World's Best Scientists 2026 revealed!
Adam William Saxler

Adam William Saxler

D-Index & Metrics

Materials Science

D-Index
52
Citations
10149
World Ranking
9545
National Ranking
2311

Overview

What is he best known for?

The fields of study he is best known for:

  • Semiconductor
  • Optoelectronics
  • Optics

Optoelectronics, Nitride, Chemical vapor deposition, Sapphire and Layer are his primary areas of study. His Optoelectronics study deals with Ohmic contact intersecting with Semiconductor device. The Chemical vapor deposition study combines topics in areas such as Thin film, Responsivity and Ultraviolet.

His Sapphire research is multidisciplinary, incorporating elements of Silicon, Epitaxy and Photoluminescence. As part of his studies on Layer, Adam William Saxler frequently links adjacent subjects like Transistor. His Transistor course of study focuses on Substrate and Heterojunction.

His most cited work include:

  • 30-W/mm GaN HEMTs by field plate optimization (911 citations)
  • Heavy doping effects in Mg-doped GaN (276 citations)
  • 40-W/mm Double Field-plated GaN HEMTs (248 citations)

What are the main themes of his work throughout his whole career to date?

His primary areas of investigation include Optoelectronics, Layer, Nitride, Doping and Transistor. Adam William Saxler has researched Optoelectronics in several fields, including Semiconductor device, Substrate and Epitaxy. His work carried out in the field of Layer brings together such families of science as Band gap and Lattice constant.

His studies deal with areas such as Electronic engineering, Silicon carbide, Heterojunction and Aluminium as well as Nitride. The concepts of his Doping study are interwoven with issues in Inorganic chemistry, Sapphire, Gallium and Analytical chemistry. His work on High electron, Field-effect transistor and High-electron-mobility transistor as part of general Transistor research is frequently linked to Communication channel, thereby connecting diverse disciplines of science.

He most often published in these fields:

  • Optoelectronics (77.58%)
  • Layer (33.33%)
  • Nitride (31.52%)

What were the highlights of his more recent work (between 2006-2019)?

  • Optoelectronics (77.58%)
  • Layer (33.33%)
  • Nitride (31.52%)

In recent papers he was focusing on the following fields of study:

His primary areas of study are Optoelectronics, Layer, Nitride, Semiconductor device and Doping. His Optoelectronics research integrates issues from Transistor, Silicon carbide and Epitaxy. Within one scientific family, Adam William Saxler focuses on topics pertaining to Wafer under Epitaxy, and may sometimes address concerns connected to High-electron-mobility transistor, Electron mobility and Sheet resistance.

His Layer study combines topics from a wide range of disciplines, such as Electronic engineering, Band gap and Lattice constant. His Nitride research incorporates themes from Inorganic chemistry and Heterojunction. His Semiconductor device research includes elements of Semiconductor structure and Ohmic contact.

Between 2006 and 2019, his most popular works were:

  • Cap Layers Including Aluminum Nitride for Nitride-Based Transistors and Methods of Fabricating Same (65 citations)
  • Integrated nitride and silicon carbide-based devices (39 citations)
  • Thick nitride semiconductor structures with interlayer structures and methods of fabricating thick nitride semiconductor structures (37 citations)

In his most recent research, the most cited papers focused on:

  • Semiconductor
  • Optics
  • Optoelectronics

The scientist’s investigation covers issues in Optoelectronics, Layer, Nitride, Doping and Dopant. Optoelectronics and Semiconductor device are commonly linked in his work. His research in Semiconductor device intersects with topics in Barrier layer, Ohmic contact and Semiconductor.

His Nitride study combines topics in areas such as Inorganic chemistry and Substrate. His Substrate research is multidisciplinary, incorporating perspectives in Epitaxy, Silicon carbide, Electrical contacts, Transistor and Electronic engineering. He has included themes like Aluminium and Gallium in his Dopant study.

Best Publications

  • 30-W/mm GaN HEMTs by field plate optimization

    Y.-F. Wu;A. Saxler;M. Moore;R.P. Smith

  • Hetero junction transistor and method for manufacturing same

    Adam W Saxler;ウィリアム サックスラー アダム

  • Heavy doping effects in Mg-doped GaN

    Peter Kozodoy;Huili Xing;Steven P. DenBaars;Umesh K. Mishra

  • 40-W/mm Double Field-plated GaN HEMTs

    Y.-F. Wu;M. Moore;A. Saxler;T. Wisleder

  • Methods of fabricating nitride-based transistors having regrown ohmic contact regions and nitride-based transistors having regrown ohmic contact regions

    Adam William Saxler;Richard Peter Smith

  • Methods of passivating surfaces of wide bandgap semiconductor devices

    Adam William Saxler;Scott Sheppard;Richard Peter Smith

  • AlGaN ultraviolet photoconductors grown on sapphire

    D. Walker;X. Zhang;P. Kung;A. Saxler

  • Nitride-based transistors and methods of fabrication thereof using non-etched contact recesses

    Adam William Saxler;Richard Peter Smith;Scott T. Sheppard

  • High quality AIN and GaN epilayers grown on (00⋅1) sapphire, (100), and (111) silicon substrates

    P. Kung;A. Saxler;X. Zhang;D. Walker

  • Polarization-enhanced Mg doping of AlGaN/GaN superlattices

    Peter Kozodoy;Yulia P. Smorchkova;Monica Hansen;Huili Xing

  • Nitride heterojunction transistors having charge-transfer induced energy barriers and methods of fabricating the same

    Adam William Saxler

  • VISIBLE BLIND GAN P-I-N PHOTODIODES

    D. Walker;A. Saxler;P. Kung;X. Zhang

  • Semiconductor devices including implanted regions and protective layers

    Scott T. Sheppard;Adam Saxler

  • Ionization Energies and Electron Mobilities in Phosphorus- and Nitrogen-Implanted 4H-Silicon Carbide

    Michael A. Capano;James A. Cooper;M.R. Melloch;Adam W. Saxler

  • Binary group III-nitride based high electron mobility transistors

    Adam William Saxler

  • AlxGa1−xN (0⩽x⩽1) ultraviolet photodetectors grown on sapphire by metal-organic chemical-vapor deposition

    D. Walker;X. Zhang;A. Saxler;P. Kung

  • Determination of the band-gap energy of Al1−xInxN grown by metal–organic chemical-vapor deposition

    K. S. Kim;A. Saxler;P. Kung;Manijeh Razeghi

  • Growth of AlxGa1−xN:Ge on sapphire and silicon substrates

    X. Zhang;P. Kung;A. Saxler;D. Walker

  • A crystallographic model of (00⋅1) aluminum nitride epitaxial thin film growth on (00⋅1) sapphire substrate

    C. J. Sun;P. Kung;A. Saxler;H. Ohsato

  • High quality aluminum nitride epitaxial layers grown on sapphire substrates

    A. Saxler;P. Kung;C. J. Sun;E. Bigan

Frequent Co-Authors

Manijeh Razeghi
Manijeh Razeghi Northwestern University
Patrick Kung
Patrick Kung University of Alabama
Yifeng Wu
Yifeng Wu Transphorm Inc.
Umesh K. Mishra
Umesh K. Mishra University of California, Santa Barbara
Steven P. DenBaars
Steven P. DenBaars University of California, Santa Barbara
David C. Look
David C. Look Wright State University
Paul T. Fini
Paul T. Fini Raytheon (United States)
Peter G. Schunemann
Peter G. Schunemann ON Semiconductor (United States)
Vinayak P. Dravid
Vinayak P. Dravid Northwestern University

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