What is he best known for?
The fields of study he is best known for:
- Optics
- Quantum mechanics
- Laser
Steven R. J. Brueck mainly investigates Optics, Optoelectronics, Nanotechnology, Lithography and Photolithography.
His study involves Refractive index, Interferometry, Surface plasmon, Laser and Interferometric microscopy, a branch of Optics.
His Refractive index research is multidisciplinary, relying on both Terahertz radiation, Magnetic field and Metamaterial.
His research integrates issues of Layer, Epitaxy, Transmission electron microscopy and Amplified spontaneous emission in his study of Optoelectronics.
His research investigates the connection between Nanotechnology and topics such as Interference lithography that intersect with issues in Composite material.
His study in Lithography is interdisciplinary in nature, drawing from both Range, Wafer, Photoresist, Spin coating and Moiré pattern.
His most cited work include:
- Experimental Demonstration of Near-Infrared Negative-Index Metamaterials (1044 citations)
- Large second-order nonlinearity in poled fused silica. (638 citations)
- Near-infrared double negative metamaterials (291 citations)
What are the main themes of his work throughout his whole career to date?
His primary areas of investigation include Optics, Optoelectronics, Laser, Lithography and Nanotechnology.
Grating, Photolithography, Refractive index, Interferometry and Wavelength are subfields of Optics in which his conducts study.
In his work, Numerical aperture is strongly intertwined with Spatial frequency, which is a subfield of Photolithography.
His Optoelectronics study integrates concerns from other disciplines, such as Substrate and Epitaxy.
Steven R. J. Brueck interconnects Nanowire and Atomic physics in the investigation of issues within Laser.
Steven R. J. Brueck has included themes like Photoresist and Next-generation lithography in his Lithography study.
He most often published in these fields:
- Optics (49.27%)
- Optoelectronics (49.06%)
- Laser (16.70%)
What were the highlights of his more recent work (between 2010-2021)?
- Optoelectronics (49.06%)
- Optics (49.27%)
- Laser (16.70%)
In recent papers he was focusing on the following fields of study:
Optoelectronics, Optics, Laser, Nanotechnology and Nanowire are his primary areas of study.
His Optoelectronics research includes themes of Layer, Gallium nitride and Substrate.
Grating, Plasmon, Refractive index, Photonic crystal and Photodetector are the core of his Optics study.
The study incorporates disciplines such as Electrical contacts, Radiation and Metamaterial in addition to Refractive index.
The various areas that he examines in his Nanotechnology study include Vacancy defect and Interference lithography.
His Nanowire study combines topics in areas such as Band gap, Polarization and Semiconductor.
Between 2010 and 2021, his most popular works were:
- Nanostructures and Functional Materials Fabricated by Interferometric Lithography (171 citations)
- A monolithically integrated plasmonic infrared quantum dot camera. (120 citations)
- Structural illumination and evanescent coupling for the extension of imaging interferometric microscopy (40 citations)
In his most recent research, the most cited papers focused on:
- Quantum mechanics
- Optics
- Laser
Steven R. J. Brueck mainly focuses on Optoelectronics, Optics, Nanowire, Epitaxy and Nanotechnology.
His studies in Optoelectronics integrate themes in fields like Quantum well and Laser.
His Optics study frequently draws parallels with other fields, such as Electrical contacts.
Steven R. J. Brueck has researched Nanowire in several fields, including Nanoscopic scale, Light-emitting diode and Semiconductor.
In Epitaxy, Steven R. J. Brueck works on issues like Substrate, which are connected to Silicon and Phase.
His work deals with themes such as Interference and Titanium oxide, which intersect with Nanotechnology.
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