| Discipline name | D-Index | World Ranking | Current World Ranking | National Ranking | Current National Ranking | Publications | Citations |
|---|---|---|---|---|---|---|---|
| Electronics and Electrical Engineering | 98 | 204 | 198 | 97 | 91 | 451 | 40570 |
| Materials Science | 98 | 1148 | 1098 | 371 | 343 | 457 | 40397 |
The chart shows the history of publications by Tomas Palacios between 2000 and 2025, highlighting the no. of papers published in each year and offering an overview of the publication velocity of this scholar. Tomas Palacios published across 26 years, from 2000 to 2025, averaging 20.5 papers a year. Output peaked at 54 publications in 2013. 33 of the 534 publications appeared in the last two years.
534 publications in total across all disciplines
| Year | Publications |
|---|---|
| 2000 | 1 |
| 2001 | 1 |
| 2002 | 11 |
| 2003 | 3 |
| 2004 | 9 |
| 2005 | 8 |
| 2006 | 10 |
| 2007 | 6 |
| 2008 | 8 |
| 2009 | 17 |
| 2010 | 24 |
| 2011 | 30 |
| 2012 | 42 |
| 2013 | 54 |
| 2014 | 43 |
| 2015 | 28 |
| 2016 | 36 |
| 2017 | 34 |
| 2018 | 29 |
| 2019 | 22 |
| 2020 | 25 |
| 2021 | 26 |
| 2022 | 18 |
| 2023 | 16 |
| 2024 | 23 |
| 2025 | 10 |
| Total | 534 |
The chart shows the distribution of publications by all Research.com ranked scientists in the field of Electronics and Electrical Engineering in 2026. The highlighted bar marks where Tomas Palacios sits on this spectrum.
This scientist: 451 publications — 80th percentile
80% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 1,065 publications or more.
| Publications | Scientists | This scientist |
|---|---|---|
| 34–53 | 24 | |
| 54–73 | 52 | |
| 74–93 | 114 | |
| 94–113 | 203 | |
| 114–133 | 269 | |
| 134–153 | 355 | |
| 154–173 | 403 | |
| 174–193 | 445 | |
| 194–213 | 430 | |
| 214–233 | 431 | |
| 234–253 | 399 | |
| 254–273 | 366 | |
| 274–293 | 335 | |
| 294–313 | 300 | |
| 314–333 | 276 | |
| 334–353 | 250 | |
| 354–373 | 214 | |
| 374–393 | 187 | |
| 394–413 | 152 | |
| 414–433 | 169 | |
| 434–453 | 147 | 451 |
| 454–473 | 111 | |
| 474–493 | 117 | |
| 494–513 | 103 | |
| 514–533 | 99 | |
| 534–553 | 92 | |
| 554–573 | 75 | |
| 574–593 | 58 | |
| 594–613 | 69 | |
| 614–633 | 50 | |
| 634–653 | 62 | |
| 654–673 | 54 | |
| 674–693 | 44 | |
| 694–713 | 37 | |
| 714–733 | 28 | |
| 734–753 | 26 | |
| 754–773 | 26 | |
| 774–793 | 19 | |
| 794–813 | 23 | |
| 814–833 | 20 | |
| 834–853 | 16 | |
| 854–873 | 20 | |
| 874–893 | 11 | |
| 894–913 | 11 | |
| 914–933 | 16 | |
| 934–953 | 13 | |
| 954–973 | 10 | |
| 974–993 | 11 | |
| 994–1,013 | 9 | |
| 1,014–1,033 | 9 | |
| 1,034–1,053 | 10 | |
| 1,054–1,064 | 6 | |
| 1,065+ | 99 |
The chart shows the D-index (discipline H-index) distribution of Electronics and Electrical Engineering scientists ranked by Research.com in 2026. The highlighted bar marks where Tomas Palacios sits on this spectrum.
This scientist: 98 D-Index — 97th percentile
97% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 111 D-Index or more.
| D-Index | Scientists | This scientist |
|---|---|---|
| 30 | 178 | |
| 31 | 257 | |
| 32 | 263 | |
| 33 | 262 | |
| 34 | 244 | |
| 35 | 236 | |
| 36 | 211 | |
| 37 | 220 | |
| 38 | 214 | |
| 39 | 214 | |
| 40 | 205 | |
| 41 | 187 | |
| 42 | 194 | |
| 43 | 201 | |
| 44 | 155 | |
| 45 | 189 | |
| 46 | 148 | |
| 47 | 160 | |
| 48 | 134 | |
| 49 | 130 | |
| 50 | 141 | |
| 51 | 156 | |
| 52 | 108 | |
| 53 | 130 | |
| 54 | 112 | |
| 55 | 97 | |
| 56 | 111 | |
| 57 | 102 | |
| 58 | 108 | |
| 59 | 120 | |
| 60 | 103 | |
| 61 | 93 | |
| 62 | 92 | |
| 63 | 74 | |
| 64 | 77 | |
| 65 | 73 | |
| 66 | 64 | |
| 67 | 69 | |
| 68 | 60 | |
| 69 | 39 | |
| 70 | 57 | |
| 71 | 59 | |
| 72 | 46 | |
| 73 | 49 | |
| 74 | 38 | |
| 75 | 35 | |
| 76 | 32 | |
| 77 | 35 | |
| 78 | 31 | |
| 79 | 22 | |
| 80 | 34 | |
| 81 | 31 | |
| 82 | 34 | |
| 83 | 23 | |
| 84 | 18 | |
| 85 | 30 | |
| 86 | 19 | |
| 87 | 19 | |
| 88 | 20 | |
| 89 | 8 | |
| 90 | 17 | |
| 91 | 7 | |
| 92 | 14 | |
| 93 | 9 | |
| 94 | 15 | |
| 95 | 10 | |
| 96 | 12 | |
| 97 | 10 | |
| 98 | 10 | 98 |
| 99 | 12 | |
| 100 | 16 | |
| 101 | 5 | |
| 102 | 7 | |
| 103 | 7 | |
| 104 | 8 | |
| 105 | 9 | |
| 106 | 13 | |
| 107 | 4 | |
| 108 | 5 | |
| 109 | 10 | |
| 110 | 8 | |
| 111+ | 96 |
Tomas Palacios is affiliated with MIT in the United States and specializes in research areas intersecting engineering, materials science, and physics and astronomy. Their primary subfields include electrical and electronic engineering, materials chemistry, condensed matter physics, biomedical engineering, and electronic, optical and magnetic materials.
The scientist's work extensively covers topics such as:
Palacios has published frequently in several respected venues, including:
Notable recent papers authored or co-authored by Palacios include:
Palacios has worked with several frequent co-authors, including:
Their contribution to the field has also been recognized by prestigious awards such as the IEEE Fellow title granted in 2017 for contributions to gallium nitride electron devices and two-dimensional materials.
Gianluca Fiori;Francesco Bonaccorso;Giuseppe Iannaccone;Tomás Palacios
Han Wang;Lili Yu;Yi-Hsien Lee;Yi-Hsien Lee;Yumeng Shi
Ki Kang Kim;Allen Hsu;Xiaoting Jia;Soo Min Kim
H Amano;Y Baines;Matteo Borga
Pin-Chun Shen;Cong Su;Yuxuan Lin;Yuxuan Lin;Ang-Sheng Chou;Ang-Sheng Chou
Su Ryon Shin;Sung Mi Jung;Momen Zalabany;Keekyoung Kim
Yi Hsien Lee;Lili Yu;Han Wang;Wenjing Fang
Yuxuan Lin;Xi Ling;Lili Yu;Shengxi Huang
Lili Yu;Yi Hsien Lee;Xi Ling;Elton J G Santos
Ki Kang Kim;Allen Hsu;Xiaoting Jia;Soo Min Kim
T. Palacios;A. Chakraborty;S. Rajan;C. Poblenz
Soo Min Kim;Allen Hsu;Min Ho Park;Sang Hoon Chae
Amirhasan Nourbakhsh;Ahmad Zubair;Mildred S. Dresselhaus;Tomás Palacios
Amirhasan Nourbakhsh;Ahmad Zubair;Redwan N. Sajjad;K G Amir Tavakkoli
T. Palacios;A. Chakraborty;S. Heikman;S. Keller
J.W. Chung;W.E. Hoke;E.M. Chumbes;T. Palacios
Yi Song;Xinming Li;Charles Mackin;Xu Zhang
Han Wang;Daniel Nezich;Jing Kong;Tomas Palacios
Qiong Ma;Su Yang Xu;Ching Kit Chan;Ching Kit Chan;Cheng Long Zhang
Lin Zhou;Kai Xu;Ahmad Zubair;Albert D. Liao
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