The chart shows the distribution of publications by all Research.com ranked scientists in the field of Electronics and Electrical Engineering in 2026. The highlighted bar marks where Daniel F. Feezell sits on this spectrum.
This scientist: 140 publications — 11th percentile
11% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 1,065 publications or more.
The chart shows the D-index (discipline H-index) distribution of Electronics and Electrical Engineering scientists ranked by Research.com in 2026. The highlighted bar marks where Daniel F. Feezell sits on this spectrum.
This scientist: 37 D-Index — 27th percentile
27% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 111 D-Index or more.
Daniel F. Feezell is affiliated with the University of New Mexico in the United States. Their research spans physics and astronomy as well as engineering, with focused expertise in semiconductor devices and materials.
The primary fields of study associated with their work include:
Within these disciplines, Feezell's research covers several subfields such as:
Their main research topics highlight specific areas of material science and device engineering, including:
Feezell's publication record involves contributions to several prominent journals. Frequent publication venues include:
Notable recent papers authored or coauthored by Feezell include:
Frequent collaborators working alongside Feezell include:
Steven P. Denbaars;Daniel Feezell;Katheryn Kelchner;Siddha Pimputkar
James W. Raring;Daniel F. Feezell;Shuji Nakamura
D. F. Feezell;J. S. Speck;S. P. DenBaars;S. Nakamura
Mathew C. Schmidt;Kwang-Choong Kim;Robert M. Farrell;Daniel F. Feezell
James W. Raring;Daniel F. Feezell;Mark P. D'Evelyn
James W. Raring;Daniel F. Feezell
Yuji Zhao;Shinichi Tanaka;Chih Chien Pan;Kenji Fujito
Robert M. Farrell;Mathew C. Schmidt;Kwang Choong Kim;Hisashi Masui
Yuji Zhao;Qimin Yan;Chia Yen Huang;Shih Chieh Huang
Daniel F. Feezell;Daniel A. Cohen;Robert M. Farrell;Masahiro Ishida
James W. Raring;Daniel F. Feezell;Nicholas J. Pfister;Rajat Sharma
James W. Raring;Daniel F. Feezell;Shuji Nakamura
Anurag Tyagi;Hong Zhong;Roy B. Chung;Daniel F. Feezell
Matthew T. Hardy;Daniel F. Feezell;Steven P. DenBaars;Shuji Nakamura
Casey Holder;James S. Speck;Steven P. DenBaars;Shuji Nakamura
James W. Raring;Daniel F. Feezell;Nick Pfister
James W. Raring;Daniel F. Feezell
Daniel F. Feezell;Matthew C. Schmidt;Kwang Choong Kim;Robert M. Farrell
Daniel F. Feezell;Mathew C. Schmidt;Steven P. DenBaars;Shuji Nakamura
Christiane Poblenz;Mathew C. Schmidt;Daniel F. Feezell;James W. Raring
Chih-Chien Pan;Shinichi Tanaka;Feng Wu;Yuji Zhao
Daniel Feezell;Shuji Nakamura
Changyi Li;Jeremy B. Wright;Sheng Liu;Ping Lu
Daniel F. Feezell;Mathew C. Schmidt;Robert M. Farrell;Kwang-Choong Kim
Arman Rashidi;Morteza Monavarian;Andrew Aragon;Ashwin Rishinaramangalam
Robert M. Farrell;Daniel F. Feezell;Mathew C. Schmidt;Daniel A. Haeger
Po Shan Hsu;Matthew T. Hardy;Feng Wu;Ingrid Koslow
Yuji Zhao;Shinichi Tanaka;Qimin Yan;Chia Yen Huang
Yoshinobu Kawaguchi;Chia Yen Huang;Yuh Renn Wu;Qimin Yan
Mohsen Nami;Isaac E. Stricklin;Kenneth M. DaVico;Saadat Mishkat-Ul-Masabih
C. O. Holder;J. T. Leonard;R. M. Farrell;D. A. Cohen
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