The chart shows the distribution of publications by all Research.com ranked scientists in the field of Electronics and Electrical Engineering in 2026. The highlighted bar marks where Stacia Keller sits on this spectrum.
This scientist: 450 publications — 80th percentile
80% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 1,065 publications or more.
The chart shows the D-index (discipline H-index) distribution of Electronics and Electrical Engineering scientists ranked by Research.com in 2026. The highlighted bar marks where Stacia Keller sits on this spectrum.
This scientist: 78 D-Index — 92nd percentile
92% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 111 D-Index or more.
Stacia Keller is affiliated with the University of California, Santa Barbara in the United States. Their research primarily focuses on semiconductor materials and devices, with significant contributions in GaN-based semiconductor devices and materials as well as related areas such as Ga2O3 and ZnO doping and properties.
Their work spans several key fields including Physics and Astronomy, Engineering, and Materials Science. Within these broader fields, Keller specializes in subfields such as Condensed Matter Physics, Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials, Materials Chemistry, and Atomic and Molecular Physics, and Optics.
Keller's research topics prominently feature GaN-based semiconductor devices and materials, Ga2O3 and related materials, semiconductor quantum structures and devices, radio frequency integrated circuit design, silicon carbide semiconductor technologies, and ZnO doping and properties.
Frequent publication venues for Keller include:
Keller has collaborated extensively with several coauthors, including:
Recent papers authored or coauthored by Keller include:
R. Vetury;N.Q. Zhang;S. Keller;U.K. Mishra
B. Heying;X. H. Wu;S. Keller;Y. Li
Yong-Hoon Cho;G. H. Gainer;A. J. Fischer;J. J. Song
Shigefusa F. Chichibu;Akira Uedono;Akira Uedono;Takeyoshi Onuma;Benjamin A. Haskell
L. Shen;S. Heikman;B. Moran;R. Coffie
T. Palacios;A. Chakraborty;S. Rajan;C. Poblenz
X. H. Wu;C. R. Elsass;A. Abare;M. Mack
X. H. Wu;L. M. Brown;D. Kapolnek;S. Keller
S. F. Chichibu;A. C. Abare;M. S. Minsky;S. Keller
Y. Dora;A. Chakraborty;L. McCarthy;S. Keller
Steven P. Denbaars;Daniel Feezell;Katheryn Kelchner;Siddha Pimputkar
Huili Xing;Y. Dora;A. Chini;S. Heikman
T. Palacios;A. Chakraborty;S. Heikman;S. Keller
Sten Heikman;Stacia Keller;Steven P. DenBaars;Umesh K. Mishra
Y.‐F. Wu;B. P. Keller;S. Keller;D. Kapolnek
D. Kapolnek;X. H. Wu;B. Heying;S. Keller
D. Kapolnek;S. Keller;R. Vetury;R. D. Underwood
G. Parish;S. Keller;P. Kozodoy;J. P. Ibbetson
I. P. Smorchkova;L. Chen;T. Mates;L. Shen
I. Gontijo;M. Boroditsky;E. Yablonovitch;S. Keller
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