  • Journal of Electronic Materials
  • Materials Science Forum
  • Defect and Diffusion Forum / Diffusion and Defect Data, Solid State Data. Part A, Defect and Diffusion Forum

Some recent papers authored or co-authored by Michael Dudley include:

  • X-ray topography characterization of gallium nitride substrates for power device development, 2020, Journal of Crystal Growth
  • The improvement of Mo/4H-SiC Schottky diodes via a P2O5 surface passivation treatment, 2020, Journal of Applied Physics
  • Synchrotron X-ray topography characterization of high quality ammonothermal-grown gallium nitride substrates, 2020, Journal of Crystal Growth
  • Synchrotron X-ray topographic image contrast variation of screw-type basal plane dislocations located at different depths below the crystal surface in 4H-SiC, 2021, Acta Materialia
  • Static Performance and Reliability of 4H-SiC Diodes with P+ Regions Formed by Various Profiles and Temperatures, 2022, 2022 IEEE International Reliability Physics Symposium (IRPS)

The scientist frequently collaborates with several co-authors including Balaji Raghothamachar, Yafei Liu, Shanshan Hu, Hongyu Peng, and Qianyu Cheng. Their collaboration counts with these colleagues range widely, indicating ongoing joint research efforts.

Best Publications

  • Springer handbook of crystal growth

    Govindhan Dhanaraj;Kullaiah Byrappa;Vishwanath Prasad;Michael Dudley

  • Fabrication and characterization of polycrystalline WO3 nanofibers and their application for ammonia sensing.

    Guan Wang;Yuan Ji;Xianrong Huang;Xiaoqing Yang

  • Study of bulk and elementary screw dislocation assisted reverse breakdown in low-voltage (<250 V) 4H-SiC p/sup +/-n junction diodes. I. DC properties

    P.G. Neudeck;Wei Huang;M. Dudley

  • Growth and Characterization of Silicon Carbide Crystals

    Govindhan Dhanaraj;Balaji Raghothamachar;Michael Dudley

  • The mechanism of micropipe nucleation at inclusions in silicon carbide

    M. Dudley;X. R. Huang;W. Huang;A. Powell

  • Breakdown degradation associated with elementary screw dislocations in 4H-SiC p+n junction rectifiers

    P.G Neudeck;W Huang;M Dudley

  • Seeded growth of AlN bulk crystals in m- and c-orientation

    P. Lu;R. Collazo;R.F. Dalmau;G. Durkaya

  • White-beam synchrotron topographic studies of defects in 6H-SiC single crystals

    M Dudley;Shaoping Wang;Wei Huang;C H Carter

  • Direct evidence of micropipe-related pure superscrew dislocations in SiC

    X. R. Huang;M. Dudley;W. M. Vetter;W. Huang

  • Recombination-enhanced defect motion in forward-biased 4H–SiC p-n diodes

    M. Skowronski;J. Q. Liu;W. M. Vetter;M. Dudley

  • Study of the defect elimination mechanisms in aspect ratio trapping Ge growth

    J. Bai;J.-S. Park;Z. Cheng;M. Curtin

  • Report on the growth of bulk aluminum nitride and subsequent substrate preparation

    J. Carlos Rojo;Glen A. Slack;Kenneth Morgan;Balaji Raghothamachar

  • Superscrew dislocation contrast on synchrotron white-beam topographs: an accurate description of the direct dislocation image

    X. R. Huang;M. Dudley;W. M. Vetter;W. Huang

  • Reduction of threading dislocation densities in AlN∕sapphire epilayers driven by growth mode modification

    J. Bai;M. Dudley;W. H. Sun;H. M. Wang

  • VO2 films with strong semiconductor to metal phase transition prepared by the precursor oxidation process

    M. Gurvitch;S. Luryi;A. Polyakov;A. Shabalov

  • Current Status and Emerging Trends in Wide Bandgap (WBG) Semiconductor Power Switching Devices

    Krishna Shenai;Michael Dudley;Robert F. Davis

  • X-ray characterization of bulk AIN single crystals grown by the sublimation technique

    B. Raghothamachar;M. Dudley;J.C. Rojo;K. Morgan

  • Nucleation of threading dislocations in sublimation grown silicon carbide

    E. K. Sanchez;J. Q. Liu;M. De Graef;M. Skowronski

  • Contribution of x-ray topography and high-resolution diffraction to the study of defects in SiC

    Michael Dudley;Xian Rong Huang;William M. Vetter

  • CFD Growth of 3C-SiC on 4H/6H Mesas

    Philip G. Neudeck;Andrew J. Trunek;David J. Spry;J. Anthony Powell

Frequent Co-Authors

Philip G. Neudeck
Philip G. Neudeck Glenn Research Center
James H. Edgar
James H. Edgar Kansas State University
Martin Kuball
Martin Kuball University of Bristol
Zlatko Sitar
Zlatko Sitar North Carolina State University
Ian Baker
Ian Baker Dartmouth College
Vishwanath Prasad
Vishwanath Prasad University of North Texas
Marek Skowronski
Marek Skowronski Carnegie Mellon University
Robert F. Davis
Robert F. Davis Carnegie Mellon University
Dong Su
Dong Su Chinese Academy of Sciences
Yimei Zhu
Yimei Zhu Brookhaven National Laboratory

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