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Materials Science

D-Index
46
Citations
10340
World Ranking
11335
National Ranking
701

Overview

Yoshinao Kumagai is affiliated with the Tokyo University of Agriculture and Technology in Japan and has contributed extensively to the field of materials science, with a particular focus on Ga2O3 and related materials. Their research encompasses a range of subfields including materials chemistry, electronic, optical and magnetic materials, renewable energy and sustainability, electrical and electronic engineering, and condensed matter physics.

The scientist's work covers numerous main topics such as:

  • Ga2O3 and related materials
  • ZnO doping and properties
  • Advanced photocatalysis techniques
  • GaN-based semiconductor devices and materials
  • Electronic and structural properties of oxides
  • Semiconductor materials and devices
  • Luminescence properties of advanced materials

Kumagai has published a significant number of papers in various academic venues, with frequent contributions to:

  • Japanese Journal of Applied Physics
  • Applied Physics Letters
  • Journal of Crystal Growth
  • Applied Physics Express
  • physica status solidi (b)

Some recent papers authored include:

  • "Anisotropic complex refractive index of β-Ga2O3 bulk and epilayer evaluated by terahertz time-domain spectroscopy" (2021, Applied Physics Letters)
  • "Vertical β-Ga2O3 Schottky barrier diodes with trench staircase field plate" (2022, Applied Physics Express)
  • "Electron paramagnetic resonance and theoretical study of gallium vacancy in β-Ga2O3" (2020, Applied Physics Letters)
  • "Effect of substrate orientation on homoepitaxial growth of β-Ga2O3 by halide vapor phase epitaxy" (2022, Applied Physics Letters)
  • "Aperture-limited conduction and its possible mechanism in ion-implanted current aperture vertical β-Ga2O3 MOSFETs" (2021, Applied Physics Letters)

Frequent collaborators in Kumagai's research activities include:

  • Ken Goto
  • Hisashi Murakami
  • Masataka Higashiwaki
  • Bo Monemar
  • Kazutada Ikenaga

Best Publications

  • Recent progress in Ga2O3 power devices

    Masataka Higashiwaki;Kohei Sasaki;Hisashi Murakami;Yoshinao Kumagai

  • 1-kV vertical Ga2O3 field-plated Schottky barrier diodes

    Keita Konishi;Ken Goto;Hisashi Murakami;Yoshinao Kumagai

  • Preparation of Large Freestanding GaN Substrates by Hydride Vapor Phase Epitaxy Using GaAs as a Starting Substrate

    Kensaku Motoki;Takuji Okahisa;Naoki Matsumoto;Masato Matsushima

  • Homoepitaxial growth of β-Ga2O3 layers by halide vapor phase epitaxy

    Hisashi Murakami;Kazushiro Nomura;Ken Goto;Kohei Sasaki

  • Temperature-dependent capacitance–voltage and current–voltage characteristics of Pt/Ga2O3 (001) Schottky barrier diodes fabricated on n––Ga2O3 drift layers grown by halide vapor phase epitaxy

    Masataka Higashiwaki;Keita Konishi;Kohei Sasaki;Ken Goto

  • State-of-the-art technologies of gallium oxide power devices

    Masataka Higashiwaki;Akito Kuramata;Hisashi Murakami;Yoshinao Kumagai

  • Current status of Ga2O3 power devices

    Masataka Higashiwaki;Hisashi Murakami;Yoshinao Kumagai;Akito Kuramata

  • Anisotropy, phonon modes, and free charge carrier parameters in monoclinic β-gallium oxide single crystals

    M. Schubert;M. Schubert;R. Korlacki;S. Knight;T. Hofmann;T. Hofmann

  • Growth and characterization of freestanding GaN substrates

    Kensaku Motoki;Takuji Okahisa;Seiji Nakahata;Naoki Matsumoto

  • Halide vapor phase epitaxy of Si doped β-Ga2O3 and its electrical properties

    Ken Goto;Keita Konishi;Hisashi Murakami;Yoshinao Kumagai

  • Band-to-band transitions, selection rules, effective mass, and excitonic contributions in monoclinic β − Ga 2 O 3

    Alyssa Mock;Rafał Korlacki;Chad Briley;Vanya Darakchieva

  • Vertical Ga 2 O 3 Schottky Barrier Diodes With Guard Ring Formed by Nitrogen-Ion Implantation

    Chia-Hung Lin;Yohei Yuda;Man Hoi Wong;Mayuko Sato

  • On the origin of the 265 nm absorption band in AlN bulk crystals

    Ramón Collazo;Jinqiao Xie;Benjamin E. Gaddy;Zachary Bryan

  • Acceptor doping of β-Ga2O3 by Mg and N ion implantations

    Man Hoi Wong;Chia-Hung Lin;Akito Kuramata;Shigenobu Yamakoshi

  • Current Aperture Vertical $eta$ -Ga 2 O 3 MOSFETs Fabricated by N- and Si-Ion Implantation Doping

    Man Hoi Wong;Ken Goto;Hisashi Murakami;Yoshinao Kumagai

  • Preparation of a Freestanding AlN Substrate from a Thick AlN Layer Grown by Hydride Vapor Phase Epitaxy on a Bulk AlN Substrate Prepared by Physical Vapor Transport

    Yoshinao Kumagai;Yuki Kubota;Toru Nagashima;Toru Nagashima;Toru Kinoshita

  • Performance and Reliability of Deep-Ultraviolet Light-Emitting Diodes Fabricated on AlN Substrates Prepared by Hydride Vapor Phase Epitaxy

    Toru Kinoshita;Toru Kinoshita;Toshiyuki Obata;Toru Nagashima;Hiroyuki Yanagi

  • Deep-Ultraviolet Light-Emitting Diodes Fabricated on AlN Substrates Prepared by Hydride Vapor Phase Epitaxy

    Toru Kinoshita;Toru Kinoshita;Keiichiro Hironaka;Toshiyuki Obata;Toru Nagashima;Toru Nagashima

  • Thermodynamic study of β-Ga2O3 growth by halide vapor phase epitaxy

    Kazushiro Nomura;Ken Goto;Rie Togashi;Hisashi Murakami

  • Growth of thick AlN layers by hydride vapor-phase epitaxy

    Yoshinao Kumagai;Takayoshi Yamane;Akinori Koukitu

  • Preparation of Large Freestanding GaN Substrates by Hydride Vapor Phase Epitaxy Using GaAs as a Starting Substrate : Semiconductors

    Kensaku Motoki;Takuji Okahisa;Naoki Matsumoto;Masato Matsushima

Frequent Co-Authors

Bo Monemar
Bo Monemar Linköping University
Masataka Higashiwaki
Masataka Higashiwaki Osaka Metropolitan University
Akito Kuramata
Akito Kuramata Novel Crystal Technology, Inc
Shigenobu Yamakoshi
Shigenobu Yamakoshi Fujitsu (Japan)
Man Hoi Wong
Man Hoi Wong Hong Kong University of Science and Technology
Zlatko Sitar
Zlatko Sitar North Carolina State University
Ramon Collazo
Ramon Collazo North Carolina State University
Kohei Sasaki
Kohei Sasaki Novel Crystal Technology, Inc
Mathias Schubert
Mathias Schubert University of Nebraska–Lincoln
Takashi Suemasu
Takashi Suemasu University of Tsukuba

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