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Materials Science

D-Index
65
Citations
14697
World Ranking
5650
National Ranking
1716

Overview

Feng Wu is affiliated with Huazhong University of Science and Technology in China and has contributed extensively to the fields of engineering, physics and astronomy, and materials science. Their research encompasses a range of subfields including electrical and electronic engineering, condensed matter physics, materials chemistry, electronic, optical and magnetic materials, and atomic and molecular physics and optics.

Their scholarly output focuses on topics related to semiconductor and battery materials, including:

  • GaN-based semiconductor devices and materials
  • Semiconductor quantum structures and devices
  • Ga2O3 and related materials
  • ZnO doping and properties
  • Semiconductor materials and devices
  • Advancements in battery materials
  • Advanced battery materials and technologies

Frequent publication venues for Feng Wu include:

  • Applied Physics Letters
  • Advanced Materials
  • Optics Express
  • Journal of Applied Physics
  • Physical Review Applied

Collaborations have been regularly maintained with several researchers including James S. Speck, Shuji Nakamura, Steven P. DenBaars, Jacob Ewing, and Tanay Tak, reflecting ongoing partnerships in advancing semiconductor and materials research.

Significant recent publications include:

  • "Structure of V-defects in long wavelength GaN-based light emitting diodes," 2023, Journal of Applied Physics
  • "Electrolyte Regulation toward Cathodes with Enhanced-Performance in Aqueous Zinc Ion Batteries," 2025, Advanced Materials
  • "Natural graphite anode for advanced lithium-ion Batteries: Challenges, Progress, and Perspectives," 2024, Chemical Engineering Journal
  • "Metal oxide catalyzed epitaxy (MOCATAXY) of β-Ga2O3 films in various orientations grown by plasma-assisted molecular beam epitaxy," 2020, APL Materials
  • "AlGaN Deep-Ultraviolet Light-Emitting Diodes Grown on SiC Substrates," 2020, ACS Photonics

Best Publications

  • Structural characterization of nonpolar (112̄0) a-plane GaN thin films grown on (11̄02) r-plane sapphire

    M. D. Craven;S. H. Lim;F. Wu;J. S. Speck

  • Ruthenium atomically dispersed in carbon outperforms platinum toward hydrogen evolution in alkaline media.

    Bingzhang Lu;Lin Guo;Lin Guo;Feng Wu;Yi Peng

  • Optical properties of yellow light-emitting diodes grown on semipolar (112¯2) bulk GaN substrates

    Hitoshi Sato;Roy B. Chung;Hirohiko Hirasawa;Natalie Fellows

  • A GaN bulk crystal with improved structural quality grown by the ammonothermal method.

    Tadao Hashimoto;Feng Wu;James S. Speck;Shuji Nakamura

  • Defect reduction in (112̄0) a-plane gallium nitride via lateral epitaxial overgrowth by hydride vapor-phase epitaxy

    B. A. Haskell;F. Wu;M. D. Craven;S. Matsuda

  • Demonstration of a semipolar (101¯3¯) InGaN /GaN green light emitting diode

    R. Sharma;P. M. Pattison;H. Masui;R. M. Farrell

  • High efficiency and fast van der Waals hetero-photodiodes with a unilateral depletion region.

    Feng Wu;Qing Li;Peng Wang;Hui Xia

  • Materials and growth issues for high-performance nonpolar and semipolar light-emitting devices

    R M Farrell;E C Young;F Wu;S P DenBaars

  • Threading dislocation reduction via laterally overgrown nonpolar (112̄0)a-plane GaN

    M. D. Craven;S. H. Lim;F. Wu;J. S. Speck

  • High power and high efficiency blue light emitting diode on freestanding semipolar (101¯1¯) bulk GaN substrate

    Hong Zhong;Anurag Tyagi;Natalie N. Fellows;Feng Wu

  • Carbon doping switching on the hydrogen adsorption activity of NiO for hydrogen evolution reaction

    Tianyi Kou;Mingpeng Chen;Feng Wu;Tyler J. Smart

  • Improved electroluminescence on nonpolar m -plane InGaN/GaN quantum wells LEDs

    Kwang-Choong Kim;Mathew C. Schmidt;Hitoshi Sato;Feng Wu

  • Characterization of Planar Semipolar Gallium Nitride Films on Spinel Substrates

    Troy J. Baker;Benjamin A. Haskell;Feng Wu;James S. Speck

  • Blackbody-sensitive room-temperature infrared photodetectors based on low-dimensional tellurium grown by chemical vapor deposition.

    Meng Peng;Meng Peng;Runzhang Xie;Zhen Wang;Peng Wang

  • Structural and morphological characteristics of planar (112̄0) a-plane gallium nitride grown by hydride vapor phase epitaxy

    B. A. Haskell;F. Wu;S. Matsuda;M. D. Craven

  • Partial strain relaxation via misfit dislocation generation at heterointerfaces in (Al,In)GaN epitaxial layers grown on semipolar (112¯2) GaN free standing substrates

    Anurag Tyagi;Feng Wu;Erin C. Young;Arpan Chakraborty

  • Basal plane misfit dislocations and stress relaxation in III-nitride semipolar heteroepitaxy

    Alexey E. Romanov;Erin C. Young;Feng Wu;Anurag Tyagi

  • β-(AlxGa1−x)2O3/Ga2O3 (010) heterostructures grown on β-Ga2O3 (010) substrates by plasma-assisted molecular beam epitaxy

    Stephen W. Kaun;Feng Wu;James S. Speck

  • Influence of the substrate misorientation on the properties of N-polar GaN films grown by metal organic chemical vapor deposition

    S. Keller;N. A. Fichtenbaum;F. Wu;D. Brown

  • Improved quality (112¯0)a-plane GaN with sidewall lateral epitaxial overgrowth

    Bilge M. Imer;Feng Wu;Steven P. DenBaars;James S. Speck

  • Microstructural evolution of a-plane GaN grown on a-plane SiC by metalorganic chemical vapor deposition

    M. D. Craven;F. Wu;A. Chakraborty;B. Imer

Frequent Co-Authors

James S. Speck
James S. Speck University of California, Santa Barbara
Steven P. DenBaars
Steven P. DenBaars University of California, Santa Barbara
Shuji Nakamura
Shuji Nakamura University of California, Santa Barbara
Umesh K. Mishra
Umesh K. Mishra University of California, Santa Barbara
Stacia Keller
Stacia Keller University of California, Santa Barbara
Kenji Fujito
Kenji Fujito Mitsubishi Chemical Corporation
Arpan Chakraborty
Arpan Chakraborty Apple (United States)
Gregor Koblmüller
Gregor Koblmüller Technical University of Munich
Paul T. Fini
Paul T. Fini Raytheon (United States)
Man Hoi Wong
Man Hoi Wong Hong Kong University of Science and Technology

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