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Scott T. Sheppard

Scott T. Sheppard

D-Index & Metrics

Electronics and Electrical Engineering

D-Index
37
Citations
8816
World Ranking
5029
National Ranking
1747

Overview

What is he best known for?

The fields of study he is best known for:

  • Semiconductor
  • Transistor
  • Electrical engineering

Scott T. Sheppard focuses on Optoelectronics, Transistor, Layer, Nitride and Electrical engineering. His studies deal with areas such as Etching, Ohmic contact, Electronic engineering and Semiconductor device as well as Optoelectronics. His studies in Ohmic contact integrate themes in fields like Metal gate and Semiconductor.

His Gate oxide and High-electron-mobility transistor investigations are all subjects of Transistor research. Scott T. Sheppard is interested in Substrate, which is a branch of Layer. His work in Nitride addresses subjects such as Passivation, which are connected to disciplines such as Wide-bandgap semiconductor.

His most cited work include:

  • A Review of GaN on SiC High Electron-Mobility Power Transistors and MMICs (554 citations)
  • Method of forming vias in silicon carbide and resulting devices and circuits (327 citations)
  • Nitride based transistors on semi-insulating silicon carbide substrates (319 citations)

What are the main themes of his work throughout his whole career to date?

His main research concerns Optoelectronics, Transistor, Layer, Semiconductor device and Nitride. His research integrates issues of Ohmic contact, Electronic engineering and Electrical engineering in his study of Optoelectronics. His Gate oxide and High-electron-mobility transistor study in the realm of Transistor connects with subjects such as Bar.

His High-electron-mobility transistor research includes elements of Gallium nitride, RF power amplifier and Monolithic microwave integrated circuit. His study explores the link between Layer and topics such as Electrical conductor that cross with problems in Sic substrate and Semi insulating. His study looks at the intersection of Nitride and topics like Barrier layer with Passivation.

He most often published in these fields:

  • Optoelectronics (90.20%)
  • Transistor (42.16%)
  • Layer (39.22%)

What were the highlights of his more recent work (between 2011-2021)?

  • Optoelectronics (90.20%)
  • Transistor (42.16%)
  • Layer (39.22%)

In recent papers he was focusing on the following fields of study:

His primary areas of study are Optoelectronics, Transistor, Layer, Electrical engineering and High-electron-mobility transistor. Scott T. Sheppard combines topics linked to Semiconductor device with his work on Optoelectronics. His Transistor study incorporates themes from Signal, Jumper, Nitride and Linearity.

The study incorporates disciplines such as Passivation, Leakage, Ohmic contact, Schottky barrier and Dry etching in addition to Nitride. The concepts of his High-electron-mobility transistor study are interwoven with issues in Amplifier and Monolithic microwave integrated circuit. The Amplifier study combines topics in areas such as Gallium nitride, Electronic engineering and Power semiconductor device.

Between 2011 and 2021, his most popular works were:

  • A Review of GaN on SiC High Electron-Mobility Power Transistors and MMICs (554 citations)
  • Methods of fabricating nitride-based transistors with an ETCH stop layer (9 citations)
  • Transistor with bypassed gate structure field (7 citations)

In his most recent research, the most cited papers focused on:

  • Semiconductor
  • Transistor
  • Electrical engineering

Scott T. Sheppard mostly deals with Transistor, Optoelectronics, Electrical engineering, Layer and Linearity. Scott T. Sheppard has researched Transistor in several fields, including Barrier layer and Semiconductor. The various areas that he examines in his Barrier layer study include Nitride, Passivation, Dry etching and Dielectric layer.

His study in RF power amplifier and Monolithic microwave integrated circuit falls under the purview of Electrical engineering. His High-electron-mobility transistor research is multidisciplinary, incorporating elements of Amplifier, Circuit design, Power semiconductor device and Integrated circuit. Bar combines with fields such as Jumper and Signal in his investigation.

Best Publications

  • 30-W/mm GaN HEMTs by field plate optimization

    Y.-F. Wu;A. Saxler;M. Moore;R.P. Smith

  • A Review of GaN on SiC High Electron-Mobility Power Transistors and MMICs

    R. S. Pengelly;S. M. Wood;J. W. Milligan;S. T. Sheppard

  • High-power microwave GaN/AlGaN HEMTs on semi-insulating silicon carbide substrates

    S.T. Sheppard;K. Doverspike;W.L. Pribble;S.T. Allen

  • Method of forming vias in silicon carbide and resulting devices and circuits

    Zoltan Ring;Scott Thomas Sheppard;Helmut Hagleitner

  • Nitride based transistors on semi-insulating silicon carbide substrates

    Scott Thomas Sheppard;Scott Thomas Allen;John Williams Palmour

  • Methods of passivating surfaces of wide bandgap semiconductor devices

    Adam William Saxler;Scott Sheppard;Richard Peter Smith

  • Nitride-based transistors and methods of fabrication thereof using non-etched contact recesses

    Adam William Saxler;Richard Peter Smith;Scott T. Sheppard

  • Methods of fabricating nitride-based transistors with an ETCH stop layer

    Scott T. Sheppard;Andrew K. Mackenzie;Scott T. Allen;Richard P. Smith

  • MANUFACTURING METHOD OF NITRIDE-BASE TRANSISTOR HAVING CAP LAYER AND BURIED GATE

    Scott Sheppard;Smith Richard P

  • Nitride-based transistor with protective layer and low damage recess, and method of fabrication thereof

    Scott T Sheppard;Richard P Smith;Ling Zoltan;ティー.シェパード スコット

  • Semiconductor devices including implanted regions and protective layers

    Scott T. Sheppard;Adam Saxler

  • Methods of fabricating transistors including dielectrically-supported gate electrodes and related devices

    Richard Peter Smith;Scott T. Sheppard

  • Wide bandgap transistors with gate-source field plates

    Yifeng Wu;Primit Parikh;Umesh Mishra;Scott Sheppard

  • Characteristics of inversion-channel and buried-channel MOS devices in 6H-SiC

    S.T. Sheppard;M.R. Melloch;J.A. Cooper

  • Deckschichten beinhaltend Aluminiumnitrid für Nitrid-basierte Transistoren und Verfahren zu deren Herstellung

    Richard Peter Smith;Adam William Saxler;Scott T. Sheppard

  • Passivation of wide band-gap based semiconductor devices with hydrogen-free sputtered nitrides

    Zoltan Ring;Helmut Hagleitner;Jason Patrick Henning;Andrew Mackenzie

  • Wide bandgap semiconductor devices and MMICs for RF power applications

    J.W. Palmour;S.T. Sheppard;R.P. Smith;S.T. Allen

  • Applications of SiC MESFETs and GaN HEMTs in power amplifier design

    W.L. Pribble;J.W. Palmour;S.T. Sheppard;R.P. Smith

  • Capacitor and methods of fabricating the same

    Hagleitner Helmut;W Palmour John;A Lipkind Lori;Kanti Das Mrinal

  • Integrated nitride and silicon carbide-based devices and methods of fabricating integrated nitride-based devices

    Scott T. Sheppard

Frequent Co-Authors

Adam William Saxler
Adam William Saxler Wolfspeed, Inc.
Michael R. Melloch
Michael R. Melloch Purdue University West Lafayette
Yifeng Wu
Yifeng Wu Transphorm Inc.
J.A. Cooper
J.A. Cooper Purdue University West Lafayette
Salah M. Bedair
Salah M. Bedair North Carolina State University
John W. Palmour
John W. Palmour Wolfspeed, Inc.

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