World's Best Scientists 2026 revealed!
Adam William Saxler

Adam William Saxler

D-Index & Metrics

Materials Science

D-Index
52
Citations
10149
World Ranking
9543
National Ranking
2309

Adam William Saxler publication distribution in Materials Science in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Adam William Saxler sits on this spectrum.

50–69 publications: 28 scientists 70–89 publications: 152 scientists 90–109 publications: 356 scientists 110–129 publications: 487 scientists 130–149 publications: 723 scientists 150–169 publications: 835 scientists 170–189 publications: 850 scientists 190–209 publications: 891 scientists 210–229 publications: 862 scientists 230–249 publications: 766 scientists 250–269 publications: 726 scientists 270–289 publications: 665 scientists 290–309 publications: 593 scientists 310–329 publications: 537 scientists 330–349 publications: 477 scientists 350–369 publications: 440 scientists 370–389 publications: 356 scientists 390–409 publications: 321 scientists 410–429 publications: 256 scientists 430–449 publications: 246 scientists 450–469 publications: 216 scientists 470–489 publications: 212 scientists 490–509 publications: 174 scientists 510–529 publications: 194 scientists 530–549 publications: 162 scientists 550–569 publications: 131 scientists 570–589 publications: 111 scientists 590–609 publications: 103 scientists 610–629 publications: 99 scientists 630–649 publications: 77 scientists 650–669 publications: 92 scientists 670–689 publications: 56 scientists 690–709 publications: 53 scientists 710–729 publications: 53 scientists 730–749 publications: 38 scientists 750–769 publications: 52 scientists 770–789 publications: 43 scientists 790–809 publications: 38 scientists 810–829 publications: 34 scientists 830–849 publications: 25 scientists 850–869 publications: 18 scientists 870–889 publications: 20 scientists 890–909 publications: 24 scientists 910–929 publications: 27 scientists 930–949 publications: 20 scientists 950–969 publications: 17 scientists 970–989 publications: 10 scientists 990–1,009 publications: 16 scientists 1,010–1,029 publications: 13 scientists 1,030–1,049 publications: 12 scientists 1,050–1,069 publications: 9 scientists 1,070–1,089 publications: 8 scientists 1,090–1,109 publications: 7 scientists 1,110–1,129 publications: 9 scientists 1,130–1,149 publications: 2 scientists 1,150–1,162 publications: 5 scientists 1,163+ publications: 100 scientists
50 publications 1,163+

This scientist: 148 publications — 13th percentile

13% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,163 publications or more.

Adam William Saxler D-index placement in Materials Science in 2026

The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Adam William Saxler sits on this spectrum.

40–41 D-Index: 211 scientists 42–43 D-Index: 450 scientists 44–45 D-Index: 612 scientists 46–47 D-Index: 612 scientists 48–49 D-Index: 598 scientists 50–51 D-Index: 657 scientists 52–53 D-Index: 667 scientists 54–55 D-Index: 621 scientists 56–57 D-Index: 597 scientists 58–59 D-Index: 610 scientists 60–61 D-Index: 587 scientists 62–63 D-Index: 606 scientists 64–65 D-Index: 533 scientists 66–67 D-Index: 490 scientists 68–69 D-Index: 469 scientists 70–71 D-Index: 378 scientists 72–73 D-Index: 421 scientists 74–75 D-Index: 359 scientists 76–77 D-Index: 323 scientists 78–79 D-Index: 299 scientists 80–81 D-Index: 230 scientists 82–83 D-Index: 210 scientists 84–85 D-Index: 195 scientists 86–87 D-Index: 203 scientists 88–89 D-Index: 175 scientists 90–91 D-Index: 175 scientists 92–93 D-Index: 142 scientists 94–95 D-Index: 121 scientists 96–97 D-Index: 117 scientists 98–99 D-Index: 107 scientists 100–101 D-Index: 88 scientists 102–103 D-Index: 85 scientists 104–105 D-Index: 68 scientists 106–107 D-Index: 62 scientists 108–109 D-Index: 57 scientists 110–111 D-Index: 45 scientists 112–113 D-Index: 49 scientists 114–115 D-Index: 50 scientists 116–117 D-Index: 34 scientists 118–119 D-Index: 38 scientists 120–121 D-Index: 37 scientists 122–123 D-Index: 29 scientists 124–125 D-Index: 28 scientists 126–127 D-Index: 24 scientists 128–129 D-Index: 33 scientists 130–131 D-Index: 28 scientists 132–133 D-Index: 21 scientists 134–135 D-Index: 20 scientists 136–137 D-Index: 23 scientists 138–139 D-Index: 17 scientists 140–141 D-Index: 12 scientists 142–143 D-Index: 17 scientists 144–145 D-Index: 21 scientists 146–147 D-Index: 13 scientists 148–149 D-Index: 11 scientists 150–151 D-Index: 14 scientists 152–153 D-Index: 13 scientists 154–155 D-Index: 9 scientists 156–157 D-Index: 10 scientists 158–159 D-Index: 7 scientists 160–161 D-Index: 4 scientists 162–163 D-Index: 4 scientists 164 D-Index: 3 scientists 165+ D-Index: 98 scientists
40 D-Index 165+

This scientist: 52 D-Index — 27th percentile

27% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 165 D-Index or more.

Overview

What is he best known for?

The fields of study he is best known for:

  • Semiconductor
  • Optoelectronics
  • Optics

Optoelectronics, Nitride, Chemical vapor deposition, Sapphire and Layer are his primary areas of study. His Optoelectronics study deals with Ohmic contact intersecting with Semiconductor device. The Chemical vapor deposition study combines topics in areas such as Thin film, Responsivity and Ultraviolet.

His Sapphire research is multidisciplinary, incorporating elements of Silicon, Epitaxy and Photoluminescence. As part of his studies on Layer, Adam William Saxler frequently links adjacent subjects like Transistor. His Transistor course of study focuses on Substrate and Heterojunction.

His most cited work include:

  • 30-W/mm GaN HEMTs by field plate optimization (911 citations)
  • Heavy doping effects in Mg-doped GaN (276 citations)
  • 40-W/mm Double Field-plated GaN HEMTs (248 citations)

What are the main themes of his work throughout his whole career to date?

His primary areas of investigation include Optoelectronics, Layer, Nitride, Doping and Transistor. Adam William Saxler has researched Optoelectronics in several fields, including Semiconductor device, Substrate and Epitaxy. His work carried out in the field of Layer brings together such families of science as Band gap and Lattice constant.

His studies deal with areas such as Electronic engineering, Silicon carbide, Heterojunction and Aluminium as well as Nitride. The concepts of his Doping study are interwoven with issues in Inorganic chemistry, Sapphire, Gallium and Analytical chemistry. His work on High electron, Field-effect transistor and High-electron-mobility transistor as part of general Transistor research is frequently linked to Communication channel, thereby connecting diverse disciplines of science.

He most often published in these fields:

  • Optoelectronics (77.58%)
  • Layer (33.33%)
  • Nitride (31.52%)

What were the highlights of his more recent work (between 2006-2019)?

  • Optoelectronics (77.58%)
  • Layer (33.33%)
  • Nitride (31.52%)

In recent papers he was focusing on the following fields of study:

His primary areas of study are Optoelectronics, Layer, Nitride, Semiconductor device and Doping. His Optoelectronics research integrates issues from Transistor, Silicon carbide and Epitaxy. Within one scientific family, Adam William Saxler focuses on topics pertaining to Wafer under Epitaxy, and may sometimes address concerns connected to High-electron-mobility transistor, Electron mobility and Sheet resistance.

His Layer study combines topics from a wide range of disciplines, such as Electronic engineering, Band gap and Lattice constant. His Nitride research incorporates themes from Inorganic chemistry and Heterojunction. His Semiconductor device research includes elements of Semiconductor structure and Ohmic contact.

Between 2006 and 2019, his most popular works were:

  • Cap Layers Including Aluminum Nitride for Nitride-Based Transistors and Methods of Fabricating Same (65 citations)
  • Integrated nitride and silicon carbide-based devices (39 citations)
  • Thick nitride semiconductor structures with interlayer structures and methods of fabricating thick nitride semiconductor structures (37 citations)

In his most recent research, the most cited papers focused on:

  • Semiconductor
  • Optics
  • Optoelectronics

The scientist’s investigation covers issues in Optoelectronics, Layer, Nitride, Doping and Dopant. Optoelectronics and Semiconductor device are commonly linked in his work. His research in Semiconductor device intersects with topics in Barrier layer, Ohmic contact and Semiconductor.

His Nitride study combines topics in areas such as Inorganic chemistry and Substrate. His Substrate research is multidisciplinary, incorporating perspectives in Epitaxy, Silicon carbide, Electrical contacts, Transistor and Electronic engineering. He has included themes like Aluminium and Gallium in his Dopant study.

Best Publications

  • 30-W/mm GaN HEMTs by field plate optimization

    Y.-F. Wu;A. Saxler;M. Moore;R.P. Smith

  • Hetero junction transistor and method for manufacturing same

    Adam W Saxler;ウィリアム サックスラー アダム

  • Heavy doping effects in Mg-doped GaN

    Peter Kozodoy;Huili Xing;Steven P. DenBaars;Umesh K. Mishra

  • 40-W/mm Double Field-plated GaN HEMTs

    Y.-F. Wu;M. Moore;A. Saxler;T. Wisleder

  • Methods of fabricating nitride-based transistors having regrown ohmic contact regions and nitride-based transistors having regrown ohmic contact regions

    Adam William Saxler;Richard Peter Smith

  • Methods of passivating surfaces of wide bandgap semiconductor devices

    Adam William Saxler;Scott Sheppard;Richard Peter Smith

  • AlGaN ultraviolet photoconductors grown on sapphire

    D. Walker;X. Zhang;P. Kung;A. Saxler

  • Nitride-based transistors and methods of fabrication thereof using non-etched contact recesses

    Adam William Saxler;Richard Peter Smith;Scott T. Sheppard

  • High quality AIN and GaN epilayers grown on (00⋅1) sapphire, (100), and (111) silicon substrates

    P. Kung;A. Saxler;X. Zhang;D. Walker

  • Polarization-enhanced Mg doping of AlGaN/GaN superlattices

    Peter Kozodoy;Yulia P. Smorchkova;Monica Hansen;Huili Xing

  • Nitride heterojunction transistors having charge-transfer induced energy barriers and methods of fabricating the same

    Adam William Saxler

  • VISIBLE BLIND GAN P-I-N PHOTODIODES

    D. Walker;A. Saxler;P. Kung;X. Zhang

  • Semiconductor devices including implanted regions and protective layers

    Scott T. Sheppard;Adam Saxler

  • Ionization Energies and Electron Mobilities in Phosphorus- and Nitrogen-Implanted 4H-Silicon Carbide

    Michael A. Capano;James A. Cooper;M.R. Melloch;Adam W. Saxler

  • Binary group III-nitride based high electron mobility transistors

    Adam William Saxler

  • AlxGa1−xN (0⩽x⩽1) ultraviolet photodetectors grown on sapphire by metal-organic chemical-vapor deposition

    D. Walker;X. Zhang;A. Saxler;P. Kung

  • Determination of the band-gap energy of Al1−xInxN grown by metal–organic chemical-vapor deposition

    K. S. Kim;A. Saxler;P. Kung;Manijeh Razeghi

  • Growth of AlxGa1−xN:Ge on sapphire and silicon substrates

    X. Zhang;P. Kung;A. Saxler;D. Walker

  • A crystallographic model of (00⋅1) aluminum nitride epitaxial thin film growth on (00⋅1) sapphire substrate

    C. J. Sun;P. Kung;A. Saxler;H. Ohsato

  • High quality aluminum nitride epitaxial layers grown on sapphire substrates

    A. Saxler;P. Kung;C. J. Sun;E. Bigan

Frequent Co-Authors

Manijeh Razeghi
Manijeh Razeghi Northwestern University
Patrick Kung
Patrick Kung University of Alabama
Yifeng Wu
Yifeng Wu Transphorm Inc.
Umesh K. Mishra
Umesh K. Mishra University of California, Santa Barbara
Steven P. DenBaars
Steven P. DenBaars University of California, Santa Barbara
David C. Look
David C. Look Wright State University
Paul T. Fini
Paul T. Fini Raytheon (United States)
Peter G. Schunemann
Peter G. Schunemann ON Semiconductor (United States)
Vinayak P. Dravid
Vinayak P. Dravid Northwestern University

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